ATE470888T1 - Kollektoren in zwei hemispheren - Google Patents

Kollektoren in zwei hemispheren

Info

Publication number
ATE470888T1
ATE470888T1 AT03816709T AT03816709T ATE470888T1 AT E470888 T1 ATE470888 T1 AT E470888T1 AT 03816709 T AT03816709 T AT 03816709T AT 03816709 T AT03816709 T AT 03816709T AT E470888 T1 ATE470888 T1 AT E470888T1
Authority
AT
Austria
Prior art keywords
hemisphere
source
hemispheres
collectors
radiation
Prior art date
Application number
AT03816709T
Other languages
English (en)
Inventor
Michael Goldstein
Peter Silverman
Original Assignee
Intel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Intel Corp filed Critical Intel Corp
Application granted granted Critical
Publication of ATE470888T1 publication Critical patent/ATE470888T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Secondary Cells (AREA)
  • Amplifiers (AREA)
  • Medicines Containing Material From Animals Or Micro-Organisms (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
AT03816709T 2003-03-20 2003-12-15 Kollektoren in zwei hemispheren ATE470888T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/394,412 US7034320B2 (en) 2003-03-20 2003-03-20 Dual hemispherical collectors
PCT/US2003/040315 WO2004095140A2 (en) 2003-03-20 2003-12-15 Collectors in two hemispheres

Publications (1)

Publication Number Publication Date
ATE470888T1 true ATE470888T1 (de) 2010-06-15

Family

ID=32988377

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03816709T ATE470888T1 (de) 2003-03-20 2003-12-15 Kollektoren in zwei hemispheren

Country Status (9)

Country Link
US (2) US7034320B2 (de)
EP (1) EP1604246B1 (de)
KR (1) KR100737645B1 (de)
CN (1) CN1729431B (de)
AT (1) ATE470888T1 (de)
AU (1) AU2003301038A1 (de)
DE (1) DE60332966D1 (de)
TW (1) TWI232351B (de)
WO (1) WO2004095140A2 (de)

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US7405871B2 (en) * 2005-02-08 2008-07-29 Intel Corporation Efficient EUV collector designs
US7482609B2 (en) * 2005-02-28 2009-01-27 Cymer, Inc. LPP EUV light source drive laser system
US7465943B2 (en) * 2005-12-08 2008-12-16 Asml Netherlands B.V. Controlling the flow through the collector during cleaning
EP1901126B1 (de) 2006-09-15 2011-10-12 Media Lario s.r.l. Optisches Kollektorsystem
US20080237498A1 (en) * 2007-01-29 2008-10-02 Macfarlane Joseph J High-efficiency, low-debris short-wavelength light sources
US8901521B2 (en) * 2007-08-23 2014-12-02 Asml Netherlands B.V. Module and method for producing extreme ultraviolet radiation
EP2182412A1 (de) * 2008-11-04 2010-05-05 ASML Netherlands B.V. Strahlungsquelle und lithografische Vorrichtung
WO2011100322A2 (en) 2010-02-09 2011-08-18 Energetiq Technology, Inc. Laser-driven light source
DE102010028655A1 (de) 2010-05-06 2011-11-10 Carl Zeiss Smt Gmbh EUV-Kollektor
US9057962B2 (en) * 2010-06-18 2015-06-16 Media Lario S.R.L. Source-collector module with GIC mirror and LPP EUV light source
DE102011084266A1 (de) 2011-10-11 2013-04-11 Carl Zeiss Smt Gmbh Kollektor
DE102012220465A1 (de) 2012-11-09 2014-05-15 Carl Zeiss Smt Gmbh EUV-Kollektor
DE102013204441A1 (de) 2013-03-14 2014-04-03 Carl Zeiss Smt Gmbh Kollektor
DE102013218132A1 (de) 2013-09-11 2015-03-12 Carl Zeiss Smt Gmbh Kollektor
DE102013218128A1 (de) 2013-09-11 2015-03-12 Carl Zeiss Smt Gmbh Beleuchtungssystem
IL234729B (en) 2013-09-20 2021-02-28 Asml Netherlands Bv A light source operated by a laser and a method using a mode mixer
IL234727B (en) 2013-09-20 2020-09-30 Asml Netherlands Bv A light source operated by a laser in an optical system corrected for deviations and the method of manufacturing the system as mentioned
US10186416B2 (en) 2014-05-15 2019-01-22 Excelitas Technologies Corp. Apparatus and a method for operating a variable pressure sealed beam lamp
US9741553B2 (en) 2014-05-15 2017-08-22 Excelitas Technologies Corp. Elliptical and dual parabolic laser driven sealed beam lamps
WO2015175760A1 (en) 2014-05-15 2015-11-19 Excelitas Technologies Corp. Laser driven sealed beam lamp
US9576785B2 (en) 2015-05-14 2017-02-21 Excelitas Technologies Corp. Electrodeless single CW laser driven xenon lamp
US10057973B2 (en) 2015-05-14 2018-08-21 Excelitas Technologies Corp. Electrodeless single low power CW laser driven plasma lamp
US10008378B2 (en) 2015-05-14 2018-06-26 Excelitas Technologies Corp. Laser driven sealed beam lamp with improved stability
US10109473B1 (en) 2018-01-26 2018-10-23 Excelitas Technologies Corp. Mechanically sealed tube for laser sustained plasma lamp and production method for same
CN110940488B (zh) * 2019-11-11 2020-11-17 中国科学院西安光学精密机械研究所 一种WolterⅠ型非球面反射镜角分辨率检测系统及方法
US11587781B2 (en) 2021-05-24 2023-02-21 Hamamatsu Photonics K.K. Laser-driven light source with electrodeless ignition
US12165856B2 (en) 2022-02-21 2024-12-10 Hamamatsu Photonics K.K. Inductively coupled plasma light source
US12144072B2 (en) 2022-03-29 2024-11-12 Hamamatsu Photonics K.K. All-optical laser-driven light source with electrodeless ignition
US12156322B2 (en) 2022-12-08 2024-11-26 Hamamatsu Photonics K.K. Inductively coupled plasma light source with switched power supply
US12578076B2 (en) 2023-06-05 2026-03-17 Hamamatsu Photonics K.K. Dual-output laser-driven light source
WO2025233082A1 (en) * 2024-05-07 2025-11-13 Carl Zeiss Smt Gmbh Collector device, wafer inspection apparatus having a collector device

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US7084412B2 (en) * 2002-03-28 2006-08-01 Carl Zeiss Smt Ag Collector unit with a reflective element for illumination systems with a wavelength of smaller than 193 nm
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US7405871B2 (en) * 2005-02-08 2008-07-29 Intel Corporation Efficient EUV collector designs

Also Published As

Publication number Publication date
US7034320B2 (en) 2006-04-25
TW200421010A (en) 2004-10-16
AU2003301038A1 (en) 2004-11-19
KR100737645B1 (ko) 2007-07-09
US20040183031A1 (en) 2004-09-23
TWI232351B (en) 2005-05-11
CN1729431A (zh) 2006-02-01
EP1604246A2 (de) 2005-12-14
US20060237668A1 (en) 2006-10-26
KR20050111780A (ko) 2005-11-28
AU2003301038A8 (en) 2004-11-19
US7501641B2 (en) 2009-03-10
DE60332966D1 (de) 2010-07-22
CN1729431B (zh) 2013-11-20
WO2004095140A2 (en) 2004-11-04
EP1604246B1 (de) 2010-06-09
WO2004095140A3 (en) 2005-05-19

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