ATE360666T1 - Verfahren zur herstellung von beschichtungen unter verwendung von sich an der oberfläche ansammelnden photoinitiatoren - Google Patents

Verfahren zur herstellung von beschichtungen unter verwendung von sich an der oberfläche ansammelnden photoinitiatoren

Info

Publication number
ATE360666T1
ATE360666T1 AT01974127T AT01974127T ATE360666T1 AT E360666 T1 ATE360666 T1 AT E360666T1 AT 01974127 T AT01974127 T AT 01974127T AT 01974127 T AT01974127 T AT 01974127T AT E360666 T1 ATE360666 T1 AT E360666T1
Authority
AT
Austria
Prior art keywords
photoinitiators
collecting
formulation
producing coatings
exposure
Prior art date
Application number
AT01974127T
Other languages
English (en)
Inventor
Gisele Baudin
Tunja Jung
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Application granted granted Critical
Publication of ATE360666T1 publication Critical patent/ATE360666T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/73—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
    • C07C69/738—Esters of keto-carboxylic acids or aldehydo-carboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Silicon Polymers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
AT01974127T 2000-08-14 2001-08-07 Verfahren zur herstellung von beschichtungen unter verwendung von sich an der oberfläche ansammelnden photoinitiatoren ATE360666T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP00810720 2000-08-14

Publications (1)

Publication Number Publication Date
ATE360666T1 true ATE360666T1 (de) 2007-05-15

Family

ID=8174856

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01974127T ATE360666T1 (de) 2000-08-14 2001-08-07 Verfahren zur herstellung von beschichtungen unter verwendung von sich an der oberfläche ansammelnden photoinitiatoren

Country Status (13)

Country Link
US (1) US7279200B2 (de)
EP (1) EP1311627B1 (de)
JP (1) JP5068413B2 (de)
KR (1) KR100818643B1 (de)
CN (1) CN1211439C (de)
AT (1) ATE360666T1 (de)
AU (1) AU2001293732A1 (de)
BR (1) BR0113233B1 (de)
CA (1) CA2417112A1 (de)
DE (1) DE60128105T8 (de)
MX (1) MXPA03001383A (de)
TW (1) TWI244495B (de)
WO (1) WO2002014439A2 (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10022352A1 (de) * 2000-05-08 2001-11-22 Georg Gros Verfahren zur Beschichtung von elektrolytisch- oder feuerverzinkten Blechen
WO2002024344A2 (de) * 2000-09-25 2002-03-28 Chemetall Gmbh Verfahren zur vorbehandlung und beschichtung von metallischen oberflächen vor der umformung mit einem lackähnlichen überzug und verwendung der derart beschichteten substrate
CN1289556C (zh) * 2002-02-04 2006-12-13 西巴特殊化学品控股有限公司 在高氟化单体中的氟化光引发剂
ATE402195T1 (de) 2002-02-04 2008-08-15 Ciba Holding Inc Oberflächenaktive siloxanphotoinitiatoren
JP4339694B2 (ja) 2002-03-06 2009-10-07 チバ ホールディング インコーポレーテッド 有機ケイ素基を含有する光開始剤を調製するための酵素的方法
ES2259413T3 (es) * 2002-04-26 2006-10-01 Ciba Specialty Chemicals Holding Inc. Fotoiniciador incorporable.
US20040115363A1 (en) * 2002-12-13 2004-06-17 Desai Umesh C. Sealant and sound dampening composition
JP4767840B2 (ja) * 2003-06-06 2011-09-07 チバ ホールディング インコーポレーテッド 新規な界面活性ポリシロキサン光開始剤
CN101061196B (zh) * 2004-07-27 2010-10-27 澳大利亚澳瑞凯有限公司 用于提供粉末涂布的再生纤维素基材的系统
KR20070070207A (ko) * 2004-10-22 2007-07-03 미츠비시 레이온 가부시키가이샤 열 성형용 매트 아크릴 수지 필름상 물건, 이의 제조방법,및 이를 포함하는 적층체
US20060234026A1 (en) * 2005-04-18 2006-10-19 Huusken Robert W M Non-combustible high pressure laminate
US7919222B2 (en) * 2006-01-29 2011-04-05 Rohm And Haas Electronics Materials Llc Coating compositions for use with an overcoated photoresist
JP2010505977A (ja) * 2006-10-03 2010-02-25 チバ ホールディング インコーポレーテッド フェニルグリオキシレート型の光開始剤を含む光硬化性組成物
US8680176B2 (en) * 2007-03-21 2014-03-25 The University Of Southern Mississippi Nanoencapsulation of isocyanates via aqueous media
US20100276059A1 (en) * 2009-04-30 2010-11-04 Dong Tian UVV curable coating compositions and method for coating flooring and other substrates with same
CN101880482B (zh) * 2010-07-12 2012-10-24 重庆大学 一种偶合接枝改性纳米金属氧化物的方法
DE102014107518A1 (de) * 2014-05-28 2015-12-03 Heraeus Kulzer Gmbh Reaktiver Mikro-Applikator mit Metall enthaltenden Additiven zur Verwendung mit dental Adhäsiven
JP7189015B2 (ja) * 2015-12-22 2022-12-13 カーボン，インコーポレイテッド 二重硬化樹脂を用いた積層造形のための二重前駆体樹脂システム
JP6531729B2 (ja) * 2016-07-19 2019-06-19 株式会社Sumco シリコン試料の炭素濃度評価方法、シリコンウェーハ製造工程の評価方法、シリコンウェーハの製造方法およびシリコン単結晶インゴットの製造方法
JP6894015B2 (ja) 2017-06-21 2021-06-23 カーボン，インコーポレイテッド 積層造形の方法
US11793289B2 (en) 2018-03-08 2023-10-24 Applied Lacquer Industries Inc. Artificial nail tip and curing composition set and applying method thereof
US11304492B2 (en) * 2018-03-08 2022-04-19 Applied Lacquer Industries Inc. Artificial nail tip and curing composition set and applying method thereof
CN113583539B (zh) * 2021-08-11 2022-05-10 武汉工程大学 一种光学树脂组合物及其制备方法和应用
CN114409902B (zh) * 2021-12-27 2023-04-25 北京化工大学 多功能型pdms基预聚体、基于该预聚体的膜及其制备
WO2023172029A1 (ko) * 2022-03-07 2023-09-14 주식회사 엘지화학 화합물
JP7722248B2 (ja) 2022-04-22 2025-08-13 信越化学工業株式会社 光反応性オルガノポリシロキサン、その製造方法および光硬化性組成物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4038164A (en) * 1975-09-18 1977-07-26 Stauffer Chemical Company Photopolymerizable aryl and heterocyclic glyoxylate compositions and process
US3991416A (en) * 1975-09-18 1976-11-09 Hughes Aircraft Company AC biased and resonated liquid crystal display
CA2275667A1 (en) * 1997-01-30 1998-08-06 Ciba Specialty Chemicals Holding Inc. Non-volatile phenylglyoxalic esters
TW557298B (en) * 2000-08-14 2003-10-11 Ciba Sc Holding Ag A compound, a photopolymerizible composition, a process for producing coatings and a method for causing a photoinitiator to accumulate at the surface of coatings

Also Published As

Publication number Publication date
TWI244495B (en) 2005-12-01
US20030213931A1 (en) 2003-11-20
DE60128105T8 (de) 2008-04-30
CN1211439C (zh) 2005-07-20
AU2001293732A1 (en) 2002-02-25
CA2417112A1 (en) 2002-02-21
WO2002014439A3 (en) 2002-06-13
EP1311627A2 (de) 2003-05-21
JP2004506776A (ja) 2004-03-04
BR0113233B1 (pt) 2013-10-01
CN1447844A (zh) 2003-10-08
US7279200B2 (en) 2007-10-09
DE60128105D1 (de) 2007-06-06
JP5068413B2 (ja) 2012-11-07
MXPA03001383A (es) 2003-06-06
DE60128105T2 (de) 2007-12-27
EP1311627B1 (de) 2007-04-25
BR0113233A (pt) 2003-06-24
WO2002014439A2 (en) 2002-02-21
KR20030055249A (ko) 2003-07-02
KR100818643B1 (ko) 2008-04-04

Similar Documents

Publication Publication Date Title
DE60128105D1 (de) Verfahren zur herstellung von beschichtungen unter verwendung von sich an der oberfläche ansammelnden photoinitiatoren
ATE435890T1 (de) Verfahren zur herstellung von nanostrukturierten oberflächenbeschichtung, deren beschichtungen und gegenständen enthaltend die beschichtung
DE50305348D1 (de) Verfahren zur Herstellung von ablösbaren schmutz- und wasserabweisenden flächigen Beschichtungen
DE60033801D1 (de) Uv-härtbare silberzusammensetzung und zugehöriges verfahren
JP6138936B2 (ja) 人工爪の除去方法、人工爪組成物、人工爪、人工爪の形成方法、及び、ネイルアートキット
DE4118184A1 (de) Beschichtungszusammensetzungen auf der basis von fluorhaltigen anorganischen polykondensaten, deren herstellung und deren verwendung
ATE284780T1 (de) Verfahren zur herstellung einer augenglaslinse aus kunststoff
EP0989169A4 (de) Verfahren zur herstellung eines hydrophilen anorganischen beschichtungsfilms und eine zusammensetzung für anorganische beschichtungen
DE60316688D1 (de) Dehydrophenylahistine und analoge davon sowie ein verfahren zur herstellung von dehydrophenylahistinen und analogen davon
DE3835968A1 (de) Verfahren zur herstellung von materialien mit einem strukturierten ueberzug
ATE341448T1 (de) Vefahren und vorrichtung zum prägen von beschichteten scheiben- oder verkleidungsfilmoberflächen, und nach diesem verfahren erhaltene elemente
EP2479238A3 (de) Zusammensetzungen mit mehrfachen Reaktionen auf Erregungsstrahlung und Verfahren zu deren Herstellung
DE602004029879D1 (de) Verfahren zur herstellung einer antireflektiven beschichtung
WO2003010603A1 (en) Positive type radiosensitive composition and method for forming pattern
ATE235383T1 (de) Verfahren zur herstellung eines dekorierten substrats
BR9607693A (pt) Fórmula, processo e aparelho para encapsulação
ATE394453T1 (de) Verfahren zum schutz eines bodenbelag- oder auskleidungsmaterials vor befleckenden substanzen
BR0115471A (pt) Fotoiniciadores fluorados em resinas de cura dupla
ATE39941T1 (de) Haertbare organopolysiloxanmassen.
DE69411759D1 (de) Acryllatex zur bildung photovernetzbarer films
ATE382477T1 (de) Flachdruckplattenvorläufer sowie verfahren zur herstellung einer flachdruckplatte
ATE278729T1 (de) Verfahren zur herstellung von organosilizium- zusammensetzungen
ATE526430T1 (de) Verfahren und vorrichtung zur herstellung von rein refraktiven optischen strukturen
TW200515098A (en) Over-coating composition for photoresist and process for forming photoresist pattern using the same
DE60031899D1 (de) Verfahren zur Herstellung einer integrierten Sensormatrixanordung

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties