ATE362648T1 - Anordnung, verfahren und elektrode zur erzeugung eines plasmas - Google Patents

Anordnung, verfahren und elektrode zur erzeugung eines plasmas

Info

Publication number
ATE362648T1
ATE362648T1 AT03077575T AT03077575T ATE362648T1 AT E362648 T1 ATE362648 T1 AT E362648T1 AT 03077575 T AT03077575 T AT 03077575T AT 03077575 T AT03077575 T AT 03077575T AT E362648 T1 ATE362648 T1 AT E362648T1
Authority
AT
Austria
Prior art keywords
generating
arrangement
electrodes
plasma
plasmas
Prior art date
Application number
AT03077575T
Other languages
English (en)
Inventor
Vries Hindrik Willem De
Jan Bastiaan Bouwstra
Eugen Aldea
De Sanden Mauritius Cornel Van
Original Assignee
Fuji Film Mfg Europ B V
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Film Mfg Europ B V filed Critical Fuji Film Mfg Europ B V
Application granted granted Critical
Publication of ATE362648T1 publication Critical patent/ATE362648T1/de

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2441—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes characterised by the physical-chemical properties of the dielectric, e.g. porous dielectric
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2437—Multilayer systems

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cleaning In General (AREA)
  • Auxiliary Devices For And Details Of Packaging Control (AREA)
AT03077575T 2003-08-14 2003-08-14 Anordnung, verfahren und elektrode zur erzeugung eines plasmas ATE362648T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03077575A EP1507281B1 (de) 2003-08-14 2003-08-14 Anordnung, Verfahren und Elektrode zur Erzeugung eines Plasmas

Publications (1)

Publication Number Publication Date
ATE362648T1 true ATE362648T1 (de) 2007-06-15

Family

ID=33560829

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03077575T ATE362648T1 (de) 2003-08-14 2003-08-14 Anordnung, verfahren und elektrode zur erzeugung eines plasmas

Country Status (5)

Country Link
US (1) US7533629B2 (de)
EP (1) EP1507281B1 (de)
JP (1) JP5175023B2 (de)
AT (1) ATE362648T1 (de)
DE (1) DE60313864T2 (de)

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DE102004049783B4 (de) * 2004-10-12 2009-03-19 Je Plasmaconsult Gmbh Vorrichtung zur Bearbeitung von Gütern unter Zuhilfenahme einer elektrischen Entladung
US20060246218A1 (en) * 2005-04-29 2006-11-02 Guardian Industries Corp. Hydrophilic DLC on substrate with barrier discharge pyrolysis treatment
JP4969223B2 (ja) * 2006-11-30 2012-07-04 独立行政法人産業技術総合研究所 高温場用フレキシブル電極
US7999173B1 (en) 2007-03-21 2011-08-16 The United States Of America As Represented By The Administrator Of National Aeronautics And Space Administration Dust removal from solar cells
WO2009067682A2 (en) 2007-11-21 2009-05-28 University Of Florida Research Foundation, Inc. Self-sterilizing device using plasma fields
US8220753B2 (en) * 2008-01-04 2012-07-17 The Boeing Company Systems and methods for controlling flows with pulsed discharges
JP5593589B2 (ja) * 2008-03-25 2014-09-24 パナソニック株式会社 プラズマ発生装置
FI20080248A7 (fi) * 2008-03-28 2009-09-29 Savcor Face Group Oy Kemiallinen kaasufaasipinnoite ja menetelmä kaasufaasipinnoitteen muodostamiseksi
US8609203B2 (en) * 2008-06-06 2013-12-17 Fujifilm Manufacturing Europe B.V. Method and apparatus for plasma surface treatment of moving substrate
JP5008622B2 (ja) * 2008-08-22 2012-08-22 株式会社日立国際電気 プラズマ発生電極及びプラズマ発生方法
GB0919274D0 (en) 2009-11-03 2009-12-16 Univ The Glasgow Plasma generation apparatus and use of plasma generation apparatus
CN102427653B (zh) * 2011-09-19 2012-11-28 大连海事大学 一种引入微辉光放电模式的大气压非平衡等离子体源
JP5787712B2 (ja) * 2011-10-20 2015-09-30 株式会社日立製作所 プラズマ処理装置
US9447205B2 (en) 2012-11-19 2016-09-20 Ut-Battelle, Llc Atmospheric pressure plasma processing of polymeric materials utilizing close proximity indirect exposure
CN103079328B (zh) * 2012-12-31 2015-10-07 云南航天工业有限公司 一种介质阻挡放电电极及其制作方法
JP6258146B2 (ja) * 2014-07-18 2018-01-10 株式会社Ｉｈｉ環境エンジニアリング プラズマ放電状態検知装置
KR101653738B1 (ko) * 2015-02-17 2016-09-09 서재화 롤형 플라즈마 발생기
CN106179749B (zh) * 2016-07-05 2019-07-02 北京航天爱锐科技有限责任公司 放电电极及其制备方法、等离子体发生器和空气净化设备
WO2018017064A1 (en) 2016-07-19 2018-01-25 Hewlett-Packard Development Company, L.P. Printing systems
WO2018017063A1 (en) 2016-07-19 2018-01-25 Hewlett-Packard Development Company, L.P. Plasma treatment heads
WO2018017058A1 (en) 2016-07-19 2018-01-25 Hewlett-Packard Development Company, L.P. Printing systems
JP2019057363A (ja) * 2017-09-19 2019-04-11 国立大学法人名古屋大学 放電リアクタ、及びその製造方法
CN112616235B (zh) * 2021-01-14 2023-06-30 深圳大学 二维钛化碳在生成大气压均匀介质阻挡放电中的应用
DE102021128964B3 (de) * 2021-11-08 2023-03-09 Hochschule für angewandte Wissenschaft und Kunst Hildesheim/Holzminden/Göttingen, Körperschaft des öffentlichen Rechts Verfahren und Vorrichtung zur Erzeugung von Plasmen mit erhöhter Pulsenergie durch dielektrisch behinderte elektrische Entladungen
JP2023154751A (ja) * 2022-04-08 2023-10-20 日本未来科学研究所合同会社 プラズマ生成装置及び空気調和装置
CN116657400B (zh) * 2023-08-01 2023-09-26 常州市武进广宇花辊机械有限公司 一种无纺布高速分切装置及分切方法

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WO2003019624A2 (en) * 2001-08-27 2003-03-06 University Of New Hampshire Dielectric barrier discharge process for depositing silicon nitride film on substrates

Also Published As

Publication number Publication date
US20060022606A1 (en) 2006-02-02
US7533629B2 (en) 2009-05-19
DE60313864D1 (de) 2007-06-28
JP2005063973A (ja) 2005-03-10
DE60313864T2 (de) 2008-01-17
EP1507281A1 (de) 2005-02-16
EP1507281B1 (de) 2007-05-16
JP5175023B2 (ja) 2013-04-03

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