ATE457062T1 - System, verfahren und vorrichtung für ein mikrogefertigtes interferometer mit optischem strahlteiler - Google Patents

System, verfahren und vorrichtung für ein mikrogefertigtes interferometer mit optischem strahlteiler

Info

Publication number
ATE457062T1
ATE457062T1 AT07301406T AT07301406T ATE457062T1 AT E457062 T1 ATE457062 T1 AT E457062T1 AT 07301406 T AT07301406 T AT 07301406T AT 07301406 T AT07301406 T AT 07301406T AT E457062 T1 ATE457062 T1 AT E457062T1
Authority
AT
Austria
Prior art keywords
beam splitter
micro
medium
optical beam
half plane
Prior art date
Application number
AT07301406T
Other languages
English (en)
Inventor
Bassam Amanallah Saadany
Diaa Abdelmaguid Khalil
Tarik Essif Eddine Bourouina
Original Assignee
Si Ware Systems
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Si Ware Systems filed Critical Si Ware Systems
Application granted granted Critical
Publication of ATE457062T1 publication Critical patent/ATE457062T1/de

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02049—Interferometers characterised by particular mechanical design details
    • G01B9/02051—Integrated design, e.g. on-chip or monolithic
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0256—Compact construction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/45—Interferometric spectrometry
    • G01J3/453—Interferometric spectrometry by correlation of the amplitudes
    • G01J3/4535—Devices with moving mirror
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Spectrometry And Color Measurement (AREA)
AT07301406T 2006-09-28 2007-09-28 System, verfahren und vorrichtung für ein mikrogefertigtes interferometer mit optischem strahlteiler ATE457062T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US84801806P 2006-09-28 2006-09-28

Publications (1)

Publication Number Publication Date
ATE457062T1 true ATE457062T1 (de) 2010-02-15

Family

ID=38920731

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07301406T ATE457062T1 (de) 2006-09-28 2007-09-28 System, verfahren und vorrichtung für ein mikrogefertigtes interferometer mit optischem strahlteiler

Country Status (5)

Country Link
US (1) US7796267B2 (de)
EP (1) EP1906159B1 (de)
JP (1) JP5204450B2 (de)
AT (1) ATE457062T1 (de)
DE (1) DE602007004659D1 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5302020B2 (ja) 2009-01-26 2013-10-02 浜松ホトニクス株式会社 光モジュール
EP2475970B1 (de) * 2009-09-08 2021-11-03 SI-Ware Systems Kompensierte mems-ftir-spektrometerarchitektur
WO2011091012A2 (en) * 2010-01-19 2011-07-28 Si-Ware Systems Interferometer with variable optical path length reference mirror and applications thereof
EP2545406B1 (de) * 2010-03-09 2015-02-11 SI-Ware Systems Verfahren zur bestimmung der spiegelposition in optischen interferometern
JP5715481B2 (ja) * 2011-05-16 2015-05-07 浜松ホトニクス株式会社 光モジュール及びその製造方法
JP5739224B2 (ja) 2011-05-16 2015-06-24 浜松ホトニクス株式会社 光学部品の製造方法及び光学部品
WO2013059633A1 (en) * 2011-10-20 2013-04-25 Si-Ware Systems Integrated monolithic optical bench containing 3-d curved optical elements and methods of its fabrication
US8922787B2 (en) 2013-01-07 2014-12-30 Si-Ware Systems Spatial splitting-based optical MEMS interferometers
US9557556B2 (en) 2013-03-18 2017-01-31 Si-Ware Systems Integrated apertured micromirror and applications thereof
US9618323B2 (en) * 2013-08-19 2017-04-11 Hamamatsu Photonics K.K. Method for manufacturing optical interferometer
US9395465B2 (en) 2014-07-31 2016-07-19 Baker Hughes Incorporated Gravity and/or acceleration measurements using dual interferometer configurations
US10562055B2 (en) 2015-02-20 2020-02-18 Si-Ware Systems Selective step coverage for micro-fabricated structures
WO2017218778A1 (en) * 2016-06-15 2017-12-21 Si-Ware Systems Integrated spectral unit
JP6704833B2 (ja) * 2016-10-27 2020-06-03 浜松ホトニクス株式会社 位置検出方法及び光モジュール
FR3076357B1 (fr) * 2017-12-29 2021-10-22 Cailabs Cavite multi passage d’un dispositif optique de manipulation spatiale d’un rayonnement lumineux.
US11085825B2 (en) 2018-03-30 2021-08-10 Si-Ware Systems Self-referenced spectrometer
WO2020059607A1 (ja) * 2018-09-20 2020-03-26 住友精密工業株式会社 基板の加工方法
WO2020163492A1 (en) 2019-02-06 2020-08-13 California Institute Of Technology Compact hyperspectral mid-infrared spectrometer
US11313722B2 (en) 2019-11-08 2022-04-26 California Institute Of Technology Infrared spectrometer having dielectric-polymer-based spectral filter
US11635369B1 (en) 2021-11-02 2023-04-25 Saudi Arabian Oil Company Miniature FT-MIR using a MEMS interferometer with a metasurface emitter and detector
US11774289B2 (en) 2021-11-02 2023-10-03 Saudi Arabian Oil Company Micro-electromechanical system (MEMS) interferometer for FT-MIR spectroscopy

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US4632553A (en) 1985-02-25 1986-12-30 Nicolet Instrument Corporation Silicon beamsplitter
US5087124A (en) * 1989-05-09 1992-02-11 Smith Rosemary L Interferometric pressure sensor capable of high temperature operation and method of fabrication
US5159408A (en) * 1991-03-27 1992-10-27 Hughes Danbury Optical Systems, Inc. Optical thickness profiler using synthetic wavelengths
DE4241045C1 (de) 1992-12-05 1994-05-26 Bosch Gmbh Robert Verfahren zum anisotropen Ätzen von Silicium
US5628917A (en) * 1995-02-03 1997-05-13 Cornell Research Foundation, Inc. Masking process for fabricating ultra-high aspect ratio, wafer-free micro-opto-electromechanical structures
IL149016A0 (en) * 2002-04-07 2004-03-28 Green Vision Systems Ltd Green Method and device for real time high speed high resolution spectral imaging
US7180603B2 (en) * 2003-06-26 2007-02-20 Zygo Corporation Reduction of thermal non-cyclic error effects in interferometers
US7349072B2 (en) * 2003-10-09 2008-03-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20080204879A1 (en) * 2004-06-25 2008-08-28 Omar Manzardo Miniature Lamellar Grating Interferometer Based on Silicon Technology
CN101091100B (zh) * 2004-11-18 2011-06-08 摩根研究股份有限公司 微型傅立叶变换分光光度计
US7705994B2 (en) * 2005-11-23 2010-04-27 Agilent Technologies, Inc. Monolithic displacement measuring interferometer with spatially separated but substantially equivalent optical pathways and optional dual beam outputs
KR100737177B1 (ko) * 2006-05-15 2007-07-10 경북대학교 산학협력단 수직 공진 표면광 레이저를 이용한 간섭계
US7719693B2 (en) * 2007-04-23 2010-05-18 The Aerospace Corporation Interferometry system chamber viewing window

Also Published As

Publication number Publication date
DE602007004659D1 (de) 2010-03-25
JP2008102132A (ja) 2008-05-01
JP5204450B2 (ja) 2013-06-05
US20080080034A1 (en) 2008-04-03
EP1906159A1 (de) 2008-04-02
EP1906159B1 (de) 2010-02-03
US7796267B2 (en) 2010-09-14

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