ATE420220T1 - In rechtem winkel angeordneter einzelendblock - Google Patents

In rechtem winkel angeordneter einzelendblock

Info

Publication number
ATE420220T1
ATE420220T1 AT06708475T AT06708475T ATE420220T1 AT E420220 T1 ATE420220 T1 AT E420220T1 AT 06708475 T AT06708475 T AT 06708475T AT 06708475 T AT06708475 T AT 06708475T AT E420220 T1 ATE420220 T1 AT E420220T1
Authority
AT
Austria
Prior art keywords
target
block
right angle
end block
single end
Prior art date
Application number
AT06708475T
Other languages
English (en)
Inventor
Krist Dellaert
Bosscher Wilmert De
Boever Joannes De
Gregory Lapeire
Original Assignee
Bekaert Advanced Coatings
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bekaert Advanced Coatings filed Critical Bekaert Advanced Coatings
Application granted granted Critical
Publication of ATE420220T1 publication Critical patent/ATE420220T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
    • H01J37/3497—Temperature of target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Joining Of Building Structures In Genera (AREA)
  • Ladders (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
  • Forklifts And Lifting Vehicles (AREA)
  • Cartons (AREA)
  • Fittings On The Vehicle Exterior For Carrying Loads, And Devices For Holding Or Mounting Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Coating By Spraying Or Casting (AREA)
AT06708475T 2005-03-11 2006-02-23 In rechtem winkel angeordneter einzelendblock ATE420220T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP05101906 2005-03-11

Publications (1)

Publication Number Publication Date
ATE420220T1 true ATE420220T1 (de) 2009-01-15

Family

ID=34938950

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06708475T ATE420220T1 (de) 2005-03-11 2006-02-23 In rechtem winkel angeordneter einzelendblock

Country Status (13)

Country Link
US (1) US20080202925A1 (de)
EP (1) EP1856303B1 (de)
JP (1) JP5004942B2 (de)
KR (1) KR20070108907A (de)
CN (1) CN101137764B (de)
AT (1) ATE420220T1 (de)
DE (1) DE602006004712D1 (de)
DK (1) DK1856303T3 (de)
ES (1) ES2319569T3 (de)
PL (1) PL1856303T3 (de)
PT (1) PT1856303E (de)
SI (1) SI1856303T1 (de)
WO (1) WO2006094905A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE423225T1 (de) * 2004-10-18 2009-03-15 Bekaert Advanced Coatings Flacher endblock als träger eines drehbaren sputter-targets
US8182662B2 (en) * 2009-03-27 2012-05-22 Sputtering Components, Inc. Rotary cathode for magnetron sputtering apparatus
EP2372744B1 (de) * 2010-04-01 2016-01-13 Applied Materials, Inc. Vorrichtung zum Stützen eines drehbaren Targets und Sputter-Installation
EP2371992B1 (de) * 2010-04-01 2013-06-05 Applied Materials, Inc. Endblock und Zerstäubungsvorrichtung
EP2709138B1 (de) * 2010-05-11 2016-11-30 Applied Materials, Inc. Kammer zur physikalischen Dampfabscheidung
WO2013003458A1 (en) 2011-06-27 2013-01-03 Soleras Ltd. Sputtering target
GB201200574D0 (en) 2012-01-13 2012-02-29 Gencoa Ltd In-vacuum rotational device
BE1024754B9 (nl) * 2016-11-29 2018-07-24 Soleras Advanced Coatings Bvba Een universeel monteerbaar eindblok
CN108893719B (zh) * 2018-09-14 2024-05-07 苏州浩联光电科技有限公司 一种靶材悬挂机构及离子溅射镀膜设备
CN115466930B (zh) * 2022-09-13 2023-05-23 安徽其芒光电科技有限公司 镀膜设备及其靶材承载装置

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3878085A (en) * 1973-07-05 1975-04-15 Sloan Technology Corp Cathode sputtering apparatus
US4356073A (en) * 1981-02-12 1982-10-26 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
US4422916A (en) * 1981-02-12 1983-12-27 Shatterproof Glass Corporation Magnetron cathode sputtering apparatus
US4445997A (en) * 1983-08-17 1984-05-01 Shatterproof Glass Corporation Rotatable sputtering apparatus
US4443318A (en) * 1983-08-17 1984-04-17 Shatterproof Glass Corporation Cathodic sputtering apparatus
US4519885A (en) * 1983-12-27 1985-05-28 Shatterproof Glass Corp. Method and apparatus for changing sputtering targets in a magnetron sputtering system
US4575102A (en) * 1984-11-20 1986-03-11 Ferrofluidics Corporation Coaxial, multiple-shaft ferrofluid seal apparatus
US4995958A (en) * 1989-05-22 1991-02-26 Varian Associates, Inc. Sputtering apparatus with a rotating magnet array having a geometry for specified target erosion profile
US5096562A (en) * 1989-11-08 1992-03-17 The Boc Group, Inc. Rotating cylindrical magnetron structure for large area coating
US5200049A (en) * 1990-08-10 1993-04-06 Viratec Thin Films, Inc. Cantilever mount for rotating cylindrical magnetrons
EP0543931A4 (en) * 1990-08-10 1993-09-08 Viratec Thin Films, Inc. Shielding for arc suppression in rotating magnetron sputtering systems
DE4336994C1 (de) * 1993-10-29 1995-03-30 Heinrich Fabschitz Fadenliefervorrichtung mit stufenlos einstellbarer Fadenabzugspannung
US5620577A (en) * 1993-12-30 1997-04-15 Viratec Thin Films, Inc. Spring-loaded mount for a rotatable sputtering cathode
US5445721A (en) * 1994-08-25 1995-08-29 The Boc Group, Inc. Rotatable magnetron including a replacement target structure
US5591314A (en) * 1995-10-27 1997-01-07 Morgan; Steven V. Apparatus for affixing a rotating cylindrical magnetron target to a spindle
EP0918351A1 (de) * 1997-11-19 1999-05-26 Sinvaco N.V. Flaches magnetron mit bewegbarer Magnetsanlage
US6488824B1 (en) * 1998-11-06 2002-12-03 Raycom Technologies, Inc. Sputtering apparatus and process for high rate coatings
JP2002529600A (ja) * 1998-11-06 2002-09-10 シヴァク 高レート・コーティング用のスパッタリング装置および方法
US6263542B1 (en) * 1999-06-22 2001-07-24 Lam Research Corporation Tolerance resistant and vacuum compliant door hinge with open-assist feature
US6375815B1 (en) * 2001-02-17 2002-04-23 David Mark Lynn Cylindrical magnetron target and apparatus for affixing the target to a rotatable spindle assembly
US6736948B2 (en) * 2002-01-18 2004-05-18 Von Ardenne Anlagentechnik Gmbh Cylindrical AC/DC magnetron with compliant drive system and improved electrical and thermal isolation
US20030173217A1 (en) * 2002-03-14 2003-09-18 Sputtering Components, Inc. High-power ion sputtering magnetron
DE10213049A1 (de) * 2002-03-22 2003-10-02 Dieter Wurczinger Drehbare Rohrkatode
KR20060111896A (ko) * 2003-07-04 2006-10-30 베카에르트 어드벤스드 코팅스 회전 관형 스퍼터 타겟 조립체
ATE423225T1 (de) * 2004-10-18 2009-03-15 Bekaert Advanced Coatings Flacher endblock als träger eines drehbaren sputter-targets

Also Published As

Publication number Publication date
US20080202925A1 (en) 2008-08-28
WO2006094905A1 (en) 2006-09-14
KR20070108907A (ko) 2007-11-13
JP5004942B2 (ja) 2012-08-22
ES2319569T3 (es) 2009-05-08
DK1856303T3 (da) 2009-03-30
EP1856303A1 (de) 2007-11-21
CN101137764A (zh) 2008-03-05
DE602006004712D1 (de) 2009-02-26
PL1856303T3 (pl) 2009-06-30
PT1856303E (pt) 2009-02-27
JP2008533297A (ja) 2008-08-21
EP1856303B1 (de) 2009-01-07
CN101137764B (zh) 2010-12-01
SI1856303T1 (sl) 2009-06-30

Similar Documents

Publication Publication Date Title
DE602006004712D1 (de) In rechtem winkel angeordneter einzelendblock
HU0700246D0 (en) Method for convertion of organic wastes using contiliuous operated closed system
EP1821201A3 (de) Grafikverarbeitungseinheit für kryptografische Verarbeitung
PT1826321E (pt) Dispositivo de fecho
WO2007062329A3 (en) Rotatable flange adapter
MY158429A (en) Laundry processing apparatus
WO2007099507A3 (en) Operating a network monitoring entity
WO2008008923A3 (en) Compositions and methods for targeting cancer-specific transcription complexes
ATE426690T1 (de) Rotierende rohrfírmige sputtertargetanorndung
GB2462785A (en) Partition system
GB2466164A (en) A device for a power tong
MX2009005752A (es) Aparato de excavación submarina.
MA38124A1 (fr) Dispositif d'entrainement
WO2007149237A3 (en) Handheld gaming machine sanitizing system
DK2004914T3 (da) Centrifugaludkaster
TW200605290A (en) Substrate processing device
UA113178C2 (xx) Блок затвора й клапана для завантажувального пристрою шахтної печі
DK1633947T3 (da) Drejedörsdrev til en dör med mindst én dörflöj
FI20030495A0 (fi) Järjestely kääntovilaitteistossa oven aseman tunnistamiseksi
WO2007114954A3 (en) Methods, compositions, and kits for the detection and monitoring of kidney cancer
EA200700641A1 (ru) Узел приводного механизма
EP1591029A3 (de) Schliesszylinder für einen Strangheftapparat
BR112014005264A2 (pt) compressor de palheta rotativo
WO2006116142A3 (en) Image rotator
CN104567223B (zh) 一种适用于冰箱的辅助关门装置

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties