ATE416398T1 - Array von räumlichen lichtmodulatoren und verfahren zur herstellung einer räumlichen lichtmodulationsvorrichtung - Google Patents

Array von räumlichen lichtmodulatoren und verfahren zur herstellung einer räumlichen lichtmodulationsvorrichtung

Info

Publication number
ATE416398T1
ATE416398T1 AT05805199T AT05805199T ATE416398T1 AT E416398 T1 ATE416398 T1 AT E416398T1 AT 05805199 T AT05805199 T AT 05805199T AT 05805199 T AT05805199 T AT 05805199T AT E416398 T1 ATE416398 T1 AT E416398T1
Authority
AT
Austria
Prior art keywords
spatial light
slms
substrate
array
producing
Prior art date
Application number
AT05805199T
Other languages
English (en)
Inventor
Samber Marc De
Jong Michiel De
Antonius Nellissen
Veen Nicolaas Van
Original Assignee
Koninkl Philips Electronics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv filed Critical Koninkl Philips Electronics Nv
Application granted granted Critical
Publication of ATE416398T1 publication Critical patent/ATE416398T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C3/00—Assembling of devices or systems from individually processed components
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49826—Assembling or joining

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Wire Bonding (AREA)
AT05805199T 2004-11-09 2005-11-03 Array von räumlichen lichtmodulatoren und verfahren zur herstellung einer räumlichen lichtmodulationsvorrichtung ATE416398T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP04105607 2004-11-09

Publications (1)

Publication Number Publication Date
ATE416398T1 true ATE416398T1 (de) 2008-12-15

Family

ID=35539572

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05805199T ATE416398T1 (de) 2004-11-09 2005-11-03 Array von räumlichen lichtmodulatoren und verfahren zur herstellung einer räumlichen lichtmodulationsvorrichtung

Country Status (9)

Country Link
US (1) US20090040595A1 (de)
EP (1) EP1815295B1 (de)
JP (1) JP2008521024A (de)
KR (1) KR20070083985A (de)
CN (1) CN100524037C (de)
AT (1) ATE416398T1 (de)
DE (1) DE602005011475D1 (de)
TW (1) TW200630758A (de)
WO (1) WO2006051448A2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8064122B2 (en) * 2007-03-15 2011-11-22 Asml Holding N.V. Apertured window for enabling flexible illumination overfill of patterning devices
MY194947A (en) * 2011-05-13 2022-12-27 Euro Celtique Sa Intranasal pharmaceutical dosage forms comprising naloxone
KR102151254B1 (ko) 2013-08-19 2020-09-03 삼성디스플레이 주식회사 노광장치 및 그 방법
WO2020142656A1 (en) 2019-01-04 2020-07-09 Engent, Inc. Systems and methods for precision placement of components
WO2022093601A1 (en) * 2020-10-29 2022-05-05 Seurat Technologies, Inc. Distributed flux array
EP4237172A4 (de) * 2020-10-29 2024-10-16 Seurat Technologies, Inc. Kühlsystem für lichtventil

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5311360A (en) * 1992-04-28 1994-05-10 The Board Of Trustees Of The Leland Stanford, Junior University Method and apparatus for modulating a light beam
US5406906A (en) * 1994-01-18 1995-04-18 Ford Motor Company Preparation of crystallographically aligned films of silicon carbide by laser deposition of carbon onto silicon
US6466349B1 (en) * 1998-05-14 2002-10-15 Hughes Electronics Corporation Integrated optical transmitter
FR2789801B1 (fr) * 1999-02-12 2001-04-27 Thomson Tubes Electroniques Cathode a effet de champ a performances accrues
US6396711B1 (en) * 2000-06-06 2002-05-28 Agere Systems Guardian Corp. Interconnecting micromechanical devices
US6602427B1 (en) * 2000-08-28 2003-08-05 Xiang Zheng Tu Micromachined optical mechanical modulator based transmitter/receiver module
EP1280007B1 (de) 2001-07-24 2008-06-18 ASML Netherlands B.V. Bilderzeugungsapparat
US6522793B1 (en) * 2001-11-21 2003-02-18 Andrei Szilagyi Low voltage electro-optic modulator with integrated driver
JP4140816B2 (ja) * 2002-05-24 2008-08-27 富士通株式会社 マイクロミラー素子
US6870554B2 (en) * 2003-01-07 2005-03-22 Anvik Corporation Maskless lithography with multiplexed spatial light modulators

Also Published As

Publication number Publication date
DE602005011475D1 (de) 2009-01-15
EP1815295A2 (de) 2007-08-08
EP1815295B1 (de) 2008-12-03
CN101057184A (zh) 2007-10-17
WO2006051448A2 (en) 2006-05-18
CN100524037C (zh) 2009-08-05
TW200630758A (en) 2006-09-01
US20090040595A1 (en) 2009-02-12
JP2008521024A (ja) 2008-06-19
KR20070083985A (ko) 2007-08-24
WO2006051448A3 (en) 2006-12-21

Similar Documents

Publication Publication Date Title
EP1416069A4 (de) Organisches halbleiterelement
EP1795514A4 (de) Keramiksubstrat zum befestigen von lichtemittierender vorrichtung und herstellungsverfahren dafür
TWI257184B (en) Lighting apparatus
DE60119311D1 (de) Verfahren zur erzeugung einer farbelektrooptischen vorrichtung
TW200735990A (en) Method for cutting substrate and substrate cutting apparatus using the same
TW200707122A (en) Exposure method and apparatus
WO2009140947A3 (de) Optoelektronisches modul
MX2007003600A (es) Modulador optico interferometrico que utiliza material y metodo de relleno.
TW200731842A (en) Organic light emitting display device and manufacturing
SG130940A1 (en) Spatial light modulator using an integrated circuit actuator and method of making and using same
TW200628885A (en) Repairing device and repairing method for display device
EP4661640A3 (de) Anzeigesubstrat, herstellungsverfahren dafür und anzeigevorrichtung
ATE416398T1 (de) Array von räumlichen lichtmodulatoren und verfahren zur herstellung einer räumlichen lichtmodulationsvorrichtung
TW200716389A (en) Light emitting device, driving method thereof, and image forming apparatus
TW200702721A (en) Spatial light modulator device, lithographic apparatus, display device, method of producing a light beam having a spatial light pattern and method of manufacturing a device
TW200710469A (en) A light module for producing light with a scattering pattern that is electrically variable and use thereof as multiple purpose light
FI20045295A7 (fi) Embossauslaite ja menetelmä embossauslaitteen säätämiseksi
TW200519503A (en) Crystallization apparatus, crystallization method, device and phase modulation element
TW200605172A (en) Substrate, semiconductor device, method of manufacturing substrate, and method of manufacturing semiconductor device
TW200612153A (en) Functional film for display picture and method for producing the same
TW200609549A (en) Optical waveguide mounting member, substrate, semiconductor device, method of manufacturing optical waveguide mounting member, and method of manufacturing substrate
TW200744140A (en) Apparatus for aligning microchips on substrate and method for the same
DE602006018734D1 (de) Verfahren zur herstellung einer metrologoschen phase-massenfertigung ohne wesentliche materialabnahme
TW200640318A (en) Method of forming film pattern, method of manufacturing device, electro-optical device, and electronic apparatus
Park et al. Advanced Mechanical Transfer of Micro-LEDs Enabled by Structurally Modified Wide Sapphire Nanomembranes through Thermal Reflow of Photoresist

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties