ATE360666T1 - Verfahren zur herstellung von beschichtungen unter verwendung von sich an der oberfläche ansammelnden photoinitiatoren - Google Patents

Verfahren zur herstellung von beschichtungen unter verwendung von sich an der oberfläche ansammelnden photoinitiatoren

Info

Publication number
ATE360666T1
ATE360666T1 AT01974127T AT01974127T ATE360666T1 AT E360666 T1 ATE360666 T1 AT E360666T1 AT 01974127 T AT01974127 T AT 01974127T AT 01974127 T AT01974127 T AT 01974127T AT E360666 T1 ATE360666 T1 AT E360666T1
Authority
AT
Austria
Prior art keywords
photoinitiators
collecting
formulation
producing coatings
exposure
Prior art date
Application number
AT01974127T
Other languages
English (en)
Inventor
Gisele Baudin
Tunja Jung
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Application granted granted Critical
Publication of ATE360666T1 publication Critical patent/ATE360666T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/73—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
    • C07C69/738—Esters of keto-carboxylic acids or aldehydo-carboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Silicon Polymers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
AT01974127T 2000-08-14 2001-08-07 Verfahren zur herstellung von beschichtungen unter verwendung von sich an der oberfläche ansammelnden photoinitiatoren ATE360666T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP00810720 2000-08-14

Publications (1)

Publication Number Publication Date
ATE360666T1 true ATE360666T1 (de) 2007-05-15

Family

ID=8174856

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01974127T ATE360666T1 (de) 2000-08-14 2001-08-07 Verfahren zur herstellung von beschichtungen unter verwendung von sich an der oberfläche ansammelnden photoinitiatoren

Country Status (13)

Country Link
US (1) US7279200B2 (de)
EP (1) EP1311627B1 (de)
JP (1) JP5068413B2 (de)
KR (1) KR100818643B1 (de)
CN (1) CN1211439C (de)
AT (1) ATE360666T1 (de)
AU (1) AU2001293732A1 (de)
BR (1) BR0113233B1 (de)
CA (1) CA2417112A1 (de)
DE (1) DE60128105T8 (de)
MX (1) MXPA03001383A (de)
TW (1) TWI244495B (de)
WO (1) WO2002014439A2 (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10022352A1 (de) * 2000-05-08 2001-11-22 Georg Gros Verfahren zur Beschichtung von elektrolytisch- oder feuerverzinkten Blechen
US20030185990A1 (en) * 2000-09-25 2003-10-02 Klaus Bittner Method for pretreating and coating metal surfaces prior to forming, with a paint-like coating and use of substrates so coated
WO2003066688A1 (en) 2002-02-04 2003-08-14 Ciba Specialty Chemicals Holding Inc. Surface-active siloxane photoinitiators
CA2471810A1 (en) * 2002-02-04 2003-08-14 Ciba Speciality Chemicals Holding Inc. Fluorinated photoinitiators in highly fluorinated monomers
US7005281B2 (en) 2002-03-06 2006-02-28 Ciba Specialty Chemicals Corp. Enzymatic process for preparing organosilicon group containing photoinitiators
CA2483004A1 (en) * 2002-04-26 2003-11-06 Ciba Specialty Chemicals Holding Inc. Incorporable photoinitiator
US20040115363A1 (en) * 2002-12-13 2004-06-17 Desai Umesh C. Sealant and sound dampening composition
AU2004245242A1 (en) * 2003-06-06 2004-12-16 Ciba Specialty Chemicals Holding Inc. Novel surface-active polysiloxane photoinitiators
EP1781750A4 (de) * 2004-07-27 2012-08-08 Duluxgroup Australia Pty Ltd System zur bereitstellung eines pulverlackierten holzwerkstoffs
CN101044023B (zh) * 2004-10-22 2010-05-05 三菱丽阳株式会社 热成形用消光丙烯酸树脂膜状物、其制造方法以及含有其的层叠体
US20060234026A1 (en) * 2005-04-18 2006-10-19 Huusken Robert W M Non-combustible high pressure laminate
US7919222B2 (en) * 2006-01-29 2011-04-05 Rohm And Haas Electronics Materials Llc Coating compositions for use with an overcoated photoresist
WO2008040650A2 (en) * 2006-10-03 2008-04-10 Ciba Holding Inc. Photocurable compositions comprising a photoinitiator of the phenylglyoxylate type
US8680176B2 (en) * 2007-03-21 2014-03-25 The University Of Southern Mississippi Nanoencapsulation of isocyanates via aqueous media
US20100276059A1 (en) * 2009-04-30 2010-11-04 Dong Tian UVV curable coating compositions and method for coating flooring and other substrates with same
CN101880482B (zh) * 2010-07-12 2012-10-24 重庆大学 一种偶合接枝改性纳米金属氧化物的方法
DE102014107518A1 (de) * 2014-05-28 2015-12-03 Heraeus Kulzer Gmbh Reaktiver Mikro-Applikator mit Metall enthaltenden Additiven zur Verwendung mit dental Adhäsiven
EP3341792A1 (de) * 2015-12-22 2018-07-04 Carbon, Inc. Doppelvorläufer-harzsysteme zur generativen fertigung mit doppelhärtungsharzen
JP6531729B2 (ja) * 2016-07-19 2019-06-19 株式会社Sumco シリコン試料の炭素濃度評価方法、シリコンウェーハ製造工程の評価方法、シリコンウェーハの製造方法およびシリコン単結晶インゴットの製造方法
CN213006569U (zh) 2017-06-21 2021-04-20 卡本有限公司 用于增材制造的系统和对分配用于增材制造的树脂有用的分配系统
US11793289B2 (en) 2018-03-08 2023-10-24 Applied Lacquer Industries Inc. Artificial nail tip and curing composition set and applying method thereof
US11304492B2 (en) * 2018-03-08 2022-04-19 Applied Lacquer Industries Inc. Artificial nail tip and curing composition set and applying method thereof
CN113583539B (zh) * 2021-08-11 2022-05-10 武汉工程大学 一种光学树脂组合物及其制备方法和应用
CN114409902B (zh) * 2021-12-27 2023-04-25 北京化工大学 多功能型pdms基预聚体、基于该预聚体的膜及其制备
KR102880444B1 (ko) * 2022-03-07 2025-11-11 주식회사 엘지화학 화합물
JP7722248B2 (ja) 2022-04-22 2025-08-13 信越化学工業株式会社 光反応性オルガノポリシロキサン、その製造方法および光硬化性組成物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3991416A (en) 1975-09-18 1976-11-09 Hughes Aircraft Company AC biased and resonated liquid crystal display
US4038164A (en) * 1975-09-18 1977-07-26 Stauffer Chemical Company Photopolymerizable aryl and heterocyclic glyoxylate compositions and process
CA2275667A1 (en) * 1997-01-30 1998-08-06 Ciba Specialty Chemicals Holding Inc. Non-volatile phenylglyoxalic esters
TW557298B (en) * 2000-08-14 2003-10-11 Ciba Sc Holding Ag A compound, a photopolymerizible composition, a process for producing coatings and a method for causing a photoinitiator to accumulate at the surface of coatings

Also Published As

Publication number Publication date
CN1447844A (zh) 2003-10-08
CN1211439C (zh) 2005-07-20
KR100818643B1 (ko) 2008-04-04
CA2417112A1 (en) 2002-02-21
TWI244495B (en) 2005-12-01
DE60128105T2 (de) 2007-12-27
DE60128105D1 (de) 2007-06-06
KR20030055249A (ko) 2003-07-02
US20030213931A1 (en) 2003-11-20
EP1311627A2 (de) 2003-05-21
DE60128105T8 (de) 2008-04-30
MXPA03001383A (es) 2003-06-06
BR0113233B1 (pt) 2013-10-01
JP2004506776A (ja) 2004-03-04
BR0113233A (pt) 2003-06-24
JP5068413B2 (ja) 2012-11-07
WO2002014439A3 (en) 2002-06-13
EP1311627B1 (de) 2007-04-25
AU2001293732A1 (en) 2002-02-25
US7279200B2 (en) 2007-10-09
WO2002014439A2 (en) 2002-02-21

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