ATE408899T1 - Kondensatoren für integrierten schaltkreis - Google Patents

Kondensatoren für integrierten schaltkreis

Info

Publication number
ATE408899T1
ATE408899T1 AT03100866T AT03100866T ATE408899T1 AT E408899 T1 ATE408899 T1 AT E408899T1 AT 03100866 T AT03100866 T AT 03100866T AT 03100866 T AT03100866 T AT 03100866T AT E408899 T1 ATE408899 T1 AT E408899T1
Authority
AT
Austria
Prior art keywords
conducting
plates
integrated circuit
conducting plate
circuit capacitors
Prior art date
Application number
AT03100866T
Other languages
English (en)
Inventor
Paul Stribley
Gary Day
Bo Alestig
Original Assignee
X Fab Semiconductor Foundries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by X Fab Semiconductor Foundries filed Critical X Fab Semiconductor Foundries
Application granted granted Critical
Publication of ATE408899T1 publication Critical patent/ATE408899T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers

Landscapes

  • Semiconductor Integrated Circuits (AREA)
  • Amplifiers (AREA)
AT03100866T 2002-04-05 2003-04-02 Kondensatoren für integrierten schaltkreis ATE408899T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB0207857.4A GB0207857D0 (en) 2002-04-05 2002-04-05 Integrated circuit capacitors

Publications (1)

Publication Number Publication Date
ATE408899T1 true ATE408899T1 (de) 2008-10-15

Family

ID=9934287

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03100866T ATE408899T1 (de) 2002-04-05 2003-04-02 Kondensatoren für integrierten schaltkreis

Country Status (5)

Country Link
US (1) US6933551B1 (de)
EP (1) EP1351304B1 (de)
AT (1) ATE408899T1 (de)
DE (1) DE60323555D1 (de)
GB (1) GB0207857D0 (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6888399B2 (en) * 2002-02-08 2005-05-03 Rohm Co., Ltd. Semiconductor device equipped with a voltage step-up circuit
US7259956B2 (en) * 2003-12-19 2007-08-21 Broadcom Corporation Scalable integrated circuit high density capacitors
KR100549002B1 (ko) * 2004-02-04 2006-02-02 삼성전자주식회사 복층 엠아이엠 커패시터를 갖는 반도체소자 및 그것을제조하는 방법
KR100809321B1 (ko) * 2005-02-01 2008-03-05 삼성전자주식회사 다중 ｍｉｍ 캐패시터 및 이의 제조 방법
JP2008532308A (ja) * 2005-03-02 2008-08-14 エヌエックスピー ビー ヴィ 電子デバイス及びその使用方法
US7619298B1 (en) * 2005-03-31 2009-11-17 Xilinx, Inc. Method and apparatus for reducing parasitic capacitance
US8623737B2 (en) * 2006-03-31 2014-01-07 Intel Corporation Sol-gel and mask patterning for thin-film capacitor fabrication, thin-film capacitors fabricated thereby, and systems containing same
KR100764741B1 (ko) * 2006-06-08 2007-10-08 삼성전자주식회사 반도체 장치 및 그 형성 방법
NL1032887C2 (nl) * 2006-11-17 2008-10-07 Thule Towing Systems B V Stekkerdoos voor voertuig.
US8207592B2 (en) * 2008-11-21 2012-06-26 Xilinx, Inc. Integrated capacitor with array of crosses
US7994610B1 (en) 2008-11-21 2011-08-09 Xilinx, Inc. Integrated capacitor with tartan cross section
US7944732B2 (en) * 2008-11-21 2011-05-17 Xilinx, Inc. Integrated capacitor with alternating layered segments
US7956438B2 (en) * 2008-11-21 2011-06-07 Xilinx, Inc. Integrated capacitor with interlinked lateral fins
US7994609B2 (en) * 2008-11-21 2011-08-09 Xilinx, Inc. Shielding for integrated capacitors
US8362589B2 (en) * 2008-11-21 2013-01-29 Xilinx, Inc. Integrated capacitor with cabled plates
FR2940457B1 (fr) * 2008-12-18 2011-02-18 Schneider Electric Ind Sas Dispositif diviseur capacitif, capteur de tension, module de declencheur et appareil de protection electrique pourvus d'un tel dispositif
US8482048B2 (en) * 2009-07-31 2013-07-09 Alpha & Omega Semiconductor, Inc. Metal oxide semiconductor field effect transistor integrating a capacitor
JP5685457B2 (ja) * 2010-04-02 2015-03-18 ルネサスエレクトロニクス株式会社 半導体集積回路装置
US8653844B2 (en) 2011-03-07 2014-02-18 Xilinx, Inc. Calibrating device performance within an integrated circuit
US8941974B2 (en) 2011-09-09 2015-01-27 Xilinx, Inc. Interdigitated capacitor having digits of varying width
JP6161267B2 (ja) * 2012-11-28 2017-07-12 ルネサスエレクトロニクス株式会社 コンデンサ、およびチャージポンプ回路
US9012296B2 (en) * 2012-12-11 2015-04-21 Taiwan Semiconductor Manufacturing Co., Ltd. Self-aligned deep trench capacitor, and method for making the same
US9270247B2 (en) 2013-11-27 2016-02-23 Xilinx, Inc. High quality factor inductive and capacitive circuit structure
US10411086B2 (en) * 2014-04-07 2019-09-10 Semiconductor Components Industries, Llc High voltage capacitor and method
CN103985707A (zh) * 2014-04-24 2014-08-13 无锡市晶源微电子有限公司 一种夹心结构的电容
US9524964B2 (en) 2014-08-14 2016-12-20 Xilinx, Inc. Capacitor structure in an integrated circuit

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4890192A (en) 1987-04-09 1989-12-26 Microelectronics And Computer Technology Corporation Thin film capacitor
US5166858A (en) * 1991-10-30 1992-11-24 Xilinx, Inc. Capacitor formed in three conductive layers
US5583359A (en) 1995-03-03 1996-12-10 Northern Telecom Limited Capacitor structure for an integrated circuit
US5739576A (en) * 1995-10-06 1998-04-14 Micron Technology, Inc. Integrated chip multilayer decoupling capacitors
JP2891242B2 (ja) * 1997-05-23 1999-05-17 日本電気株式会社 半導体装置の製造方法
JP2003332447A (ja) * 2002-05-13 2003-11-21 Mitsubishi Electric Corp 容量素子

Also Published As

Publication number Publication date
DE60323555D1 (de) 2008-10-30
GB0207857D0 (en) 2002-05-15
EP1351304B1 (de) 2008-09-17
US6933551B1 (en) 2005-08-23
EP1351304A2 (de) 2003-10-08
EP1351304A3 (de) 2004-07-28

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