ATE392466T1 - Reinigungs- bzw. spülverfahren - Google Patents

Reinigungs- bzw. spülverfahren

Info

Publication number
ATE392466T1
ATE392466T1 AT04746450T AT04746450T ATE392466T1 AT E392466 T1 ATE392466 T1 AT E392466T1 AT 04746450 T AT04746450 T AT 04746450T AT 04746450 T AT04746450 T AT 04746450T AT E392466 T1 ATE392466 T1 AT E392466T1
Authority
AT
Austria
Prior art keywords
cleaning
rinsing
article
contacting
formula
Prior art date
Application number
AT04746450T
Other languages
English (en)
Inventor
Tsuyoshi Hanada
Hidekazu Okamoto
Masaaki Tsuzaki
Maki Shigematsu
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Application granted granted Critical
Publication of ATE392466T1 publication Critical patent/ATE392466T1/de

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16Organic compounds
    • C11D3/20Organic compounds containing oxygen
    • C11D3/2068Ethers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/08Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16Organic compounds
    • C11D3/18Hydrocarbons
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16Organic compounds
    • C11D3/24Organic compounds containing halogen
    • C11D3/245Organic compounds containing halogen containing fluorine
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/24Hydrocarbons
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/24Hydrocarbons
    • C11D7/247Hydrocarbons aromatic
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/26Organic compounds containing oxygen
    • C11D7/263Ethers
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/28Organic compounds containing halogen
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50Solvents
    • C11D7/5004Organic solvents
    • C11D7/5018Halogenated solvents
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50Solvents
    • C11D7/5004Organic solvents
    • C11D7/5022Organic solvents containing oxygen
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50Solvents
    • C11D7/5004Organic solvents
    • C11D7/5027Hydrocarbons
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/032Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing oxygen-containing compounds
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10Objects to be cleaned
    • C11D2111/14Hard surfaces
    • C11D2111/18Glass; Plastics
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10Objects to be cleaned
    • C11D2111/14Hard surfaces
    • C11D2111/22Electronic devices, e.g. PCBs or semiconductors
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/40Specific cleaning or washing processes
    • C11D2111/44Multi-step processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Emergency Medicine (AREA)
  • Health & Medical Sciences (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Detergent Compositions (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Registering, Tensioning, Guiding Webs, And Rollers Therefor (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Manufacturing Of Printed Wiring (AREA)
AT04746450T 2003-06-27 2004-06-25 Reinigungs- bzw. spülverfahren ATE392466T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003184722 2003-06-27

Publications (1)

Publication Number Publication Date
ATE392466T1 true ATE392466T1 (de) 2008-05-15

Family

ID=33549625

Family Applications (2)

Application Number Title Priority Date Filing Date
AT04746450T ATE392466T1 (de) 2003-06-27 2004-06-25 Reinigungs- bzw. spülverfahren
AT07013715T ATE449156T1 (de) 2003-06-27 2004-06-25 Reinigungs-/spülverfahren

Family Applications After (1)

Application Number Title Priority Date Filing Date
AT07013715T ATE449156T1 (de) 2003-06-27 2004-06-25 Reinigungs-/spülverfahren

Country Status (12)

Country Link
US (1) US7662192B2 (de)
EP (2) EP1867709B1 (de)
JP (2) JP4655931B2 (de)
KR (2) KR101026095B1 (de)
CN (1) CN100412184C (de)
AT (2) ATE392466T1 (de)
AU (2) AU2004252335B2 (de)
CA (1) CA2530180C (de)
DE (2) DE602004024253D1 (de)
ES (2) ES2335362T3 (de)
SG (1) SG161108A1 (de)
WO (1) WO2005001015A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4761293B2 (ja) * 2005-03-08 2011-08-31 Jx日鉱日石エネルギー株式会社 洗浄剤組成物及び洗浄方法
JP4749006B2 (ja) * 2005-03-15 2011-08-17 新オオツカ株式会社 被洗浄物防錆方法及び被洗浄物防錆装置
JP4894307B2 (ja) * 2005-03-29 2012-03-14 旭硝子株式会社 潜熱輸送装置用作動液および潜熱輸送装置の作動方法
TWI346837B (en) * 2005-07-12 2011-08-11 Tokyo Ohka Kogyo Co Ltd Protective film-forming material and method of photoresist patterning with it
US8084367B2 (en) * 2006-05-24 2011-12-27 Samsung Electronics Co., Ltd Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods
JPWO2008149907A1 (ja) * 2007-06-08 2010-08-26 旭硝子株式会社 洗浄溶剤および洗浄方法
CN101679923B (zh) * 2007-07-05 2012-07-25 日本曹达株式会社 有机薄膜清洗用溶剂
JP2011072967A (ja) * 2009-10-01 2011-04-14 Asahi Glass Co Ltd 含フッ素ポリマーの除去方法
JP5960439B2 (ja) * 2012-01-27 2016-08-02 スリーエム イノベイティブ プロパティズ カンパニー 除塵洗浄液およびそれを用いた洗浄方法
KR102478194B1 (ko) * 2017-06-26 2022-12-15 에이지씨 가부시키가이샤 진공 증착용의 마스크의 세정 방법 및 린스 조성물

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9007645D0 (en) * 1990-04-04 1990-05-30 Ici Plc Solvent cleaning of articles
DE4013369A1 (de) * 1990-04-26 1991-10-31 Hoechst Ag Neues azeotropes oder azeotropartiges gemisch aus 2,2,2-trifluorethyl-1,1,2,2-tetrafluorethylether und ethanol sowie dessen verwendung
JP3056239B2 (ja) * 1990-11-15 2000-06-26 昭和電工株式会社 ハンダフラックス除去液
JPH04270799A (ja) * 1991-02-25 1992-09-28 Arakawa Chem Ind Co Ltd 非ハロゲン系の工業用脱脂洗浄剤及び該洗浄剤を用いてなる物品の洗浄処理方法
JPH06128592A (ja) * 1992-10-15 1994-05-10 Tokuyama Sekiyu Kagaku Kk ワックス溶解組成物
JP3312758B2 (ja) * 1992-12-22 2002-08-12 山口日本電気株式会社 エレクトロニクス用洗浄液
JP4063906B2 (ja) * 1996-05-20 2008-03-19 三井・デュポンフロロケミカル株式会社 洗浄方法
JPH10202209A (ja) * 1997-01-20 1998-08-04 Otsuka Giken Kogyo Kk 洗浄装置
JP3560269B2 (ja) * 1997-01-28 2004-09-02 第一工業製薬株式会社 非引火性工業用洗浄剤組成物およびそれを用いた洗浄方法
KR100580912B1 (ko) * 1997-05-16 2006-05-17 제온 코포레이션 불소화 탄화수소 및 세정제와 세정방법, 중합체 함유액과 중합체 피막의 형성방법
JP2881195B1 (ja) * 1998-03-30 1999-04-12 工業技術院長 共沸様組成物
JP5013562B2 (ja) * 1998-06-25 2012-08-29 三井・デュポンフロロケミカル株式会社 洗浄方法及び装置
JP4227695B2 (ja) 1999-02-09 2009-02-18 株式会社リコー 画像形成装置
JP3404541B2 (ja) * 1999-12-15 2003-05-12 独立行政法人産業技術総合研究所 1,1,2,2−テトラフルオロ−3−(1,1,2,2−テトラフルオロエトキシ)−プロパンとアルコール類からなる組成物
KR100632536B1 (ko) * 2000-03-20 2006-10-09 에스케이 주식회사 파울링 제거용 세정제 조성물 및 이의 사용방법
US6310018B1 (en) * 2000-03-31 2001-10-30 3M Innovative Properties Company Fluorinated solvent compositions containing hydrogen fluoride
US6372700B1 (en) * 2000-03-31 2002-04-16 3M Innovative Properties Company Fluorinated solvent compositions containing ozone
JP2001300446A (ja) * 2000-04-28 2001-10-30 Nippon Zeon Co Ltd 被洗浄物の洗浄方法
TWI250206B (en) * 2000-06-01 2006-03-01 Asahi Kasei Corp Cleaning agent, cleaning method and cleaning apparatus
JP2003327999A (ja) * 2002-03-06 2003-11-19 Asahi Glass Co Ltd 溶剤組成物
TWI315301B (en) * 2002-03-06 2009-10-01 Asahi Glass Co Ltd Solvent composition
JP4270799B2 (ja) 2002-03-22 2009-06-03 オリンパス株式会社 画像記録装置
JP3833650B2 (ja) * 2003-12-04 2006-10-18 関東化学株式会社 低分子型有機el素子製造の真空蒸着工程において使用するマスクの洗浄液組成物および洗浄方法
JP4182062B2 (ja) 2005-01-21 2008-11-19 新明和工業株式会社 車両の荷役装置

Also Published As

Publication number Publication date
DE602004013154T2 (de) 2009-05-14
CN100412184C (zh) 2008-08-20
AU2004252335B2 (en) 2009-04-09
DE602004013154D1 (de) 2008-05-29
ES2304613T3 (es) 2008-10-16
US7662192B2 (en) 2010-02-16
EP1640443A4 (de) 2006-12-06
US20060135390A1 (en) 2006-06-22
JP4655931B2 (ja) 2011-03-23
CA2530180C (en) 2011-05-24
KR101080657B1 (ko) 2011-11-08
JP2010242097A (ja) 2010-10-28
KR101026095B1 (ko) 2011-03-31
DE602004024253D1 (de) 2009-12-31
ATE449156T1 (de) 2009-12-15
KR20100123928A (ko) 2010-11-25
EP1867709A1 (de) 2007-12-19
SG161108A1 (en) 2010-05-27
EP1640443B1 (de) 2008-04-16
CA2530180A1 (en) 2005-01-06
AU2009200896B2 (en) 2010-11-11
AU2009200896A1 (en) 2009-03-26
AU2004252335A1 (en) 2005-01-06
JPWO2005001015A1 (ja) 2006-08-10
ES2335362T3 (es) 2010-03-25
EP1867709B1 (de) 2009-11-18
EP1640443A1 (de) 2006-03-29
CN1809627A (zh) 2006-07-26
KR20060029217A (ko) 2006-04-05
WO2005001015A1 (ja) 2005-01-06

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