ATE378712T1 - Lasergerät, belichtungsapparat und verfahren - Google Patents

Lasergerät, belichtungsapparat und verfahren

Info

Publication number
ATE378712T1
ATE378712T1 AT03250470T AT03250470T ATE378712T1 AT E378712 T1 ATE378712 T1 AT E378712T1 AT 03250470 T AT03250470 T AT 03250470T AT 03250470 T AT03250470 T AT 03250470T AT E378712 T1 ATE378712 T1 AT E378712T1
Authority
AT
Austria
Prior art keywords
gas
laser
chamber
laser beam
characteristic
Prior art date
Application number
AT03250470T
Other languages
English (en)
Inventor
Yoshiyuki Nagai
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Application granted granted Critical
Publication of ATE378712T1 publication Critical patent/ATE378712T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/134—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/1305—Feedback control systems

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lasers (AREA)
  • Laser Surgery Devices (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
AT03250470T 2002-01-31 2003-01-27 Lasergerät, belichtungsapparat und verfahren ATE378712T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002023632 2002-01-31

Publications (1)

Publication Number Publication Date
ATE378712T1 true ATE378712T1 (de) 2007-11-15

Family

ID=27606407

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03250470T ATE378712T1 (de) 2002-01-31 2003-01-27 Lasergerät, belichtungsapparat und verfahren

Country Status (7)

Country Link
US (1) US7085302B2 (de)
EP (1) EP1335460B1 (de)
KR (1) KR100624081B1 (de)
CN (1) CN1438545A (de)
AT (1) ATE378712T1 (de)
DE (1) DE60317393T2 (de)
TW (1) TW595057B (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4497650B2 (ja) * 2000-04-26 2010-07-07 キヤノン株式会社 レーザ発振装置、露光装置および半導体デバイス製造方法
US7164703B2 (en) * 2003-02-20 2007-01-16 Lambda Physik Ag Temperature control systems for excimer lasers
KR100558560B1 (ko) * 2004-08-27 2006-03-10 삼성전자주식회사 반도체 소자 제조를 위한 노광 장치
US20090323739A1 (en) * 2006-12-22 2009-12-31 Uv Tech Systems Laser optical system
JP2010087388A (ja) * 2008-10-02 2010-04-15 Ushio Inc 露光装置
US8837536B2 (en) * 2010-04-07 2014-09-16 Cymer, Llc Method and apparatus for controlling light bandwidth
WO2015068205A1 (ja) * 2013-11-05 2015-05-14 ギガフォトン株式会社 レーザ装置及び非一過性のコンピュータ読み取り可能な記録媒体
US9785050B2 (en) 2015-06-26 2017-10-10 Cymer, Llc Pulsed light beam spectral feature control
WO2019102613A1 (ja) 2017-11-27 2019-05-31 ギガフォトン株式会社 エキシマレーザ装置、及び電子デバイスの製造方法
DE102018124314B9 (de) * 2018-10-02 2020-12-31 Carl Zeiss Smt Gmbh Vorrichtung zur Bestimmung der Belichtungsenergie bei der Belichtung eines Elements in einem optischen System, insbesondere für die Mikrolithographie
US12007696B2 (en) * 2019-12-11 2024-06-11 Cymer, Llc Burst statistics data aggregation filter
WO2025262492A1 (en) * 2024-06-20 2025-12-26 Cymer, Llc Repetition rate agile laser apparatus and method

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5383217A (en) * 1989-05-09 1995-01-17 Nikon Corporation Exposure apparatus with laser source requiring new gas introduction
US5377215A (en) * 1992-11-13 1994-12-27 Cymer Laser Technologies Excimer laser
JP3824092B2 (ja) * 1993-12-24 2006-09-20 株式会社小松製作所 エキシマレ−ザ装置のガス補給方法
WO1998054382A1 (en) 1997-05-30 1998-12-03 The Dow Chemical Company Fibers made from long chain branched syndiotactic vinyl aromatic polymers
US6018537A (en) * 1997-07-18 2000-01-25 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate F2 laser
US6317447B1 (en) * 2000-01-25 2001-11-13 Cymer, Inc. Electric discharge laser with acoustic chirp correction
JP3697036B2 (ja) 1997-10-03 2005-09-21 キヤノン株式会社 露光装置及びそれを用いた半導体製造方法
JP3459564B2 (ja) 1998-03-11 2003-10-20 日本酸素株式会社 ガスの分光分析装置および分光分析方法
US6516013B1 (en) * 1999-12-20 2003-02-04 Lambda Physik Ag Laser beam monitoring apparatus and method
US6389052B2 (en) * 1999-03-17 2002-05-14 Lambda Physik Ag Laser gas replenishment method
US6176135B1 (en) * 1999-07-27 2001-01-23 Marc Dubois System and method for laser-ultrasonic frequency control using optimal wavelength tuning
JP4497650B2 (ja) 2000-04-26 2010-07-07 キヤノン株式会社 レーザ発振装置、露光装置および半導体デバイス製造方法
US20020007148A1 (en) * 2000-05-15 2002-01-17 May Raymond Jeffrey Garment having integrated zone of elastic tension aligned with an opening
US6763048B2 (en) * 2000-06-19 2004-07-13 Lambda Physik Ag Line narrowing of molecular fluorine laser emission
JP2002287023A (ja) * 2001-03-27 2002-10-03 Nikon Corp 投影光学系、該投影光学系を備えた投影露光装置及び投影露光方法
JP2003008119A (ja) * 2001-06-26 2003-01-10 Komatsu Ltd 注入同期式又はｍｏｐａ方式のレーザ装置

Also Published As

Publication number Publication date
US7085302B2 (en) 2006-08-01
CN1438545A (zh) 2003-08-27
TW595057B (en) 2004-06-21
KR100624081B1 (ko) 2006-09-19
EP1335460A2 (de) 2003-08-13
DE60317393D1 (de) 2007-12-27
DE60317393T2 (de) 2008-09-04
KR20030065334A (ko) 2003-08-06
EP1335460B1 (de) 2007-11-14
EP1335460A3 (de) 2005-07-06
US20030142715A1 (en) 2003-07-31
TW200302612A (en) 2003-08-01

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Legal Events

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