ATE378799T1 - Photolithographisch hergestellter, integrierter kondensator mit selbst-ausgerichteten elektroden und dielektrika - Google Patents
Photolithographisch hergestellter, integrierter kondensator mit selbst-ausgerichteten elektroden und dielektrikaInfo
- Publication number
- ATE378799T1 ATE378799T1 AT99964048T AT99964048T ATE378799T1 AT E378799 T1 ATE378799 T1 AT E378799T1 AT 99964048 T AT99964048 T AT 99964048T AT 99964048 T AT99964048 T AT 99964048T AT E378799 T1 ATE378799 T1 AT E378799T1
- Authority
- AT
- Austria
- Prior art keywords
- regions
- layer
- conductive layer
- dielectric
- conductive
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/16—Printed circuits incorporating printed electric components, e.g. printed resistors, capacitors or inductors
- H05K1/162—Printed circuits incorporating printed electric components, e.g. printed resistors, capacitors or inductors incorporating printed capacitors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0183—Dielectric layers
- H05K2201/0187—Dielectric layers with regions of different dielectrics in the same layer, e.g. in a printed capacitor for locally changing the dielectric properties
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09209—Shape and layout details of conductors
- H05K2201/095—Conductive through-holes or vias
- H05K2201/09509—Blind vias, i.e. vias having one side closed
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0023—Etching of the substrate by chemical or physical means by exposure and development of a photosensitive insulating layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
- H05K3/064—Photoresists
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4652—Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/43—Electric condenser making
- Y10T29/435—Solid dielectric type
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
- Y10T29/49165—Manufacturing circuit on or in base by forming conductive walled aperture in base
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Semiconductor Integrated Circuits (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Ceramic Capacitors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/224,338 US6349456B1 (en) | 1998-12-31 | 1998-12-31 | Method of manufacturing photodefined integral capacitor with self-aligned dielectric and electrodes |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE378799T1 true ATE378799T1 (de) | 2007-11-15 |
Family
ID=22840229
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT99964048T ATE378799T1 (de) | 1998-12-31 | 1999-12-02 | Photolithographisch hergestellter, integrierter kondensator mit selbst-ausgerichteten elektroden und dielektrika |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6349456B1 (de) |
| EP (1) | EP1090401B1 (de) |
| JP (1) | JP2002534791A (de) |
| AT (1) | ATE378799T1 (de) |
| DE (1) | DE69937561T2 (de) |
| TW (1) | TW436970B (de) |
| WO (1) | WO2000041192A1 (de) |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4093532B2 (ja) * | 2001-03-13 | 2008-06-04 | 独立行政法人理化学研究所 | アモルファス状金属酸化物の薄膜材料の製造方法 |
| US6751113B2 (en) | 2002-03-07 | 2004-06-15 | Netlist, Inc. | Arrangement of integrated circuits in a memory module |
| US6891190B2 (en) * | 2002-05-23 | 2005-05-10 | Motorola, Inc. | Organic semiconductor device and method |
| KR100455891B1 (ko) * | 2002-12-24 | 2004-11-06 | 삼성전기주식회사 | 커패시터 내장형 인쇄회로기판 및 그 제조 방법 |
| KR100455890B1 (ko) * | 2002-12-24 | 2004-11-06 | 삼성전기주식회사 | 커패시터 내장형 인쇄회로기판 및 그 제조 방법 |
| US20050086037A1 (en) * | 2003-09-29 | 2005-04-21 | Pauley Robert S. | Memory device load simulator |
| US20050087877A1 (en) * | 2003-10-22 | 2005-04-28 | Dong-Ho Han | Differential signal traces coupled with high permittivity material |
| US7012022B2 (en) * | 2003-10-30 | 2006-03-14 | Chartered Semiconductor Manufacturing Ltd. | Self-patterning of photo-active dielectric materials for interconnect isolation |
| US20050018495A1 (en) * | 2004-01-29 | 2005-01-27 | Netlist, Inc. | Arrangement of integrated circuits in a memory module |
| TWI314745B (en) * | 2004-02-02 | 2009-09-11 | Ind Tech Res Inst | Method and apparatus of non-symmetrical electrode of build-in capacitor |
| US7100277B2 (en) * | 2004-07-01 | 2006-09-05 | E. I. Du Pont De Nemours And Company | Methods of forming printed circuit boards having embedded thick film capacitors |
| US8062539B2 (en) * | 2004-08-10 | 2011-11-22 | Mitsui Mining & Smelting Co., Ltd. | Method for manufacturing multilayer printed wiring board and multilayer printed wiring board obtained by the same |
| US8205329B2 (en) * | 2004-08-11 | 2012-06-26 | Mitsuimining & Smelting Co., Ltd. | Method for manufacturing dielectric layer constituting material, dielectric layer constituting material obtained thereby; method for manufacturing capacitor circuit forming piece using dielectric layer constituting material, capacitor circuit forming piece obtained thereby; and multi-layer printed wiring board obtained by using dielectric layer constituting material and/or capacitor circuit forming piece |
| KR100619367B1 (ko) * | 2004-08-26 | 2006-09-08 | 삼성전기주식회사 | 고유전율을 갖는 커패시터를 내장한 인쇄회로기판 및 그제조 방법 |
| KR100645625B1 (ko) * | 2004-12-01 | 2006-11-15 | 삼성전기주식회사 | 커패시터 내장형 인쇄회로기판 및 그 제조방법 |
| KR20070086706A (ko) * | 2004-12-28 | 2007-08-27 | 니뽄 도쿠슈 도교 가부시키가이샤 | 배선 기판 및 배선 기판의 제조 방법 |
| KR100632554B1 (ko) * | 2004-12-30 | 2006-10-11 | 삼성전기주식회사 | 커패시터 내장형 인쇄회로기판 및 그 제조방법 |
| KR100716815B1 (ko) * | 2005-02-28 | 2007-05-09 | 삼성전기주식회사 | 칩 내장형 인쇄회로기판 및 그 제조방법 |
| KR100867038B1 (ko) * | 2005-03-02 | 2008-11-04 | 삼성전기주식회사 | 커패시터 내장형 인쇄회로기판 및 그 제조방법 |
| KR100716810B1 (ko) * | 2005-03-18 | 2007-05-09 | 삼성전기주식회사 | 블라인드 비아홀을 구비한 커패시터 내장형 인쇄회로기판및 그 제조 방법 |
| KR100716824B1 (ko) * | 2005-04-28 | 2007-05-09 | 삼성전기주식회사 | 하이브리드 재료를 이용한 커패시터 내장형 인쇄회로기판및 그 제조방법 |
| TWI270901B (en) * | 2005-09-16 | 2007-01-11 | Ctech Technology Corp | Solid capacitor and fabrication method thereof |
| US7919804B2 (en) * | 2005-11-08 | 2011-04-05 | Oracle America, Inc. | Power distribution for high-speed integrated circuits |
| US7444727B2 (en) * | 2006-03-10 | 2008-11-04 | Motorola, Inc. | Method for forming multi-layer embedded capacitors on a printed circuit board |
| US20080037198A1 (en) * | 2006-08-10 | 2008-02-14 | Borland William J | Methods of forming individual formed-on-foil thin capacitors for embedding inside printed wiring boards and semiconductor packages |
| KR100878414B1 (ko) * | 2006-10-27 | 2009-01-13 | 삼성전기주식회사 | 캐패시터 내장형 인쇄회로기판 및 제조방법 |
| US7742276B2 (en) * | 2007-03-30 | 2010-06-22 | Industrial Technology Research Institute | Wiring structure of laminated capacitors |
| US8022785B2 (en) * | 2008-12-03 | 2011-09-20 | Arcom Digital, Llc | Step attenuator circuit with improved insertion loss |
| JP2013122999A (ja) * | 2011-12-12 | 2013-06-20 | Sony Corp | 配線基板の製造方法 |
| KR102262907B1 (ko) * | 2014-05-30 | 2021-06-09 | 삼성전기주식회사 | 패키지 기판, 패키지, 적층 패키지 및 패키지 기판 제조 방법 |
| CN104093284B (zh) * | 2014-07-25 | 2017-05-31 | 惠州市金百泽电路科技有限公司 | 一种通过pcb布线设计形成板上电容的方法 |
| CN105405791A (zh) * | 2015-11-04 | 2016-03-16 | 咏巨科技有限公司 | 产生微静电场的抛光组件及化学抛光设备 |
| US20200083154A1 (en) * | 2018-09-10 | 2020-03-12 | At&S Austria Technologie & Systemtechnik Aktiengesellschaft | Component Carrier With a Photoimageable Dielectric Layer and a Structured Conductive Layer Being Used as a Mask for Selectively Exposing the Photoimageable Dielectric Layer With Electromagnetic Radiation |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1924775B2 (de) * | 1969-05-14 | 1971-06-09 | Verfahren zur herstellung einer leiterplatte | |
| US4554229A (en) * | 1984-04-06 | 1985-11-19 | At&T Technologies, Inc. | Multilayer hybrid integrated circuit |
| JPS61229389A (ja) * | 1985-04-03 | 1986-10-13 | イビデン株式会社 | セラミツク配線板およびその製造方法 |
| ATE56050T1 (de) * | 1987-04-24 | 1990-09-15 | Siemens Ag | Verfahren zur herstellung von leiterplatten. |
| US4830704A (en) * | 1988-01-29 | 1989-05-16 | Rockwell International Corporation | Method of manufacture of a wiring board |
| US5108553A (en) * | 1989-04-04 | 1992-04-28 | Olin Corporation | G-tab manufacturing process and the product produced thereby |
| US5716663A (en) * | 1990-02-09 | 1998-02-10 | Toranaga Technologies | Multilayer printed circuit |
| JP2881963B2 (ja) * | 1990-05-25 | 1999-04-12 | ソニー株式会社 | 配線基板及びその製造方法 |
| JP3019541B2 (ja) | 1990-11-22 | 2000-03-13 | 株式会社村田製作所 | コンデンサ内蔵型配線基板およびその製造方法 |
| US5162977A (en) | 1991-08-27 | 1992-11-10 | Storage Technology Corporation | Printed circuit board having an integrated decoupling capacitive element |
| US5973910A (en) | 1991-12-31 | 1999-10-26 | Intel Corporation | Decoupling capacitor in an integrated circuit |
| JPH05283859A (ja) * | 1992-04-02 | 1993-10-29 | Hitachi Chem Co Ltd | 印刷配線板の製造法 |
| US5455064A (en) * | 1993-11-12 | 1995-10-03 | Fujitsu Limited | Process for fabricating a substrate with thin film capacitor and insulating plug |
| US5849396A (en) * | 1995-09-13 | 1998-12-15 | Hughes Electronics Corporation | Multilayer electronic structure and its preparation |
| KR100189982B1 (ko) | 1995-11-29 | 1999-06-01 | 윤종용 | 고유전체 캐패시터의 제조방법 |
| KR100413649B1 (ko) * | 1996-01-26 | 2004-04-28 | 마츠시타 덴끼 산교 가부시키가이샤 | 반도체장치의제조방법 |
| KR100516043B1 (ko) * | 1997-03-06 | 2005-09-26 | 라미나 세라믹스, 인크. | 수동 소자들이 내재된 세라믹 다층 인쇄 회로 기판 |
| US6085415A (en) * | 1998-07-27 | 2000-07-11 | Ormet Corporation | Methods to produce insulated conductive through-features in core materials for electric packaging |
-
1998
- 1998-12-31 US US09/224,338 patent/US6349456B1/en not_active Expired - Fee Related
-
1999
- 1999-12-02 DE DE69937561T patent/DE69937561T2/de not_active Expired - Lifetime
- 1999-12-02 EP EP99964048A patent/EP1090401B1/de not_active Expired - Lifetime
- 1999-12-02 WO PCT/US1999/028536 patent/WO2000041192A1/en not_active Ceased
- 1999-12-02 JP JP2000592842A patent/JP2002534791A/ja active Pending
- 1999-12-02 AT AT99964048T patent/ATE378799T1/de not_active IP Right Cessation
- 1999-12-09 TW TW088121568A patent/TW436970B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| EP1090401B1 (de) | 2007-11-14 |
| DE69937561D1 (de) | 2007-12-27 |
| WO2000041192A1 (en) | 2000-07-13 |
| EP1090401A4 (de) | 2004-04-28 |
| TW436970B (en) | 2001-05-28 |
| EP1090401A1 (de) | 2001-04-11 |
| JP2002534791A (ja) | 2002-10-15 |
| DE69937561T2 (de) | 2008-09-04 |
| US6349456B1 (en) | 2002-02-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ATE378799T1 (de) | Photolithographisch hergestellter, integrierter kondensator mit selbst-ausgerichteten elektroden und dielektrika | |
| US8810002B2 (en) | Vertical metal insulator metal capacitor | |
| US3423821A (en) | Method of producing thin film integrated circuits | |
| US8187944B2 (en) | Patterned capacitor ground shield for inductor in an integrated circuit | |
| TW200505033A (en) | Capacitor and method of fabricating the same | |
| KR960012469A (ko) | 커패시터, 바이폴라 트랜지스터 및 igfet를 갖는 반도체 집적 회로 장치의 제조 방법 | |
| SG125881A1 (en) | Define via in dual damascene process | |
| KR960006038A (ko) | 비랜덤 서브-리쏘그라피 수직 스택 커패시터 | |
| US5915188A (en) | Integrated inductor and capacitor on a substrate and method for fabricating same | |
| JP2003526904A (ja) | コンデンサ構造を有する半導体装置及びその製造方法 | |
| WO2003046974A3 (de) | Kondensator und verfahren zum herstellen eines kondensators | |
| JPH02228063A (ja) | 高周波集積回路チヤンネル・キヤパシタ | |
| DE102011080439B4 (de) | Halbleiterbauelement und Verfahren zur Herstellung eines Halbleiterbauelements | |
| JP2000269449A5 (de) | ||
| US7109090B1 (en) | Pyramid-shaped capacitor structure | |
| GB2439883A (en) | Integrated circuit and method of manufacture | |
| KR20040009753A (ko) | 엠아이엠 캐패시터 형성방법 | |
| TW589670B (en) | Method of fabricating deep sub-micron CMOS source/drain with MDD and selective CVD silicide | |
| EP1334515B1 (de) | Verfahren zur herstellung eines integrierten halbleiter-bauelements | |
| US9159661B2 (en) | Integrated circuits with close electrical contacts and methods for fabricating the same | |
| WO2003081616A1 (de) | Spule auf einem halbleitersubstrat und verfahren zu deren herstellung | |
| KR100225848B1 (ko) | 커패시터 및 커패시터의 제조 방법 | |
| US6348393B1 (en) | Capacitor in an integrated circuit and a method of manufacturing an integrated circuit | |
| US8389374B1 (en) | Method for producing a microfabricated in-plane radio frequency (RF) capacitor | |
| JP2003179146A (ja) | 半導体装置及びその製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |