ATE381039T1 - In-situ-ausgleich für eine phasenschiebemaske - Google Patents

In-situ-ausgleich für eine phasenschiebemaske

Info

Publication number
ATE381039T1
ATE381039T1 AT02798923T AT02798923T ATE381039T1 AT E381039 T1 ATE381039 T1 AT E381039T1 AT 02798923 T AT02798923 T AT 02798923T AT 02798923 T AT02798923 T AT 02798923T AT E381039 T1 ATE381039 T1 AT E381039T1
Authority
AT
Austria
Prior art keywords
region
substrate
thickness
layer
phase shifting
Prior art date
Application number
AT02798923T
Other languages
English (en)
Inventor
Giang Dao
Qi-De Qian
Original Assignee
Intel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Intel Corp filed Critical Intel Corp
Application granted granted Critical
Publication of ATE381039T1 publication Critical patent/ATE381039T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/30—Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)
AT02798923T 2001-09-19 2002-08-22 In-situ-ausgleich für eine phasenschiebemaske ATE381039T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/957,571 US6548417B2 (en) 2001-09-19 2001-09-19 In-situ balancing for phase-shifting mask

Publications (1)

Publication Number Publication Date
ATE381039T1 true ATE381039T1 (de) 2007-12-15

Family

ID=25499784

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02798923T ATE381039T1 (de) 2001-09-19 2002-08-22 In-situ-ausgleich für eine phasenschiebemaske

Country Status (8)

Country Link
US (2) US6548417B2 (de)
EP (1) EP1428073B1 (de)
CN (1) CN100549817C (de)
AT (1) ATE381039T1 (de)
DE (1) DE60224061T2 (de)
MY (1) MY126251A (de)
TW (1) TW559893B (de)
WO (1) WO2003025672A2 (de)

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US6255717B1 (en) * 1998-11-25 2001-07-03 Advanced Micro Devices, Inc. Shallow trench isolation using antireflection layer
US6821883B1 (en) 1998-11-25 2004-11-23 Advanced Micro Devices, Inc. Shallow trench isolation using antireflection layer
US7061075B1 (en) 1998-11-25 2006-06-13 Advanced Micro Devices, Inc. Shallow trench isolation using antireflection layer
US6512385B1 (en) 1999-07-26 2003-01-28 Paul Pfaff Method for testing a device under test including the interference of two beams
US6573030B1 (en) * 2000-02-17 2003-06-03 Applied Materials, Inc. Method for depositing an amorphous carbon layer
TW517286B (en) * 2000-12-19 2003-01-11 Hoya Corp Gray tone mask and method for producing the same
US20030000921A1 (en) * 2001-06-29 2003-01-02 Ted Liang Mask repair with electron beam-induced chemical etching
US7733499B2 (en) 2001-12-06 2010-06-08 Attofemto, Inc. Method for optically testing semiconductor devices
US9952161B2 (en) 2001-12-06 2018-04-24 Attofemto, Inc. Methods for obtaining and analyzing digital interferometric data for computer testing and developing semiconductor and anisotropic devices and materials
US8462350B2 (en) 2001-12-06 2013-06-11 Attofemto, Inc. Optically enhanced holographic interferometric testing methods for the development and evaluation of semiconductor devices, materials, wafers, and for monitoring all phases of development and manufacture
KR100566151B1 (ko) * 2002-03-25 2006-03-31 에이에스엠엘 마스크툴즈 비.브이. 무크롬 상 리소그래피를 이용하여 상 및 크롬영역으로반도체디바이스패턴을 분해하는 방법 및 장치
US6541397B1 (en) * 2002-03-29 2003-04-01 Applied Materials, Inc. Removable amorphous carbon CMP stop
KR100468735B1 (ko) * 2002-06-12 2005-01-29 삼성전자주식회사 얼터네이팅 위상 반전 마스크의 제조방법
DE10230755A1 (de) * 2002-07-09 2004-01-22 Carl Zeiss Jena Gmbh Anordnung zur Herstellung von Photomasken
US6852455B1 (en) * 2002-07-31 2005-02-08 Advanced Micro Devices, Inc. Amorphous carbon absorber/shifter film for attenuated phase shift mask
US7112288B2 (en) * 2002-08-13 2006-09-26 Texas Instruments Incorporated Methods for inspection sample preparation
TWI274969B (en) * 2002-09-11 2007-03-01 Asml Masktools Bv Method and computer program product of generating masks and mask generated thereby, device manufacturing method and device manufactured thereby, and method of printing pattern
DE10316713A1 (de) * 2003-04-11 2004-10-28 Infineon Technologies Ag Verfahren zur Herstellung von Fotomasken mittels gepulsten Plasmen
JP4520787B2 (ja) * 2003-06-30 2010-08-11 エーエスエムエル マスクツールズ ビー．ブイ． 半波長以下リソグラフィ模様付けの改良型散乱バーｏｐｃ適用方法
DE10339888A1 (de) * 2003-08-29 2005-03-31 Infineon Technologies Ag Maske und Verfahren zur Durchführung eines Fotolithografieprozesses
US7169514B2 (en) * 2003-12-31 2007-01-30 Intel Corporation Extreme ultraviolet mask with molybdenum phase shifter
US7448012B1 (en) * 2004-04-21 2008-11-04 Qi-De Qian Methods and system for improving integrated circuit layout
DE102004028849B4 (de) * 2004-06-15 2007-07-19 Infineon Technologies Ag Phasenschiebende Fotomaske für eine fotolithographische Abbildung und Verfahren zu deren Herstellung
TW200909999A (en) * 2004-07-09 2009-03-01 Hoya Corp Photomask blank, photomask manufacturing method and semiconductor device manufacturing method
WO2006037027A1 (en) * 2004-09-27 2006-04-06 Toppan Photomasks, Inc. Phase-shift mask providing balanced light intensity through different phase-shift apertures and method for forming such phase-shift mask
US7122465B1 (en) * 2004-12-02 2006-10-17 Spansion Llc Method for achieving increased control over interconnect line thickness across a wafer and between wafers
US7767363B2 (en) * 2005-06-24 2010-08-03 Micron Technology, Inc. Methods for photo-processing photo-imageable material
DE602006021102D1 (de) * 2005-07-21 2011-05-19 Shinetsu Chemical Co Photomaskenrohling, Photomaske und deren Herstellungsverfahren
US7674562B2 (en) * 2005-12-07 2010-03-09 Chartered Semiconductor Manufacturing, Ltd. Angled-wedge chrome-face wall for intensity balance of alternating phase shift mask
US20080254233A1 (en) * 2007-04-10 2008-10-16 Kwangduk Douglas Lee Plasma-induced charge damage control for plasma enhanced chemical vapor deposition processes
KR101274713B1 (ko) * 2009-12-07 2013-06-12 엘지디스플레이 주식회사 인쇄판의 제조 방법 및 그를 이용한 박막 패턴의 제조 방법
CN102096334B (zh) * 2010-12-22 2012-08-08 中国科学院光电技术研究所 一种基于移相原理提高分辨率的超衍射成像器件及其制作方法
CN103178349A (zh) * 2011-12-26 2013-06-26 深圳光启高等理工研究院 微结构加工方法
US8598042B1 (en) * 2012-06-01 2013-12-03 Taiwan Semiconductor Manufacturing Company, Ltd. Device manufacturing and cleaning method
CN104576539B (zh) * 2013-10-23 2017-08-25 中芯国际集成电路制造(上海)有限公司 半导体结构形成方法
US11402743B2 (en) * 2020-08-31 2022-08-02 Taiwan Semiconductor Manufacturing Co., Ltd. Mask defect prevention

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US5362591A (en) * 1989-10-09 1994-11-08 Hitachi Ltd. Et Al. Mask having a phase shifter and method of manufacturing same
DE69131497T2 (de) * 1990-06-21 2000-03-30 Matsushita Electronics Corp., Kadoma Photomaske, die in der Photolithographie benutzt wird und ein Herstellungsverfahren derselben
US5633102A (en) * 1991-08-23 1997-05-27 Intel Corporation Lithography using a new phase-shifting reticle
US5403682A (en) * 1992-10-30 1995-04-04 International Business Machines Corporation Alternating rim phase-shifting mask
KR0166497B1 (ko) * 1995-03-24 1999-01-15 김주용 위상반전 마스크 및 그 제조방법
KR100201040B1 (ko) * 1996-08-26 1999-06-15 다니구찌 이찌로오; 기타오카 다카시 위상 쉬프트 마스크 및 그 제조 방법
US5858580A (en) * 1997-09-17 1999-01-12 Numerical Technologies, Inc. Phase shifting circuit manufacture method and apparatus
TW324074B (en) * 1997-02-14 1998-01-01 United Microelectronics Corp Manufacturing method of phase shifting mask
US5976968A (en) * 1997-10-14 1999-11-02 Industrial Technology Research Institute Single-mask dual damascene processes by using phase-shifting mask
US5932377A (en) * 1998-02-24 1999-08-03 International Business Machines Corporation Exact transmission balanced alternating phase-shifting mask for photolithography
US6153342A (en) * 1999-06-30 2000-11-28 Intel Corporation Selective spacer methodology for fabricating phase shift masks
TW512424B (en) * 2000-05-01 2002-12-01 Asml Masktools Bv Hybrid phase-shift mask
US6458495B1 (en) * 2000-06-30 2002-10-01 Intel Corporation Transmission and phase balance for phase-shifting mask

Also Published As

Publication number Publication date
US20030054260A1 (en) 2003-03-20
EP1428073A2 (de) 2004-06-16
TW559893B (en) 2003-11-01
US6548417B2 (en) 2003-04-15
US20030054262A1 (en) 2003-03-20
EP1428073B1 (de) 2007-12-12
US6660649B2 (en) 2003-12-09
CN1668978A (zh) 2005-09-14
MY126251A (en) 2006-09-29
WO2003025672A2 (en) 2003-03-27
DE60224061D1 (de) 2008-01-24
CN100549817C (zh) 2009-10-14
WO2003025672A3 (en) 2003-11-20
DE60224061T2 (de) 2008-04-03

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