ATE438605T1 - Fluorverbindung, flourpolymer und verfahren zur herstellung davon - Google Patents

Fluorverbindung, flourpolymer und verfahren zur herstellung davon

Info

Publication number
ATE438605T1
ATE438605T1 AT04793261T AT04793261T ATE438605T1 AT E438605 T1 ATE438605 T1 AT E438605T1 AT 04793261 T AT04793261 T AT 04793261T AT 04793261 T AT04793261 T AT 04793261T AT E438605 T1 ATE438605 T1 AT E438605T1
Authority
AT
Austria
Prior art keywords
production
fluorpolymer
fluorine compound
functional groups
provides
Prior art date
Application number
AT04793261T
Other languages
English (en)
Inventor
Yoko Takebe
Osamu Yokokoji
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Application granted granted Critical
Publication of ATE438605T1 publication Critical patent/ATE438605T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C33/00—Unsaturated compounds having hydroxy or O-metal groups bound to acyclic carbon atoms
    • C07C33/40—Halogenated unsaturated alcohols
    • C07C33/42—Halogenated unsaturated alcohols acyclic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C33/00—Unsaturated compounds having hydroxy or O-metal groups bound to acyclic carbon atoms
    • C07C33/40—Halogenated unsaturated alcohols
    • C07C33/42—Halogenated unsaturated alcohols acyclic
    • C07C33/423—Halogenated unsaturated alcohols acyclic containing only double bonds as unsaturation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F14/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
    • C08F14/18—Monomers containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F36/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
    • C08F36/02—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
    • C08F36/20—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds unconjugated
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/108—Polyolefin or halogen containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
AT04793261T 2003-10-31 2004-10-29 Fluorverbindung, flourpolymer und verfahren zur herstellung davon ATE438605T1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2003372654 2003-10-31
JP2004032038 2004-02-09
JP2004185091 2004-06-23
PCT/JP2004/016160 WO2005042453A1 (ja) 2003-10-31 2004-10-29 含フッ素化合物、含フッ素ポリマーとその製造方法

Publications (1)

Publication Number Publication Date
ATE438605T1 true ATE438605T1 (de) 2009-08-15

Family

ID=34557018

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04793261T ATE438605T1 (de) 2003-10-31 2004-10-29 Fluorverbindung, flourpolymer und verfahren zur herstellung davon

Country Status (8)

Country Link
US (1) US7244545B2 (de)
EP (1) EP1679297B1 (de)
JP (1) JPWO2005042453A1 (de)
KR (1) KR20060132793A (de)
AT (1) ATE438605T1 (de)
DE (1) DE602004022442D1 (de)
TW (1) TW200517785A (de)
WO (1) WO2005042453A1 (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005060664A (ja) * 2003-07-31 2005-03-10 Asahi Glass Co Ltd 含フッ素化合物、含フッ素ポリマーとその製造方法およびそれを含むレジスト組成物
JP2005097531A (ja) * 2003-08-21 2005-04-14 Asahi Glass Co Ltd 含フッ素共重合体とその製造方法およびそれを含むレジスト組成物
WO2005042453A1 (ja) 2003-10-31 2005-05-12 Asahi Glass Company, Limited 含フッ素化合物、含フッ素ポリマーとその製造方法
WO2005108446A1 (ja) * 2004-05-07 2005-11-17 Asahi Glass Company, Limited 含フッ素共重合体とその製造方法およびそれを含むレジスト組成物
JP4551701B2 (ja) * 2004-06-14 2010-09-29 富士フイルム株式会社 液浸露光用保護膜形成組成物及びそれを用いたパターン形成方法
US20060008746A1 (en) * 2004-07-07 2006-01-12 Yasunobu Onishi Method for manufacturing semiconductor device
JPWO2006011427A1 (ja) * 2004-07-30 2008-05-01 旭硝子株式会社 含フッ素化合物、含フッ素ポリマー、レジスト組成物、およびレジスト保護膜組成物
JP4621451B2 (ja) * 2004-08-11 2011-01-26 富士フイルム株式会社 液浸露光用保護膜形成組成物及びそれを用いたパターン形成方法
WO2006132287A1 (ja) * 2005-06-08 2006-12-14 Asahi Glass Company, Limited 含フッ素共重合体とその製造方法およびそれを含むレジスト組成物
JP2007072336A (ja) * 2005-09-09 2007-03-22 Tokyo Ohka Kogyo Co Ltd 保護膜形成用材料およびこれを用いたホトレジストパターン形成方法
JP5151038B2 (ja) 2006-02-16 2013-02-27 富士通株式会社 レジストカバー膜形成材料、レジストパターンの形成方法、半導体装置及びその製造方法
WO2007142244A1 (ja) * 2006-06-07 2007-12-13 Asahi Glass Company, Limited 新規なポリフルオロジエン、その製造方法、および新規な含フッ素重合体
CN101646696B (zh) * 2007-03-30 2012-07-04 旭硝子株式会社 新的含氟化合物、含氟聚合物及其制造方法
US20090042148A1 (en) * 2007-08-06 2009-02-12 Munirathna Padmanaban Photoresist Composition for Deep UV and Process Thereof
JP5381298B2 (ja) 2008-05-12 2014-01-08 信越化学工業株式会社 レジスト保護膜材料及びパターン形成方法
JP4650644B2 (ja) 2008-05-12 2011-03-16 信越化学工業株式会社 レジスト材料及びパターン形成方法
KR101438844B1 (ko) 2008-10-30 2014-09-05 신에쓰 가가꾸 고교 가부시끼가이샤 환상 아세탈 구조를 갖는 불소 함유 단량체, 고분자 화합물, 레지스트 보호막 재료, 레지스트 재료, 및 패턴 형성 방법
JP4822028B2 (ja) 2008-12-02 2011-11-24 信越化学工業株式会社 レジスト保護膜材料及びパターン形成方法
JP4748331B2 (ja) 2008-12-02 2011-08-17 信越化学工業株式会社 レジスト材料及びパターン形成方法
JP5170456B2 (ja) 2009-04-16 2013-03-27 信越化学工業株式会社 レジスト材料及びパターン形成方法
JP5131488B2 (ja) 2009-12-22 2013-01-30 信越化学工業株式会社 含フッ素単量体及び含フッ素高分子化合物
JP5375811B2 (ja) 2010-01-18 2013-12-25 信越化学工業株式会社 高分子化合物、レジスト材料、及びパターン形成方法
KR101097677B1 (ko) * 2010-06-01 2011-12-22 서울대학교산학협력단 액정 표시 장치, 이의 제조 방법 및 액정 배향 기판의 제조 방법
JP5282781B2 (ja) 2010-12-14 2013-09-04 信越化学工業株式会社 レジスト材料及びパターン形成方法
JP5617810B2 (ja) 2011-10-04 2014-11-05 信越化学工業株式会社 レジスト保護膜材料及びパターン形成方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3029323B2 (ja) 1990-06-01 2000-04-04 旭硝子株式会社 コーティング用含フッ素重合体組成物およびその用途
JP3005040B2 (ja) 1990-11-22 2000-01-31 旭硝子株式会社 コーティング用樹脂組成物
JP3292534B2 (ja) 1993-01-27 2002-06-17 旭硝子株式会社 基材の被覆方法
AU6056099A (en) 1998-09-23 2000-04-10 E.I. Du Pont De Nemours And Company Photoresists, polymers and processes for microlithography
KR20020053083A (ko) 1999-11-17 2002-07-04 메리 이. 보울러 자외선 및 진공자외선 투명 폴리머 조성물 및 그의 용도
US6468712B1 (en) 2000-02-25 2002-10-22 Massachusetts Institute Of Technology Resist materials for 157-nm lithography
AU2001264271A1 (en) * 2000-06-13 2001-12-24 Asahi Glass Company, Limited Resist composition
AU2001274579A1 (en) * 2000-06-21 2002-01-02 Asahi Glass Company, Limited Resist composition
DE60223654T2 (de) * 2001-02-09 2008-10-30 Asahi Glass Co., Ltd. Resistzusammensetzung
WO2002064648A1 (en) 2001-02-09 2002-08-22 Asahi Glass Company, Limited Fluorine-containing compounds and polymers and processes for producing the same
JP4010160B2 (ja) * 2002-03-04 2007-11-21 旭硝子株式会社 レジスト組成物
JP2003284156A (ja) * 2002-03-19 2003-10-03 Matsushita Electric Ind Co Ltd 無線通信システム及び無線通信基地局並びに無線通信端末
AU2003257656A1 (en) * 2002-08-21 2004-03-11 Asahi Glass Company, Limited Fluorine compounds, fluoropolymers, and process for production thereof
KR20050071666A (ko) * 2002-11-07 2005-07-07 아사히 가라스 가부시키가이샤 레지스트 조성물
JP2005097531A (ja) * 2003-08-21 2005-04-14 Asahi Glass Co Ltd 含フッ素共重合体とその製造方法およびそれを含むレジスト組成物
WO2005042453A1 (ja) 2003-10-31 2005-05-12 Asahi Glass Company, Limited 含フッ素化合物、含フッ素ポリマーとその製造方法
WO2005108446A1 (ja) * 2004-05-07 2005-11-17 Asahi Glass Company, Limited 含フッ素共重合体とその製造方法およびそれを含むレジスト組成物
JPWO2006011427A1 (ja) * 2004-07-30 2008-05-01 旭硝子株式会社 含フッ素化合物、含フッ素ポリマー、レジスト組成物、およびレジスト保護膜組成物

Also Published As

Publication number Publication date
EP1679297A1 (de) 2006-07-12
DE602004022442D1 (de) 2009-09-17
KR20060132793A (ko) 2006-12-22
JPWO2005042453A1 (ja) 2007-11-29
EP1679297B1 (de) 2009-08-05
US20060188816A1 (en) 2006-08-24
EP1679297A4 (de) 2006-11-02
TW200517785A (en) 2005-06-01
WO2005042453A1 (ja) 2005-05-12
US7244545B2 (en) 2007-07-17

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