ATE471533T1 - Verfahren zur herstellung einer schablone - Google Patents

Verfahren zur herstellung einer schablone

Info

Publication number
ATE471533T1
ATE471533T1 AT01920080T AT01920080T ATE471533T1 AT E471533 T1 ATE471533 T1 AT E471533T1 AT 01920080 T AT01920080 T AT 01920080T AT 01920080 T AT01920080 T AT 01920080T AT E471533 T1 ATE471533 T1 AT E471533T1
Authority
AT
Austria
Prior art keywords
template
plate
producing
production
thereafter fixed
Prior art date
Application number
AT01920080T
Other languages
English (en)
Inventor
Babak Heidari
Original Assignee
Obducat Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Obducat Ab filed Critical Obducat Ab
Application granted granted Critical
Publication of ATE471533T1 publication Critical patent/ATE471533T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Micromachines (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Magnetic Ceramics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Adornments (AREA)
  • Auxiliary Devices For Music (AREA)
  • Mechanical Coupling Of Light Guides (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
AT01920080T 2000-05-24 2001-04-10 Verfahren zur herstellung einer schablone ATE471533T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SE0001931A SE516414C2 (sv) 2000-05-24 2000-05-24 Metod vid tillverkning av en mall, samt mallen tillverkad därav
PCT/SE2001/000787 WO2001090816A1 (en) 2000-05-24 2001-04-10 Method in connection with the production of a template and the template thus produced

Publications (1)

Publication Number Publication Date
ATE471533T1 true ATE471533T1 (de) 2010-07-15

Family

ID=20279811

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01920080T ATE471533T1 (de) 2000-05-24 2001-04-10 Verfahren zur herstellung einer schablone

Country Status (10)

Country Link
US (1) US7022465B2 (de)
EP (1) EP1290497B1 (de)
JP (1) JP2003534651A (de)
CN (1) CN1236359C (de)
AT (1) ATE471533T1 (de)
AU (1) AU2001247025A1 (de)
DE (1) DE60142393D1 (de)
HK (1) HK1052978B (de)
SE (1) SE516414C2 (de)
WO (1) WO2001090816A1 (de)

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US6964793B2 (en) 2002-05-16 2005-11-15 Board Of Regents, The University Of Texas System Method for fabricating nanoscale patterns in light curable compositions using an electric field
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US6932934B2 (en) 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US7442336B2 (en) 2003-08-21 2008-10-28 Molecular Imprints, Inc. Capillary imprinting technique
US6916584B2 (en) 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
US7071088B2 (en) 2002-08-23 2006-07-04 Molecular Imprints, Inc. Method for fabricating bulbous-shaped vias
US6936194B2 (en) 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
US6929762B2 (en) 2002-11-13 2005-08-16 Molecular Imprints, Inc. Method of reducing pattern distortions during imprint lithography processes
US6980282B2 (en) 2002-12-11 2005-12-27 Molecular Imprints, Inc. Method for modulating shapes of substrates
US6871558B2 (en) 2002-12-12 2005-03-29 Molecular Imprints, Inc. Method for determining characteristics of substrate employing fluid geometries
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US7179396B2 (en) 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
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US7122482B2 (en) 2003-10-27 2006-10-17 Molecular Imprints, Inc. Methods for fabricating patterned features utilizing imprint lithography
WO2005070167A2 (en) * 2004-01-12 2005-08-04 The Regents Of The University Of California Nanoscale electric lithography
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CA2579603A1 (en) * 2004-09-08 2006-03-16 Nil Technology Aps A flexible nano-imprint stamp
US7676088B2 (en) * 2004-12-23 2010-03-09 Asml Netherlands B.V. Imprint lithography
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US7490547B2 (en) * 2004-12-30 2009-02-17 Asml Netherlands B.V. Imprint lithography
US7686970B2 (en) * 2004-12-30 2010-03-30 Asml Netherlands B.V. Imprint lithography
US20060144274A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US20060144814A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US7354698B2 (en) * 2005-01-07 2008-04-08 Asml Netherlands B.V. Imprint lithography
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US20060267231A1 (en) * 2005-05-27 2006-11-30 Asml Netherlands B.V. Imprint lithography
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US7878791B2 (en) * 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
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US8318253B2 (en) * 2006-06-30 2012-11-27 Asml Netherlands B.V. Imprint lithography
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JP5061525B2 (ja) * 2006-08-04 2012-10-31 株式会社日立製作所 インプリント方法及びインプリント装置
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Also Published As

Publication number Publication date
CN1434930A (zh) 2003-08-06
EP1290497B1 (de) 2010-06-16
DE60142393D1 (de) 2010-07-29
US7022465B2 (en) 2006-04-04
CN1236359C (zh) 2006-01-11
SE0001931L (sv) 2001-11-25
EP1290497A1 (de) 2003-03-12
US20030139042A1 (en) 2003-07-24
AU2001247025A1 (en) 2001-12-03
SE0001931D0 (sv) 2000-05-24
HK1052978B (en) 2010-09-17
SE516414C2 (sv) 2002-01-15
HK1052978A1 (en) 2003-10-03
WO2001090816A1 (en) 2001-11-29
JP2003534651A (ja) 2003-11-18

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