ATE423330T1 - Verfahren zum herstellen eines optischen bauteils mit einer wasserabstossenden dünnschicht - Google Patents

Verfahren zum herstellen eines optischen bauteils mit einer wasserabstossenden dünnschicht

Info

Publication number
ATE423330T1
ATE423330T1 AT02009645T AT02009645T ATE423330T1 AT E423330 T1 ATE423330 T1 AT E423330T1 AT 02009645 T AT02009645 T AT 02009645T AT 02009645 T AT02009645 T AT 02009645T AT E423330 T1 ATE423330 T1 AT E423330T1
Authority
AT
Austria
Prior art keywords
temperature
water
thin film
stage
vapor deposition
Prior art date
Application number
AT02009645T
Other languages
English (en)
Inventor
Shigetoshi Kono
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Application granted granted Critical
Publication of ATE423330T1 publication Critical patent/ATE423330T1/de

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/60Deposition of organic layers from vapour phase
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/243Crucibles for source material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/541Heating or cooling of the substrates
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Surface Treatment Of Optical Elements (AREA)
AT02009645T 2001-04-27 2002-04-27 Verfahren zum herstellen eines optischen bauteils mit einer wasserabstossenden dünnschicht ATE423330T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001133577 2001-04-27

Publications (1)

Publication Number Publication Date
ATE423330T1 true ATE423330T1 (de) 2009-03-15

Family

ID=18981410

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02009645T ATE423330T1 (de) 2001-04-27 2002-04-27 Verfahren zum herstellen eines optischen bauteils mit einer wasserabstossenden dünnschicht

Country Status (4)

Country Link
US (1) US6929822B2 (de)
EP (1) EP1255129B1 (de)
AT (1) ATE423330T1 (de)
DE (1) DE60231165D1 (de)

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AU2005200563B2 (en) * 2002-03-18 2007-07-26 Hoya Corporation Optical member, process of producing optical member, and process of producing thin film
KR100543222B1 (ko) * 2002-08-02 2006-01-20 호야 가부시키가이샤 광학부재 및 그의 제조방법
US6991826B2 (en) * 2004-04-20 2006-01-31 3M Innovative Properties Company Antisoiling coatings for antireflective substrates
DE102004044441B3 (de) * 2004-09-14 2006-06-01 Rodenstock Gmbh Verbesserung des Einschleif- und Anstempelverhaltens von Brillengläsern mit hydrophober Beschichtung
US7178919B2 (en) * 2005-01-18 2007-02-20 Tokai Kogaku Co., Ltd. Plastic lens for spectacles
US20080002146A1 (en) * 2006-06-28 2008-01-03 Stachowski Mark J Biocompatible, surface modified materials
US8919966B2 (en) * 2009-01-29 2014-12-30 Speranza, Inc. Rotatable mounting system for a projection system
US9957609B2 (en) 2011-11-30 2018-05-01 Corning Incorporated Process for making of glass articles with optical and easy-to-clean coatings
US10077207B2 (en) 2011-11-30 2018-09-18 Corning Incorporated Optical coating method, apparatus and product
TWI661065B (zh) * 2011-11-30 2019-06-01 美商康寧公司 磁性基板載體與磁性載體
JP2015506893A (ja) * 2011-11-30 2015-03-05 コーニング インコーポレイテッド 光学コーティングとクリーニング容易なコーティングを有するガラス物品を製造する方法
EP3737587A4 (de) * 2018-01-08 2022-02-23 3M Innovative Properties Company Schutzfilm und verfahren zu seiner verwendung
CN112020570B (zh) * 2018-04-20 2023-11-28 柯尼卡美能达株式会社 透明部件和透明部件的制造方法

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JPS53306B2 (de) * 1973-10-16 1978-01-07
JPS60221470A (ja) 1984-04-17 1985-11-06 Shin Etsu Chem Co Ltd 硬化皮膜形成剤
US4678688A (en) * 1983-12-28 1987-07-07 Shin-Etsu Chemical Co., Ltd. Method for forming a surface film of cured organosilicon polymer on a substrate surface
CA1293655C (en) * 1985-04-30 1991-12-31 Takashi Taniguchi Anti-reflection optical article and process for preparation thereof
JP2561395B2 (ja) 1991-02-27 1996-12-04 ホーヤ株式会社 撥水性薄膜を有する光学部材及びその製造方法
JPH04355404A (ja) 1991-05-31 1992-12-09 Hoya Corp 撥水性薄膜を有する光学部材及びその製造方法
EP0844265B1 (de) * 1995-08-11 2002-11-20 Daikin Industries, Limited Silizium enthaltende organische fluorpolymere und ihre verwendung
JP2860979B2 (ja) 1996-01-24 1999-02-24 ダイキン工業株式会社 表面処理方法
JP3758247B2 (ja) 1995-08-11 2006-03-22 ダイキン工業株式会社 防汚性基材
DE19539789A1 (de) * 1995-10-26 1997-04-30 Merck Patent Gmbh Mittel und Verfahren zur Herstellung von wasserabweisenden Beschichtungen auf optischen Substraten
JP3449070B2 (ja) 1995-10-19 2003-09-22 住友化学工業株式会社 汚れ防止処理方法
US5709753A (en) * 1995-10-27 1998-01-20 Specialty Coating Sysetms, Inc. Parylene deposition apparatus including a heated and cooled dimer crucible
JP4282099B2 (ja) 1996-01-24 2009-06-17 ダイキン工業株式会社 表面処理組成物
US6119626A (en) 1996-11-14 2000-09-19 Canon Kabushiki Kaisha Vacuum apparatus for forming a thin-film and method for forming thin-film
JPH10319208A (ja) * 1997-05-16 1998-12-04 Hoya Corp 複合式連続薄膜形成装置
DE69838634T2 (de) * 1997-05-16 2008-08-28 Hoya K.K. Mechanismus um gleichzeitig zwei seiten wasserabweisend zu machen
US6136725A (en) * 1998-04-14 2000-10-24 Cvd Systems, Inc. Method for chemical vapor deposition of a material on a substrate
US6264751B1 (en) * 1998-05-18 2001-07-24 Hoya Corporation Mechanism for performing water repellency processing on both sides simultaneously
DE19825100A1 (de) * 1998-06-05 1999-12-16 Merck Patent Gmbh Mittel zur Herstellung von wasserabweisenden Beschichtungen auf optischen Substraten
JP2000080465A (ja) 1998-09-03 2000-03-21 Toppan Printing Co Ltd 防汚蒸着材料及びこれを用いた反射防止部材
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Also Published As

Publication number Publication date
EP1255129B1 (de) 2009-02-18
EP1255129A3 (de) 2004-04-14
DE60231165D1 (de) 2009-04-02
EP1255129A2 (de) 2002-11-06
US6929822B2 (en) 2005-08-16
US20030003227A1 (en) 2003-01-02

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