ATE40757T1 - WATER-BASED PHOTOPOLYMERIZABLE COMPOSITIONS AND USE. - Google Patents

WATER-BASED PHOTOPOLYMERIZABLE COMPOSITIONS AND USE.

Info

Publication number
ATE40757T1
ATE40757T1 AT84302232T AT84302232T ATE40757T1 AT E40757 T1 ATE40757 T1 AT E40757T1 AT 84302232 T AT84302232 T AT 84302232T AT 84302232 T AT84302232 T AT 84302232T AT E40757 T1 ATE40757 T1 AT E40757T1
Authority
AT
Austria
Prior art keywords
water
photopolymerizable compositions
based photopolymerizable
sensitizers
plasticizers
Prior art date
Application number
AT84302232T
Other languages
German (de)
Inventor
Peter Dickinson
Michael Ellwood
Original Assignee
Sericol Group Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sericol Group Ltd filed Critical Sericol Group Ltd
Application granted granted Critical
Publication of ATE40757T1 publication Critical patent/ATE40757T1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00—General processes for preparing compounds provided for in this subclass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/11—Vinyl alcohol polymer or derivative
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/113—Binder containing with plasticizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y10S430/123—Sulfur in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)

Abstract

Aqueous dispersions comprising water, a cationically curable compound, and a photosensitive onium salt, and preferably other ingredients such as sensitizers, fillers, and plasticizers, are useful for making printing screens, lithographic plates, and printed circuit resists. After exposure, the un-cured composition is easily removed by washing with water.
AT84302232T 1983-03-31 1984-03-30 WATER-BASED PHOTOPOLYMERIZABLE COMPOSITIONS AND USE. ATE40757T1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB08309019A GB2137626B (en) 1983-03-31 1983-03-31 Water based photopolymerisable compositions and their use
EP84302232A EP0124292B1 (en) 1983-03-31 1984-03-30 Water based photopolymerisable compositions and their use

Publications (1)

Publication Number Publication Date
ATE40757T1 true ATE40757T1 (en) 1989-02-15

Family

ID=10540571

Family Applications (1)

Application Number Title Priority Date Filing Date
AT84302232T ATE40757T1 (en) 1983-03-31 1984-03-30 WATER-BASED PHOTOPOLYMERIZABLE COMPOSITIONS AND USE.

Country Status (9)

Country Link
US (1) US4548890A (en)
EP (1) EP0124292B1 (en)
JP (1) JPS59184220A (en)
AT (1) ATE40757T1 (en)
AU (1) AU574672B2 (en)
CA (1) CA1264889A (en)
DE (1) DE3476706D1 (en)
DK (1) DK173784A (en)
GB (1) GB2137626B (en)

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GB2139369B (en) * 1983-05-06 1987-01-21 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
DE3565013D1 (en) * 1984-02-10 1988-10-20 Ciba Geigy Ag Process for the preparation of a protection layer or a relief pattern
GB8405549D0 (en) * 1984-03-02 1984-04-04 Sericol Group Ltd Screen printing compositions
US4554342A (en) * 1984-07-30 1985-11-19 Shell Oil Company Heat-curable compositions comprising an epoxy resin, an amine and a sulfonium salt
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US5300380A (en) * 1986-08-06 1994-04-05 Ciba-Geigy Corporation Process for the production of relief structures using a negative photoresist based on polyphenols and epoxy compounds or vinyl ethers
DE3766315D1 (en) * 1986-08-06 1991-01-03 Ciba Geigy Ag NEGATIVE PHOTORESIST BASED ON POLYPHENOLS AND EPOXY COMPOUNDS OR VINYL ETHERS.
EP0267554A3 (en) * 1986-11-12 1990-09-19 S.C. Johnson & Son, Inc. Aqueous polymer systems curable by cationic photo-initiation and methods of applying same to substrates
JPS63200339A (en) * 1987-02-12 1988-08-18 Canon Inc information recording medium
JPH0814695B2 (en) * 1987-03-25 1996-02-14 富士写真フイルム株式会社 Photosolubilizing composition
US4994346A (en) * 1987-07-28 1991-02-19 Ciba-Geigy Corporation Negative photoresist based on polyphenols and selected epoxy or vinyl ether compounds
US4840977A (en) * 1987-10-01 1989-06-20 General Electric Company Polymeric iodonium salts, method for making, and heat curable compositions
JP2686283B2 (en) * 1988-06-13 1997-12-08 関西ペイント株式会社 Photopolymerizable composition
US5264325A (en) * 1988-12-30 1993-11-23 International Business Machines Corporation Composition for photo imaging
US6180317B1 (en) 1988-12-30 2001-01-30 International Business Machines Corporation Composition for photoimaging
US5439766A (en) * 1988-12-30 1995-08-08 International Business Machines Corporation Composition for photo imaging
US5026624A (en) * 1989-03-03 1991-06-25 International Business Machines Corporation Composition for photo imaging
US5747223A (en) * 1988-12-30 1998-05-05 International Business Machines Corporation Composition for photoimaging
US4940651A (en) * 1988-12-30 1990-07-10 International Business Machines Corporation Method for patterning cationic curable photoresist
US5304457A (en) * 1989-03-03 1994-04-19 International Business Machines Corporation Composition for photo imaging
US5278010A (en) * 1989-03-03 1994-01-11 International Business Machines Corporation Composition for photo imaging
US5391465A (en) * 1989-06-20 1995-02-21 Rohm And Haas Company Method of using selected photoactive compounds in high resolution, acid hardening photoresists with near ultraviolet radiation wherein the photoresist comprise conventional deep UV photoacid generators
US5110711A (en) * 1989-10-10 1992-05-05 International Business Machines Corporation Method for forming a pattern
US5059512A (en) * 1989-10-10 1991-10-22 International Business Machines Corporation Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions
US5667934A (en) * 1990-10-09 1997-09-16 International Business Machines Corporation Thermally stable photoimaging composition
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US5439779A (en) * 1993-02-22 1995-08-08 International Business Machines Corporation Aqueous soldermask
US6020436A (en) * 1993-03-09 2000-02-01 The Chromaline Corporation Photosensitive resin composition
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JP3993691B2 (en) * 1997-09-24 2007-10-17 関西ペイント株式会社 Resist pattern forming method
US20030157414A1 (en) * 1997-11-13 2003-08-21 Pradeep K. Dhal Holographic medium and process for use thereof
EP1106639B1 (en) * 1998-03-20 2007-08-29 Nippon Soda Co., Ltd. Photocurable composition containing iodonium salt compound
US6232361B1 (en) * 1998-12-11 2001-05-15 Sun Chemical Corporation Radiation curable water based cationic inks and coatings
JP3992550B2 (en) * 2002-07-04 2007-10-17 國宏 市村 Active energy ray resin composition, active energy ray resin film, and pattern forming method using the film
JP4773348B2 (en) 2003-07-12 2011-09-14 アクセラー８ テクノロジー コーポレイション Sensitive and rapid biodetection method
US20120077206A1 (en) 2003-07-12 2012-03-29 Accelr8 Technology Corporation Rapid Microbial Detection and Antimicrobial Susceptibility Testing
JP2005162962A (en) * 2003-12-05 2005-06-23 Konica Minolta Medical & Graphic Inc Active ray-hardening type composition, active ray hardening type ink, image-forming method using the ink and inkjet recorder
JP4522751B2 (en) * 2004-06-08 2010-08-11 株式会社ムラカミ Photosensitive film, screen printing plate and etching photosensitive film
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EP4082677A4 (en) * 2020-01-30 2024-01-24 Toray Industries, Inc. Coating agent, sheet-like intermediate base material, photocurable resin film, fiber-reinforced composite material intermediate, fiber-reinforced composite material, method for producing fiber-reinforced composite material intermediate, and method for producing fiber-reinforced composite material
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JP7739717B2 (en) * 2020-03-03 2025-09-17 東レ株式会社 Fiber-reinforced composite material intermediate, and method for producing fiber-reinforced composite material
JP7739718B2 (en) * 2020-04-28 2025-09-17 東レ株式会社 Fiber-reinforced composite material intermediate, and method for producing fiber-reinforced composite material
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Also Published As

Publication number Publication date
AU2623884A (en) 1984-10-04
CA1264889A (en) 1990-01-23
DE3476706D1 (en) 1989-03-16
EP0124292A2 (en) 1984-11-07
EP0124292B1 (en) 1989-02-08
GB2137626A (en) 1984-10-10
GB2137626B (en) 1986-10-15
US4548890A (en) 1985-10-22
DK173784D0 (en) 1984-03-30
EP0124292A3 (en) 1985-09-18
AU574672B2 (en) 1988-07-14
JPS59184220A (en) 1984-10-19
DK173784A (en) 1984-10-01

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Legal Events

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UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee