ATE472510T1 - Pyrogenes sio2 und dispersion desselben - Google Patents
Pyrogenes sio2 und dispersion desselbenInfo
- Publication number
- ATE472510T1 ATE472510T1 AT03782417T AT03782417T ATE472510T1 AT E472510 T1 ATE472510 T1 AT E472510T1 AT 03782417 T AT03782417 T AT 03782417T AT 03782417 T AT03782417 T AT 03782417T AT E472510 T1 ATE472510 T1 AT E472510T1
- Authority
- AT
- Austria
- Prior art keywords
- burner
- less
- gas
- powder
- dispersion
- Prior art date
Links
- 239000006185 dispersion Substances 0.000 title abstract 3
- 230000001698 pyrogenic effect Effects 0.000 title abstract 2
- 239000007789 gas Substances 0.000 abstract 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 3
- 239000000203 mixture Substances 0.000 abstract 3
- 239000001301 oxygen Substances 0.000 abstract 3
- 229910052760 oxygen Inorganic materials 0.000 abstract 3
- 239000000843 powder Substances 0.000 abstract 3
- 239000000945 filler Substances 0.000 abstract 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 238000010276 construction Methods 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 229920001971 elastomer Polymers 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 239000004033 plastic Substances 0.000 abstract 1
- 229920003023 plastic Polymers 0.000 abstract 1
- 239000005060 rubber Substances 0.000 abstract 1
- 150000003377 silicon compounds Chemical class 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 229920002379 silicone rubber Polymers 0.000 abstract 1
- 239000004945 silicone rubber Substances 0.000 abstract 1
- 239000007787 solid Substances 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/50—Mixing liquids with solids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/141—Preparation of hydrosols or aqueous dispersions
- C01B33/1415—Preparation of hydrosols or aqueous dispersions by suspending finely divided silica in water
- C01B33/1417—Preparation of hydrosols or aqueous dispersions by suspending finely divided silica in water an aqueous dispersion being obtained
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/146—After-treatment of sols
- C01B33/148—Concentration; Drying; Dehydration; Stabilisation; Purification
- C01B33/1485—Stabilisation, e.g. prevention of gelling; Purification
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/50—Agglomerated particles
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/10—Solid density
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/22—Rheological behaviour as dispersion, e.g. viscosity, sedimentation stability
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Dispersion Chemistry (AREA)
- Nanotechnology (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Geochemistry & Mineralogy (AREA)
- Physics & Mathematics (AREA)
- Composite Materials (AREA)
- General Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Silicon Compounds (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Colloid Chemistry (AREA)
- Medicinal Preparation (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10258857A DE10258857A1 (de) | 2002-12-17 | 2002-12-17 | Pyrogen hergestelltes Siliciumdioxid und Dispersion hiervon |
| PCT/EP2003/014322 WO2004054929A1 (en) | 2002-12-17 | 2003-12-16 | Pyrogenic silicon dioxide and a dispersion thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE472510T1 true ATE472510T1 (de) | 2010-07-15 |
Family
ID=32477701
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT03782417T ATE472510T1 (de) | 2002-12-17 | 2003-12-16 | Pyrogenes sio2 und dispersion desselben |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US7722849B2 (de) |
| EP (1) | EP1572587B1 (de) |
| JP (1) | JP4280712B2 (de) |
| KR (1) | KR101030873B1 (de) |
| CN (1) | CN1330570C (de) |
| AT (1) | ATE472510T1 (de) |
| AU (1) | AU2003290058A1 (de) |
| DE (2) | DE10258857A1 (de) |
| WO (1) | WO2004054929A1 (de) |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102004036602A1 (de) * | 2004-07-28 | 2006-03-23 | Degussa Ag | Hochgefüllte, wässerige Metalloxid-Dispersion |
| DE102005001409A1 (de) * | 2005-01-12 | 2006-07-20 | Degussa Ag | Pyrogen hergestelltes Siliciumdioxidpulver und dieses Pulver enthaltene Silikondichtmasse |
| DE102005001410A1 (de) * | 2005-01-12 | 2006-07-20 | Degussa Ag | Pyrogen hergestelltes Siliciumdioxidpulver und Dispersion hiervon |
| DE602005003198T2 (de) | 2005-03-09 | 2008-08-28 | Degussa Novara Technology S.P.A. | Verfahren zur Herstellung von Monolithen durch ein Sol-Gel Verfahren |
| EP1700824A1 (de) | 2005-03-09 | 2006-09-13 | Degussa AG | Granulate basierend auf pyrogen hergestelles silicon dioxid, sowie Verfahren zu deren Herstellung und Verwendung dergleichen |
| EP1700829A1 (de) * | 2005-03-09 | 2006-09-13 | Degussa AG | Verfahren zum Herstellen eines Glasmonolithes mittels eines Sol-Gel-Verfahrens |
| EP1700832A1 (de) * | 2005-03-09 | 2006-09-13 | Degussa AG | Verfahren zur Herstellung von Glas optischer Qualität |
| EP1700830A1 (de) | 2005-03-09 | 2006-09-13 | Novara Technology S.R.L. | Prozess für die Herstellung von Monolithen mittels eines Sol-Gel Prozesses |
| EP1700828A1 (de) * | 2005-03-09 | 2006-09-13 | Degussa AG | Verfahren zur Herstellung von Glaskörpern ultrahoher Reinheit und optischer Qualität |
| EP1717202A1 (de) * | 2005-04-29 | 2006-11-02 | Degussa AG | Sinterwerkstoffe aus Siliciumdioxid |
| DE102006005093A1 (de) * | 2006-02-04 | 2007-08-09 | Degussa Ag | Siliciumdioxid und Polycarboxylatether enthaltende Dispersion |
| DE102006030002A1 (de) * | 2006-06-29 | 2008-01-03 | Wacker Chemie Ag | Herstellung pyrogener Metalloxide in temperierten Reaktionskammern |
| DE102006054156A1 (de) | 2006-11-16 | 2008-05-21 | Wacker Chemie Ag | Pyrogene Kieselsäure hergestellt in einer Produktions-Anlage mit großer Kapazität |
| ATE497483T1 (de) * | 2007-05-21 | 2011-02-15 | Evonik Degussa Gmbh | Pyrogen hergestelltes siliciumdioxid mit niedriger verdickungswirkung |
| EP2088128B1 (de) | 2007-12-10 | 2015-04-08 | Cristal Materials Corporation | Verfahren zur Herstellung von Glasmonolithen über das Sol-Gel-Verfahren |
| EP2618338A3 (de) * | 2010-03-12 | 2013-10-23 | General Cable Technologies Corporation | Isolierung mit Mikrooxidpartikeln für Kabelkomponenten |
| DE102013206266A1 (de) * | 2013-04-10 | 2014-10-16 | Wacker Chemie Ag | Vernetzbare Massen auf der Basis von Organosiliciumverbindungen |
| CN103712951B (zh) * | 2013-12-31 | 2016-03-09 | 清华大学深圳研究生院 | 一种基于三维结构纳米阵列生物芯片的制备方法及其应用 |
| CN108698883A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 石英玻璃制备中的二氧化硅的喷雾造粒 |
| EP3390293B1 (de) | 2015-12-18 | 2023-04-19 | Heraeus Quarzglas GmbH & Co. KG | Erhöhen des siliziumgehalts bei der herstellung von quarzglas |
| TWI813534B (zh) | 2015-12-18 | 2023-09-01 | 德商何瑞斯廓格拉斯公司 | 利用露點監測在熔融烘箱中製備石英玻璃體 |
| US10618833B2 (en) | 2015-12-18 | 2020-04-14 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of a synthetic quartz glass grain |
| TWI788278B (zh) | 2015-12-18 | 2023-01-01 | 德商何瑞斯廓格拉斯公司 | 由均質石英玻璃製得之玻璃纖維及預成型品 |
| CN108698880B (zh) | 2015-12-18 | 2023-05-02 | 贺利氏石英玻璃有限两合公司 | 不透明石英玻璃体的制备 |
| TW201731782A (zh) | 2015-12-18 | 2017-09-16 | 何瑞斯廓格拉斯公司 | 在多腔式爐中製備石英玻璃體 |
| JP6940235B2 (ja) | 2015-12-18 | 2021-09-22 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 高融点金属の溶融坩堝内での石英ガラス体の調製 |
| JP7044454B2 (ja) | 2015-12-18 | 2022-03-30 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 石英ガラス調製時の中間体としての炭素ドープ二酸化ケイ素造粒体の調製 |
| JP6981710B2 (ja) | 2015-12-18 | 2021-12-17 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 二酸化ケイ素造粒体からの石英ガラス体の調製 |
| DE102017203998A1 (de) * | 2017-03-10 | 2017-06-01 | Wacker Chemie Ag | Verfahren zur Herstellung von pyrogener Kieselsäure |
| EP4662173A1 (de) | 2023-02-10 | 2025-12-17 | Evonik Operations GmbH | Verfahren zur herstellung von oxiden |
| CN117843004B (zh) * | 2023-12-20 | 2025-12-02 | 华中科技大学 | 一种通过可控降解废旧硅橡胶以制备纳米二氧化硅的方法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2620737C2 (de) | 1976-05-11 | 1982-07-29 | Wacker-Chemie GmbH, 8000 München | Verfahren zum Herstellen von hochdispersem Siliciumdioxid |
| JPH01234319A (ja) * | 1988-03-16 | 1989-09-19 | Nippon Steel Chem Co Ltd | 球状シリカの製造方法 |
| DE19530339A1 (de) | 1995-08-18 | 1997-02-20 | Degussa | Pyrogene Kieselsäure, Verfahren zu ihrer Herstellung und Verwendung |
| DE19756840A1 (de) * | 1997-01-23 | 1998-07-30 | Degussa | Pyrogene Oxide und Verfahren zu ihrer Herstellung |
| DE19807700A1 (de) * | 1998-02-24 | 1999-08-26 | Degussa | Fällungskieselsäuregranulate |
| DE19953029A1 (de) * | 1999-11-04 | 2001-05-17 | Degussa | Polyester |
| EP1148026B1 (de) * | 2000-04-12 | 2016-08-10 | Evonik Degussa GmbH | Dispersionen |
| EP1182168B1 (de) * | 2000-08-21 | 2004-05-12 | Degussa AG | Pyrogen hergestelltes Siliciumdioxid |
| US6679945B2 (en) * | 2000-08-21 | 2004-01-20 | Degussa Ag | Pyrogenically prepared silicon dioxide |
| DE10326049A1 (de) | 2003-06-10 | 2004-12-30 | Degussa Ag | Flammenhydrolytisch hergestelltes Siliciumdioxid, Verfahren zu seiner Herstellung und Verwendung |
-
2002
- 2002-12-17 DE DE10258857A patent/DE10258857A1/de not_active Ceased
-
2003
- 2003-12-16 AU AU2003290058A patent/AU2003290058A1/en not_active Abandoned
- 2003-12-16 AT AT03782417T patent/ATE472510T1/de not_active IP Right Cessation
- 2003-12-16 US US10/530,491 patent/US7722849B2/en active Active
- 2003-12-16 JP JP2004560434A patent/JP4280712B2/ja not_active Expired - Lifetime
- 2003-12-16 WO PCT/EP2003/014322 patent/WO2004054929A1/en not_active Ceased
- 2003-12-16 EP EP03782417A patent/EP1572587B1/de not_active Expired - Lifetime
- 2003-12-16 CN CNB2003801065821A patent/CN1330570C/zh not_active Expired - Lifetime
- 2003-12-16 KR KR1020057011024A patent/KR101030873B1/ko not_active Expired - Lifetime
- 2003-12-16 DE DE60333223T patent/DE60333223D1/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US7722849B2 (en) | 2010-05-25 |
| JP4280712B2 (ja) | 2009-06-17 |
| US20080045411A1 (en) | 2008-02-21 |
| JP2006509712A (ja) | 2006-03-23 |
| CN1726170A (zh) | 2006-01-25 |
| KR20050091725A (ko) | 2005-09-15 |
| DE60333223D1 (de) | 2010-08-12 |
| WO2004054929A1 (en) | 2004-07-01 |
| KR101030873B1 (ko) | 2011-04-22 |
| DE10258857A1 (de) | 2004-07-08 |
| EP1572587B1 (de) | 2010-06-30 |
| AU2003290058A1 (en) | 2004-07-09 |
| EP1572587A1 (de) | 2005-09-14 |
| CN1330570C (zh) | 2007-08-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |