ATE463736T1 - Optisches system zur detektion von anomalien und/oder charakteristika von oberflächen - Google Patents

Optisches system zur detektion von anomalien und/oder charakteristika von oberflächen

Info

Publication number
ATE463736T1
ATE463736T1 AT04756129T AT04756129T ATE463736T1 AT E463736 T1 ATE463736 T1 AT E463736T1 AT 04756129 T AT04756129 T AT 04756129T AT 04756129 T AT04756129 T AT 04756129T AT E463736 T1 ATE463736 T1 AT E463736T1
Authority
AT
Austria
Prior art keywords
channels
detector arrays
employed
inspected
lines
Prior art date
Application number
AT04756129T
Other languages
English (en)
Inventor
Isabella Lewis
Mehdi Vaez-Iravani
Original Assignee
Kla Tencor Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kla Tencor Tech Corp filed Critical Kla Tencor Tech Corp
Application granted granted Critical
Publication of ATE463736T1 publication Critical patent/ATE463736T1/de

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95623—Inspecting patterns on the surface of objects using a spatial filtering method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/4738—Diffuse reflection, e.g. also for testing fluids, fibrous materials
    • G01N21/474—Details of optical heads therefor, e.g. using optical fibres
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
AT04756129T 2003-06-24 2004-06-24 Optisches system zur detektion von anomalien und/oder charakteristika von oberflächen ATE463736T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US48253903P 2003-06-24 2003-06-24
US10/874,861 US7365834B2 (en) 2003-06-24 2004-06-22 Optical system for detecting anomalies and/or features of surfaces
PCT/US2004/020483 WO2005003746A1 (en) 2003-06-24 2004-06-24 Optical system for detecting anomalies and/or features of surfaces

Publications (1)

Publication Number Publication Date
ATE463736T1 true ATE463736T1 (de) 2010-04-15

Family

ID=33567651

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04756129T ATE463736T1 (de) 2003-06-24 2004-06-24 Optisches system zur detektion von anomalien und/oder charakteristika von oberflächen

Country Status (7)

Country Link
US (2) US7365834B2 (de)
EP (1) EP1636573B1 (de)
JP (2) JP4838122B2 (de)
KR (1) KR101128717B1 (de)
AT (1) ATE463736T1 (de)
DE (1) DE602004026442D1 (de)
WO (1) WO2005003746A1 (de)

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WO2019016856A1 (ja) 2017-07-18 2019-01-24 株式会社日立ハイテクノロジーズ 欠陥検査装置およびパターンチップ
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WO2021024319A1 (ja) * 2019-08-02 2021-02-11 株式会社日立ハイテク 欠陥検査装置および欠陥検査方法
US12366538B2 (en) 2020-04-02 2025-07-22 Hitachi High-Tech Corporation Defect inspection apparatus and defect inspection method
JP7738648B2 (ja) * 2020-09-16 2025-09-12 エーエスエムエル ネザーランズ ビー．ブイ． メトロロジを実行する方法、機械学習モデルを訓練する方法、２次元材料を含む層を提供する方法、メトロロジ装置
KR102865108B1 (ko) * 2020-12-18 2025-09-26 삼성디스플레이 주식회사 다결정 실리콘층의 제조 방법, 표시 장치 및 표시 장치의 제조 방법
WO2022162881A1 (ja) 2021-01-29 2022-08-04 株式会社日立ハイテク 欠陥検査装置
WO2023152848A1 (ja) * 2022-02-09 2023-08-17 株式会社日立ハイテク 欠陥検査装置及び欠陥検査方法
CN114705133B (zh) * 2022-04-15 2023-05-26 电子科技大学 一种高度不连续镜面三维面形检测系统及方法
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JP2024082253A (ja) * 2022-12-07 2024-06-19 ネクスティン，インコーポレイテッド リアルタイム可変機能を有する暗視野検査装置
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Also Published As

Publication number Publication date
US20050052644A1 (en) 2005-03-10
US7679735B2 (en) 2010-03-16
EP1636573B1 (de) 2010-04-07
EP1636573A1 (de) 2006-03-22
JP2012021994A (ja) 2012-02-02
US20080165343A1 (en) 2008-07-10
DE602004026442D1 (de) 2010-05-20
WO2005003746A1 (en) 2005-01-13
KR20060052712A (ko) 2006-05-19
US7365834B2 (en) 2008-04-29
KR101128717B1 (ko) 2012-03-23
JP2007524832A (ja) 2007-08-30
JP4838122B2 (ja) 2011-12-14

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