ATE431630T1 - Seitlich gepumpter röhrenfestkörperlaser - Google Patents
Seitlich gepumpter röhrenfestkörperlaserInfo
- Publication number
- ATE431630T1 ATE431630T1 AT06748641T AT06748641T ATE431630T1 AT E431630 T1 ATE431630 T1 AT E431630T1 AT 06748641 T AT06748641 T AT 06748641T AT 06748641 T AT06748641 T AT 06748641T AT E431630 T1 ATE431630 T1 AT E431630T1
- Authority
- AT
- Austria
- Prior art keywords
- tube
- state laser
- substrate
- solid state
- ssl
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/0602—Crystal lasers or glass lasers
- H01S3/0608—Laser crystal with a hole, e.g. a hole or bore for housing a flashlamp or a mirror
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/025—Constructional details of solid state lasers, e.g. housings or mountings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/0407—Liquid cooling, e.g. by water
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/042—Arrangements for thermal management for solid state lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/07—Construction or shape of active medium consisting of a plurality of parts, e.g. segments
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08059—Constructional details of the reflector, e.g. shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08072—Thermal lensing or thermally induced birefringence; Compensation thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/0813—Configuration of resonator
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
- H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
- H01S3/0941—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/163—Solid materials characterised by a crystal matrix
- H01S3/164—Solid materials characterised by a crystal matrix garnet
- H01S3/1641—GGG
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/163—Solid materials characterised by a crystal matrix
- H01S3/164—Solid materials characterised by a crystal matrix garnet
- H01S3/1643—YAG
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/163—Solid materials characterised by a crystal matrix
- H01S3/1645—Solid materials characterised by a crystal matrix halide
- H01S3/1653—YLiF4(YLF, LYF)
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/163—Solid materials characterised by a crystal matrix
- H01S3/1671—Solid materials characterised by a crystal matrix vanadate, niobate, tantalate
- H01S3/1673—YVO4 [YVO]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2308—Amplifier arrangements, e.g. MOPA
- H01S3/2316—Cascaded amplifiers
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/101,198 US7430230B2 (en) | 2005-04-07 | 2005-04-07 | Tube solid-state laser |
| PCT/US2006/010732 WO2006110289A1 (en) | 2005-04-07 | 2006-03-22 | Side-pumped tube solid-state laser |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE431630T1 true ATE431630T1 (de) | 2009-05-15 |
Family
ID=36708479
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT06748641T ATE431630T1 (de) | 2005-04-07 | 2006-03-22 | Seitlich gepumpter röhrenfestkörperlaser |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7430230B2 (de) |
| EP (1) | EP1867012B1 (de) |
| JP (1) | JP5135207B2 (de) |
| AT (1) | ATE431630T1 (de) |
| DE (1) | DE602006006816D1 (de) |
| RU (1) | RU2407121C2 (de) |
| WO (1) | WO2006110289A1 (de) |
Families Citing this family (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7609741B2 (en) * | 2007-01-23 | 2009-10-27 | The Boeing Company | Disk laser including an amplified spontaneous emission (ASE) suppression feature |
| JP5116354B2 (ja) * | 2007-04-27 | 2013-01-09 | 芝浦メカトロニクス株式会社 | 固体レーザ媒質および固体レーザ発振器 |
| JP5354657B2 (ja) * | 2009-03-17 | 2013-11-27 | 独立行政法人理化学研究所 | 偏極電子銃、偏極電子線の発生方法、電子銃の評価方法、及び逆光電子分光方法 |
| US8238042B2 (en) * | 2009-06-05 | 2012-08-07 | CVI Melles Griot, Inc. | Reflective axicon systems and methods |
| ES2530070T3 (es) * | 2011-09-05 | 2015-02-26 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Aparato de marcado con una pluralidad de láseres y conjuntos ajustables individualmente de medios de desviación |
| DK2564973T3 (en) * | 2011-09-05 | 2015-01-12 | Alltec Angewandte Laserlicht Technologie Ges Mit Beschränkter Haftung | Marking apparatus having a plurality of lasers and a kombineringsafbøjningsindretning |
| EP2564972B1 (de) * | 2011-09-05 | 2015-08-26 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Markierungsvorrichtung mith mehreren Lasern, Deflektionmitteln und Telescopikmitteln für jeden Laserstrahl |
| EP2565996B1 (de) | 2011-09-05 | 2013-12-11 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Lasergerät mit Lasereinheit und Flüssigkeitsbehälter für eine Kühlvorrichtung dieser Lasereinheit |
| EP2565994B1 (de) | 2011-09-05 | 2014-02-12 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Laservorrichtung und -verfahren zum Markieren eines Gegenstands |
| EP2564976B1 (de) | 2011-09-05 | 2015-06-10 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Markierungsvorrichtung mit mindestens einem Gaslaser und einer Kühleinrichtung |
| ES2544269T3 (es) * | 2011-09-05 | 2015-08-28 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Aparato de marcado con una pluralidad de láseres de gas con tubos de resonancia y medios de deflexión ajustables individualmente |
| ES2438751T3 (es) | 2011-09-05 | 2014-01-20 | ALLTEC Angewandte Laserlicht Technologie Gesellschaft mit beschränkter Haftung | Dispositivo y procedimiento para marcar un objeto por medio de un rayo láser |
| RU2550372C1 (ru) * | 2014-03-04 | 2015-05-10 | Открытое акционерное общество "Научно-исследовательский институт "Полюс" им. М.Ф. Стельмаха" | Твердотельный лазер |
| CN104617476B (zh) * | 2015-01-20 | 2017-07-28 | 中国科学院理化技术研究所 | 防止激光二极管发光腔面污染的侧面泵浦激光模块 |
| US9899798B2 (en) | 2015-08-03 | 2018-02-20 | University Of Central Florida Research Foundation, Inc. | Apparatus and method for suppressing parasitic lasing and applications thereof |
| JP6632315B2 (ja) | 2015-10-16 | 2020-01-22 | 三菱重工業株式会社 | 固体レーザ増幅装置 |
| JP6560954B2 (ja) | 2015-10-16 | 2019-08-14 | 三菱重工業株式会社 | 固体レーザ増幅装置 |
| US11114813B2 (en) | 2015-11-25 | 2021-09-07 | Raytheon Company | Integrated pumplight homogenizer and signal injector for high-power laser system |
| US9865988B2 (en) | 2015-11-25 | 2018-01-09 | Raytheon Company | High-power planar waveguide (PWG) pumphead with modular components for high-power laser system |
| US10297968B2 (en) | 2015-11-25 | 2019-05-21 | Raytheon Company | High-gain single planar waveguide (PWG) amplifier laser system |
| US10211590B2 (en) | 2015-11-25 | 2019-02-19 | Raytheon Company | Dual-function optical bench and cooling manifold for high-power laser system |
| CN105305218A (zh) * | 2015-12-05 | 2016-02-03 | 中国航空工业集团公司洛阳电光设备研究所 | 一种全固态激光器 |
| RU2623709C1 (ru) * | 2016-02-10 | 2017-06-28 | Российская Федерация, от имени которой выступает Государственная корпорация по атомной энергии "Росатом" (Госкорпорация "Росатом") | Малогабаритный квантрон с жидкостным охлаждением |
| US10069270B2 (en) | 2016-02-11 | 2018-09-04 | Raytheon Company | Planar waveguides with enhanced support and/or cooling features for high-power laser systems |
| RU2664761C1 (ru) * | 2017-07-27 | 2018-08-22 | Федеральное государственное бюджетное учреждение науки Физический институт им. П.Н. Лебедева Российской академии наук, (ФГБУН ФИАН) | Активный элемент твёрдотельного лазера и способ его охлаждения |
| GB201718212D0 (en) * | 2017-11-02 | 2017-12-20 | Leonardo Mw Ltd | A laser |
| US10511135B2 (en) | 2017-12-19 | 2019-12-17 | Raytheon Company | Laser system with mechanically-robust monolithic fused planar waveguide (PWG) structure |
| CN111788747B (zh) * | 2018-01-29 | 2024-02-27 | Idea机器显影设计及生产有限公司 | 紧凑型同轴激光器 |
| US11133639B2 (en) | 2018-07-24 | 2021-09-28 | Raytheon Company | Fast axis thermal lens compensation for a planar amplifier structure |
| CN109244803B (zh) * | 2018-10-22 | 2021-04-30 | 中国电子科技集团公司第十一研究所 | 一种管状激光增益介质及其封装方法 |
| CN109149327A (zh) * | 2018-10-30 | 2019-01-04 | 中国工程物理研究院激光聚变研究中心 | 一种多光束合成转动激光器及激光设备 |
| CN109378693B (zh) * | 2018-12-11 | 2024-02-20 | 中国工程物理研究院激光聚变研究中心 | 激光增益结构及激光器 |
| CN109361137B (zh) * | 2018-12-11 | 2024-01-26 | 中国工程物理研究院激光聚变研究中心 | 激光增益组件及激光器 |
| RU2763262C1 (ru) * | 2021-05-28 | 2021-12-28 | Евгений Владленович Бурый | Квантрон лазера с диодной накачкой активной среды |
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| GB1038149A (en) * | 1963-01-10 | 1966-08-10 | Varian Associates | Solid-state lasers |
| US3582820A (en) * | 1968-04-29 | 1971-06-01 | American Optical Corp | Erbium laser device |
| US3683296A (en) * | 1970-10-13 | 1972-08-08 | Texas Instruments Inc | High efficiency laser cavity |
| DE2542652C3 (de) | 1975-09-24 | 1981-01-15 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Optischer Sender oder Verstärker (Laser) |
| US4514850A (en) | 1983-05-16 | 1985-04-30 | Rockwell International Corporation | Common-pass decentered annular ring resonator |
| US4516244A (en) | 1983-09-01 | 1985-05-07 | Rockwell International Corporation | Common-pass decentered annular ring resonator with improved polarization control |
| US4598408A (en) | 1984-10-22 | 1986-07-01 | Trw Inc. | High extraction efficiency cylindrical ring resonator |
| US4744090A (en) * | 1985-07-08 | 1988-05-10 | Trw Inc. | High-extraction efficiency annular resonator |
| US4751716A (en) | 1986-05-01 | 1988-06-14 | Amada Engineering & Service Co., Inc. | Hollow cylindrical solid state laser medium and a laser system using the medium |
| US5162940A (en) * | 1987-03-06 | 1992-11-10 | The United States Of America As Represented By The Secretary Of The Air Force | Multiple energy level, multiple pulse rate laser source |
| US4740983A (en) * | 1987-08-28 | 1988-04-26 | General Electric Company | Laser apparatus for minimizing wavefront distortion |
| US4894709A (en) * | 1988-03-09 | 1990-01-16 | Massachusetts Institute Of Technology | Forced-convection, liquid-cooled, microchannel heat sinks |
| US4949358A (en) * | 1988-04-25 | 1990-08-14 | Coherent, Inc. | Ring laser with improved beam quality |
| US5852622A (en) * | 1988-08-30 | 1998-12-22 | Onyx Optics, Inc. | Solid state lasers with composite crystal or glass components |
| US5099311A (en) * | 1991-01-17 | 1992-03-24 | The United States Of America As Represented By The United States Department Of Energy | Microchannel heat sink assembly |
| US5105430A (en) * | 1991-04-09 | 1992-04-14 | The United States Of America As Represented By The United States Department Of Energy | Thin planar package for cooling an array of edge-emitting laser diodes |
| US5172388A (en) * | 1991-07-23 | 1992-12-15 | International Business Machines Corporation | Method and apparatus for an increased pulse repetition rate for a CW pumped laser |
| JP2682339B2 (ja) * | 1992-07-20 | 1997-11-26 | 株式会社日立製作所 | 固体レーザ共振器 |
| US5351251A (en) | 1993-03-30 | 1994-09-27 | Carl Zeiss, Inc. | Laser apparatus |
| JP3155132B2 (ja) * | 1993-09-24 | 2001-04-09 | 三菱電機株式会社 | 固体レーザ装置及びレーザ加工装置 |
| US5636239A (en) * | 1995-05-15 | 1997-06-03 | Hughes Electronics | Solid state optically pumped laser head |
| US5548605A (en) * | 1995-05-15 | 1996-08-20 | The Regents Of The University Of California | Monolithic microchannel heatsink |
| US6330259B1 (en) * | 1999-06-24 | 2001-12-11 | Jonathan S. Dahm | Monolithic radial diode-pumped laser with integral micro channel cooling |
| US6937636B1 (en) * | 1999-09-27 | 2005-08-30 | The Regents Of The University Of California | Tapered laser rods as a means of minimizing the path length of trapped barrel mode rays |
| US6339605B1 (en) | 2000-02-16 | 2002-01-15 | The Boeing Company | Active mirror amplifier system and method for a high-average power laser system |
| US6827786B2 (en) * | 2000-12-26 | 2004-12-07 | Stephen M Lord | Machine for production of granular silicon |
| US7042631B2 (en) * | 2001-01-04 | 2006-05-09 | Coherent Technologies, Inc. | Power scalable optical systems for generating, transporting, and delivering high power, high quality, laser beams |
| US7200161B2 (en) * | 2001-01-22 | 2007-04-03 | The Boeing Company | Side-pumped solid-state disk laser for high-average power |
| US6625193B2 (en) | 2001-01-22 | 2003-09-23 | The Boeing Company | Side-pumped active mirror solid-state laser for high-average power |
| US6810060B2 (en) | 2001-02-13 | 2004-10-26 | The Boeing Company | High-average power active mirror solid-state laser with multiple subapertures |
| US6603793B2 (en) | 2001-05-18 | 2003-08-05 | The Boeing Company | Solid-state laser oscillator with gain media in active mirror configuration |
-
2005
- 2005-04-07 US US11/101,198 patent/US7430230B2/en not_active Expired - Fee Related
-
2006
- 2006-03-22 JP JP2008505355A patent/JP5135207B2/ja not_active Expired - Fee Related
- 2006-03-22 WO PCT/US2006/010732 patent/WO2006110289A1/en not_active Ceased
- 2006-03-22 DE DE602006006816T patent/DE602006006816D1/de not_active Expired - Lifetime
- 2006-03-22 RU RU2007141215/28A patent/RU2407121C2/ru not_active IP Right Cessation
- 2006-03-22 AT AT06748641T patent/ATE431630T1/de not_active IP Right Cessation
- 2006-03-22 EP EP06748641A patent/EP1867012B1/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US7430230B2 (en) | 2008-09-30 |
| DE602006006816D1 (de) | 2009-06-25 |
| EP1867012B1 (de) | 2009-05-13 |
| US20060227841A1 (en) | 2006-10-12 |
| JP2008536313A (ja) | 2008-09-04 |
| JP5135207B2 (ja) | 2013-02-06 |
| EP1867012A1 (de) | 2007-12-19 |
| RU2007141215A (ru) | 2009-05-20 |
| WO2006110289A1 (en) | 2006-10-19 |
| RU2407121C2 (ru) | 2010-12-20 |
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