ATE366779T1 - Ir-photoempfindliche zusammensetzung - Google Patents

Ir-photoempfindliche zusammensetzung

Info

Publication number
ATE366779T1
ATE366779T1 AT03006180T AT03006180T ATE366779T1 AT E366779 T1 ATE366779 T1 AT E366779T1 AT 03006180 T AT03006180 T AT 03006180T AT 03006180 T AT03006180 T AT 03006180T AT E366779 T1 ATE366779 T1 AT E366779T1
Authority
AT
Austria
Prior art keywords
meth
photosensitive composition
resin
derivative
infrared
Prior art date
Application number
AT03006180T
Other languages
English (en)
Inventor
Takeshi Serikawa
Ikuo Kawauchi
Mitsumasa Tsuchiya
Ippei Nakamura
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2002077817A external-priority patent/JP4028272B2/ja
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Application granted granted Critical
Publication of ATE366779T1 publication Critical patent/ATE366779T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0041—Optical brightening agents, organic pigments
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/06—Backcoats; Back layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/10—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by inorganic compounds, e.g. pigments
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Holo Graphy (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
AT03006180T 2002-03-20 2003-03-19 Ir-photoempfindliche zusammensetzung ATE366779T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002077817A JP4028272B2 (ja) 2002-03-20 2002-03-20 感赤外線感光性組成物
JP2002081044 2002-03-22

Publications (1)

Publication Number Publication Date
ATE366779T1 true ATE366779T1 (de) 2007-08-15

Family

ID=27791036

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03006180T ATE366779T1 (de) 2002-03-20 2003-03-19 Ir-photoempfindliche zusammensetzung

Country Status (5)

Country Link
US (1) US6902863B2 (de)
EP (1) EP1347014B1 (de)
CN (1) CN100340921C (de)
AT (1) ATE366779T1 (de)
DE (1) DE60314794T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1400349B1 (de) * 2002-09-17 2007-04-18 Dainippon Ink And Chemicals, Inc. Wärmeempfindliche Flachdruckplatte und Bebilderungsverfahren
US7229744B2 (en) 2003-03-21 2007-06-12 Eastman Kodak Company Method for preparing lithographic printing plates
JP4340530B2 (ja) * 2003-12-26 2009-10-07 富士フイルム株式会社 画像記録材料
US6969579B1 (en) 2004-12-21 2005-11-29 Eastman Kodak Company Solvent resistant imageable element
US20060210917A1 (en) * 2005-03-18 2006-09-21 Kodak Polychrome Graphics Llc Positive-working, thermally sensitive imageable element
US7291440B2 (en) * 2005-05-16 2007-11-06 Eastman Kodak Company Bakeable multi-layer imageable element
US7144661B1 (en) 2005-11-01 2006-12-05 Eastman Kodak Company Multilayer imageable element with improved chemical resistance
JP5137611B2 (ja) * 2007-03-28 2013-02-06 富士フイルム株式会社 着色硬化性樹脂組成物、着色パターン形成方法、着色パターン、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示素子
TWI444788B (zh) * 2010-01-28 2014-07-11 Everlight Chem Ind Corp 顯影液之組成物
JP5555732B2 (ja) * 2012-02-29 2014-07-23 富士フイルム株式会社 感光性樹脂組成物、これを用いた硬化膜の製造方法、硬化膜、液晶表示装置および有機ｅｌ表示装置
CN109776737B (zh) * 2017-11-11 2023-01-06 乐凯华光印刷科技有限公司 耐溶剂树脂、含有该树脂的感光组合物及该组合物的应用

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4123279A (en) 1974-03-25 1978-10-31 Fuji Photo Film Co., Ltd. Light-sensitive o-quinonediazide containing planographic printing plate
JPS5134711A (en) 1974-09-18 1976-03-24 Konishiroku Photo Ind Kankoseisoseibutsu
JPS5669192A (en) 1979-11-09 1981-06-10 Konishiroku Photo Ind Co Ltd Heat-sensitive recording material
EP0287212B1 (de) 1987-03-12 1994-12-28 Mitsubishi Chemical Corporation Lichtempfindliche positive Flachdruckplatte
US5182183A (en) * 1987-03-12 1993-01-26 Mitsubishi Kasei Corporation Positive photosensitive planographic printing plates containing specific high-molecular weight compound and photosensitive ester of O-napthoquinonediazidosulfonic acid with polyhydroxybenzophenone
JP3159569B2 (ja) 1993-07-09 2001-04-23 富士写真フイルム株式会社 感光性組成物及び画像形成方法
JP3136227B2 (ja) 1993-07-23 2001-02-19 富士写真フイルム株式会社 感光性組成物
JP3461377B2 (ja) 1994-04-18 2003-10-27 富士写真フイルム株式会社 画像記録材料
JP3633179B2 (ja) * 1997-01-27 2005-03-30 Ｊｓｒ株式会社 ポジ型フォトレジスト組成物
JPH10282643A (ja) 1997-04-04 1998-10-23 Mitsubishi Chem Corp ポジ型感光性平版印刷版
JP3615995B2 (ja) 2000-07-04 2005-02-02 クラリアント インターナショナル リミテッド 感光性樹脂組成物
JP4092840B2 (ja) 2000-02-01 2008-05-28 コニカミノルタホールディングス株式会社 画像形成材料
JP4615673B2 (ja) 2000-05-16 2011-01-19 コダック株式会社 ポジ型感光性組成物及びポジ型感光性平版印刷版

Also Published As

Publication number Publication date
EP1347014A3 (de) 2004-04-07
DE60314794D1 (de) 2007-08-23
CN100340921C (zh) 2007-10-03
US6902863B2 (en) 2005-06-07
EP1347014A2 (de) 2003-09-24
EP1347014B1 (de) 2007-07-11
DE60314794T2 (de) 2008-04-10
CN1445608A (zh) 2003-10-01
US20030203312A1 (en) 2003-10-30

Similar Documents

Publication Publication Date Title
EP1767529A4 (de) Pyridazinverbindung und deren verwendung
ATE366779T1 (de) Ir-photoempfindliche zusammensetzung
TW200606580A (en) A chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same
ES2172864T3 (es) 2-metoxibenzofenonas fungicidas.
ATE555421T1 (de) Lichtempfindliche zusammensetzung und negativ arbeitende flachdruckplatte
EP1341039A4 (de) Lichtaushärtbare und hitzehärtbare harzzusammensetzung
NO20034660D0 (no) Spiropyrazolforbindelser
DE602004017244D1 (de) Lichtempfindliche Zusammensetzung und lithographischer Druckplattenvorläufer
JP2005514490A5 (de)
EP1471387A3 (de) Lichtempfindliche Zusammensetzung und darin verwendete Verbindung
DE602005026554D1 (de) Copolymerisierbare azoverbindungen und artikel damit
EP1314712A4 (de) Substituierte benzoesäurederivate als nf-kappa-b-inhibitoren
BR0207335A (pt) Sistema polimerizável
EP1564232A4 (de) Lichtempfindliche harzzusammensetzung und verfahren zur bildung von hydrogel
FR2826961B1 (fr) Procede de preparation d'anhydride (meth) acrylique
DE602006007887D1 (de) Haftkleber und Klebepflaster
EA199900798A1 (ru) Соединения
BR0312348B1 (pt) processo para a preparaÇço de copolÍmeros em bloco e copolÍmeros em bloco.
DE602004000069D1 (de) Fluorinated Acrylic Verbindungen, ihre Herstellungsverfahren und diese enthaltende Photoresistzusammensetzungen
WO2009022540A1 (ja) 化合物及び感放射線性組成物
DE60200639D1 (de) Puzzle
EA199900888A1 (ru) Противоревматические средства
EP0729945A4 (de) Eine eine squariliumverbindung enthaltende photopolymerisierbare zusammensetzung
JP2004524565A5 (de)
EP1744212A3 (de) Lichtempfindliche Zusammensetzung

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties