ATE460742T1 - Aberrations-korrigierter optischer apparat für geladene teilchen - Google Patents

Aberrations-korrigierter optischer apparat für geladene teilchen

Info

Publication number
ATE460742T1
ATE460742T1 AT03253955T AT03253955T ATE460742T1 AT E460742 T1 ATE460742 T1 AT E460742T1 AT 03253955 T AT03253955 T AT 03253955T AT 03253955 T AT03253955 T AT 03253955T AT E460742 T1 ATE460742 T1 AT E460742T1
Authority
AT
Austria
Prior art keywords
charged
aberrations
aberration
particle
order
Prior art date
Application number
AT03253955T
Other languages
English (en)
Inventor
Ondrej L Krivanek
Peter D Nellist
Niklas Dellby
Original Assignee
Nion Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nion Co filed Critical Nion Co
Application granted granted Critical
Publication of ATE460742T1 publication Critical patent/ATE460742T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
AT03253955T 2002-07-08 2003-06-23 Aberrations-korrigierter optischer apparat für geladene teilchen ATE460742T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/189,855 US6770887B2 (en) 2002-07-08 2002-07-08 Aberration-corrected charged-particle optical apparatus

Publications (1)

Publication Number Publication Date
ATE460742T1 true ATE460742T1 (de) 2010-03-15

Family

ID=29735271

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03253955T ATE460742T1 (de) 2002-07-08 2003-06-23 Aberrations-korrigierter optischer apparat für geladene teilchen

Country Status (4)

Country Link
US (1) US6770887B2 (de)
EP (1) EP1381073B1 (de)
AT (1) ATE460742T1 (de)
DE (1) DE60331620D1 (de)

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DE10159454B4 (de) * 2001-12-04 2012-08-02 Carl Zeiss Nts Gmbh Korrektor zur Korrektion von Farbfehlern erster Ordnung, ersten Grades
US6924488B2 (en) * 2002-06-28 2005-08-02 Jeol Ltd. Charged-particle beam apparatus equipped with aberration corrector
US7080544B2 (en) * 2002-08-23 2006-07-25 Firemaster Oilfield Services Inc. Apparatus system and method for gas well site monitoring
US7015481B2 (en) * 2003-02-14 2006-03-21 Jeol Ltd. Charged-particle optical system
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US7164139B1 (en) * 2005-02-01 2007-01-16 Kla-Tencor Technologies Corporation Wien filter with reduced chromatic aberration
JP2006216396A (ja) * 2005-02-04 2006-08-17 Hitachi High-Technologies Corp 荷電粒子線装置
TWI415162B (zh) * 2005-03-03 2013-11-11 Toshiba Kk 映像投影型電子線裝置及使用該裝置之缺陷檢查系統
US20090014649A1 (en) * 2005-03-22 2009-01-15 Ebara Corporation Electron beam apparatus
JP5373251B2 (ja) * 2005-04-05 2013-12-18 エフ イー アイ カンパニ 収差補正手段を備える粒子光学装置
TW201101476A (en) * 2005-06-02 2011-01-01 Sony Corp Semiconductor image sensor module and method of manufacturing the same
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JP4851148B2 (ja) * 2005-09-27 2012-01-11 日本電子株式会社 電子顕微鏡
JP2007128656A (ja) * 2005-11-01 2007-05-24 Jeol Ltd 収差補正装置を備えた荷電粒子ビーム装置
EP1783811A3 (de) * 2005-11-02 2008-02-27 FEI Company Korrektor zur Korrektion von chromatischen Aberrationen in einem korpuskularoptiachen Apparat
EP1958231B1 (de) * 2005-12-06 2018-05-23 Ceos Corrected Electron Optical Systems GmbH Korrektiv zur beseitigung des öffnungsfehlers 3. ordnung und des axialen farbfehlers 1. ordnung 1. grades
JP2007335125A (ja) * 2006-06-13 2007-12-27 Ebara Corp 電子線装置
WO2008113079A1 (en) * 2007-03-15 2008-09-18 Multibeam Systems, Inc. Charged particle optics with azimuthally-varying third-order aberrations for generation of shaped beams
DE102007058443B4 (de) * 2007-12-05 2010-05-06 Ceos Corrected Electron Optical Systems Gmbh Korrektor für axialen und außeraxialen Strahlengang und TEM damit
JP4533441B2 (ja) * 2008-03-13 2010-09-01 株式会社日立製作所 荷電粒子装置の球面収差を補正する収差補正装置
JP4533444B2 (ja) * 2008-03-31 2010-09-01 株式会社日立製作所 透過型電子顕微鏡用収差補正器
EP2166557A1 (de) * 2008-09-22 2010-03-24 FEI Company Verfahren zur Berichtigung von Verzerrungen in einer teilchenoptischen Vorrichtung
DE102009010774A1 (de) * 2009-02-26 2010-11-11 Ceos Corrected Electron Optical Systems Gmbh Verfahren und Vorrichtung zur Bildkontrasterzeugung durch Phasenschiebung
US8217352B2 (en) * 2009-09-11 2012-07-10 Lawrence Livermore National Security, Llc Ponderomotive phase plate for transmission electron microscopes
EP2325862A1 (de) * 2009-11-18 2011-05-25 Fei Company Korrektor für axiale Aberrationen einer teilchenoptischen Linse
US20110168888A1 (en) * 2010-01-11 2011-07-14 Lawrence Livermore National Security, Llc Weak-lens coupling of high current electron sources to electron microscope columns
JP5502595B2 (ja) * 2010-05-18 2014-05-28 日本電子株式会社 球面収差補正装置および球面収差補正方法
DE102010054541A1 (de) * 2010-12-15 2012-06-21 Ceos Corrected Electron Optical Systems Gmbh Korrektor
DE102011009954A1 (de) * 2011-02-01 2012-08-02 Ceos Corrected Electron Optical Systems Gmbh Korrektor
EP2511936B1 (de) 2011-04-13 2013-10-02 Fei Company Verzerrungsfreie Stigmation eines TEM
US9275817B2 (en) 2012-04-09 2016-03-01 Frederick Wight Martin Particle-beam column corrected for both chromatic and spherical aberration
JP5993668B2 (ja) * 2012-09-05 2016-09-14 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP6261228B2 (ja) * 2013-07-31 2018-01-17 株式会社日立ハイテクノロジーズ 集束イオンビーム装置、集束イオン／電子ビーム加工観察装置、及び試料加工方法
JP6326303B2 (ja) * 2014-06-18 2018-05-16 日本電子株式会社 収差計測角度範囲計算装置、収差計測角度範囲計算方法、および電子顕微鏡
US10727024B2 (en) 2016-08-23 2020-07-28 Hitachi High-Technologies Corporation Charged particle beam device and aberration correction method for charged particle beam device
US11114271B2 (en) * 2019-11-22 2021-09-07 Fei Company Sixth-order and above corrected STEM multipole correctors
US11239045B1 (en) * 2020-09-30 2022-02-01 Fei Company Method and system for correcting two-fold, fifth-order parasitic aberrations in charged particle systems
WO2022153367A1 (ja) * 2021-01-12 2022-07-21 株式会社日立ハイテク 収差補正装置及び電子顕微鏡
US20240420915A1 (en) * 2022-03-31 2024-12-19 Hitachi High-Tech Corporation Charged particle beam device

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Also Published As

Publication number Publication date
US6770887B2 (en) 2004-08-03
DE60331620D1 (de) 2010-04-22
US20040004192A1 (en) 2004-01-08
EP1381073A1 (de) 2004-01-14
EP1381073B1 (de) 2010-03-10

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