ATE473469T1 - Verfahren zur herstellung einer lithografiedruckform - Google Patents

Verfahren zur herstellung einer lithografiedruckform

Info

Publication number
ATE473469T1
ATE473469T1 AT05110916T AT05110916T ATE473469T1 AT E473469 T1 ATE473469 T1 AT E473469T1 AT 05110916 T AT05110916 T AT 05110916T AT 05110916 T AT05110916 T AT 05110916T AT E473469 T1 ATE473469 T1 AT E473469T1
Authority
AT
Austria
Prior art keywords
precursor
gumming
support
lithographic printing
coating
Prior art date
Application number
AT05110916T
Other languages
English (en)
Inventor
Damme Marc Van
Original Assignee
Agfa Graphics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Graphics Nv filed Critical Agfa Graphics Nv
Application granted granted Critical
Publication of ATE473469T1 publication Critical patent/ATE473469T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/02—Cover layers; Protective layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/04—Intermediate layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/14—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by macromolecular organic compounds, e.g. binder, adhesives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/10—Developable by an acidic solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
AT05110916T 2005-11-18 2005-11-18 Verfahren zur herstellung einer lithografiedruckform ATE473469T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP05110916A EP1788441B1 (de) 2005-11-18 2005-11-18 Verfahren zur Herstellung einer Lithografiedruckform

Publications (1)

Publication Number Publication Date
ATE473469T1 true ATE473469T1 (de) 2010-07-15

Family

ID=36950554

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05110916T ATE473469T1 (de) 2005-11-18 2005-11-18 Verfahren zur herstellung einer lithografiedruckform

Country Status (8)

Country Link
US (1) US8026043B2 (de)
EP (1) EP1788441B1 (de)
CN (1) CN101331432B (de)
AT (1) ATE473469T1 (de)
DE (1) DE602005022203D1 (de)
ES (1) ES2346320T3 (de)
PL (1) PL1788441T3 (de)
WO (1) WO2007057335A1 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7763413B2 (en) 2007-10-16 2010-07-27 Eastman Kodak Company Methods for imaging and processing negative-working imageable elements
US8323874B2 (en) 2008-01-22 2012-12-04 Eastman Kodak Company Method of making lithographic printing plates
JP5264427B2 (ja) * 2008-03-25 2013-08-14 富士フイルム株式会社 平版印刷版の作製方法
ATE546760T1 (de) 2008-03-26 2012-03-15 Agfa Graphics Nv Verfahren zur herstellung lithographischer druckplatten
WO2010006948A1 (en) 2008-07-16 2010-01-21 Agfa Graphics Nv A method and apparatus for preparing lithographic printing plate precursors
ATE555903T1 (de) 2008-10-23 2012-05-15 Agfa Graphics Nv Lithographiedruckplatte
EP2290447A1 (de) 2009-08-25 2011-03-02 Agfa Graphics N.V. Satz zur Entwicklung einer Lithografiedruckplatte
EP3008517A1 (de) * 2013-06-14 2016-04-20 Agfa Graphics N.V. Flachdruckplattenvorläufer
US10048594B2 (en) * 2016-02-19 2018-08-14 Tokyo Electron Limited Photo-sensitized chemically amplified resist (PS-CAR) model calibration
ES2881270T3 (es) * 2017-12-08 2021-11-29 Agfa Nv Procedimiento de fabricación de una plancha de impresión litográfica
WO2020120400A1 (en) * 2018-12-10 2020-06-18 Agfa Nv A lithographic printing plate precursor

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WO1979000593A1 (en) * 1978-02-06 1979-08-23 Napp Systems Inc Desensitizing solution and process for treating a diazo photosensitive printing plate
US4370406A (en) * 1979-12-26 1983-01-25 Richardson Graphics Company Developers for photopolymer lithographic plates
JPS63109442A (ja) * 1986-10-27 1988-05-14 Konica Corp ネガ型とポジ型を共通に安定に処理できる感光材料の処理方法
DE3938108A1 (de) * 1989-11-16 1991-05-23 Hoechst Ag Entwicklerkonzentrat und daraus hergestellter entwickler fuer belichtete negativ arbeitende reproduktionsschichten mit deckschicht sowie verfahren zur herstellung von druckformen
US5910395A (en) * 1995-04-27 1999-06-08 Minnesota Mining And Manufacturing Company Negative-acting no-process printing plates
EP0851299B1 (de) 1996-12-26 2000-10-25 Mitsubishi Chemical Corporation Photoempfindliche lithographische Druckplatte
DE10022786B4 (de) * 1999-05-12 2008-04-10 Kodak Graphic Communications Gmbh Auf der Druckmaschine entwickelbare Druckplatte
US6071675A (en) * 1999-06-05 2000-06-06 Teng; Gary Ganghui On-press development of a lithographic plate comprising dispersed solid particles
US6558873B1 (en) 1999-10-05 2003-05-06 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor
US6245481B1 (en) * 1999-10-12 2001-06-12 Gary Ganghui Teng On-press process of lithographic plates having a laser sensitive mask layer
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JP4266077B2 (ja) * 2001-03-26 2009-05-20 富士フイルム株式会社 平版印刷版原版及び平版印刷方法
US6723493B2 (en) * 2001-06-04 2004-04-20 Gary Ganghui Teng Negative lithographic printing plate comprising a specific compound in the photosensitive layer
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US6902865B2 (en) * 2002-07-22 2005-06-07 Gary Ganghui Teng Non-alkaline aqueous development of thermosensitive lithographic printing plates
WO2004095141A1 (en) * 2003-04-24 2004-11-04 Kodak Polychrome Graphics Gmbh Method and apparatus for refreshment and reuse of loaded developer
JP2005014348A (ja) 2003-06-25 2005-01-20 Fuji Photo Film Co Ltd 平版印刷版原版及び平版印刷方法
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DE602004030519D1 (de) 2003-07-22 2011-01-27 Fujifilm Corp Flachdruckplattenvorläufer und lithographisches Druckverfahren
JP2005067006A (ja) * 2003-08-22 2005-03-17 Fuji Photo Film Co Ltd 平版印刷版の製版方法、平版印刷方法および平版印刷原版
JP2005084092A (ja) * 2003-09-04 2005-03-31 Fuji Photo Film Co Ltd 感光性平版印刷版
JP4644458B2 (ja) 2003-09-30 2011-03-02 富士フイルム株式会社 平版印刷版原版および平版印刷方法
US20050170282A1 (en) 2004-01-23 2005-08-04 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor and lithographic printing method
US20070144384A1 (en) * 2004-05-19 2007-06-28 Fuji Photo Film Co., Ltd Image recording method
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JP4321815B2 (ja) * 2004-07-30 2009-08-26 富士フイルム株式会社 感光材料処理装置
JP2008515014A (ja) * 2004-10-01 2008-05-08 アグファ・ゲヴェルト・ナームロゼ・ベンノートチャップ 平版印刷版の製造方法

Also Published As

Publication number Publication date
WO2007057335A1 (en) 2007-05-24
US8026043B2 (en) 2011-09-27
US20080274428A1 (en) 2008-11-06
PL1788441T3 (pl) 2010-12-31
CN101331432B (zh) 2012-04-25
ES2346320T3 (es) 2010-10-14
CN101331432A (zh) 2008-12-24
DE602005022203D1 (de) 2010-08-19
EP1788441B1 (de) 2010-07-07
EP1788441A1 (de) 2007-05-23

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