ATE471533T1 - Verfahren zur herstellung einer schablone - Google Patents
Verfahren zur herstellung einer schabloneInfo
- Publication number
- ATE471533T1 ATE471533T1 AT01920080T AT01920080T ATE471533T1 AT E471533 T1 ATE471533 T1 AT E471533T1 AT 01920080 T AT01920080 T AT 01920080T AT 01920080 T AT01920080 T AT 01920080T AT E471533 T1 ATE471533 T1 AT E471533T1
- Authority
- AT
- Austria
- Prior art keywords
- template
- plate
- producing
- production
- thereafter fixed
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 3
- 238000000034 method Methods 0.000 abstract 3
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000001127 nanoimprint lithography Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
- G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Manufacturing & Machinery (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Magnetic Ceramics (AREA)
- Micromachines (AREA)
- Auxiliary Devices For Music (AREA)
- Mechanical Coupling Of Light Guides (AREA)
- Adornments (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| SE0001931A SE516414C2 (sv) | 2000-05-24 | 2000-05-24 | Metod vid tillverkning av en mall, samt mallen tillverkad därav |
| PCT/SE2001/000787 WO2001090816A1 (en) | 2000-05-24 | 2001-04-10 | Method in connection with the production of a template and the template thus produced |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE471533T1 true ATE471533T1 (de) | 2010-07-15 |
Family
ID=20279811
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT01920080T ATE471533T1 (de) | 2000-05-24 | 2001-04-10 | Verfahren zur herstellung einer schablone |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US7022465B2 (de) |
| EP (1) | EP1290497B1 (de) |
| JP (1) | JP2003534651A (de) |
| CN (1) | CN1236359C (de) |
| AT (1) | ATE471533T1 (de) |
| AU (1) | AU2001247025A1 (de) |
| DE (1) | DE60142393D1 (de) |
| HK (1) | HK1052978B (de) |
| SE (1) | SE516414C2 (de) |
| WO (1) | WO2001090816A1 (de) |
Families Citing this family (78)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6921615B2 (en) | 2000-07-16 | 2005-07-26 | Board Of Regents, The University Of Texas System | High-resolution overlay alignment methods for imprint lithography |
| EP2270592B1 (de) | 2000-07-17 | 2015-09-02 | Board of Regents, The University of Texas System | Verfahren zur Bildung einer Struktur auf einem Substrat |
| JP2004523906A (ja) | 2000-10-12 | 2004-08-05 | ボード・オブ・リージエンツ,ザ・ユニバーシテイ・オブ・テキサス・システム | 室温かつ低圧マイクロおよびナノ転写リソグラフィのためのテンプレート |
| US6964793B2 (en) | 2002-05-16 | 2005-11-15 | Board Of Regents, The University Of Texas System | Method for fabricating nanoscale patterns in light curable compositions using an electric field |
| US7037639B2 (en) | 2002-05-01 | 2006-05-02 | Molecular Imprints, Inc. | Methods of manufacturing a lithography template |
| US7179079B2 (en) | 2002-07-08 | 2007-02-20 | Molecular Imprints, Inc. | Conforming template for patterning liquids disposed on substrates |
| US7442336B2 (en) | 2003-08-21 | 2008-10-28 | Molecular Imprints, Inc. | Capillary imprinting technique |
| US7077992B2 (en) | 2002-07-11 | 2006-07-18 | Molecular Imprints, Inc. | Step and repeat imprint lithography processes |
| US6932934B2 (en) | 2002-07-11 | 2005-08-23 | Molecular Imprints, Inc. | Formation of discontinuous films during an imprint lithography process |
| US7019819B2 (en) | 2002-11-13 | 2006-03-28 | Molecular Imprints, Inc. | Chucking system for modulating shapes of substrates |
| US6916584B2 (en) | 2002-08-01 | 2005-07-12 | Molecular Imprints, Inc. | Alignment methods for imprint lithography |
| US7071088B2 (en) | 2002-08-23 | 2006-07-04 | Molecular Imprints, Inc. | Method for fabricating bulbous-shaped vias |
| US6936194B2 (en) | 2002-09-05 | 2005-08-30 | Molecular Imprints, Inc. | Functional patterning material for imprint lithography processes |
| US6980282B2 (en) | 2002-12-11 | 2005-12-27 | Molecular Imprints, Inc. | Method for modulating shapes of substrates |
| US6929762B2 (en) | 2002-11-13 | 2005-08-16 | Molecular Imprints, Inc. | Method of reducing pattern distortions during imprint lithography processes |
| US6871558B2 (en) | 2002-12-12 | 2005-03-29 | Molecular Imprints, Inc. | Method for determining characteristics of substrate employing fluid geometries |
| US7323130B2 (en) | 2002-12-13 | 2008-01-29 | Molecular Imprints, Inc. | Magnification correction employing out-of-plane distortion of a substrate |
| GB0229191D0 (en) * | 2002-12-14 | 2003-01-22 | Plastic Logic Ltd | Embossing of polymer devices |
| US7452574B2 (en) | 2003-02-27 | 2008-11-18 | Molecular Imprints, Inc. | Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer |
| US7179396B2 (en) | 2003-03-25 | 2007-02-20 | Molecular Imprints, Inc. | Positive tone bi-layer imprint lithography method |
| US7122079B2 (en) | 2004-02-27 | 2006-10-17 | Molecular Imprints, Inc. | Composition for an etching mask comprising a silicon-containing material |
| US7396475B2 (en) | 2003-04-25 | 2008-07-08 | Molecular Imprints, Inc. | Method of forming stepped structures employing imprint lithography |
| US6805054B1 (en) | 2003-05-14 | 2004-10-19 | Molecular Imprints, Inc. | Method, system and holder for transferring templates during imprint lithography processes |
| US6951173B1 (en) | 2003-05-14 | 2005-10-04 | Molecular Imprints, Inc. | Assembly and method for transferring imprint lithography templates |
| US7157036B2 (en) | 2003-06-17 | 2007-01-02 | Molecular Imprints, Inc | Method to reduce adhesion between a conformable region and a pattern of a mold |
| US7150622B2 (en) | 2003-07-09 | 2006-12-19 | Molecular Imprints, Inc. | Systems for magnification and distortion correction for imprint lithography processes |
| US7136150B2 (en) | 2003-09-25 | 2006-11-14 | Molecular Imprints, Inc. | Imprint lithography template having opaque alignment marks |
| US7090716B2 (en) | 2003-10-02 | 2006-08-15 | Molecular Imprints, Inc. | Single phase fluid imprint lithography method |
| US7122482B2 (en) | 2003-10-27 | 2006-10-17 | Molecular Imprints, Inc. | Methods for fabricating patterned features utilizing imprint lithography |
| WO2005070167A2 (en) * | 2004-01-12 | 2005-08-04 | The Regents Of The University Of California | Nanoscale electric lithography |
| US7730834B2 (en) * | 2004-03-04 | 2010-06-08 | Asml Netherlands B.V. | Printing apparatus and device manufacturing method |
| US7195733B2 (en) * | 2004-04-27 | 2007-03-27 | The Board Of Trustees Of The University Of Illinois | Composite patterning devices for soft lithography |
| US7140861B2 (en) | 2004-04-27 | 2006-11-28 | Molecular Imprints, Inc. | Compliant hard template for UV imprinting |
| US7309225B2 (en) | 2004-08-13 | 2007-12-18 | Molecular Imprints, Inc. | Moat system for an imprint lithography template |
| CA2579603A1 (en) * | 2004-09-08 | 2006-03-16 | Nil Technology Aps | A flexible nano-imprint stamp |
| US7676088B2 (en) * | 2004-12-23 | 2010-03-09 | Asml Netherlands B.V. | Imprint lithography |
| US20060144814A1 (en) * | 2004-12-30 | 2006-07-06 | Asml Netherlands B.V. | Imprint lithography |
| US7686970B2 (en) * | 2004-12-30 | 2010-03-30 | Asml Netherlands B.V. | Imprint lithography |
| US20060144274A1 (en) * | 2004-12-30 | 2006-07-06 | Asml Netherlands B.V. | Imprint lithography |
| US7490547B2 (en) * | 2004-12-30 | 2009-02-17 | Asml Netherlands B.V. | Imprint lithography |
| CN100541326C (zh) * | 2004-12-30 | 2009-09-16 | 中国科学院电工研究所 | 纳米级别图形的压印制造方法及其装置 |
| US7354698B2 (en) * | 2005-01-07 | 2008-04-08 | Asml Netherlands B.V. | Imprint lithography |
| US7922474B2 (en) * | 2005-02-17 | 2011-04-12 | Asml Netherlands B.V. | Imprint lithography |
| US7329115B2 (en) * | 2005-02-18 | 2008-02-12 | Hewlett-Packard Development Company, L.P. | Patterning nanoline arrays with spatially varying pitch |
| US7523701B2 (en) | 2005-03-07 | 2009-04-28 | Asml Netherlands B.V. | Imprint lithography method and apparatus |
| US7611348B2 (en) * | 2005-04-19 | 2009-11-03 | Asml Netherlands B.V. | Imprint lithography |
| US7762186B2 (en) * | 2005-04-19 | 2010-07-27 | Asml Netherlands B.V. | Imprint lithography |
| US7442029B2 (en) * | 2005-05-16 | 2008-10-28 | Asml Netherlands B.V. | Imprint lithography |
| US7692771B2 (en) * | 2005-05-27 | 2010-04-06 | Asml Netherlands B.V. | Imprint lithography |
| US7708924B2 (en) * | 2005-07-21 | 2010-05-04 | Asml Netherlands B.V. | Imprint lithography |
| US20060267231A1 (en) * | 2005-05-27 | 2006-11-30 | Asml Netherlands B.V. | Imprint lithography |
| US7418902B2 (en) * | 2005-05-31 | 2008-09-02 | Asml Netherlands B.V. | Imprint lithography including alignment |
| US7377764B2 (en) * | 2005-06-13 | 2008-05-27 | Asml Netherlands B.V. | Imprint lithography |
| US20070023976A1 (en) * | 2005-07-26 | 2007-02-01 | Asml Netherlands B.V. | Imprint lithography |
| US7878791B2 (en) * | 2005-11-04 | 2011-02-01 | Asml Netherlands B.V. | Imprint lithography |
| US8011915B2 (en) | 2005-11-04 | 2011-09-06 | Asml Netherlands B.V. | Imprint lithography |
| EP1795958A1 (de) * | 2005-12-07 | 2007-06-13 | Electronics And Telecommunications Research Institute | Vorrichtung zur Herstellung einer Nanoimprintform |
| US7517211B2 (en) | 2005-12-21 | 2009-04-14 | Asml Netherlands B.V. | Imprint lithography |
| US20070138699A1 (en) * | 2005-12-21 | 2007-06-21 | Asml Netherlands B.V. | Imprint lithography |
| CN100396595C (zh) * | 2005-12-27 | 2008-06-25 | 北京大学 | 应用纳米压印和反应离子刻蚀术制备纳米悬臂结构的方法 |
| US20070134943A2 (en) * | 2006-04-02 | 2007-06-14 | Dunnrowicz Clarence J | Subtractive - Additive Edge Defined Lithography |
| US20070291623A1 (en) * | 2006-06-15 | 2007-12-20 | Nanochip, Inc. | Cantilever with control of vertical and lateral position of contact probe tip |
| US20070121477A1 (en) * | 2006-06-15 | 2007-05-31 | Nanochip, Inc. | Cantilever with control of vertical and lateral position of contact probe tip |
| US20080023885A1 (en) * | 2006-06-15 | 2008-01-31 | Nanochip, Inc. | Method for forming a nano-imprint lithography template having very high feature counts |
| US20070290282A1 (en) * | 2006-06-15 | 2007-12-20 | Nanochip, Inc. | Bonded chip assembly with a micro-mover for microelectromechanical systems |
| US8318253B2 (en) * | 2006-06-30 | 2012-11-27 | Asml Netherlands B.V. | Imprint lithography |
| US8015939B2 (en) | 2006-06-30 | 2011-09-13 | Asml Netherlands B.V. | Imprintable medium dispenser |
| JP5061525B2 (ja) * | 2006-08-04 | 2012-10-31 | 株式会社日立製作所 | インプリント方法及びインプリント装置 |
| US20080074984A1 (en) * | 2006-09-21 | 2008-03-27 | Nanochip, Inc. | Architecture for a Memory Device |
| US20080074792A1 (en) * | 2006-09-21 | 2008-03-27 | Nanochip, Inc. | Control scheme for a memory device |
| US20090038636A1 (en) * | 2007-08-09 | 2009-02-12 | Asml Netherlands B.V. | Cleaning method |
| US7854877B2 (en) | 2007-08-14 | 2010-12-21 | Asml Netherlands B.V. | Lithography meandering order |
| US8144309B2 (en) | 2007-09-05 | 2012-03-27 | Asml Netherlands B.V. | Imprint lithography |
| US7906274B2 (en) | 2007-11-21 | 2011-03-15 | Molecular Imprints, Inc. | Method of creating a template employing a lift-off process |
| RU2570280C2 (ru) | 2010-04-28 | 2015-12-10 | Кимберли-Кларк Ворлдвайд, Инк. | Композитная матрица микроигл, содержащая на поверхности наноструктуры |
| PL3542851T3 (pl) | 2011-10-27 | 2022-04-25 | Sorrento Therapeutics, Inc. | Wszczepialne urządzenia do dostarczania środków biologicznie czynnych |
| TW201445246A (zh) * | 2013-05-31 | 2014-12-01 | 奈米晶光電股份有限公司 | 無缺陷模仁之製造方法 |
| CN115390370B (zh) * | 2022-09-21 | 2026-01-13 | 北京京东方技术开发有限公司 | 模具的制造方法和悬空成像结构的制造方法 |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3954469A (en) * | 1973-10-01 | 1976-05-04 | Mca Disco-Vision, Inc. | Method of creating a replicating matrix |
| US4336320A (en) * | 1981-03-12 | 1982-06-22 | Honeywell Inc. | Process for dielectric stenciled microcircuits |
| JPH01171817A (ja) * | 1987-12-28 | 1989-07-06 | Canon Inc | 情報記録媒体用基板の製造方法 |
| JPH085072B2 (ja) * | 1987-12-29 | 1996-01-24 | キヤノン株式会社 | 情報記録媒体用基板の製造方法 |
| JPH01309989A (ja) * | 1988-06-09 | 1989-12-14 | Asahi Glass Co Ltd | 樹脂またはガラス基板成型用スタンパー |
| JPH02149952A (ja) * | 1988-11-30 | 1990-06-08 | Sharp Corp | スタンパー製造方法 |
| DE3937308C1 (de) * | 1989-11-09 | 1991-03-21 | Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe, De | |
| JPH04109536A (ja) * | 1990-08-29 | 1992-04-10 | Mitsubishi Electric Corp | プラズマデイスプレイの製造方法 |
| US5298366A (en) * | 1990-10-09 | 1994-03-29 | Brother Kogyo Kabushiki Kaisha | Method for producing a microlens array |
| JPH04147101A (ja) * | 1990-10-09 | 1992-05-20 | Brother Ind Ltd | マイクロレンズアレイ及びその製造方法 |
| JP3077188B2 (ja) * | 1990-10-22 | 2000-08-14 | ブラザー工業株式会社 | 光導波路の製造方法 |
| DE4219667C2 (de) * | 1992-06-16 | 1994-12-01 | Kernforschungsz Karlsruhe | Werkzeug und Verfahren zur Herstellung einer mikrostrukturierten Kunststoffschicht |
| US5512131A (en) * | 1993-10-04 | 1996-04-30 | President And Fellows Of Harvard College | Formation of microstamped patterns on surfaces and derivative articles |
| US5494782A (en) * | 1994-07-29 | 1996-02-27 | Sony Corporation | Direct to stamper/mother optical disk mastering |
| DE19510096A1 (de) * | 1995-03-20 | 1996-09-26 | Leybold Ag | Matrize zum Abformen von Schallaufzeichnungen und Verfahren zu ihrer Herstellung |
| US5944974A (en) * | 1995-07-01 | 1999-08-31 | Fahrenberg; Jens | Process for manufacturing mold inserts |
| US5645977A (en) * | 1995-09-22 | 1997-07-08 | Industrial Technology Research Institute | Method of making molds for manufacturing multiple-lead microstructures |
| US5772905A (en) * | 1995-11-15 | 1998-06-30 | Regents Of The University Of Minnesota | Nanoimprint lithography |
| DE19755712B4 (de) * | 1997-12-15 | 2005-09-01 | Industrial Technology Research Institute, Chutung | Verfahren zum Erzeugen von Stanzstempeln für gestanzte IC-Mikrostrukturen |
| DE19815130A1 (de) * | 1998-04-03 | 1999-10-14 | Bosch Gmbh Robert | Herstellung eines metallischen Stempels zur Definition von Nanostrukturen |
| EP1171800B1 (de) * | 2000-02-07 | 2006-04-19 | Koninklijke Philips Electronics N.V. | Stempel für ein lithographisches verfahren, methode zur stempelherstellung und methode zur herstellung einer gemusterten schicht auf einem substrat |
| EP1509379B1 (de) * | 2002-05-24 | 2012-02-29 | Stephen Y. Chou | Verfahren und vorrichtung zur prägeformlithographie mit feldinduziertem druck |
-
2000
- 2000-05-24 SE SE0001931A patent/SE516414C2/sv not_active IP Right Cessation
-
2001
- 2001-04-10 DE DE60142393T patent/DE60142393D1/de not_active Expired - Lifetime
- 2001-04-10 EP EP01920080A patent/EP1290497B1/de not_active Expired - Lifetime
- 2001-04-10 AT AT01920080T patent/ATE471533T1/de not_active IP Right Cessation
- 2001-04-10 JP JP2001586524A patent/JP2003534651A/ja active Pending
- 2001-04-10 US US10/296,326 patent/US7022465B2/en not_active Expired - Lifetime
- 2001-04-10 WO PCT/SE2001/000787 patent/WO2001090816A1/en not_active Ceased
- 2001-04-10 HK HK03105231.5A patent/HK1052978B/en not_active IP Right Cessation
- 2001-04-10 AU AU2001247025A patent/AU2001247025A1/en not_active Abandoned
- 2001-04-10 CN CNB01809984XA patent/CN1236359C/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| HK1052978B (en) | 2010-09-17 |
| US20030139042A1 (en) | 2003-07-24 |
| SE516414C2 (sv) | 2002-01-15 |
| WO2001090816A1 (en) | 2001-11-29 |
| CN1236359C (zh) | 2006-01-11 |
| CN1434930A (zh) | 2003-08-06 |
| JP2003534651A (ja) | 2003-11-18 |
| US7022465B2 (en) | 2006-04-04 |
| EP1290497B1 (de) | 2010-06-16 |
| SE0001931L (sv) | 2001-11-25 |
| EP1290497A1 (de) | 2003-03-12 |
| AU2001247025A1 (en) | 2001-12-03 |
| DE60142393D1 (de) | 2010-07-29 |
| SE0001931D0 (sv) | 2000-05-24 |
| HK1052978A1 (en) | 2003-10-03 |
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