ATE476685T1 - Nanoimprintlithographiemethode unter benutzung einer form mit einer wärmeerzeugenden region - Google Patents

Nanoimprintlithographiemethode unter benutzung einer form mit einer wärmeerzeugenden region

Info

Publication number
ATE476685T1
ATE476685T1 AT04743806T AT04743806T ATE476685T1 AT E476685 T1 ATE476685 T1 AT E476685T1 AT 04743806 T AT04743806 T AT 04743806T AT 04743806 T AT04743806 T AT 04743806T AT E476685 T1 ATE476685 T1 AT E476685T1
Authority
AT
Austria
Prior art keywords
die
mass
polymeric material
mold
heat generating
Prior art date
Application number
AT04743806T
Other languages
English (en)
Inventor
Massimo Tormen
Original Assignee
Consiglio Nazionale Ricerche
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Consiglio Nazionale Ricerche filed Critical Consiglio Nazionale Ricerche
Application granted granted Critical
Publication of ATE476685T1 publication Critical patent/ATE476685T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/02—Moulds or cores; Details thereof or accessories therefor with incorporated heating or cooling means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C99/00—Subject matter not provided for in other groups of this subclass
    • B81C99/0075—Manufacture of substrate-free structures
    • B81C99/0085—Manufacture of substrate-free structures using moulds and master templates, e.g. for hot-embossing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0147—Film patterning
    • B81C2201/015—Imprinting
    • B81C2201/0153—Imprinting techniques not provided for in B81C2201/0152
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/03—Processes for manufacturing substrate-free structures
    • B81C2201/036—Hot embossing

Landscapes

  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mechanical Engineering (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
AT04743806T 2003-06-23 2004-06-22 Nanoimprintlithographiemethode unter benutzung einer form mit einer wärmeerzeugenden region ATE476685T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT000473A ITTO20030473A1 (it) 2003-06-23 2003-06-23 Procedimento litografico di nanoimpressione che prevede l'utilizzo di uno stampo presentante una regione atta a
PCT/IB2004/002120 WO2004114017A1 (en) 2003-06-23 2004-06-22 A nano impression lithographic process which involves the use of a die having a region able to generate heat

Publications (1)

Publication Number Publication Date
ATE476685T1 true ATE476685T1 (de) 2010-08-15

Family

ID=33524062

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04743806T ATE476685T1 (de) 2003-06-23 2004-06-22 Nanoimprintlithographiemethode unter benutzung einer form mit einer wärmeerzeugenden region

Country Status (7)

Country Link
US (1) US8409488B2 (de)
EP (1) EP1639411B1 (de)
AT (1) ATE476685T1 (de)
DE (1) DE602004028475D1 (de)
DK (1) DK1639411T3 (de)
IT (1) ITTO20030473A1 (de)
WO (1) WO2004114017A1 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI243796B (en) * 2004-06-08 2005-11-21 Ind Tech Res Inst Device of nano-structure imprint for pattern transfer and method of the same
FR2876193B1 (fr) * 2004-10-04 2007-01-26 Commissariat Energie Atomique Dispositif nanoimprime comportant des motifs metalliques et procede de nanoimpression de motifs metalliques
JP4554330B2 (ja) * 2004-10-21 2010-09-29 株式会社リコー 高耐久性を有する断熱スタンパ構造
FR2950043B1 (fr) 2009-09-17 2011-10-14 Commissariat Energie Atomique Moule pour la lithographie par nanoimpression thermique, son procede de preparation, et procede de nanoimpression thermique le mettant en ?uvre.
CN101829772B (zh) * 2010-05-26 2011-11-02 浙江大学 金属玻璃微构件的热塑性成型加工方法
FR2964338B1 (fr) * 2010-09-07 2012-10-05 Commissariat Energie Atomique Moule pour la lithographie par nano-impression thermique, son procede de preparation, et procede de nano-impression thermique le mettant en ?uvre.
US9498918B2 (en) 2012-09-18 2016-11-22 Ev Group E. Thallner Gmbh Method and device for embossing
WO2015023683A1 (en) * 2013-08-12 2015-02-19 Tufts University Micro forming devices and systems and uses thereof
DE102015009982A1 (de) 2015-07-31 2017-02-02 Giesecke & Devrient Gmbh Prägestempel für die Nanoprägelithographie
TWI628062B (zh) * 2016-03-17 2018-07-01 欣興電子股份有限公司 線路板的製作方法與感壓印模
CN116722368A (zh) * 2023-06-25 2023-09-08 北京信息科技大学 一种超表面结构及其制备方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1864666A (en) 1930-04-04 1932-06-28 John F Osborne Electric mold
US2210583A (en) 1939-03-04 1940-08-06 Owens Illinois Glass Co Mold
US3387333A (en) 1965-01-27 1968-06-11 Lockheed Aircraft Corp Electrically heated mold
EP0244496B1 (de) * 1986-05-06 1991-01-16 Ibm Deutschland Gmbh Maske für die Ionen-, Elektronen- oder Röntgenstrahllithographie und Verfahren zur ihrer Herstellung
US5064597A (en) * 1988-03-30 1991-11-12 General Electric Company Method of compression molding on hot surfaces
JPH0580530A (ja) * 1991-09-24 1993-04-02 Hitachi Ltd 薄膜パターン製造方法
US5261806A (en) 1992-02-26 1993-11-16 Pleasant Ronald E Electrically heated mold insert
US5772905A (en) 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
US6517995B1 (en) 1999-09-14 2003-02-11 Massachusetts Institute Of Technology Fabrication of finely featured devices by liquid embossing
US6755984B2 (en) * 2002-10-24 2004-06-29 Hewlett-Packard Development Company, L.P. Micro-casted silicon carbide nano-imprinting stamp
WO2004058479A1 (en) 2002-12-31 2004-07-15 Shinill Kang Molding system for molding micro pattern structure having micro heating element and method for fabricating mold insert for molding micro pattern structure used therein

Also Published As

Publication number Publication date
US8409488B2 (en) 2013-04-02
WO2004114017A1 (en) 2004-12-29
EP1639411B1 (de) 2010-08-04
DE602004028475D1 (de) 2010-09-16
ITTO20030473A1 (it) 2004-12-24
DK1639411T3 (da) 2010-11-22
US20070063390A1 (en) 2007-03-22
EP1639411A1 (de) 2006-03-29

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