ATE446666T1 - Gasentladungslampe - Google Patents

Gasentladungslampe

Info

Publication number
ATE446666T1
ATE446666T1 AT03792583T AT03792583T ATE446666T1 AT E446666 T1 ATE446666 T1 AT E446666T1 AT 03792583 T AT03792583 T AT 03792583T AT 03792583 T AT03792583 T AT 03792583T AT E446666 T1 ATE446666 T1 AT E446666T1
Authority
AT
Austria
Prior art keywords
discharge lamp
gas discharge
opening
charge carriers
external region
Prior art date
Application number
AT03792583T
Other languages
English (en)
Inventor
Dominik Vaudrevange
Klaus Bergmann
Original Assignee
Koninkl Philips Electronics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv filed Critical Koninkl Philips Electronics Nv
Application granted granted Critical
Publication of ATE446666T1 publication Critical patent/ATE446666T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/84—Lamps with discharge constricted by high pressure
    • H01J61/86—Lamps with discharge constricted by high pressure with discharge additionally constricted by close spacing of electrodes, e.g. for optical projection
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/04—Electrodes; Screens; Shields
    • H01J61/06—Main electrodes
    • H01J61/073—Main electrodes for high-pressure discharge lamps
    • H01J61/0732—Main electrodes for high-pressure discharge lamps characterised by the construction of the electrode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/04—Electrodes; Screens; Shields
    • H01J61/06—Main electrodes
    • H01J61/073—Main electrodes for high-pressure discharge lamps
    • H01J61/0735—Main electrodes for high-pressure discharge lamps characterised by the material of the electrode

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Incineration Of Waste (AREA)
  • Glass Compositions (AREA)
  • Vessels And Coating Films For Discharge Lamps (AREA)
AT03792583T 2002-08-21 2003-08-11 Gasentladungslampe ATE446666T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10238096A DE10238096B3 (de) 2002-08-21 2002-08-21 Gasentladungslampe
PCT/IB2003/003657 WO2004019662A1 (de) 2002-08-21 2003-08-11 Gasentladungslampe

Publications (1)

Publication Number Publication Date
ATE446666T1 true ATE446666T1 (de) 2009-11-15

Family

ID=30469797

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03792583T ATE446666T1 (de) 2002-08-21 2003-08-11 Gasentladungslampe

Country Status (9)

Country Link
US (1) US7323701B2 (de)
EP (1) EP1532848B1 (de)
JP (1) JP4563807B2 (de)
KR (1) KR100991995B1 (de)
AT (1) ATE446666T1 (de)
AU (1) AU2003255933A1 (de)
DE (1) DE10238096B3 (de)
TW (1) TWI339402B (de)
WO (1) WO2004019662A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6770895B2 (en) 2002-11-21 2004-08-03 Asml Holding N.V. Method and apparatus for isolating light source gas from main chamber gas in a lithography tool
DE10256663B3 (de) * 2002-12-04 2005-10-13 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Gasentladungslampe für EUV-Strahlung
US6919573B2 (en) 2003-03-20 2005-07-19 Asml Holding N.V Method and apparatus for recycling gases used in a lithography tool
DE10359464A1 (de) * 2003-12-17 2005-07-28 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen von insbesondere EUV-Strahlung und/oder weicher Röntgenstrahlung
DE102005025624B4 (de) * 2005-06-01 2010-03-18 Xtreme Technologies Gmbh Anordnung zur Erzeugung von intensiver kurzwelliger Strahlung auf Basis eines Gasentladungsplasmas
EP1883281B1 (de) * 2006-07-28 2012-09-05 Sage Innovations, Inc. Ein Verfahren zur Erzeugung eines Impuls-Strahles von energiereichen Teilchen, und Teilchenquelle dazu
US8227771B2 (en) * 2007-07-23 2012-07-24 Asml Netherlands B.V. Debris prevention system and lithographic apparatus

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3688946T2 (de) * 1985-04-30 1994-01-13 Nippon Telegraph & Telephone Röntgenstrahlungsquelle.
DE3927089C1 (de) * 1989-08-17 1991-04-25 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De
US5504795A (en) * 1995-02-06 1996-04-02 Plex Corporation Plasma X-ray source
JP2701775B2 (ja) * 1995-03-17 1998-01-21 日本電気株式会社 プラズマ処理装置
US6232613B1 (en) 1997-03-11 2001-05-15 University Of Central Florida Debris blocker/collector and emission enhancer for discharge sources
US6016027A (en) * 1997-05-19 2000-01-18 The Board Of Trustees Of The University Of Illinois Microdischarge lamp
DE19753696A1 (de) * 1997-12-03 1999-06-17 Fraunhofer Ges Forschung Vorrichtung und Verfahren zur Erzeugung von Extrem-Ultraviolettstrahlung und weicher Röntgenstrahlung aus einer Gasentladung
US6700326B1 (en) * 1999-06-14 2004-03-02 Osram Sylvania Inc. Edge sealing electrode for discharge lamp
DE19962160C2 (de) * 1999-06-29 2003-11-13 Fraunhofer Ges Forschung Vorrichtungen zur Erzeugung von Extrem-Ultraviolett- und weicher Röntgenstrahlung aus einer Gasentladung
TWI246872B (en) * 1999-12-17 2006-01-01 Asml Netherlands Bv Radiation source for use in lithographic projection apparatus
RU2206186C2 (ru) * 2000-07-04 2003-06-10 Государственный научный центр Российской Федерации Троицкий институт инновационных и термоядерных исследований Способ получения коротковолнового излучения из газоразрядной плазмы и устройство для его реализации
WO2002007484A2 (en) * 2000-07-04 2002-01-24 Lambda Physik Ag Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it
DE10139677A1 (de) * 2001-04-06 2002-10-17 Fraunhofer Ges Forschung Verfahren und Vorrichtung zum Erzeugen von extrem ultravioletter Strahlung und weicher Röntgenstrahlung
DE10151080C1 (de) * 2001-10-10 2002-12-05 Xtreme Tech Gmbh Einrichtung und Verfahren zum Erzeugen von extrem ultravioletter (EUV-)Strahlung auf Basis einer Gasentladung
DE10256663B3 (de) * 2002-12-04 2005-10-13 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Gasentladungslampe für EUV-Strahlung
DE102005041567B4 (de) * 2005-08-30 2009-03-05 Xtreme Technologies Gmbh EUV-Strahlungsquelle mit hoher Strahlungsleistung auf Basis einer Gasentladung

Also Published As

Publication number Publication date
WO2004019662A1 (de) 2004-03-04
TW200419614A (en) 2004-10-01
KR20050058347A (ko) 2005-06-16
EP1532848A1 (de) 2005-05-25
EP1532848B1 (de) 2009-10-21
JP4563807B2 (ja) 2010-10-13
KR100991995B1 (ko) 2010-11-04
JP2005536844A (ja) 2005-12-02
US20060113498A1 (en) 2006-06-01
AU2003255933A1 (en) 2004-03-11
US7323701B2 (en) 2008-01-29
TWI339402B (en) 2011-03-21
DE10238096B3 (de) 2004-02-19

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Legal Events

Date Code Title Description
REN Ceased due to non-payment of the annual fee