ATE377839T1 - Elektronememittierende- und isolierende teilchen enthaltende feldemissions kathoden - Google Patents

Elektronememittierende- und isolierende teilchen enthaltende feldemissions kathoden

Info

Publication number
ATE377839T1
ATE377839T1 AT00959217T AT00959217T ATE377839T1 AT E377839 T1 ATE377839 T1 AT E377839T1 AT 00959217 T AT00959217 T AT 00959217T AT 00959217 T AT00959217 T AT 00959217T AT E377839 T1 ATE377839 T1 AT E377839T1
Authority
AT
Austria
Prior art keywords
field emission
particles
emission cathodes
electronememissioning
insulating particles
Prior art date
Application number
AT00959217T
Other languages
English (en)
Inventor
Benjamin Russ
Ichiro Saito
Jack Barger
Original Assignee
Sony Electronics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Electronics Inc filed Critical Sony Electronics Inc
Application granted granted Critical
Publication of ATE377839T1 publication Critical patent/ATE377839T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/30—Cold cathodes, e.g. field-emissive cathode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/30—Cold cathodes, e.g. field-emissive cathode
    • H01J1/304—Field-emissive cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
    • H01J9/025—Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2201/00—Electrodes common to discharge tubes
    • H01J2201/30—Cold cathodes
    • H01J2201/304—Field emission cathodes
    • H01J2201/30403—Field emission cathodes characterised by the emitter shape

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Cold Cathode And The Manufacture (AREA)
  • Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
  • Catalysts (AREA)
  • Electrostatic Separation (AREA)
  • Electrodes For Cathode-Ray Tubes (AREA)
AT00959217T 1999-08-11 2000-08-11 Elektronememittierende- und isolierende teilchen enthaltende feldemissions kathoden ATE377839T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/373,028 US6342755B1 (en) 1999-08-11 1999-08-11 Field emission cathodes having an emitting layer comprised of electron emitting particles and insulating particles

Publications (1)

Publication Number Publication Date
ATE377839T1 true ATE377839T1 (de) 2007-11-15

Family

ID=23470623

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00959217T ATE377839T1 (de) 1999-08-11 2000-08-11 Elektronememittierende- und isolierende teilchen enthaltende feldemissions kathoden

Country Status (9)

Country Link
US (1) US6342755B1 (de)
EP (1) EP1208577B1 (de)
JP (1) JP2003506843A (de)
KR (1) KR100732874B1 (de)
AT (1) ATE377839T1 (de)
AU (1) AU7057300A (de)
CA (1) CA2381701C (de)
DE (1) DE60037027T2 (de)
WO (1) WO2001011647A1 (de)

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JP3595718B2 (ja) * 1999-03-15 2004-12-02 株式会社東芝 表示素子およびその製造方法
GB0015928D0 (en) * 2000-06-30 2000-08-23 Printable Field Emitters Limit Field emitters
KR100765539B1 (ko) * 2001-05-18 2007-10-10 엘지.필립스 엘시디 주식회사 화학기상 증착장비
US7153455B2 (en) * 2001-05-21 2006-12-26 Sabel Plastechs Inc. Method of making a stretch/blow molded article (bottle) with an integral projection such as a handle
US7455757B2 (en) * 2001-11-30 2008-11-25 The University Of North Carolina At Chapel Hill Deposition method for nanostructure materials
US7252749B2 (en) * 2001-11-30 2007-08-07 The University Of North Carolina At Chapel Hill Deposition method for nanostructure materials
US6902658B2 (en) * 2001-12-18 2005-06-07 Motorola, Inc. FED cathode structure using electrophoretic deposition and method of fabrication
RU2225052C1 (ru) * 2002-06-25 2004-02-27 Батурин Андрей Сергеевич Способ изготовления автоэмиссионного катода
US7866342B2 (en) * 2002-12-18 2011-01-11 Vapor Technologies, Inc. Valve component for faucet
US7866343B2 (en) * 2002-12-18 2011-01-11 Masco Corporation Of Indiana Faucet
US6904935B2 (en) 2002-12-18 2005-06-14 Masco Corporation Of Indiana Valve component with multiple surface layers
US8555921B2 (en) * 2002-12-18 2013-10-15 Vapor Technologies Inc. Faucet component with coating
US8220489B2 (en) 2002-12-18 2012-07-17 Vapor Technologies Inc. Faucet with wear-resistant valve component
WO2004079766A1 (ja) * 2003-03-06 2004-09-16 Matsushita Electric Industrial Co., Ltd. 電子放射素子、蛍光体発光素子及び画像描画装置
US20070014148A1 (en) * 2004-05-10 2007-01-18 The University Of North Carolina At Chapel Hill Methods and systems for attaching a magnetic nanowire to an object and apparatuses formed therefrom
KR101082437B1 (ko) 2005-03-02 2011-11-11 삼성에스디아이 주식회사 전자 방출원, 그 제조방법 및 이를 채용한 전자 방출 소자
US20070026205A1 (en) * 2005-08-01 2007-02-01 Vapor Technologies Inc. Article having patterned decorative coating
DE112006002464T5 (de) * 2005-09-14 2008-07-24 Littelfuse, Inc., Des Plaines Gasgefüllter Überspannungsableiter, aktivierende Verbindung, Zündstreifen und Herstellungsverfahren dafür
GB2441813A (en) * 2006-08-07 2008-03-19 Quantum Filament Technologies Improved field emission backplate
US7821412B2 (en) * 2006-09-15 2010-10-26 Applied Nanotech Holdings, Inc. Smoke detector
DE102006054206A1 (de) * 2006-11-15 2008-05-21 Till Keesmann Feldemissionsvorrichtung
KR101042003B1 (ko) * 2009-10-13 2011-06-16 한국전기연구원 나노구슬을 이용한 전계방출소자의 제작방법

Family Cites Families (19)

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Publication number Priority date Publication date Assignee Title
DE2628584C3 (de) 1975-06-27 1981-04-16 Hitachi, Ltd., Tokyo Feldemissionskathode und Verfahren zur Herstellung einer nadelförmigen Kathodenspitze dafür
JPS6016059B2 (ja) 1977-08-11 1985-04-23 ソニー株式会社 陰極線管の製法
US4498952A (en) * 1982-09-17 1985-02-12 Condesin, Inc. Batch fabrication procedure for manufacture of arrays of field emitted electron beams with integral self-aligned optical lense in microguns
US4663559A (en) * 1982-09-17 1987-05-05 Christensen Alton O Field emission device
JP2822480B2 (ja) 1989-09-14 1998-11-11 ソニー株式会社 陰極線管の製造方法とその装置
US5332627A (en) 1990-10-30 1994-07-26 Sony Corporation Field emission type emitter and a method of manufacturing thereof
DE69211581T2 (de) 1991-03-13 1997-02-06 Sony Corp Anordnung von Feldemissionskathoden
JP3252545B2 (ja) 1993-07-21 2002-02-04 ソニー株式会社 電界放出型カソードを用いたフラットディスプレイ
EP0675519A1 (de) 1994-03-30 1995-10-04 AT&T Corp. Vorrichtung mit Feldeffekt-Emittern
US5608283A (en) 1994-06-29 1997-03-04 Candescent Technologies Corporation Electron-emitting devices utilizing electron-emissive particles which typically contain carbon
FR2726688B1 (fr) * 1994-11-08 1996-12-06 Commissariat Energie Atomique Source d'electrons a effet de champ et procede de fabrication de cette source, application aux dispositifs de visualisation par cathodoluminescence
FR2726689B1 (fr) * 1994-11-08 1996-11-29 Commissariat Energie Atomique Source d'electrons a effet de champ et procede de fabrication de cette source, application aux dispositifs de visualisation par cathodoluminescence
KR100405886B1 (ko) * 1995-08-04 2004-04-03 프린터블 필드 에미터스 리미티드 전계전자방출물질과그제조방법및그물질을이용한소자
TW368671B (en) 1995-08-30 1999-09-01 Tektronix Inc Sputter-resistant, low-work-function, conductive coatings for cathode electrodes in DC plasma addressing structure
US5755944A (en) 1996-06-07 1998-05-26 Candescent Technologies Corporation Formation of layer having openings produced by utilizing particles deposited under influence of electric field
US5656883A (en) * 1996-08-06 1997-08-12 Christensen; Alton O. Field emission devices with improved field emission surfaces
EP0827176A3 (de) * 1996-08-16 2000-03-08 Tektronix, Inc. Zerstäubungsfeste, leitende Überzüge mit verbesserter Elektronenemittierung für Kathodenelektroden in Gleichstromplasma-Adressierungsvorrichtungen
US5947783A (en) * 1996-11-01 1999-09-07 Si Diamond Technology, Inc. Method of forming a cathode assembly comprising a diamond layer
JPH11329217A (ja) * 1998-05-15 1999-11-30 Sony Corp 電界放出型カソードの製造方法

Also Published As

Publication number Publication date
CA2381701C (en) 2009-11-03
US6342755B1 (en) 2002-01-29
CA2381701A1 (en) 2001-02-15
JP2003506843A (ja) 2003-02-18
KR20020037753A (ko) 2002-05-22
DE60037027D1 (de) 2007-12-20
EP1208577B1 (de) 2007-11-07
KR100732874B1 (ko) 2007-06-28
DE60037027T2 (de) 2008-08-21
EP1208577A4 (de) 2006-06-21
WO2001011647A1 (en) 2001-02-15
EP1208577A1 (de) 2002-05-29
AU7057300A (en) 2001-03-05

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