ATE476686T1 - Bestrahlungsverfahren - Google Patents

Bestrahlungsverfahren

Info

Publication number
ATE476686T1
ATE476686T1 AT04806612T AT04806612T ATE476686T1 AT E476686 T1 ATE476686 T1 AT E476686T1 AT 04806612 T AT04806612 T AT 04806612T AT 04806612 T AT04806612 T AT 04806612T AT E476686 T1 ATE476686 T1 AT E476686T1
Authority
AT
Austria
Prior art keywords
transparent layer
fluid
imperfections
radiation
resist
Prior art date
Application number
AT04806612T
Other languages
English (en)
Inventor
Peter Dirksen
Robert Morton
Peter Zandbergen
Steenwinckel David Van
Yuri Aksenov
Jeroen Lammers
Wingerden Johannes Van
Laurent Marinier
Original Assignee
Koninkl Philips Electronics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv filed Critical Koninkl Philips Electronics Nv
Application granted granted Critical
Publication of ATE476686T1 publication Critical patent/ATE476686T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
AT04806612T 2003-12-23 2004-12-22 Bestrahlungsverfahren ATE476686T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP03104940 2003-12-23
EP04102397 2004-05-28
PCT/IB2004/052886 WO2005064409A2 (en) 2003-12-23 2004-12-22 Removable pellicle for immersion lithography

Publications (1)

Publication Number Publication Date
ATE476686T1 true ATE476686T1 (de) 2010-08-15

Family

ID=34740664

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04806612T ATE476686T1 (de) 2003-12-23 2004-12-22 Bestrahlungsverfahren

Country Status (9)

Country Link
US (1) US8067147B2 (de)
EP (1) EP1700164B1 (de)
JP (1) JP4579927B2 (de)
KR (1) KR101163095B1 (de)
CN (1) CN100555083C (de)
AT (1) ATE476686T1 (de)
DE (1) DE602004028511D1 (de)
TW (1) TWI380138B (de)
WO (1) WO2005064409A2 (de)

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GB0222514D0 (en) 2002-09-27 2002-11-06 Novartis Ag Organic compounds
EP2261742A3 (de) * 2003-06-11 2011-05-25 ASML Netherlands BV Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
TWI245163B (en) 2003-08-29 2005-12-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7050146B2 (en) 2004-02-09 2006-05-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7385670B2 (en) * 2004-10-05 2008-06-10 Asml Netherlands B.V. Lithographic apparatus, cleaning system and cleaning method for in situ removing contamination from a component in a lithographic apparatus
US7880860B2 (en) 2004-12-20 2011-02-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7288362B2 (en) * 2005-02-23 2007-10-30 International Business Machines Corporation Immersion topcoat materials with improved performance
JP4684139B2 (ja) * 2005-10-17 2011-05-18 信越化学工業株式会社 レジスト保護膜材料及びパターン形成方法
US8125610B2 (en) * 2005-12-02 2012-02-28 ASML Metherlands B.V. Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus
US7969548B2 (en) * 2006-05-22 2011-06-28 Asml Netherlands B.V. Lithographic apparatus and lithographic apparatus cleaning method
WO2008029884A1 (en) * 2006-09-08 2008-03-13 Nikon Corporation Cleaning member, cleaning method and device manufacturing method
DE102006046675A1 (de) * 2006-09-29 2008-04-03 Carl Zeiss Smt Ag Mikrolithopraphische Projektionsbelichtungsanlage
US8817226B2 (en) 2007-02-15 2014-08-26 Asml Holding N.V. Systems and methods for insitu lens cleaning using ozone in immersion lithography
US8654305B2 (en) * 2007-02-15 2014-02-18 Asml Holding N.V. Systems and methods for insitu lens cleaning in immersion lithography
US8011377B2 (en) 2007-05-04 2011-09-06 Asml Netherlands B.V. Cleaning device and a lithographic apparatus cleaning method
US8947629B2 (en) * 2007-05-04 2015-02-03 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US7900641B2 (en) * 2007-05-04 2011-03-08 Asml Netherlands B.V. Cleaning device and a lithographic apparatus cleaning method
US7866330B2 (en) 2007-05-04 2011-01-11 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US20080311530A1 (en) 2007-06-15 2008-12-18 Allen Robert D Graded topcoat materials for immersion lithography
US20090025753A1 (en) * 2007-07-24 2009-01-29 Asml Netherlands B.V. Lithographic Apparatus And Contamination Removal Or Prevention Method
US7916269B2 (en) * 2007-07-24 2011-03-29 Asml Netherlands B.V. Lithographic apparatus and contamination removal or prevention method
NL1035942A1 (nl) * 2007-09-27 2009-03-30 Asml Netherlands Bv Lithographic Apparatus and Method of Cleaning a Lithographic Apparatus.
SG151198A1 (en) * 2007-09-27 2009-04-30 Asml Netherlands Bv Methods relating to immersion lithography and an immersion lithographic apparatus
JP5017232B2 (ja) * 2007-10-31 2012-09-05 エーエスエムエル ネザーランズ ビー．ブイ． クリーニング装置および液浸リソグラフィ装置
NL1036273A1 (nl) * 2007-12-18 2009-06-19 Asml Netherlands Bv Lithographic apparatus and method of cleaning a surface of an immersion lithographic apparatus.
NL1036306A1 (nl) 2007-12-20 2009-06-23 Asml Netherlands Bv Lithographic apparatus and in-line cleaning apparatus.
US8339572B2 (en) 2008-01-25 2012-12-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2011028091A (ja) * 2009-07-28 2011-02-10 Shin-Etsu Chemical Co Ltd ペリクル
CA2784148A1 (en) * 2009-12-28 2011-07-28 Pioneer Hi-Bred International, Inc. Sorghum fertility restorer genotypes and methods of marker-assisted selection
CN113204180B (zh) * 2021-04-16 2024-04-26 华虹半导体(无锡)有限公司 光刻方法
US11761905B2 (en) * 2021-08-26 2023-09-19 Taiwan Semiconductor Manufacturing Company Limited Inspection layer to improve the detection of defects through optical systems and methods of inspecting semiconductor device for defects
CN113731863B (zh) * 2021-09-18 2023-06-16 浙江晶科能源有限公司 电池片分选设备及电池片的分选方法

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US4131363A (en) * 1977-12-05 1978-12-26 International Business Machines Corporation Pellicle cover for projection printing system
EP0025805B1 (de) * 1979-09-21 1983-04-06 CENSOR Patent- und Versuchs-Anstalt Verfahren zur Übertragung eines Musters auf eine Halbleiterscheibe
US4509852A (en) * 1980-10-06 1985-04-09 Werner Tabarelli Apparatus for the photolithographic manufacture of integrated circuit elements
US5373806A (en) * 1985-05-20 1994-12-20 Applied Materials, Inc. Particulate-free epitaxial process
JPS648583A (en) 1987-07-01 1989-01-12 Hitachi Ltd Manufacture of magnetic memory device
US6040116A (en) * 1989-03-17 2000-03-21 Basf Aktiengesellschaft Photosensitive recording element having a recording layer and a top layer possessing different solubility properties, and its development in one operation
CA2067297C (en) 1991-05-31 1998-07-21 Kevin Yu Protected photosensitive recording films
JP2520801B2 (ja) * 1991-07-12 1996-07-31 株式会社荏原総合研究所 中空液滴流による液体移動装置
JP2753930B2 (ja) * 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
US5366559A (en) * 1993-05-27 1994-11-22 Research Triangle Institute Method for protecting a substrate surface from contamination using the photophoretic effect
JPH0729799A (ja) 1993-07-14 1995-01-31 Oki Electric Ind Co Ltd レジストパターンの形成方法
JPH07220990A (ja) * 1994-01-28 1995-08-18 Hitachi Ltd パターン形成方法及びその露光装置
US5900354A (en) * 1997-07-03 1999-05-04 Batchelder; John Samuel Method for optical inspection and lithography
US6153044A (en) 1998-04-30 2000-11-28 Euv Llc Protection of lithographic components from particle contamination
US6555234B1 (en) * 2001-02-01 2003-04-29 Advanced Micro Devices, Inc. Barrier for and a method of reducing outgassing from a photoresist material
US7175968B2 (en) * 2003-07-28 2007-02-13 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and a substrate
US7579135B2 (en) * 2003-08-11 2009-08-25 Taiwan Semiconductor Manufacturing Company, Ltd. Lithography apparatus for manufacture of integrated circuits
JP4265766B2 (ja) * 2003-08-25 2009-05-20 東京応化工業株式会社 液浸露光プロセス用レジスト保護膜形成用材料、該保護膜形成材料からなるレジスト保護膜、および該レジスト保護膜を用いたレジストパターン形成方法
JP3993549B2 (ja) * 2003-09-30 2007-10-17 株式会社東芝 レジストパターン形成方法
US7432042B2 (en) * 2003-12-03 2008-10-07 United Microelectronics Corp. Immersion lithography process and mask layer structure applied in the same

Also Published As

Publication number Publication date
CN1898608A (zh) 2007-01-17
US8067147B2 (en) 2011-11-29
US20070064215A1 (en) 2007-03-22
TW200532390A (en) 2005-10-01
WO2005064409A2 (en) 2005-07-14
KR101163095B1 (ko) 2012-07-06
KR20060128895A (ko) 2006-12-14
JP2007520058A (ja) 2007-07-19
EP1700164A2 (de) 2006-09-13
CN100555083C (zh) 2009-10-28
EP1700164B1 (de) 2010-08-04
JP4579927B2 (ja) 2010-11-10
DE602004028511D1 (de) 2010-09-16
WO2005064409A3 (en) 2006-03-09
TWI380138B (en) 2012-12-21

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