ATE457517T1 - Nichtflüchtige cmis-halbleiterspeicherschaltung - Google Patents

Nichtflüchtige cmis-halbleiterspeicherschaltung

Info

Publication number
ATE457517T1
ATE457517T1 AT03782793T AT03782793T ATE457517T1 AT E457517 T1 ATE457517 T1 AT E457517T1 AT 03782793 T AT03782793 T AT 03782793T AT 03782793 T AT03782793 T AT 03782793T AT E457517 T1 ATE457517 T1 AT E457517T1
Authority
AT
Austria
Prior art keywords
transistor
semiconductor memory
memory circuit
volatile
transistors
Prior art date
Application number
AT03782793T
Other languages
English (en)
Inventor
Kazuyuki Nakamura
Original Assignee
Nscore Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nscore Inc filed Critical Nscore Inc
Application granted granted Critical
Publication of ATE457517T1 publication Critical patent/ATE457517T1/de

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C14/00—Digital stores characterised by arrangements of cells having volatile and non-volatile storage properties for back-up when the power is down
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C16/00—Erasable programmable read-only memories
    • G11C16/02—Erasable programmable read-only memories electrically programmable
    • G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0466—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells with charge storage in an insulating layer, e.g. metal-nitride-oxide-silicon [MNOS], silicon-oxide-nitride-oxide-silicon [SONOS]

Landscapes

  • Static Random-Access Memory (AREA)
  • Read Only Memory (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Semiconductor Memories (AREA)
  • Non-Volatile Memory (AREA)
AT03782793T 2002-12-19 2003-12-17 Nichtflüchtige cmis-halbleiterspeicherschaltung ATE457517T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002367648A JP4169592B2 (ja) 2002-12-19 2002-12-19 Ｃｍｉｓ型半導体不揮発記憶回路
PCT/JP2003/016143 WO2004057621A1 (ja) 2002-12-19 2003-12-17 Ｃｍｉｓ型半導体不揮発記憶回路

Publications (1)

Publication Number Publication Date
ATE457517T1 true ATE457517T1 (de) 2010-02-15

Family

ID=32677087

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03782793T ATE457517T1 (de) 2002-12-19 2003-12-17 Nichtflüchtige cmis-halbleiterspeicherschaltung

Country Status (8)

Country Link
US (2) US7151706B2 (de)
EP (1) EP1575055B1 (de)
JP (1) JP4169592B2 (de)
CN (1) CN1726562B (de)
AT (1) ATE457517T1 (de)
AU (1) AU2003292559A1 (de)
DE (1) DE60331244D1 (de)
WO (1) WO2004057621A1 (de)

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WO2005096314A1 (ja) 2004-03-31 2005-10-13 Kitakyushu Foundation For The Advancement Of Industry, Science And Technology 半導体不揮発記憶回路
US8114719B2 (en) * 2004-06-03 2012-02-14 Semiconductor Energy Laboratory Co., Ltd. Memory device and manufacturing method of the same
JP2006127737A (ja) 2004-09-30 2006-05-18 Nscore:Kk 不揮発性メモリ回路
US7193888B2 (en) 2005-07-13 2007-03-20 Nscore Inc. Nonvolatile memory circuit based on change in MIS transistor characteristics
US7149104B1 (en) 2005-07-13 2006-12-12 Nscore Inc. Storage and recovery of data based on change in MIS transistor characteristics
US7835196B2 (en) 2005-10-03 2010-11-16 Nscore Inc. Nonvolatile memory device storing data based on change in transistor characteristics
US7321505B2 (en) 2006-03-03 2008-01-22 Nscore, Inc. Nonvolatile memory utilizing asymmetric characteristics of hot-carrier effect
JP2007273065A (ja) * 2006-03-31 2007-10-18 Nscore:Kk Ｃｍｉｓ型半導体不揮発記憶回路
US7414903B2 (en) * 2006-04-28 2008-08-19 Nscore Inc. Nonvolatile memory device with test mechanism
US20080019162A1 (en) 2006-07-21 2008-01-24 Taku Ogura Non-volatile semiconductor storage device
JP4955340B2 (ja) 2006-08-22 2012-06-20 ルネサスエレクトロニクス株式会社 半導体記憶装置
JP2008103011A (ja) * 2006-10-18 2008-05-01 National Institute Of Advanced Industrial & Technology 半導体不揮発性メモリ回路および装置
US7561471B2 (en) * 2006-12-26 2009-07-14 Spansion Llc Cycling improvement using higher erase bias
US7483290B2 (en) 2007-02-02 2009-01-27 Nscore Inc. Nonvolatile memory utilizing hot-carrier effect with data reversal function
JP2008217972A (ja) * 2007-02-28 2008-09-18 Samsung Electronics Co Ltd 不揮発性メモリ素子の作動方法
US8018781B2 (en) * 2007-02-28 2011-09-13 Samsung Electronics, Co., Ltd. Method of operating nonvolatile memory device
US7518917B2 (en) 2007-07-11 2009-04-14 Nscore Inc. Nonvolatile memory utilizing MIS memory transistors capable of multiple store operations
US7542341B2 (en) 2007-08-20 2009-06-02 Nscore, Inc. MIS-transistor-based nonvolatile memory device with verify function
US7460400B1 (en) 2007-08-22 2008-12-02 Nscore Inc. Nonvolatile memory utilizing MIS memory transistors with bit mask function
US7463519B1 (en) 2007-08-22 2008-12-09 Nscore Inc. MIS-transistor-based nonvolatile memory device for authentication
JP2009076566A (ja) * 2007-09-19 2009-04-09 Nec Electronics Corp 不揮発性半導体記憶装置
US8106443B2 (en) * 2007-10-09 2012-01-31 Genusion, Inc. Non-volatile semiconductor memory device
US8492826B2 (en) * 2007-10-09 2013-07-23 Genusion, Inc. Non-volatile semiconductor memory device and manufacturing method thereof
US7511999B1 (en) 2007-11-06 2009-03-31 Nscore Inc. MIS-transistor-based nonvolatile memory with reliable data retention capability
US7630247B2 (en) 2008-02-25 2009-12-08 Nscore Inc. MIS-transistor-based nonvolatile memory
US7639546B2 (en) 2008-02-26 2009-12-29 Nscore Inc. Nonvolatile memory utilizing MIS memory transistors with function to correct data reversal
US7733714B2 (en) 2008-06-16 2010-06-08 Nscore Inc. MIS-transistor-based nonvolatile memory for multilevel data storage
US7821806B2 (en) 2008-06-18 2010-10-26 Nscore Inc. Nonvolatile semiconductor memory circuit utilizing a MIS transistor as a memory cell
JP4908472B2 (ja) 2008-08-26 2012-04-04 株式会社東芝 半導体集積記憶回路及びラッチ回路のトリミング方法
JP5442235B2 (ja) 2008-11-06 2014-03-12 ルネサスエレクトロニクス株式会社 半導体装置の製造方法および半導体装置
US7791927B1 (en) 2009-02-18 2010-09-07 Nscore Inc. Mis-transistor-based nonvolatile memory circuit with stable and enhanced performance
US8213247B2 (en) 2009-11-16 2012-07-03 Nscore Inc. Memory device with test mechanism
US8259505B2 (en) 2010-05-28 2012-09-04 Nscore Inc. Nonvolatile memory device with reduced current consumption
JP5503433B2 (ja) * 2010-07-01 2014-05-28 ローム株式会社 半導体不揮発記憶回路及びその試験方法
US8451657B2 (en) 2011-02-14 2013-05-28 Nscore, Inc. Nonvolatile semiconductor memory device using MIS transistor
JP5888917B2 (ja) * 2011-09-27 2016-03-22 ラピスセミコンダクタ株式会社 半導体メモリ
JP5522296B2 (ja) * 2013-06-03 2014-06-18 凸版印刷株式会社 不揮発性半導体記憶装置
US9159404B2 (en) 2014-02-26 2015-10-13 Nscore, Inc. Nonvolatile memory device
JP5760106B2 (ja) * 2014-03-14 2015-08-05 ローム株式会社 半導体不揮発記憶回路及びその試験方法
CN104299648B (zh) * 2014-09-25 2017-12-26 苏州宽温电子科技有限公司 一种差分架构只读存储单元
JP6063003B2 (ja) * 2015-06-08 2017-01-18 ローム株式会社 半導体不揮発記憶回路及びその試験方法
US9484072B1 (en) 2015-10-06 2016-11-01 Nscore, Inc. MIS transistors configured to be placed in programmed state and erased state
US9966141B2 (en) 2016-02-19 2018-05-08 Nscore, Inc. Nonvolatile memory cell employing hot carrier effect for data storage
CN106571162B (zh) * 2016-11-02 2023-06-16 上扬无线射频科技扬州有限公司 Cmos非易失存储器单元电路
US9653152B1 (en) 2016-11-15 2017-05-16 Qualcomm Incorporated Low voltage high sigma multi-port memory control
JP6220041B2 (ja) * 2016-12-15 2017-10-25 ローム株式会社 半導体不揮発記憶回路及びその試験方法
DE112021003866T5 (de) * 2020-09-18 2023-05-04 Rohm Co., Ltd. Nichtflüchtiger speicher
JP2024074160A (ja) * 2022-11-18 2024-05-30 株式会社NSCore 半導体記憶装置

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GB2091510B (en) 1981-01-09 1984-06-20 Plessey Co Ltd Non-volatile static ram element
JPS5837896A (ja) * 1981-08-31 1983-03-05 Fujitsu Ltd Ｍｏｓダイナミック回路
JPH0676582A (ja) * 1992-08-27 1994-03-18 Hitachi Ltd 半導体装置
JPH06231587A (ja) * 1993-02-02 1994-08-19 Toshiba Corp プログラマブルイニシャル設定回路
JPH07226088A (ja) 1994-02-15 1995-08-22 Nippon Steel Corp 半導体記憶装置
US5687114A (en) * 1995-10-06 1997-11-11 Agate Semiconductor, Inc. Integrated circuit for storage and retrieval of multiple digital bits per nonvolatile memory cell
JP3543905B2 (ja) * 1997-03-19 2004-07-21 シャープ株式会社 半導体記憶装置
US5956269A (en) 1997-11-05 1999-09-21 Industrial Technology Research Institute Non-volatile SRAM
US6038168A (en) * 1998-06-26 2000-03-14 International Business Machines Corporation Hot-electron programmable latch for integrated circuit fuse applications and method of programming therefor
US6521958B1 (en) 1999-08-26 2003-02-18 Micron Technology, Inc. MOSFET technology for programmable address decode and correction
JP4530464B2 (ja) * 2000-03-09 2010-08-25 ルネサスエレクトロニクス株式会社 半導体集積回路
JP2001358313A (ja) * 2000-06-14 2001-12-26 Hitachi Ltd 半導体装置
JP3954302B2 (ja) * 2000-12-06 2007-08-08 株式会社東芝 半導体集積回路
US6853587B2 (en) 2002-06-21 2005-02-08 Micron Technology, Inc. Vertical NROM having a storage density of 1 bit per 1F2
US6906962B2 (en) 2002-09-30 2005-06-14 Agere Systems Inc. Method for defining the initial state of static random access memory

Also Published As

Publication number Publication date
US7248507B2 (en) 2007-07-24
EP1575055A1 (de) 2005-09-14
US20070091663A1 (en) 2007-04-26
US7151706B2 (en) 2006-12-19
JP2005353106A (ja) 2005-12-22
CN1726562B (zh) 2011-01-12
EP1575055B1 (de) 2010-02-10
JP4169592B2 (ja) 2008-10-22
AU2003292559A1 (en) 2004-07-14
EP1575055A4 (de) 2007-06-27
WO2004057621A1 (ja) 2004-07-08
CN1726562A (zh) 2006-01-25
DE60331244D1 (de) 2010-03-25
US20050232009A1 (en) 2005-10-20

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