ATE440074T1 - Verfahren zur reinigung von wasserstoffverbindungen enthaltendem siliciumtetrachlorid oder germaniumtetrachlorid - Google Patents

Verfahren zur reinigung von wasserstoffverbindungen enthaltendem siliciumtetrachlorid oder germaniumtetrachlorid

Info

Publication number
ATE440074T1
ATE440074T1 AT05749314T AT05749314T ATE440074T1 AT E440074 T1 ATE440074 T1 AT E440074T1 AT 05749314 T AT05749314 T AT 05749314T AT 05749314 T AT05749314 T AT 05749314T AT E440074 T1 ATE440074 T1 AT E440074T1
Authority
AT
Austria
Prior art keywords
tetrachloride
unit
germanium
germanium tetrachloride
silicon tetrachloride
Prior art date
Application number
AT05749314T
Other languages
English (en)
Inventor
Hanns-Peter Popp
Rainer Nicolai
Hartwig Rauleder
Jurgen Lang
Original Assignee
Evonik Degussa Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Evonik Degussa Gmbh filed Critical Evonik Degussa Gmbh
Application granted granted Critical
Publication of ATE440074T1 publication Critical patent/ATE440074T1/de

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/10778—Purification
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G17/00—Compounds of germanium
    • C01G17/04—Halides of germanium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00781—Aspects relating to microreactors
    • B01J2219/00851—Additional features
    • B01J2219/00853—Employing electrode arrangements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00781—Aspects relating to microreactors
    • B01J2219/00925—Irradiation
    • B01J2219/0093—Electric or magnetic energy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
    • B01J2219/0809—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes employing two or more electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
    • B01J2219/0815—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes involving stationary electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
    • B01J2219/0824—Details relating to the shape of the electrodes
    • B01J2219/0826—Details relating to the shape of the electrodes essentially linear
    • B01J2219/083—Details relating to the shape of the electrodes essentially linear cylindrical
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
    • B01J2219/0837—Details relating to the material of the electrodes
    • B01J2219/0841—Metal
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B01J2219/0845—Details relating to the type of discharge
    • B01J2219/0847—Glow discharge
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • B01J2219/0845—Details relating to the type of discharge
    • B01J2219/0849—Corona pulse discharge
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0894—Processes carried out in the presence of a plasma
    • B01J2219/0896—Cold plasma

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Silicon Compounds (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
AT05749314T 2004-08-04 2005-06-10 Verfahren zur reinigung von wasserstoffverbindungen enthaltendem siliciumtetrachlorid oder germaniumtetrachlorid ATE440074T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102004037675A DE102004037675A1 (de) 2004-08-04 2004-08-04 Verfahren und Vorrichtung zur Reinigung von Wasserstoffverbindungen enthaltendem Siliciumtetrachlorid oder Germaniumtetrachlorid
PCT/EP2005/052691 WO2006013129A1 (en) 2004-08-04 2005-06-10 Process and apparatus for purifying silicon tetrachloride or germanium tetrachloride containing hydrogen compounds

Publications (1)

Publication Number Publication Date
ATE440074T1 true ATE440074T1 (de) 2009-09-15

Family

ID=34969451

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05749314T ATE440074T1 (de) 2004-08-04 2005-06-10 Verfahren zur reinigung von wasserstoffverbindungen enthaltendem siliciumtetrachlorid oder germaniumtetrachlorid

Country Status (10)

Country Link
US (1) US8002954B2 (de)
EP (1) EP1786731B1 (de)
JP (1) JP5114198B2 (de)
KR (1) KR101172927B1 (de)
CN (1) CN100393618C (de)
AT (1) ATE440074T1 (de)
BR (1) BRPI0513097B1 (de)
DE (2) DE102004037675A1 (de)
DK (1) DK1786731T3 (de)
WO (1) WO2006013129A1 (de)

Families Citing this family (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004008442A1 (de) * 2004-02-19 2005-09-15 Degussa Ag Siliciumverbindungen für die Erzeugung von SIO2-haltigen Isolierschichten auf Chips
DE102005041137A1 (de) * 2005-08-30 2007-03-01 Degussa Ag Reaktor, Anlage und großtechnisches Verfahren zur kontinuierlichen Herstellung von hochreinem Siliciumtetrachlorid oder hochreinem Germaniumtetrachlorid
CN100484361C (zh) * 2006-02-24 2009-04-29 清华大学 基于缩放通道结构的大气压放电冷等离子体发生器及阵列
DE102006034061A1 (de) * 2006-07-20 2008-01-24 REV Renewable Energy Ventures, Inc., Aloha Polysilanverarbeitung und Verwendung
DE102007007874A1 (de) * 2007-02-14 2008-08-21 Evonik Degussa Gmbh Verfahren zur Herstellung höherer Silane
DE102007013219A1 (de) * 2007-03-15 2008-09-18 Rev Renewable Energy Ventures, Inc. Plasmagestützte Synthese
DE102007014107A1 (de) * 2007-03-21 2008-09-25 Evonik Degussa Gmbh Aufarbeitung borhaltiger Chlorsilanströme
DE102007048937A1 (de) * 2007-10-12 2009-04-16 Evonik Degussa Gmbh Entfernung von polaren organischen Verbindungen und Fremdmetallen aus Organosilanen
DE102007050199A1 (de) * 2007-10-20 2009-04-23 Evonik Degussa Gmbh Entfernung von Fremdmetallen aus anorganischen Silanen
DE102007050573A1 (de) * 2007-10-23 2009-04-30 Evonik Degussa Gmbh Großgebinde zur Handhabung und für den Transport von hochreinen und ultra hochreinen Chemikalien
DE102007059170A1 (de) * 2007-12-06 2009-06-10 Evonik Degussa Gmbh Katalysator und Verfahren zur Dismutierung von Wasserstoff enthaltenden Halogensilanen
DE102008004396A1 (de) * 2008-01-14 2009-07-16 Evonik Degussa Gmbh Anlage und Verfahren zur Verminderung des Gehaltes von Elementen, wie Bor, in Halogensilanen
CN101269835B (zh) * 2008-05-07 2010-06-09 云南驰宏锌锗股份有限公司 一种将光纤用四氯化锗中盐酸分离出来的装置
DE102008001851A1 (de) * 2008-05-19 2009-11-26 Evonik Degussa Gmbh Verfahren zur Phasenumwandlung von Stoffen
DE102008002537A1 (de) * 2008-06-19 2009-12-24 Evonik Degussa Gmbh Verfahren zur Entfernung von Bor enthaltenden Verunreinigungen aus Halogensilanen sowie Anlage zur Durchführung des Verfahrens
DE102008054537A1 (de) * 2008-12-11 2010-06-17 Evonik Degussa Gmbh Entfernung von Fremdmetallen aus Siliciumverbindungen durch Adsorption und/oder Filtration
CN101934212A (zh) * 2009-06-30 2011-01-05 新疆天业（集团）有限公司 一种气-固/气-气相等离子体管式反应器工艺及装置
DE102009027730A1 (de) 2009-07-15 2011-01-27 Evonik Degussa Gmbh Verahren und Verwendung von aminofunktionellen Harzen zur Dismutierung von Halogensilanen und zur Entfernung von Fremdmetallen
DE102009053804B3 (de) 2009-11-18 2011-03-17 Evonik Degussa Gmbh Verfahren zur Herstellung von Hydridosilanen
DE102010002342A1 (de) 2010-02-25 2011-08-25 Evonik Degussa GmbH, 45128 Verwendung der spezifischen Widerstandsmessung zur indirekten Bestimmung der Reinheit von Silanen und Germanen und ein entsprechendes Verfahren
CN101891243B (zh) * 2010-06-10 2012-01-11 南京中锗科技股份有限公司 一种提纯四氯化锗的萃取工艺方法
CN102557042A (zh) * 2010-12-24 2012-07-11 北京有色金属研究总院 一种四氯化硅中三氯氢硅杂质的去除方法
DE102011003453A1 (de) * 2011-02-01 2012-08-02 Wacker Chemie Ag Verfahren zur destillativen Reinigung von Chlorsilanen
DE102011004058A1 (de) 2011-02-14 2012-08-16 Evonik Degussa Gmbh Monochlorsilan, Verfahren und Vorrichtung zu dessen Herstellung
DE102011078942A1 (de) * 2011-07-11 2013-01-17 Evonik Degussa Gmbh Verfahren zur Herstellung höherer Silane mit verbesserter Ausbeute
CN102328951B (zh) * 2011-07-13 2014-08-06 云南驰宏锌锗股份有限公司 一种去除四氯化锗中含氢杂质的方法及装置
CN103387237A (zh) * 2012-05-10 2013-11-13 深圳市格林美高新技术股份有限公司 一种光纤废料资源化的方法
CN102659967B (zh) * 2012-06-02 2014-07-09 悦康药业集团安徽天然制药有限公司 聚丙烯酸树脂乳胶液反应装置
KR101250092B1 (ko) * 2012-06-13 2013-04-03 오씨아이머티리얼즈 주식회사 게르만 가스 제조 장치 및 이를 이용한 모노 게르만 가스 제조 방법
DE102013207447A1 (de) * 2013-04-24 2014-10-30 Evonik Degussa Gmbh Verfahren und Vorrichtung zur Herstellung von Octachlortrisilan
CN103754428B (zh) * 2014-01-14 2015-08-19 武汉云晶飞光纤材料有限公司 一种光纤用四氯化锗的灌装方法
US10328410B2 (en) 2014-02-18 2019-06-25 King Abdullah University Of Science And Technology Systems and methods for producing electrical discharges in compositions
CN104556054B (zh) * 2015-01-19 2017-03-29 新疆大全新能源有限公司 三氯氢硅合成料中轻组分的回收利用方法和装置
EP3088359B1 (de) * 2015-04-28 2018-09-12 Evonik Degussa GmbH Verfahren zur herstellung von octachlortrisilan und höherer polychlorsilane unter verwertung von hexachlordisilan
CN106730964A (zh) * 2015-11-25 2017-05-31 衡阳恒荣高纯半导体材料有限公司 一种生产高纯四氯化锗的蒸馏装置
CN106744685B (zh) * 2016-11-21 2018-10-23 亚洲硅业（青海）有限公司 电子级多晶硅生产中循环氢气的深度净化方法
EP3385223A1 (de) * 2017-04-05 2018-10-10 Evonik Degussa GmbH Verfahren zur abtrennung von brom, jod, brom und/oder jod enthaltenden verbindungen aus chlorsilanen
CN107055552B (zh) * 2017-06-27 2018-08-07 亚洲硅业（青海）有限公司 一种四氯化硅的净化方法及应用
EP3533519B1 (de) * 2018-02-28 2020-09-30 Paris Sciences et Lettres - Quartier Latin Biphasischer plasmamikroreaktor und verfahren zur verwendung davon
CN108686597B (zh) * 2018-05-16 2020-06-02 亚洲硅业(青海)股份有限公司 一种气体放电反应器、气体放电系统及三氯氢硅的制备方法
EP3659964A1 (de) 2018-11-28 2020-06-03 Hysilabs, SAS Katalysiertes verfahren zur herstellung von wasserstoff aus silylierten derivaten als wasserstoffträgerverbindungen
CN112546659B (zh) * 2020-12-08 2022-02-15 云南临沧鑫圆锗业股份有限公司 一种四氟化锗的提纯装置及方法
DE102024121661A1 (de) * 2024-07-30 2026-02-05 Ruhr-Universität Bochum, Körperschaft des öffentlichen Rechts Vorrichtung zum Generieren mehrerer Plasmastrahlen

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4372834A (en) 1981-06-19 1983-02-08 Bell Telephone Laboratories, Incorporated Purification process for compounds useful in optical fiber manufacture
DE3502367A1 (de) * 1985-01-25 1986-07-31 Philips Patentverwaltung Gmbh, 2000 Hamburg Verfahren zum entfernen von wasserstoff aus in siliziumtetrachlorid oder germaniumtetrachlorid geloesten wasserstoffhaltigen verbindungen
DE3711444A1 (de) 1987-04-04 1988-10-13 Huels Troisdorf Verfahren und vorrichtung zur herstellung von dichlorsilan
DE3828549A1 (de) 1988-08-23 1990-03-08 Huels Chemische Werke Ag Verfahren zur entfernung von silanverbindungen aus silanhaltigen abgasen
EP0702017B1 (de) 1994-09-14 2001-11-14 Degussa AG Verfahren zur Herstellung von chloridarmen bzw. chloridfreien aminofunktionellen Organosilanen
DE19516386A1 (de) 1995-05-04 1996-11-07 Huels Chemische Werke Ag Verfahren zur Herstellung von an chlorfunktionellen Organosilanen armen bzw. freien aminofunktionellen Organosilanen
DE19520737C2 (de) 1995-06-07 2003-04-24 Degussa Verfahren zur Herstellung von Alkylhydrogenchlorsilanen
DE19649023A1 (de) 1996-11-27 1998-05-28 Huels Chemische Werke Ag Verfahren zur Entfernung von Restmengen an acidem Chlor in Carbonoyloxysilanen
DE19746862A1 (de) * 1997-10-23 1999-04-29 Huels Chemische Werke Ag Vorrichtung und Verfahren für Probenahme und IR-spektroskopische Analyse von hochreinen, hygroskopischen Flüssigkeiten
DE19821156B4 (de) 1998-05-12 2006-04-06 Degussa Ag Verfahren zur Minderung von Resthalogengehalten und Farbzahlverbesserung in Alkoxysilanen oder Alkoxysilan-basierenden Zusammensetzungen und die Verwendung von Aktivkohle dazu
DE19847786A1 (de) 1998-10-16 2000-04-20 Degussa Vorrichtung und Verfahren zum Befüllen und Entleeren eines mit brennbarem sowie aggressivem Gas beaufschlagten Behälters
DE19849196A1 (de) 1998-10-26 2000-04-27 Degussa Verfahren zur Neutralisation und Minderung von Resthalogengehalten in Alkoxysilanen oder Alkoxysilan-basierenden Zusammensetzungen
ATE284406T1 (de) 1998-11-06 2004-12-15 Degussa Verfahren zur herstellung von chloridarmen oder chloridfreien alkoxysilanen
DE19918114C2 (de) 1999-04-22 2002-01-03 Degussa Verfahren und Vorrichtung zur Herstellung von Vinylchlorsilanen
DE19918115C2 (de) 1999-04-22 2002-01-03 Degussa Verfahren zur Herstellung von Vinylchlorsilanen
DE19963433A1 (de) 1999-12-28 2001-07-12 Degussa Verfahren zur Abscheidung von Chlorsilanen aus Gasströmen
DE10116007A1 (de) 2001-03-30 2002-10-02 Degussa Vorrichtung und Verfahren zur Herstellung von im Wesentlichen halogenfreien Trialkoxysilanen
DE10124548A1 (de) * 2001-05-19 2002-11-28 Degussa Verfahren zur selektiven katalytischen Reduktion von Stickoxiden mit Ammoniak im mageren Abgas eines Verbrennungsprozesses
DE10124549A1 (de) * 2001-05-19 2002-11-28 Degussa Verfahren zur selektiven katalytischen Reduktion von Stickoxiden mit Ammoniak im mageren Abgas eines Verbrennungsprozesses
US6858196B2 (en) * 2001-07-19 2005-02-22 Asm America, Inc. Method and apparatus for chemical synthesis
DE10330022A1 (de) 2003-07-03 2005-01-20 Degussa Ag Verfahren zur Herstellung von Iow-k dielektrischen Filmen
DE102004008442A1 (de) 2004-02-19 2005-09-15 Degussa Ag Siliciumverbindungen für die Erzeugung von SIO2-haltigen Isolierschichten auf Chips
DE102004025766A1 (de) 2004-05-26 2005-12-22 Degussa Ag Herstellung von Organosilanestern
DE102006003464A1 (de) 2006-01-25 2007-07-26 Degussa Gmbh Verfahren zur Erzeugung einer Siliciumschicht auf einer Substratoberfläche durch Gasphasenabscheidung
DE102007023759A1 (de) 2006-08-10 2008-02-14 Evonik Degussa Gmbh Anlage und Verfahren zur kontinuierlichen industriellen Herstellung von Fluoralkylchlorsilan
DE102007059170A1 (de) 2007-12-06 2009-06-10 Evonik Degussa Gmbh Katalysator und Verfahren zur Dismutierung von Wasserstoff enthaltenden Halogensilanen

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Publication number Publication date
KR20070043977A (ko) 2007-04-26
EP1786731A1 (de) 2007-05-23
DE102004037675A1 (de) 2006-03-16
DE602005016125D1 (de) 2009-10-01
WO2006013129A1 (en) 2006-02-09
DK1786731T3 (da) 2009-11-30
BRPI0513097A (pt) 2008-04-29
US20090020413A1 (en) 2009-01-22
CN1842491A (zh) 2006-10-04
KR101172927B1 (ko) 2012-08-10
BRPI0513097B1 (pt) 2016-01-19
CN100393618C (zh) 2008-06-11
US8002954B2 (en) 2011-08-23
JP2008509065A (ja) 2008-03-27
JP5114198B2 (ja) 2013-01-09
EP1786731B1 (de) 2009-08-19

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