ATE399335T1 - Flüssige, strahlungshärtbare zusammensetzung, insbesondere zur herstellung von biegsamen gehärteten gegenständen für die stereolithographie - Google Patents
Flüssige, strahlungshärtbare zusammensetzung, insbesondere zur herstellung von biegsamen gehärteten gegenständen für die stereolithographieInfo
- Publication number
- ATE399335T1 ATE399335T1 AT99916836T AT99916836T ATE399335T1 AT E399335 T1 ATE399335 T1 AT E399335T1 AT 99916836 T AT99916836 T AT 99916836T AT 99916836 T AT99916836 T AT 99916836T AT E399335 T1 ATE399335 T1 AT E399335T1
- Authority
- AT
- Austria
- Prior art keywords
- polyether polyol
- radiation
- cationic
- stereolithography
- reactive
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
- B33Y70/10—Composites of different types of material, e.g. mixtures of ceramics and polymers or mixtures of metals and biomaterials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C9/00—Stereo-photographic or similar processes
- G03C9/08—Stereo-photographic or similar processes producing three-dimensional [3D] images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Ceramic Engineering (AREA)
- Civil Engineering (AREA)
- Composite Materials (AREA)
- Structural Engineering (AREA)
- Epoxy Resins (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/050,279 US6136497A (en) | 1998-03-30 | 1998-03-30 | Liquid, radiation-curable composition, especially for producing flexible cured articles by stereolithography |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE399335T1 true ATE399335T1 (de) | 2008-07-15 |
Family
ID=21964363
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT99916836T ATE399335T1 (de) | 1998-03-30 | 1999-03-19 | Flüssige, strahlungshärtbare zusammensetzung, insbesondere zur herstellung von biegsamen gehärteten gegenständen für die stereolithographie |
Country Status (14)
| Country | Link |
|---|---|
| US (3) | US6136497A (de) |
| EP (1) | EP1080392B1 (de) |
| JP (1) | JP4798845B2 (de) |
| KR (1) | KR100653732B1 (de) |
| CN (1) | CN1191498C (de) |
| AT (1) | ATE399335T1 (de) |
| AU (1) | AU3518699A (de) |
| BR (1) | BR9909270A (de) |
| CA (1) | CA2326128C (de) |
| DE (1) | DE69938966D1 (de) |
| IL (1) | IL138301A0 (de) |
| TR (1) | TR200002776T2 (de) |
| TW (1) | TWI221850B (de) |
| WO (1) | WO1999050711A1 (de) |
Families Citing this family (79)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6287745B1 (en) * | 1998-02-18 | 2001-09-11 | Dsm N.V. | Photocurable liquid resin composition comprising an epoxy-branched alicyclic compound |
| US6100007A (en) * | 1998-04-06 | 2000-08-08 | Ciba Specialty Chemicals Corp. | Liquid radiation-curable composition especially for producing cured articles by stereolithography having high heat deflection temperatures |
| US20060154175A9 (en) * | 1998-07-10 | 2006-07-13 | Lawton John A | Solid imaging compositions for preparing polypropylene-like articles |
| US6287748B1 (en) | 1998-07-10 | 2001-09-11 | Dsm N.V. | Solid imaging compositions for preparing polyethylene-like articles |
| US6379866B2 (en) | 2000-03-31 | 2002-04-30 | Dsm Desotech Inc | Solid imaging compositions for preparing polypropylene-like articles |
| US6762002B2 (en) | 1998-07-10 | 2004-07-13 | Dsm Desotech, Inc. | Solid imaging compositions for preparing polypropylene-like articles |
| JP4350832B2 (ja) * | 1999-04-19 | 2009-10-21 | Jsr株式会社 | 立体造形用光硬化性樹脂組成物およびこれを硬化してなる造形物 |
| AU3023301A (en) * | 2000-02-08 | 2001-08-20 | Vantico Ag | Liquid, radiation-curable composition, especially for stereolithography |
| US6569373B2 (en) * | 2000-03-13 | 2003-05-27 | Object Geometries Ltd. | Compositions and methods for use in three dimensional model printing |
| US20030207959A1 (en) * | 2000-03-13 | 2003-11-06 | Eduardo Napadensky | Compositions and methods for use in three dimensional model printing |
| US7300619B2 (en) * | 2000-03-13 | 2007-11-27 | Objet Geometries Ltd. | Compositions and methods for use in three dimensional model printing |
| US8481241B2 (en) | 2000-03-13 | 2013-07-09 | Stratasys Ltd. | Compositions and methods for use in three dimensional model printing |
| US6574523B1 (en) * | 2000-05-05 | 2003-06-03 | 3D Systems, Inc. | Selective control of mechanical properties in stereolithographic build style configuration |
| US6485306B1 (en) * | 2001-07-10 | 2002-11-26 | Aiptek International Inc. | Locus-recordable portable handwriting device |
| GB0103752D0 (en) * | 2001-02-15 | 2001-04-04 | Vantico Ltd | Three-Dimensional printing |
| KR100737723B1 (ko) * | 2001-07-27 | 2007-07-10 | 주식회사 동진쎄미켐 | 감광성 수지 조성물 |
| US20030149124A1 (en) * | 2001-11-27 | 2003-08-07 | Thommes Glen A. | Radiation curable resin composition for making colored three dimensional objects |
| WO2003068870A1 (en) * | 2002-02-18 | 2003-08-21 | Kansai Paint Co., Ltd. | Coating compositions and method of forming coating film |
| US7495034B2 (en) * | 2002-02-22 | 2009-02-24 | Henkel Corporation | Deformable soft molding compositions |
| MXPA04010574A (es) * | 2002-04-25 | 2005-02-17 | Ashland Inc | Mejorador de superficie para composiciones de mezclas reforzadas. |
| US20040054025A1 (en) * | 2002-06-20 | 2004-03-18 | Lawton John A. | Compositions comprising a benzophenone photoinitiator |
| US6989225B2 (en) * | 2002-07-18 | 2006-01-24 | 3D Systems, Inc. | Stereolithographic resins with high temperature and high impact resistance |
| US6833231B2 (en) * | 2002-07-31 | 2004-12-21 | 3D Systems, Inc. | Toughened stereolithographic resin compositions |
| US20040077745A1 (en) * | 2002-10-18 | 2004-04-22 | Jigeng Xu | Curable compositions and rapid prototyping process using the same |
| TWI223736B (en) * | 2002-12-19 | 2004-11-11 | Ind Tech Res Inst | Hybrid photoresist with multi reaction models and process for forming pattern using the same |
| US20040137368A1 (en) * | 2003-01-13 | 2004-07-15 | 3D Systems, Inc. | Stereolithographic resins containing selected oxetane compounds |
| US20040161704A1 (en) * | 2003-02-18 | 2004-08-19 | Jianbing Huang | Method of making a flexographic printing plate by lithographic transfer of an energy-curable composition |
| US6881533B2 (en) | 2003-02-18 | 2005-04-19 | Kodak Polychrome Graphics Llc | Flexographic printing plate with ink-repellent non-image areas |
| US20040170923A1 (en) * | 2003-02-27 | 2004-09-02 | 3D Systems, Inc. | Colored stereolithographic resins |
| US6856283B2 (en) * | 2003-02-28 | 2005-02-15 | Raytheon Company | Method and apparatus for a power system for phased-array radar |
| JP4161858B2 (ja) * | 2003-06-03 | 2008-10-08 | コニカミノルタエムジー株式会社 | 感光性組成物、感光性平版印刷版、及び平版印刷版の作製方法 |
| WO2004113056A1 (ja) * | 2003-06-24 | 2004-12-29 | Cmet Inc. | 三次元構造体およびその製造方法 |
| US20050040562A1 (en) * | 2003-08-19 | 2005-02-24 | 3D Systems Inc. | Nanoparticle-filled stereolithographic resins |
| US7569260B2 (en) * | 2003-08-21 | 2009-08-04 | Asahi Kasei Chemicals Corporation | Photosensitive composition and cured products thereof |
| US7120512B2 (en) * | 2003-08-25 | 2006-10-10 | Hewlett-Packard Development Company, L.P. | Method and a system for solid freeform fabricating using non-reactive powder |
| US7232850B2 (en) | 2003-10-03 | 2007-06-19 | Huntsman Advanced Materials Americas Inc. | Photocurable compositions for articles having stable tensile properties |
| US7820275B2 (en) * | 2003-11-06 | 2010-10-26 | Huntsman Advanced Materials Americas Llc | Photocurable composition for producing cured articles having high clarity and improved mechanical properties |
| WO2005045525A1 (en) * | 2003-11-06 | 2005-05-19 | Dsm Ip Assets B.V. | Curable compositions and rapid prototyping process using the same |
| US20050101684A1 (en) * | 2003-11-06 | 2005-05-12 | Xiaorong You | Curable compositions and rapid prototyping process using the same |
| US20050165127A1 (en) * | 2003-12-31 | 2005-07-28 | Dsm Desotech, Inc. | Solid imaging compositions for preparing polyethylene-like articles |
| DE102004012682A1 (de) * | 2004-03-16 | 2005-10-06 | Degussa Ag | Verfahren zur Herstellung von dreidimensionalen Objekten mittels Lasertechnik und Auftragen eines Absorbers per Inkjet-Verfahren |
| WO2005092598A1 (en) * | 2004-03-22 | 2005-10-06 | Huntsman Advanced Materials (Switzerland) Gmbh | Photocurable compositions |
| DE102004020452A1 (de) * | 2004-04-27 | 2005-12-01 | Degussa Ag | Verfahren zur Herstellung von dreidimensionalen Objekten mittels elektromagnetischer Strahlung und Auftragen eines Absorbers per Inkjet-Verfahren |
| DE102004034416A1 (de) * | 2004-07-15 | 2006-02-02 | "Stiftung Caesar" (Center Of Advanced European Studies And Research) | Flüssige, strahlunghärtende Zusammensetzungen |
| JP4490798B2 (ja) * | 2004-08-30 | 2010-06-30 | Jsr株式会社 | 光ファイバアップジャケット用液状硬化性樹脂組成物 |
| TWI367214B (en) * | 2004-09-15 | 2012-07-01 | Dongjin Semichem Co Ltd New | Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same |
| US7423073B2 (en) * | 2004-11-23 | 2008-09-09 | Lexmark International, Inc. | Radiation curable compositions having improved flexibility |
| US20060172230A1 (en) * | 2005-02-02 | 2006-08-03 | Dsm Ip Assets B.V. | Method and composition for reducing waste in photo-imaging applications |
| US20070116311A1 (en) * | 2005-11-16 | 2007-05-24 | Henkel Corporation | High strength curable compositions for the solid freeform fabrication of hearing aids |
| TWI432904B (zh) * | 2006-01-25 | 2014-04-01 | Dow Corning | 用於微影技術之環氧樹脂調配物 |
| JP4929784B2 (ja) * | 2006-03-27 | 2012-05-09 | 富士通株式会社 | 多層配線基板、半導体装置およびソルダレジスト |
| EP2019975B1 (de) * | 2006-05-01 | 2017-08-16 | DSM IP Assets B.V. | MIT STRAHLUNG AUSHÄRTBARE HARZZUSAMMENSETZUNG UND DIESE VERWENDENDER SCHNELLER DREIDIMENSIONALER ABBILDUNGSPROZEß |
| US20080103226A1 (en) | 2006-10-31 | 2008-05-01 | Dsm Ip Assets B.V. | Photo-curable resin composition |
| TWI447939B (zh) * | 2007-06-15 | 2014-08-01 | 納美仕有限公司 | Led用導電性晶粒黏著劑 |
| DE102007043559B4 (de) * | 2007-09-13 | 2012-05-31 | Carl Zeiss Vision Gmbh | Verwendung eines lichthärtenden thermoplastischen Epoxidharzklebstoffs zum Blocken oder Kleben von optischen Bauelementen |
| WO2009070500A1 (en) * | 2007-11-27 | 2009-06-04 | Huntsman Advanced Materials Americas Inc. | Photocurable resin composition for producing three dimensional articles having high clarity |
| EP2098367A1 (de) * | 2008-03-05 | 2009-09-09 | Eastman Kodak Company | Sensibilisator/Initiator-Kombination für negativ arbeitende wärmeempfindliche Zusammensetzungen für Lithografieplatten |
| WO2010043274A1 (en) * | 2008-10-17 | 2010-04-22 | Huntsman Advanced Materials (Switzerland) Gmbh | Improvements for rapid prototyping apparatus |
| US20100190881A1 (en) | 2009-01-28 | 2010-07-29 | 3D Systems, Incorporated | Radiation Curable Compositions Useful in Solid Freeform Fabrication Systems |
| US8501033B2 (en) | 2009-03-13 | 2013-08-06 | Dsm Ip Assets B.V. | Radiation curable resin composition and rapid three-dimensional imaging process using the same |
| EP2436510A1 (de) | 2010-10-04 | 2012-04-04 | 3D Systems, Inc. | System und Harz zur schnellen Prototypisierung |
| WO2012126695A1 (en) | 2011-03-23 | 2012-09-27 | Huntsman Advanced Materials (Switzerland) Gmbh | Stable curable thiol-ene composition |
| KR20130139134A (ko) | 2012-06-12 | 2013-12-20 | 제일모직주식회사 | 접착제 조성물, 이를 이용한 편광판, 그 제조 방법 및 이를 포함하는 광학 부재 |
| EP2842980B1 (de) | 2013-08-09 | 2021-05-05 | DSM IP Assets B.V. | Niedrigviskose flüssige strahlungshärtbare harzzusammensetzungen für zahnregulierungsform zur herstellung von zusatzstoffen |
| CN105482513B (zh) * | 2014-10-11 | 2017-12-26 | 中国科学院宁波材料技术与工程研究所 | 油墨用玻璃粉和颜料的改性分散方法及耐高温油墨 |
| WO2016142947A2 (en) * | 2015-03-11 | 2016-09-15 | Stratasys Ltd. | Support material formulation and additive manufacturing processes employing same |
| WO2016153711A1 (en) * | 2015-03-23 | 2016-09-29 | Dow Global Technologies Llc | Photocurable compositions for three-dimensional printing |
| CN104914675B (zh) * | 2015-04-08 | 2019-04-23 | 乐道战略材料有限公司 | 一种用于三维快速成型的含光敏性硅氧烷和超支化聚醚多元醇的光敏树脂组合物 |
| DE102015014925B4 (de) * | 2015-11-17 | 2017-09-28 | Ronald Hüner | Reibschichten mit Kanalstruktur |
| EP3181357B1 (de) | 2015-12-15 | 2018-10-10 | Agfa Nv | Additives fertigungsverfahren mit dynamischer lichtprojektion für flexografiedruckvorlage |
| CN108778688B (zh) * | 2016-03-14 | 2022-05-13 | 科思创(荷兰)有限公司 | 具有改善韧性耐高温性的加成法制造用可辐射固化组合物 |
| JP2019516823A (ja) | 2016-04-08 | 2019-06-20 | ソルベイ スペシャルティ ポリマーズ ユーエスエー, エルエルシー | 光硬化性ポリマー、光硬化性ポリマー組成物、及びこれを含むリソグラフィープロセス |
| ES2685280B2 (es) * | 2017-03-31 | 2019-06-21 | Centro Tecnologico De Nanomateriales Avanzados S L | Composición de resina curable por radiación y procedimiento para su obtención |
| US10961448B2 (en) | 2017-06-05 | 2021-03-30 | Nanosys, Inc. | Acid stabilization of quantum dot-resin concentrates and premixes |
| CN112074395A (zh) * | 2018-03-02 | 2020-12-11 | 福姆实验室公司 | 潜伏性固化树脂及相关方法 |
| JP7214981B2 (ja) * | 2018-05-31 | 2023-01-31 | 味の素株式会社 | 樹脂組成物、シート状積層材料、プリント配線板及び半導体装置 |
| EP3914043A1 (de) | 2020-05-20 | 2021-11-24 | Henkel IP & Holding GmbH | Nachbearbeitung von 3d-druckmaterialien mittels mikrowellenverstärkter chemie |
| SE545292C2 (en) * | 2020-07-08 | 2023-06-20 | Perstorp Ab | A radiation curable composition comprising a biobased reactive diluent |
| US20220411634A1 (en) | 2021-06-24 | 2022-12-29 | Henkel Ag & Co. Kgaa | Silicone formulation with high temperature stability and clarity |
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|---|---|---|---|---|
| US4318766A (en) * | 1975-09-02 | 1982-03-09 | Minnesota Mining And Manufacturing Company | Process of using photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials |
| JP2538652B2 (ja) * | 1988-09-19 | 1996-09-25 | 旭電化工業株式会社 | 光学的造形用樹脂組成物 |
| US5434196A (en) * | 1988-02-19 | 1995-07-18 | Asahi Denka Kogyo K.K. | Resin composition for optical molding |
| WO1992015620A1 (en) * | 1991-02-27 | 1992-09-17 | Allied-Signal Inc. | Stereolithography using vinyl ether based polymers |
| US5510226A (en) * | 1991-05-01 | 1996-04-23 | Alliedsignal Inc. | Stereolithography using vinyl ether-epoxide polymers |
| DE4138309C2 (de) * | 1991-11-21 | 1995-02-09 | Eos Electro Optical Syst | Durch Einwirkung elektromagnetischer Strahlung vernetzbares Kunststoffmaterial |
| CA2092131A1 (en) * | 1992-03-27 | 1993-09-28 | Victor Kadziela (Nmi) | Low viscosity self-toughening acrylate composition |
| DE69315003T2 (de) * | 1992-07-17 | 1998-03-12 | Ethicon Inc | Strahlenhärtbare Urethan-Acrylatprepolymere und vernetzte Polymere |
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| JPH0760843A (ja) * | 1993-08-26 | 1995-03-07 | Olympus Optical Co Ltd | 三次元構造体の製造方法 |
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| US5494618A (en) * | 1994-06-27 | 1996-02-27 | Alliedsignal Inc. | Increasing the useful range of cationic photoinitiators in stereolithography |
| US5705116A (en) * | 1994-06-27 | 1998-01-06 | Sitzmann; Eugene Valentine | Increasing the useful range of cationic photoinitiators in stereolithography |
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| JP3626275B2 (ja) * | 1996-04-09 | 2005-03-02 | Jsr株式会社 | 光硬化性樹脂組成物 |
| KR100491736B1 (ko) * | 1996-07-29 | 2005-09-09 | 반티코 아게 | 입체리토그래피용방사선-경화성액체조성물 |
| JP3844824B2 (ja) * | 1996-11-26 | 2006-11-15 | 株式会社Adeka | エネルギー線硬化性エポキシ樹脂組成物、光学的立体造形用樹脂組成物及び光学的立体造形方法 |
| EP0960354A1 (de) * | 1997-02-14 | 1999-12-01 | Alliedsignal Inc. | Hochtemperaturbeständige polymere für stereolithographie |
| JP4204113B2 (ja) * | 1997-12-04 | 2009-01-07 | 株式会社Adeka | 新規な芳香族スルホニウム化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光造形用樹脂組成物ならびに光学的立体造形法 |
-
1998
- 1998-03-30 US US09/050,279 patent/US6136497A/en not_active Expired - Lifetime
-
1999
- 1999-03-19 JP JP2000541560A patent/JP4798845B2/ja not_active Expired - Lifetime
- 1999-03-19 BR BR9909270-0A patent/BR9909270A/pt not_active IP Right Cessation
- 1999-03-19 EP EP99916836A patent/EP1080392B1/de not_active Expired - Lifetime
- 1999-03-19 IL IL13830199A patent/IL138301A0/xx unknown
- 1999-03-19 DE DE69938966T patent/DE69938966D1/de not_active Expired - Lifetime
- 1999-03-19 CA CA002326128A patent/CA2326128C/en not_active Expired - Lifetime
- 1999-03-19 AT AT99916836T patent/ATE399335T1/de active
- 1999-03-19 TR TR2000/02776T patent/TR200002776T2/xx unknown
- 1999-03-19 KR KR1020007010875A patent/KR100653732B1/ko not_active Expired - Lifetime
- 1999-03-19 CN CNB998048062A patent/CN1191498C/zh not_active Expired - Lifetime
- 1999-03-19 AU AU35186/99A patent/AU3518699A/en not_active Abandoned
- 1999-03-19 WO PCT/EP1999/001844 patent/WO1999050711A1/en not_active Ceased
- 1999-03-29 TW TW088104905A patent/TWI221850B/zh not_active IP Right Cessation
-
2000
- 2000-08-25 US US09/645,944 patent/US6413697B1/en not_active Expired - Lifetime
-
2002
- 2002-06-13 US US10/167,436 patent/US20020177073A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| TWI221850B (en) | 2004-10-11 |
| CN1296577A (zh) | 2001-05-23 |
| CA2326128C (en) | 2008-07-15 |
| KR100653732B1 (ko) | 2006-12-05 |
| US6413697B1 (en) | 2002-07-02 |
| JP2002509982A (ja) | 2002-04-02 |
| CA2326128A1 (en) | 1999-10-07 |
| BR9909270A (pt) | 2000-11-21 |
| KR20010042325A (ko) | 2001-05-25 |
| EP1080392B1 (de) | 2008-06-25 |
| TR200002776T2 (tr) | 2001-02-21 |
| US20020177073A1 (en) | 2002-11-28 |
| JP4798845B2 (ja) | 2011-10-19 |
| US6136497A (en) | 2000-10-24 |
| DE69938966D1 (de) | 2008-08-07 |
| CN1191498C (zh) | 2005-03-02 |
| EP1080392A1 (de) | 2001-03-07 |
| IL138301A0 (en) | 2001-10-31 |
| HK1032635A1 (en) | 2001-07-27 |
| AU3518699A (en) | 1999-10-18 |
| WO1999050711A1 (en) | 1999-10-07 |
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