ATE418570T1 - Acrylpolymere und strahlungsempfindliche harzzusammensetzung - Google Patents
Acrylpolymere und strahlungsempfindliche harzzusammensetzungInfo
- Publication number
- ATE418570T1 ATE418570T1 AT04771184T AT04771184T ATE418570T1 AT E418570 T1 ATE418570 T1 AT E418570T1 AT 04771184 T AT04771184 T AT 04771184T AT 04771184 T AT04771184 T AT 04771184T AT E418570 T1 ATE418570 T1 AT E418570T1
- Authority
- AT
- Austria
- Prior art keywords
- linear
- units
- general formula
- hydrogen
- branched alkyl
- Prior art date
Links
- 229920000058 polyacrylate Polymers 0.000 title abstract 2
- 230000005855 radiation Effects 0.000 title 1
- 239000011342 resin composition Substances 0.000 title 1
- 125000000217 alkyl group Chemical group 0.000 abstract 4
- 229910052739 hydrogen Inorganic materials 0.000 abstract 3
- 239000001257 hydrogen Substances 0.000 abstract 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 abstract 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 125000002723 alicyclic group Chemical group 0.000 abstract 1
- 125000001931 aliphatic group Chemical group 0.000 abstract 1
- 125000003545 alkoxy group Chemical group 0.000 abstract 1
- 125000004432 carbon atom Chemical group C* 0.000 abstract 1
- 230000001419 dependent effect Effects 0.000 abstract 1
- 125000003709 fluoroalkyl group Chemical group 0.000 abstract 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract 1
- 125000003367 polycyclic group Chemical group 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/108—Polyolefin or halogen containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polymerisation Methods In General (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003286389 | 2003-08-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE418570T1 true ATE418570T1 (de) | 2009-01-15 |
Family
ID=34113954
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT04771184T ATE418570T1 (de) | 2003-08-05 | 2004-08-04 | Acrylpolymere und strahlungsempfindliche harzzusammensetzung |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US7704669B2 (de) |
| EP (1) | EP1652866B1 (de) |
| JP (1) | JP4765625B2 (de) |
| KR (1) | KR101109798B1 (de) |
| CN (1) | CN100374475C (de) |
| AT (1) | ATE418570T1 (de) |
| DE (1) | DE602004018648D1 (de) |
| TW (1) | TW200506527A (de) |
| WO (1) | WO2005012374A1 (de) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI477909B (zh) | 2006-01-24 | 2015-03-21 | Fujifilm Corp | 正型感光性組成物及使用它之圖案形成方法 |
| CN102109760B (zh) * | 2006-03-31 | 2015-04-15 | Jsr株式会社 | 抗蚀剂图案形成方法 |
| CN101959909B (zh) * | 2008-02-25 | 2013-03-13 | 大赛璐化学工业株式会社 | 包含吸电子取代基和内酯骨架的单体、高分子化合物及光致抗蚀剂组合物 |
| JP5427447B2 (ja) * | 2008-03-28 | 2014-02-26 | 富士フイルム株式会社 | ポジ型感光性組成物及びそれを用いたパターン形成方法 |
| JP5287065B2 (ja) * | 2008-09-12 | 2013-09-11 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物 |
| KR101706409B1 (ko) * | 2009-09-30 | 2017-02-13 | 제이에스알 가부시끼가이샤 | 중합체, 감방사선성 조성물 및 단량체, 및 그의 제조 방법 |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4910122A (en) | 1982-09-30 | 1990-03-20 | Brewer Science, Inc. | Anti-reflective coating |
| JPH0612452B2 (ja) | 1982-09-30 | 1994-02-16 | ブリュ−ワ−・サイエンス・インコ−ポレイテッド | 集積回路素子の製造方法 |
| DE69214035T2 (de) | 1991-06-28 | 1997-04-10 | Ibm | Reflexionsverminderde Überzüge |
| JPH0612452A (ja) | 1992-06-25 | 1994-01-21 | Hitachi Ltd | グループ情報アクセス方式 |
| KR100354871B1 (ko) * | 1997-12-31 | 2003-03-10 | 주식회사 하이닉스반도체 | 공중합체수지와그제조방법및이수지를이용한포토레지스트 |
| JP3821211B2 (ja) * | 2000-03-21 | 2006-09-13 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
| US6541179B2 (en) * | 2000-03-21 | 2003-04-01 | Shin-Etsu Chemical Co., Ltd. | Resist compositions and patterning process |
| JP4768152B2 (ja) | 2000-09-01 | 2011-09-07 | ダイセル化学工業株式会社 | フォトレジスト用高分子化合物及びフォトレジスト用樹脂組成物 |
| JP2002201232A (ja) | 2000-10-27 | 2002-07-19 | Daicel Chem Ind Ltd | フォトレジスト用高分子化合物及びフォトレジスト用樹脂組成物 |
| JP2002145934A (ja) | 2000-11-08 | 2002-05-22 | Daicel Chem Ind Ltd | フォトレジスト用樹脂とその製造方法、及びフォトレジスト組成物 |
| US6838225B2 (en) * | 2001-01-18 | 2005-01-04 | Jsr Corporation | Radiation-sensitive resin composition |
| KR100907268B1 (ko) * | 2001-04-05 | 2009-07-13 | 후지필름 가부시키가이샤 | 포지티브 레지스트 조성물 및 이를 사용한 패턴 형성 방법 |
| JP4149148B2 (ja) | 2001-08-03 | 2008-09-10 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| JP4727092B2 (ja) * | 2001-09-10 | 2011-07-20 | 東京応化工業株式会社 | 化学増幅型レジスト組成物 |
| JP4420169B2 (ja) * | 2001-09-12 | 2010-02-24 | 信越化学工業株式会社 | 高分子化合物、レジスト材料、及びパターン形成方法 |
| JP3895224B2 (ja) * | 2001-12-03 | 2007-03-22 | 東京応化工業株式会社 | ポジ型レジスト組成物及びそれを用いたレジストパターン形成方法 |
| JP3855770B2 (ja) | 2001-12-28 | 2006-12-13 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物 |
| JP3963724B2 (ja) | 2002-01-10 | 2007-08-22 | ダイセル化学工業株式会社 | フォトレジスト用高分子化合物の製造方法、及びフォトレジスト用樹脂組成物 |
| JP4345326B2 (ja) * | 2002-03-15 | 2009-10-14 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物 |
| JP3900135B2 (ja) * | 2002-10-29 | 2007-04-04 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物 |
| JP4134685B2 (ja) * | 2002-11-05 | 2008-08-20 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物 |
| JP2004220009A (ja) * | 2002-12-28 | 2004-08-05 | Jsr Corp | 感放射線性樹脂組成物 |
| JP4110398B2 (ja) * | 2003-03-07 | 2008-07-02 | 信越化学工業株式会社 | α位メチル基に酸素置換基を有する脂環含有メタクリレート化合物 |
| US7279265B2 (en) * | 2003-03-27 | 2007-10-09 | Fujifilm Corporation | Positive resist composition and pattern formation method using the same |
| JP2005023234A (ja) * | 2003-07-04 | 2005-01-27 | Jsr Corp | アクリル系重合体および感放射線性樹脂組成物 |
-
2004
- 2004-08-04 US US10/567,117 patent/US7704669B2/en not_active Expired - Lifetime
- 2004-08-04 AT AT04771184T patent/ATE418570T1/de not_active IP Right Cessation
- 2004-08-04 EP EP04771184A patent/EP1652866B1/de not_active Expired - Lifetime
- 2004-08-04 WO PCT/JP2004/011143 patent/WO2005012374A1/ja not_active Ceased
- 2004-08-04 DE DE602004018648T patent/DE602004018648D1/de not_active Expired - Lifetime
- 2004-08-04 JP JP2005512561A patent/JP4765625B2/ja not_active Expired - Lifetime
- 2004-08-04 CN CNB2004800246896A patent/CN100374475C/zh not_active Expired - Lifetime
- 2004-08-04 KR KR1020067002354A patent/KR101109798B1/ko not_active Expired - Lifetime
- 2004-08-05 TW TW093123523A patent/TW200506527A/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| EP1652866A4 (de) | 2007-04-11 |
| EP1652866A1 (de) | 2006-05-03 |
| KR20060059998A (ko) | 2006-06-02 |
| JPWO2005012374A1 (ja) | 2007-09-27 |
| EP1652866B1 (de) | 2008-12-24 |
| US7704669B2 (en) | 2010-04-27 |
| CN100374475C (zh) | 2008-03-12 |
| TW200506527A (en) | 2005-02-16 |
| DE602004018648D1 (de) | 2009-02-05 |
| JP4765625B2 (ja) | 2011-09-07 |
| TWI351579B (de) | 2011-11-01 |
| WO2005012374A1 (ja) | 2005-02-10 |
| CN1842551A (zh) | 2006-10-04 |
| KR101109798B1 (ko) | 2012-03-13 |
| US20070269754A1 (en) | 2007-11-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |