ATE412518T1 - Verfahren und vorrichtung zum drucken einer gemusterten schicht auf einen flachen träger mit einem flach-bett - Google Patents
Verfahren und vorrichtung zum drucken einer gemusterten schicht auf einen flachen träger mit einem flach-bettInfo
- Publication number
- ATE412518T1 ATE412518T1 AT04801484T AT04801484T ATE412518T1 AT E412518 T1 ATE412518 T1 AT E412518T1 AT 04801484 T AT04801484 T AT 04801484T AT 04801484 T AT04801484 T AT 04801484T AT E412518 T1 ATE412518 T1 AT E412518T1
- Authority
- AT
- Austria
- Prior art keywords
- subbeds
- clichés
- printing
- alignment
- patterned layer
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 2
- 239000011521 glass Substances 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41F—PRINTING MACHINES OR PRESSES
- B41F1/00—Platen presses, i.e. presses in which printing is effected by at least one essentially-flat pressure-applying member co-operating with a flat type-bed
- B41F1/26—Details
- B41F1/28—Sheet-conveying, -aligning or -clamping devices
- B41F1/34—Registering devices, e.g. gauges
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41F—PRINTING MACHINES OR PRESSES
- B41F1/00—Platen presses, i.e. presses in which printing is effected by at least one essentially-flat pressure-applying member co-operating with a flat type-bed
- B41F1/16—Platen presses, i.e. presses in which printing is effected by at least one essentially-flat pressure-applying member co-operating with a flat type-bed for offset printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6758—Thin-film transistors [TFT] characterised by the insulating substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/01—Manufacture or treatment
- H10D86/021—Manufacture or treatment of multiple TFTs
- H10D86/0241—Manufacture or treatment of multiple TFTs using liquid deposition, e.g. printing
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Manufacturing & Machinery (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- Printing Methods (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Photoreceptors In Electrophotography (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB0328459.3A GB0328459D0 (en) | 2003-12-09 | 2003-12-09 | Printing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE412518T1 true ATE412518T1 (de) | 2008-11-15 |
Family
ID=30129851
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT04801484T ATE412518T1 (de) | 2003-12-09 | 2004-12-07 | Verfahren und vorrichtung zum drucken einer gemusterten schicht auf einen flachen träger mit einem flach-bett |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US20080276813A1 (de) |
| EP (1) | EP1694506B1 (de) |
| JP (1) | JP2007519946A (de) |
| KR (1) | KR20060123257A (de) |
| CN (1) | CN100553971C (de) |
| AT (1) | ATE412518T1 (de) |
| DE (1) | DE602004017499D1 (de) |
| GB (1) | GB0328459D0 (de) |
| TW (1) | TW200532397A (de) |
| WO (1) | WO2005056294A1 (de) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100805047B1 (ko) * | 2003-09-08 | 2008-02-20 | 엘지.필립스 엘시디 주식회사 | 인쇄 장비 및 이를 이용한 패턴 형성 방법 |
| DE102008029299B4 (de) | 2008-06-19 | 2012-02-16 | Itw Morlock Gmbh | Tampondruckmaschine |
| US8281715B2 (en) * | 2009-02-16 | 2012-10-09 | Vistaprint Technologies Limited | Printer pallet assembly for use in printing multiple articles of manufacture |
| WO2012121534A2 (ko) * | 2011-03-09 | 2012-09-13 | 주식회사 엘지화학 | 2 이상의 패턴화된 기판의 제조방법 및 제조장치 |
| KR102233737B1 (ko) * | 2020-01-17 | 2021-03-30 | 메탈쓰리디 주식회사 | 시편 출력을 통한 금속 3d 프린터 공정 최적화 방법 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL67035C (de) * | 1947-03-18 | |||
| JPH01225553A (ja) * | 1988-03-07 | 1989-09-08 | Denki Kagaku Kogyo Kk | プラスチック成形体浸透印刷装置 |
| US5272980A (en) * | 1990-08-31 | 1993-12-28 | Dai Nippon Printing Co. Ltd. | Alignment method for transfer and alignment device |
| US5352634A (en) * | 1992-03-23 | 1994-10-04 | Brody Thomas P | Process for fabricating an active matrix circuit |
| US5407763A (en) * | 1992-05-28 | 1995-04-18 | Ceridian Corporation | Mask alignment mark system |
| US5367953A (en) * | 1992-07-01 | 1994-11-29 | Nsk Ltd. | Roller offset printing apparatus |
| US5335595A (en) * | 1992-07-01 | 1994-08-09 | Nsk Ltd. | Roller offset printing apparatus |
| EP0726851A4 (de) * | 1993-11-03 | 1997-04-16 | Corning Inc | Farbfilter und druckverfahren |
| CN1062077C (zh) * | 1996-04-29 | 2001-02-14 | 南亚科技股份有限公司 | 液晶显示器取向层及其制作方法 |
| KR100502797B1 (ko) * | 1997-12-01 | 2005-10-19 | 삼성전자주식회사 | 액정 표시 장치 및 그의 제조 방법 |
| JP2001154371A (ja) * | 1999-11-30 | 2001-06-08 | Nikon Corp | 回路デバイスや表示デバイスの製造方法、及び大型ディスプレー装置 |
| KR100611041B1 (ko) * | 2000-02-17 | 2006-08-09 | 엘지.필립스 엘시디 주식회사 | 대면적 액정표시장치를 위한 포토마스크와 어레이기판제작방법 |
| FR2817767B1 (fr) * | 2000-12-07 | 2003-02-28 | Technip Cie | Procede et installation pour la recuperation et la purification de l'ethylene produit par pyrolyse d'hydrocarbures, et gaz obtenus par procede |
| US6983688B1 (en) * | 2003-08-26 | 2006-01-10 | The Gem Group, Inc. | Decoration for bags and cases and method for applying the same |
| KR100805047B1 (ko) * | 2003-09-08 | 2008-02-20 | 엘지.필립스 엘시디 주식회사 | 인쇄 장비 및 이를 이용한 패턴 형성 방법 |
-
2003
- 2003-12-09 GB GBGB0328459.3A patent/GB0328459D0/en not_active Ceased
-
2004
- 2004-12-06 TW TW093137632A patent/TW200532397A/zh unknown
- 2004-12-07 DE DE602004017499T patent/DE602004017499D1/de not_active Expired - Fee Related
- 2004-12-07 EP EP04801484A patent/EP1694506B1/de not_active Expired - Lifetime
- 2004-12-07 CN CNB2004800365683A patent/CN100553971C/zh not_active Expired - Fee Related
- 2004-12-07 WO PCT/IB2004/052691 patent/WO2005056294A1/en not_active Ceased
- 2004-12-07 JP JP2006543690A patent/JP2007519946A/ja not_active Withdrawn
- 2004-12-07 AT AT04801484T patent/ATE412518T1/de not_active IP Right Cessation
- 2004-12-07 KR KR1020067011005A patent/KR20060123257A/ko not_active Withdrawn
- 2004-12-07 US US10/596,183 patent/US20080276813A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| DE602004017499D1 (de) | 2008-12-11 |
| US20080276813A1 (en) | 2008-11-13 |
| WO2005056294A1 (en) | 2005-06-23 |
| JP2007519946A (ja) | 2007-07-19 |
| GB0328459D0 (en) | 2004-01-14 |
| EP1694506B1 (de) | 2008-10-29 |
| CN100553971C (zh) | 2009-10-28 |
| EP1694506A1 (de) | 2006-08-30 |
| CN1890100A (zh) | 2007-01-03 |
| TW200532397A (en) | 2005-10-01 |
| KR20060123257A (ko) | 2006-12-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |