ATE363819T1 - Verfahren zur erzeugung eines tröpfchen-targets - Google Patents

Verfahren zur erzeugung eines tröpfchen-targets

Info

Publication number
ATE363819T1
ATE363819T1 AT03813077T AT03813077T ATE363819T1 AT E363819 T1 ATE363819 T1 AT E363819T1 AT 03813077 T AT03813077 T AT 03813077T AT 03813077 T AT03813077 T AT 03813077T AT E363819 T1 ATE363819 T1 AT E363819T1
Authority
AT
Austria
Prior art keywords
target liquid
generating
target
droplet target
supersaturated vapor
Prior art date
Application number
AT03813077T
Other languages
English (en)
Inventor
Sargis Ter-Avetisyan
Matthias Schnuerer
Peter-Viktor Nickles
Original Assignee
Forschungsverbund Berlin Ev
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Forschungsverbund Berlin Ev filed Critical Forschungsverbund Berlin Ev
Application granted granted Critical
Publication of ATE363819T1 publication Critical patent/ATE363819T1/de

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0023—Constructional details of the ejection system

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Structure Of Belt Conveyors (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
AT03813077T 2002-12-13 2003-12-11 Verfahren zur erzeugung eines tröpfchen-targets ATE363819T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10260376A DE10260376A1 (de) 2002-12-13 2002-12-13 Vorrichtung und Verfahren zur Erzeugung eines Tröpfchen-Targets

Publications (1)

Publication Number Publication Date
ATE363819T1 true ATE363819T1 (de) 2007-06-15

Family

ID=32519270

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03813077T ATE363819T1 (de) 2002-12-13 2003-12-11 Verfahren zur erzeugung eines tröpfchen-targets

Country Status (7)

Country Link
US (1) US7306015B2 (de)
EP (1) EP1574116B1 (de)
JP (1) JP4488214B2 (de)
AT (1) ATE363819T1 (de)
AU (1) AU2003300494A1 (de)
DE (2) DE10260376A1 (de)
WO (1) WO2004056158A2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7405416B2 (en) * 2005-02-25 2008-07-29 Cymer, Inc. Method and apparatus for EUV plasma source target delivery
DE102004036441B4 (de) 2004-07-23 2007-07-12 Xtreme Technologies Gmbh Vorrichtung und Verfahren zum Dosieren von Targetmaterial für die Erzeugung kurzwelliger elektromagnetischer Strahlung
WO2006093687A1 (en) * 2005-02-25 2006-09-08 Cymer, Inc. Method and apparatus for euv light source target material handling
DE102006017904B4 (de) * 2006-04-13 2008-07-03 Xtreme Technologies Gmbh Anordnung zur Erzeugung von extrem ultravioletter Strahlung aus einem energiestrahlerzeugten Plasma mit hoher Konversionseffizienz und minimaler Kontamination
DE102009018021B4 (de) 2009-04-18 2013-09-05 Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh Mikrodosiersystem mit einem gepulsten Laser
EP2951643B1 (de) 2013-01-30 2019-12-25 Kla-Tencor Corporation Euv-licht-quelle mit kryogenen tröpfchen-targets in der maskeninspektion

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE364469A (de) * 1928-10-13
US4962886A (en) * 1988-10-14 1990-10-16 The Board Of Trustees Of The University Of Maine High flow rate nozzle system with production of uniform size droplets
FR2799667B1 (fr) * 1999-10-18 2002-03-08 Commissariat Energie Atomique Procede et dispositif de generation d'un brouillard dense de gouttelettes micrometriques et submicrometriques, application a la generation de lumiere dans l'extreme ultraviolet notamment pour la lithographie
US6711233B2 (en) * 2000-07-28 2004-03-23 Jettec Ab Method and apparatus for generating X-ray or EUV radiation
US6324256B1 (en) * 2000-08-23 2001-11-27 Trw Inc. Liquid sprays as the target for a laser-plasma extreme ultraviolet light source
US6498832B2 (en) * 2001-03-13 2002-12-24 Euv Llc Electrode configuration for extreme-UV electrical discharge source
US6738452B2 (en) * 2002-05-28 2004-05-18 Northrop Grumman Corporation Gasdynamically-controlled droplets as the target in a laser-plasma extreme ultraviolet light source
US6792076B2 (en) * 2002-05-28 2004-09-14 Northrop Grumman Corporation Target steering system for EUV droplet generators

Also Published As

Publication number Publication date
DE50307397D1 (de) 2007-07-12
EP1574116A2 (de) 2005-09-14
AU2003300494A1 (en) 2004-07-09
WO2004056158A3 (de) 2004-09-16
JP4488214B2 (ja) 2010-06-23
DE10260376A1 (de) 2004-07-15
JP2006510176A (ja) 2006-03-23
US20060054238A1 (en) 2006-03-16
EP1574116B1 (de) 2007-05-30
US7306015B2 (en) 2007-12-11
WO2004056158A2 (de) 2004-07-01

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Legal Events

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