ATE358888T1 - Belichtungsverfahren und belichtungsapparat - Google Patents

Belichtungsverfahren und belichtungsapparat

Info

Publication number
ATE358888T1
ATE358888T1 AT98933930T AT98933930T ATE358888T1 AT E358888 T1 ATE358888 T1 AT E358888T1 AT 98933930 T AT98933930 T AT 98933930T AT 98933930 T AT98933930 T AT 98933930T AT E358888 T1 ATE358888 T1 AT E358888T1
Authority
AT
Austria
Prior art keywords
exposure
transmittance
optical system
wafer
time
Prior art date
Application number
AT98933930T
Other languages
English (en)
Inventor
Masahiro Nei
Taro Ogata
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP19971097A external-priority patent/JP2002023382A/ja
Priority claimed from JP06702198A external-priority patent/JP4029200B2/ja
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of ATE358888T1 publication Critical patent/ATE358888T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electron Beam Exposure (AREA)
AT98933930T 1997-07-25 1998-07-24 Belichtungsverfahren und belichtungsapparat ATE358888T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP19971097A JP2002023382A (ja) 1997-07-25 1997-07-25 投影露光装置および投影露光方法
JP33710497 1997-12-08
JP06702198A JP4029200B2 (ja) 1997-12-08 1998-03-17 投影露光装置、投影露光方法、光洗浄方法および半導体デバイスの製造方法

Publications (1)

Publication Number Publication Date
ATE358888T1 true ATE358888T1 (de) 2007-04-15

Family

ID=27299335

Family Applications (1)

Application Number Title Priority Date Filing Date
AT98933930T ATE358888T1 (de) 1997-07-25 1998-07-24 Belichtungsverfahren und belichtungsapparat

Country Status (7)

Country Link
US (1) US6492649B1 (de)
EP (1) EP1009020B1 (de)
KR (1) KR100564437B1 (de)
AT (1) ATE358888T1 (de)
AU (1) AU8358198A (de)
DE (1) DE69837483T2 (de)
WO (1) WO1999005710A1 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999027568A1 (en) 1997-11-21 1999-06-03 Nikon Corporation Projection aligner and projection exposure method
WO1999052130A1 (en) 1998-04-07 1999-10-14 Nikon Corporation Exposure method, exposure apparatus, method of producing the same, device, and method of fabricating the same
JP2001110710A (ja) 1999-10-08 2001-04-20 Nikon Corp 露光装置、露光方法、および半導体デバイスの製造方法
JP2001267239A (ja) 2000-01-14 2001-09-28 Nikon Corp 露光方法及び装置、並びにデバイス製造方法
JP3302965B2 (ja) * 2000-02-15 2002-07-15 株式会社東芝 露光装置の検査方法
US20020041377A1 (en) * 2000-04-25 2002-04-11 Nikon Corporation Aerial image measurement method and unit, optical properties measurement method and unit, adjustment method of projection optical system, exposure method and apparatus, making method of exposure apparatus, and device manufacturing method
JP3630624B2 (ja) * 2000-09-18 2005-03-16 株式会社日立製作所 欠陥検査装置および欠陥検査方法
JP2002195819A (ja) * 2000-12-27 2002-07-10 Nikon Corp 形状測定方法、形状測定装置、露光方法、露光装置、及びデバイス製造方法
JP4345098B2 (ja) * 2001-02-06 2009-10-14 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
EP1329773A3 (de) * 2002-01-18 2006-08-30 ASML Netherlands B.V. Lithographischer Apparat, Verfahren zur Reinigung des Apparats und Verfahren zur Herstellung eines Artikels
US6930326B2 (en) * 2002-03-26 2005-08-16 Semiconductor Energy Laboratory Co., Ltd. Semiconductor circuit and method of fabricating the same
JP3720788B2 (ja) * 2002-04-15 2005-11-30 キヤノン株式会社 投影露光装置及びデバイス製造方法
DE102006039760A1 (de) * 2006-08-24 2008-03-13 Carl Zeiss Smt Ag Beleuchtungssystem mit einem Detektor zur Aufnahme einer Lichtintensität
JP2008277585A (ja) 2007-04-27 2008-11-13 Canon Inc 露光装置の洗浄装置及び露光装置
RU2369866C1 (ru) * 2008-01-09 2009-10-10 Федеральное государственное учреждение "Федеральный государственный научно-исследовательский испытательный центр радиоэлектронной борьбы и оценки эффективности снижения заметности" Министерства обороны Российской Федерации Способ комплексного мониторинга окружающей среды региона
CN102707568B (zh) * 2012-06-08 2014-07-16 北京工业大学 多台阶器件结构底层表面的光刻方法
JP6768561B2 (ja) * 2017-03-01 2020-10-14 株式会社Ｓｃｒｅｅｎホールディングス 露光装置、基板処理装置、基板の露光方法および基板処理方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3378271B2 (ja) 1992-06-11 2003-02-17 株式会社ニコン 露光方法及び装置、並びに前記方法を使用するデバイス製造方法
JP2856608B2 (ja) * 1992-08-28 1999-02-10 山形日本電気株式会社 半導体露光装置
JP2765422B2 (ja) * 1992-12-28 1998-06-18 キヤノン株式会社 露光装置及びそれを用いた半導体素子の製造方法
US5677757A (en) * 1994-03-29 1997-10-14 Nikon Corporation Projection exposure apparatus
JP3412981B2 (ja) * 1995-08-29 2003-06-03 キヤノン株式会社 投影露光装置および投影露光方法
KR100210569B1 (ko) * 1995-09-29 1999-07-15 미따라이 하지메 노광방법 및 노광장치, 그리고 이를 이용한 디바이스제조방법
JP3459742B2 (ja) 1996-01-17 2003-10-27 キヤノン株式会社 露光装置及びそれを用いたデバイスの製造方法
JPH10116766A (ja) 1996-10-11 1998-05-06 Canon Inc 露光装置及びデバイス製造方法
TW398029B (en) 1997-04-18 2000-07-11 Nikon Corp Exposure device, method of manufacturing the same and the electric circuit
WO1998048452A1 (en) 1997-04-18 1998-10-29 Nikon Corporation Method and device for exposure control, method and device for exposure, and method of manufacture of device
EP0874283B1 (de) 1997-04-23 2003-09-03 Nikon Corporation Optischer Belichtungsapparat und optisches Reinigungsverfahren
WO1998057213A1 (en) 1997-06-10 1998-12-17 Nikon Corporation Optical device, method of cleaning the same, projection aligner, and method of producing the same

Also Published As

Publication number Publication date
EP1009020A1 (de) 2000-06-14
EP1009020B1 (de) 2007-04-04
DE69837483D1 (de) 2007-05-16
EP1009020A4 (de) 2005-05-04
KR20010030561A (ko) 2001-04-16
DE69837483T2 (de) 2007-12-20
KR100564437B1 (ko) 2006-03-29
US6492649B1 (en) 2002-12-10
WO1999005710A1 (en) 1999-02-04
AU8358198A (en) 1999-02-16

Similar Documents

Publication Publication Date Title
DE69837483D1 (de) Belichtungsverfahren und Belichtungsapparat
FI935738A0 (fi) Belysnings- och avbildningsundersystem foer ett linskontrollsystem
NO934717D0 (no) Fremgangsmaate for inspisering av optalmise linser
EP1014429A4 (de) Verfahren und vorrichtung zur belichtungssteuerung, verfahren und vorrichtung zur belichtung, und verfahren zur herstellung dieser vorrichtung
ATE112398T1 (de) Flüssigkristallprojektor und verfahren.
JPS54111832A (en) Exposure device
ATE441157T1 (de) Optische sensoreinrichtung und verfahren zur steuerung ihrer belichtungszeit
TW429413B (en) Projection exposure device, projection exposure method, optical cleaning method, and the method of fabricating semiconductor device
JPS5779922A (en) Automatic focusing camera
JPS5455429A (en) Automatic exposure control device for camera with blur detecting circuit
ATE221226T1 (de) Beleuchterungsverfahren und vorrichtung fuer photosensibele materialen
JPS54149421A (en) Image pickup system
SU853821A1 (ru) Устройство автоматической регули-РОВКи чуВСТВиТЕльНОСТи дАТчиКА изОбРАжЕНи
JPS5677865A (en) Optical reflection system
JPS6431139A (en) Image recorder
JPS6464462A (en) Device for reading image of microfilm
KR980003870A (ko) 반도체 사진 식각 공정의 노광방법
JPS5533182A (en) Camera for photomechanical process
JPS6443733A (en) Photometry circuit
JPS6432623A (en) Aligner
JPS5579471A (en) Exposure method in copying machine
JPS57172332A (en) Dimming confirmation system using focusing detector
JPS56106227A (en) Photometric device of reflex photometric system camera
JPS6478082A (en) Automatic exposure control method for electronic still camera
JPS56154723A (en) Film cassette of camera for endoscope

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties