ATE430369T1 - Spiegel für hochleistungs-euv-lampensystem - Google Patents

Spiegel für hochleistungs-euv-lampensystem

Info

Publication number
ATE430369T1
ATE430369T1 AT06806462T AT06806462T ATE430369T1 AT E430369 T1 ATE430369 T1 AT E430369T1 AT 06806462 T AT06806462 T AT 06806462T AT 06806462 T AT06806462 T AT 06806462T AT E430369 T1 ATE430369 T1 AT E430369T1
Authority
AT
Austria
Prior art keywords
mirror
aspheric surface
euv radiation
high power
euv
Prior art date
Application number
AT06806462T
Other languages
English (en)
Inventor
Fergal O'reilly
Patrick Hayden
Gerard O'sullivan
Padraig Dunne
Original Assignee
Univ Dublin
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Dublin filed Critical Univ Dublin
Application granted granted Critical
Publication of ATE430369T1 publication Critical patent/ATE430369T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
AT06806462T 2005-11-02 2006-10-23 Spiegel für hochleistungs-euv-lampensystem ATE430369T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IE20050730 2005-11-02
PCT/EP2006/010187 WO2007051537A2 (en) 2005-11-02 2006-10-23 High power euv lamp system

Publications (1)

Publication Number Publication Date
ATE430369T1 true ATE430369T1 (de) 2009-05-15

Family

ID=37564079

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06806462T ATE430369T1 (de) 2005-11-02 2006-10-23 Spiegel für hochleistungs-euv-lampensystem

Country Status (6)

Country Link
US (1) US7763872B2 (de)
EP (1) EP1946331B1 (de)
JP (1) JP4901874B2 (de)
AT (1) ATE430369T1 (de)
DE (1) DE602006006589D1 (de)
WO (1) WO2007051537A2 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2904176A1 (fr) * 2006-07-24 2008-01-25 Xenocs Soc Par Actions Simplif Systeme de delivrance de faisceau de rayons x stabilise
KR101477472B1 (ko) * 2007-09-07 2014-12-30 코닌클리케 필립스 엔.브이. 가스 방전 소스를 위한 전극 장치 및 이 전극 장치를 갖는 가스 방전 소스를 동작시키는 방법
CN101796892B (zh) * 2007-09-07 2013-02-06 皇家飞利浦电子股份有限公司 用于以高功率操作的包括轮盖的气体放电源的转轮式电极装置
CN101868764A (zh) * 2007-11-22 2010-10-20 皇家飞利浦电子股份有限公司 增加设置在照射设备中的聚集器光学器件的操作寿命的方法及相应的照射设备
NL1036613A1 (nl) * 2008-03-03 2009-09-07 Asml Netherlands Bv Lithographic apparatus, plasma source, and reflecting method.
JP2011518955A (ja) * 2008-04-30 2011-06-30 ユニバーシティ・カレッジ・ダブリン，ナショナル・ユニバーシティ・オブ・アイルランド，ダブリン 液体金属による固体基体表面の湿潤
WO2010004481A1 (en) * 2008-07-07 2010-01-14 Philips Intellectual Property & Standards Gmbh Extreme uv radiation generating device comprising a corrosion-resistant material
EP2157481A3 (de) * 2008-08-14 2012-06-13 ASML Netherlands B.V. Strahlungsquelle, Lithographieapparat und Verfahren zur Herstellung von Bauelementen
JP5577351B2 (ja) 2008-12-22 2014-08-20 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置および放射システム
US8330131B2 (en) * 2010-01-11 2012-12-11 Media Lario, S.R.L. Source-collector module with GIC mirror and LPP EUV light source
US8746975B2 (en) 2011-02-17 2014-06-10 Media Lario S.R.L. Thermal management systems, assemblies and methods for grazing incidence collectors for EUV lithography
US8731139B2 (en) 2011-05-04 2014-05-20 Media Lario S.R.L. Evaporative thermal management of grazing incidence collectors for EUV lithography
WO2013189827A2 (en) * 2012-06-22 2013-12-27 Asml Netherlands B.V. Radiation source and lithographic apparatus.
US9544984B2 (en) * 2013-07-22 2017-01-10 Kla-Tencor Corporation System and method for generation of extreme ultraviolet light
JP6571092B2 (ja) 2013-09-25 2019-09-04 エーエスエムエル ネザーランズ ビー．ブイ． ビームデリバリ装置及び方法
RU2670273C2 (ru) * 2017-11-24 2018-10-22 Общество с ограниченной ответственностью "РнД-ИСАН" Устройство и способ для генерации излучения из лазерной плазмы
US10613444B2 (en) * 2018-08-28 2020-04-07 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor apparatus and method of operating the same
US11968772B2 (en) * 2019-05-30 2024-04-23 Kla Corporation Optical etendue matching methods for extreme ultraviolet metrology
JP7806584B2 (ja) * 2022-03-30 2026-01-27 ウシオ電機株式会社 光源装置
JP2024179110A (ja) * 2023-06-14 2024-12-26 ウシオ電機株式会社 光源装置及び膜厚調整機構

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55143502A (en) * 1979-04-25 1980-11-08 Toshikatsu Omiya Production of paraboloid-of-revolution mirror
DD152168A1 (de) * 1980-07-07 1981-11-18 Ustinow Nikolai Parabolspiegel zur energiegewinnung
DD230944A1 (de) * 1983-11-15 1985-12-11 Nikolai Ustinow Parabolspiegel zur informationsgewinnung
JPH05343297A (ja) * 1992-06-09 1993-12-24 Matsushita Electron Corp 露光方法および露光装置
US7439530B2 (en) * 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
DE10138284A1 (de) * 2001-08-10 2003-02-27 Zeiss Carl Beleuchtungssystem mit genesteten Kollektoren
JP4065528B2 (ja) * 2003-03-10 2008-03-26 キヤノン株式会社 恒温真空容器及びそれを用いた露光装置
EP1526550A1 (de) * 2003-10-20 2005-04-27 ASML Netherlands B.V. Spiegel für ein Lithographiegerät, Lithographiegerät mit einem solchen und Verfahren zur Herstellung eines Bauteils
JP2006019510A (ja) * 2004-07-01 2006-01-19 Nikon Corp 露光装置及びマイクロデバイスの製造方法

Also Published As

Publication number Publication date
JP4901874B2 (ja) 2012-03-21
JP2009515326A (ja) 2009-04-09
DE602006006589D1 (de) 2009-06-10
EP1946331A2 (de) 2008-07-23
WO2007051537A2 (en) 2007-05-10
WO2007051537A3 (en) 2007-07-19
EP1946331B1 (de) 2009-04-29
US7763872B2 (en) 2010-07-27
US20090153975A1 (en) 2009-06-18

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