ATE458278T1 - Magnetvorrichtung, die einen magnetoresistiven stapel und mindestens einen nanokontakt umfasst - Google Patents
Magnetvorrichtung, die einen magnetoresistiven stapel und mindestens einen nanokontakt umfasstInfo
- Publication number
- ATE458278T1 ATE458278T1 AT09356014T AT09356014T ATE458278T1 AT E458278 T1 ATE458278 T1 AT E458278T1 AT 09356014 T AT09356014 T AT 09356014T AT 09356014 T AT09356014 T AT 09356014T AT E458278 T1 ATE458278 T1 AT E458278T1
- Authority
- AT
- Austria
- Prior art keywords
- nanocontact
- stack
- electrode
- magnetorresistive
- magnetic device
- Prior art date
Links
- 230000005291 magnetic effect Effects 0.000 title abstract 2
- 239000003792 electrolyte Substances 0.000 abstract 1
- 239000003302 ferromagnetic material Substances 0.000 abstract 1
- 239000000696 magnetic material Substances 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 239000007784 solid electrolyte Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/10—Magnetoresistive devices
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03B—GENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING, BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN A NON-SWITCHING MANNER; GENERATION OF NOISE BY SUCH CIRCUITS
- H03B15/00—Generation of oscillations using galvano-magnetic devices, e.g. Hall-effect devices, or using superconductivity effects
- H03B15/006—Generation of oscillations using galvano-magnetic devices, e.g. Hall-effect devices, or using superconductivity effects using spin transfer effects or giant magnetoresistance
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B61/00—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Hall/Mr Elements (AREA)
- Mram Or Spin Memory Techniques (AREA)
- Thin Magnetic Films (AREA)
- Magnetic Heads (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0852236A FR2929759B1 (fr) | 2008-04-03 | 2008-04-03 | Dispositif magnetique integrant un empilement magnetoresistif |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE458278T1 true ATE458278T1 (de) | 2010-03-15 |
Family
ID=39864814
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT09356014T ATE458278T1 (de) | 2008-04-03 | 2009-02-19 | Magnetvorrichtung, die einen magnetoresistiven stapel und mindestens einen nanokontakt umfasst |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8148709B2 (de) |
| EP (1) | EP2107623B1 (de) |
| JP (1) | JP2009267369A (de) |
| AT (1) | ATE458278T1 (de) |
| DE (1) | DE602009000005D1 (de) |
| FR (1) | FR2929759B1 (de) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2939256B1 (fr) * | 2008-12-01 | 2011-06-17 | Commissariat Energie Atomique | Oscillateur radiofrequence a vanne de spin ou a jonction tunnel |
| KR20110008553A (ko) * | 2009-07-20 | 2011-01-27 | 삼성전자주식회사 | 반도체 메모리 장치 및 그 제조 방법 |
| US8164861B2 (en) * | 2009-12-11 | 2012-04-24 | Hitachi Global Storage Technologies Netherlands B.V. | Spin torque oscillator sensor employing antiparallel coupled oscilation layers |
| FR2969425B1 (fr) * | 2010-12-16 | 2013-08-23 | Commissariat Energie Atomique | Circuit oscillant a jonctions a effet de magnétorésistance géante |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6734455B2 (en) * | 2001-03-15 | 2004-05-11 | Micron Technology, Inc. | Agglomeration elimination for metal sputter deposition of chalcogenides |
| US6730949B2 (en) * | 2001-03-22 | 2004-05-04 | Kabushiki Kaisha Toshiba | Magnetoresistance effect device |
| US6709958B2 (en) * | 2001-08-30 | 2004-03-23 | Micron Technology, Inc. | Integrated circuit device and fabrication using metal-doped chalcogenide materials |
| US20030047765A1 (en) * | 2001-08-30 | 2003-03-13 | Campbell Kristy A. | Stoichiometry for chalcogenide glasses useful for memory devices and method of formation |
| US6963500B2 (en) * | 2003-03-14 | 2005-11-08 | Applied Spintronics Technology, Inc. | Magnetic tunneling junction cell array with shared reference layer for MRAM applications |
| EP1548702A1 (de) * | 2003-12-24 | 2005-06-29 | Interuniversitair Microelektronica Centrum Vzw | Verfahren zur superschnellen Steuerung magnetischer Zelle sowie zugehörige Vorrichtungen |
| JP4877575B2 (ja) * | 2005-05-19 | 2012-02-15 | 日本電気株式会社 | 磁気ランダムアクセスメモリ |
| JP4504273B2 (ja) * | 2005-07-06 | 2010-07-14 | 株式会社東芝 | 磁気抵抗効果素子および磁気メモリ |
| US7635903B2 (en) * | 2005-09-13 | 2009-12-22 | Everspin Technologies, Inc. | Oscillator and method of manufacture |
| JP4444241B2 (ja) * | 2005-10-19 | 2010-03-31 | 株式会社東芝 | 磁気抵抗効果素子、磁気ランダムアクセスメモリ、電子カード及び電子装置 |
| FR2892871B1 (fr) * | 2005-11-02 | 2007-11-23 | Commissariat Energie Atomique | Oscillateur radio frequence a courant elelctrique polarise en spin |
| US7732881B2 (en) * | 2006-11-01 | 2010-06-08 | Avalanche Technology, Inc. | Current-confined effect of magnetic nano-current-channel (NCC) for magnetic random access memory (MRAM) |
| FR2904724B1 (fr) * | 2006-08-03 | 2011-03-04 | Commissariat Energie Atomique | Dispositif magnetique en couches minces a forte polarisation en spin perpendiculaire au plan des couches, jonction tunnel magnetique et vanne de spin mettant en oeuvre un tel dispositif |
| US7532506B2 (en) * | 2007-09-17 | 2009-05-12 | Qimonda Ag | Integrated circuit, cell arrangement, method of operating an integrated circuit, memory module |
| US7936027B2 (en) * | 2008-01-07 | 2011-05-03 | Magic Technologies, Inc. | Method of MRAM fabrication with zero electrical shorting |
| FR2939256B1 (fr) * | 2008-12-01 | 2011-06-17 | Commissariat Energie Atomique | Oscillateur radiofrequence a vanne de spin ou a jonction tunnel |
-
2008
- 2008-04-03 FR FR0852236A patent/FR2929759B1/fr not_active Expired - Fee Related
-
2009
- 2009-02-05 US US12/366,011 patent/US8148709B2/en not_active Expired - Fee Related
- 2009-02-19 DE DE602009000005T patent/DE602009000005D1/de active Active
- 2009-02-19 AT AT09356014T patent/ATE458278T1/de not_active IP Right Cessation
- 2009-02-19 EP EP09356014A patent/EP2107623B1/de active Active
- 2009-02-25 JP JP2009042819A patent/JP2009267369A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| FR2929759B1 (fr) | 2010-04-16 |
| EP2107623A1 (de) | 2009-10-07 |
| US8148709B2 (en) | 2012-04-03 |
| JP2009267369A (ja) | 2009-11-12 |
| FR2929759A1 (fr) | 2009-10-09 |
| DE602009000005D1 (de) | 2010-04-01 |
| US20090250775A1 (en) | 2009-10-08 |
| EP2107623B1 (de) | 2010-02-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP2605283A3 (de) | In-situ-gewachsenes Gate-Dielektrikum und Feldplatten-Dielektrikum | |
| GB2495826B (en) | Patterning contacts in carbon nanotube devices | |
| JP2012084865A5 (ja) | 半導体装置の作製方法 | |
| SG196852A1 (en) | Semiconductor device and method of forming interconnect structure over seed layer on contact pad of semiconductor die without undercutting seed layer beneath interconnect structure | |
| EP2575180A3 (de) | Verbundhalbleiterbauelement und Herstellungsverfahren dafür | |
| JP2012068627A5 (ja) | 半導体装置の作製方法 | |
| WO2012143784A8 (en) | Semiconductor device and manufacturing method thereof | |
| JP2011086927A5 (ja) | 半導体装置 | |
| WO2013025994A3 (en) | Spin hall effect magnetic apparatus, method and applications | |
| EP2317558A3 (de) | Halbleitervorrichtung, Herstellungsverfahren und elektronische Vorrichtung | |
| WO2014028598A3 (en) | Method of manufacturing a magnetoresistive-based device | |
| JP2011501420A5 (de) | ||
| WO2013049042A3 (en) | Coalesced nanowire structures with interstitial voids and method for manufacturing the same | |
| FR2830971B1 (fr) | Dispositif magnetoresistif a vanne de spin a performances ameliorees | |
| WO2009126204A8 (en) | High aspect ratio openings | |
| WO2011088375A3 (en) | Spin torque driven magnetic tunnel junction with non-uniform current path and composite hardmask architecture for forming the same | |
| ATE361475T1 (de) | Synthetisch antiferromagnetische struktur für ein magnetoelektronisches gerät | |
| TW200746237A (en) | Method for making an electronic device including a poled superlattice having a net electrical dipole moment | |
| EP2453635A3 (de) | Tragbares Endgerät und Verfahren zu dessen Herstellung | |
| GB201111513D0 (en) | Memory resistors | |
| SG195087A1 (en) | Superconducting element for superconducting current limiter, method for manufacturing superconducting element for superconducting current limiter, and superconducting current limiter | |
| SG178945A1 (en) | A sensor arrangement | |
| FR2973163B1 (fr) | Dispositif constitue de différentes couches minces et utilisation d'un tel dispositif | |
| ATE458278T1 (de) | Magnetvorrichtung, die einen magnetoresistiven stapel und mindestens einen nanokontakt umfasst | |
| EP2731133A3 (de) | Verbindungsstruktur und Herstellung davon |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |