ATE423330T1 - Verfahren zum herstellen eines optischen bauteils mit einer wasserabstossenden dünnschicht - Google Patents
Verfahren zum herstellen eines optischen bauteils mit einer wasserabstossenden dünnschichtInfo
- Publication number
- ATE423330T1 ATE423330T1 AT02009645T AT02009645T ATE423330T1 AT E423330 T1 ATE423330 T1 AT E423330T1 AT 02009645 T AT02009645 T AT 02009645T AT 02009645 T AT02009645 T AT 02009645T AT E423330 T1 ATE423330 T1 AT E423330T1
- Authority
- AT
- Austria
- Prior art keywords
- temperature
- water
- thin film
- stage
- vapor deposition
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title abstract 4
- 239000005871 repellent Substances 0.000 title abstract 3
- 239000010409 thin film Substances 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000007740 vapor deposition Methods 0.000 abstract 4
- 230000003667 anti-reflective effect Effects 0.000 abstract 3
- 239000010408 film Substances 0.000 abstract 3
- 238000000151 deposition Methods 0.000 abstract 2
- 238000001704 evaporation Methods 0.000 abstract 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 230000008020 evaporation Effects 0.000 abstract 1
- 229910052731 fluorine Inorganic materials 0.000 abstract 1
- 239000011737 fluorine Substances 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 150000003377 silicon compounds Chemical class 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/60—Deposition of organic layers from vapour phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Physical Vapour Deposition (AREA)
- Surface Treatment Of Glass (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Surface Treatment Of Optical Elements (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001133577 | 2001-04-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE423330T1 true ATE423330T1 (de) | 2009-03-15 |
Family
ID=18981410
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT02009645T ATE423330T1 (de) | 2001-04-27 | 2002-04-27 | Verfahren zum herstellen eines optischen bauteils mit einer wasserabstossenden dünnschicht |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6929822B2 (de) |
| EP (1) | EP1255129B1 (de) |
| AT (1) | ATE423330T1 (de) |
| DE (1) | DE60231165D1 (de) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU2005200563B2 (en) * | 2002-03-18 | 2007-07-26 | Hoya Corporation | Optical member, process of producing optical member, and process of producing thin film |
| KR100543222B1 (ko) * | 2002-08-02 | 2006-01-20 | 호야 가부시키가이샤 | 광학부재 및 그의 제조방법 |
| US6991826B2 (en) * | 2004-04-20 | 2006-01-31 | 3M Innovative Properties Company | Antisoiling coatings for antireflective substrates |
| DE102004044441B3 (de) * | 2004-09-14 | 2006-06-01 | Rodenstock Gmbh | Verbesserung des Einschleif- und Anstempelverhaltens von Brillengläsern mit hydrophober Beschichtung |
| US7178919B2 (en) * | 2005-01-18 | 2007-02-20 | Tokai Kogaku Co., Ltd. | Plastic lens for spectacles |
| US20080002146A1 (en) * | 2006-06-28 | 2008-01-03 | Stachowski Mark J | Biocompatible, surface modified materials |
| US8919966B2 (en) * | 2009-01-29 | 2014-12-30 | Speranza, Inc. | Rotatable mounting system for a projection system |
| US9957609B2 (en) | 2011-11-30 | 2018-05-01 | Corning Incorporated | Process for making of glass articles with optical and easy-to-clean coatings |
| US10077207B2 (en) | 2011-11-30 | 2018-09-18 | Corning Incorporated | Optical coating method, apparatus and product |
| TWI661065B (zh) * | 2011-11-30 | 2019-06-01 | 美商康寧公司 | 磁性基板載體與磁性載體 |
| JP2015506893A (ja) * | 2011-11-30 | 2015-03-05 | コーニング インコーポレイテッド | 光学コーティングとクリーニング容易なコーティングを有するガラス物品を製造する方法 |
| EP3737587A4 (de) * | 2018-01-08 | 2022-02-23 | 3M Innovative Properties Company | Schutzfilm und verfahren zu seiner verwendung |
| CN112020570B (zh) * | 2018-04-20 | 2023-11-28 | 柯尼卡美能达株式会社 | 透明部件和透明部件的制造方法 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53306B2 (de) * | 1973-10-16 | 1978-01-07 | ||
| JPS60221470A (ja) | 1984-04-17 | 1985-11-06 | Shin Etsu Chem Co Ltd | 硬化皮膜形成剤 |
| US4678688A (en) * | 1983-12-28 | 1987-07-07 | Shin-Etsu Chemical Co., Ltd. | Method for forming a surface film of cured organosilicon polymer on a substrate surface |
| CA1293655C (en) * | 1985-04-30 | 1991-12-31 | Takashi Taniguchi | Anti-reflection optical article and process for preparation thereof |
| JP2561395B2 (ja) | 1991-02-27 | 1996-12-04 | ホーヤ株式会社 | 撥水性薄膜を有する光学部材及びその製造方法 |
| JPH04355404A (ja) | 1991-05-31 | 1992-12-09 | Hoya Corp | 撥水性薄膜を有する光学部材及びその製造方法 |
| EP0844265B1 (de) * | 1995-08-11 | 2002-11-20 | Daikin Industries, Limited | Silizium enthaltende organische fluorpolymere und ihre verwendung |
| JP2860979B2 (ja) | 1996-01-24 | 1999-02-24 | ダイキン工業株式会社 | 表面処理方法 |
| JP3758247B2 (ja) | 1995-08-11 | 2006-03-22 | ダイキン工業株式会社 | 防汚性基材 |
| DE19539789A1 (de) * | 1995-10-26 | 1997-04-30 | Merck Patent Gmbh | Mittel und Verfahren zur Herstellung von wasserabweisenden Beschichtungen auf optischen Substraten |
| JP3449070B2 (ja) | 1995-10-19 | 2003-09-22 | 住友化学工業株式会社 | 汚れ防止処理方法 |
| US5709753A (en) * | 1995-10-27 | 1998-01-20 | Specialty Coating Sysetms, Inc. | Parylene deposition apparatus including a heated and cooled dimer crucible |
| JP4282099B2 (ja) | 1996-01-24 | 2009-06-17 | ダイキン工業株式会社 | 表面処理組成物 |
| US6119626A (en) | 1996-11-14 | 2000-09-19 | Canon Kabushiki Kaisha | Vacuum apparatus for forming a thin-film and method for forming thin-film |
| JPH10319208A (ja) * | 1997-05-16 | 1998-12-04 | Hoya Corp | 複合式連続薄膜形成装置 |
| DE69838634T2 (de) * | 1997-05-16 | 2008-08-28 | Hoya K.K. | Mechanismus um gleichzeitig zwei seiten wasserabweisend zu machen |
| US6136725A (en) * | 1998-04-14 | 2000-10-24 | Cvd Systems, Inc. | Method for chemical vapor deposition of a material on a substrate |
| US6264751B1 (en) * | 1998-05-18 | 2001-07-24 | Hoya Corporation | Mechanism for performing water repellency processing on both sides simultaneously |
| DE19825100A1 (de) * | 1998-06-05 | 1999-12-16 | Merck Patent Gmbh | Mittel zur Herstellung von wasserabweisenden Beschichtungen auf optischen Substraten |
| JP2000080465A (ja) | 1998-09-03 | 2000-03-21 | Toppan Printing Co Ltd | 防汚蒸着材料及びこれを用いた反射防止部材 |
| US6542302B2 (en) * | 1999-12-01 | 2003-04-01 | Bushnell Corporation | Lens coating to reduce external fogging of scope lenses |
| US6833159B1 (en) * | 2000-05-02 | 2004-12-21 | Vision-Ease Lens, Inc. | Method for applying hydrophobic anti-reflection coatings to lenses and lens blanks |
-
2002
- 2002-04-26 US US10/132,519 patent/US6929822B2/en not_active Expired - Lifetime
- 2002-04-27 EP EP02009645A patent/EP1255129B1/de not_active Expired - Lifetime
- 2002-04-27 DE DE60231165T patent/DE60231165D1/de not_active Expired - Lifetime
- 2002-04-27 AT AT02009645T patent/ATE423330T1/de not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| EP1255129B1 (de) | 2009-02-18 |
| EP1255129A3 (de) | 2004-04-14 |
| DE60231165D1 (de) | 2009-04-02 |
| EP1255129A2 (de) | 2002-11-06 |
| US6929822B2 (en) | 2005-08-16 |
| US20030003227A1 (en) | 2003-01-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ATE423330T1 (de) | Verfahren zum herstellen eines optischen bauteils mit einer wasserabstossenden dünnschicht | |
| ATE524574T1 (de) | Verfahren zur herstellung vom dünnen metalloxidfilm | |
| KR101688260B1 (ko) | 패턴 형성 방법 | |
| EP0514547A4 (de) | Halbleiterbauteil, dasselbe verwendender halbleiterspeicher, integrierte cmos-halbleiterschaltung und verfahren zur herstellung des halbleiterbauteils. | |
| WO2004095086A3 (en) | Conformal coatings for micro-optical elements | |
| JP5412037B2 (ja) | シロキサン樹脂、シロキサン樹脂の調製方法および抗反射コーティング組成物 | |
| DE69941675D1 (de) | Verfahren zur Herstellung einer photovoltaischen Dünnschichtvorrichtung | |
| EP1296363A4 (de) | Verfahren zur herstellung eines halbleiterbauelements mit nitridzusammensetzung der gruppe iii | |
| DE60220230D1 (de) | Herstellungsverfahren eines halbleiterbauelements | |
| EP1416069A4 (de) | Organisches halbleiterelement | |
| ATE162231T1 (de) | Verfahren zur herstellung einer gradientenschicht | |
| EP1324078A3 (de) | Hybridfilm, Hybridfilm-enthaltender Antireflexionsfilm, optische Gegenstände und Verfahren zur Herstellung der Beschlagverminderten Eigenschaften von Hybridfilmen | |
| DE60132914D1 (de) | Niedrigtemperaturverfahren zur herstellung einer antireflexionsbeschichtung | |
| US9063424B2 (en) | Isocyanurate compound for forming organic anti-reflective layer and composition including same | |
| KR20160055145A (ko) | 다층 레지스트 프로세스용 무기 막 형성 조성물 및 패턴 형성 방법 | |
| DE60140673D1 (de) | Dampfphasenabscheidung | |
| ATE201460T1 (de) | Verfahren zur herstellung von aluminiumoxidfilmen unter verwendung von dialkylaluminiumalkoxid | |
| TW200732383A (en) | Silicon-containing antireflective coating forming composition, silicon-containing antireflective coating, substrate processing intermediate, and substrate processing method | |
| ATE368297T1 (de) | Verfahren zur säuberung einer vorrichtung zum herstellen von dünnfilm-silizium | |
| DE60233126D1 (de) | Photochromische kunststofflinsen für gläser und prozess für ihre herstellung | |
| DE50212709D1 (de) | Verfahren und vorrichtung zur herstellung eines optisch wirksamen schichtsystems | |
| EP1507293A4 (de) | Verfahren zur quanten-dot-bildung, quantenhalbleiterbauelement und verfahren zu seiner herstellung | |
| EP1316849A3 (de) | Methode zum Entfernen von Farbzentren aus film-beschichteten optischen Elementen aus Fluorid | |
| ATE215737T1 (de) | Verfahren zur herstellung von photovoltaischen modulen aus kristallinem silizium | |
| CA2700114A1 (en) | Microprocessing of synthetic quartz glass substrate |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |