ATE482465T1 - Belichtungsvorrichtung und belichtungsverfahren - Google Patents

Belichtungsvorrichtung und belichtungsverfahren

Info

Publication number
ATE482465T1
ATE482465T1 AT05751462T AT05751462T ATE482465T1 AT E482465 T1 ATE482465 T1 AT E482465T1 AT 05751462 T AT05751462 T AT 05751462T AT 05751462 T AT05751462 T AT 05751462T AT E482465 T1 ATE482465 T1 AT E482465T1
Authority
AT
Austria
Prior art keywords
light
splitting element
optical path
optical
light splitting
Prior art date
Application number
AT05751462T
Other languages
English (en)
Inventor
Motoo Koyama
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=35509985&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE482465(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of ATE482465T1 publication Critical patent/ATE482465T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0414—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using plane or convex mirrors, parallel phase plates, or plane beam-splitters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Electron Beam Exposure (AREA)
  • Liquid Crystal (AREA)
AT05751462T 2004-06-18 2005-06-06 Belichtungsvorrichtung und belichtungsverfahren ATE482465T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004180816 2004-06-18
PCT/JP2005/010356 WO2005124831A1 (ja) 2004-06-18 2005-06-06 光検出装置、照明光学装置、露光装置、および露光方法

Publications (1)

Publication Number Publication Date
ATE482465T1 true ATE482465T1 (de) 2010-10-15

Family

ID=35509985

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05751462T ATE482465T1 (de) 2004-06-18 2005-06-06 Belichtungsvorrichtung und belichtungsverfahren

Country Status (7)

Country Link
US (1) US7573019B2 (de)
EP (1) EP1780770B2 (de)
JP (1) JP4730712B2 (de)
KR (2) KR101173715B1 (de)
AT (1) ATE482465T1 (de)
DE (1) DE602005023740D1 (de)
WO (1) WO2005124831A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI463272B (zh) * 2010-11-30 2014-12-01 牛尾電機股份有限公司 Light irradiation device
US9528906B1 (en) * 2013-12-19 2016-12-27 Apple Inc. Monitoring DOE performance using total internal reflection
US10113903B1 (en) * 2014-09-02 2018-10-30 Amazon Technologies, Inc. Ambient light sensor calibration
US10073004B2 (en) 2016-09-19 2018-09-11 Apple Inc. DOE defect monitoring utilizing total internal reflection
DE102018124314B9 (de) * 2018-10-02 2020-12-31 Carl Zeiss Smt Gmbh Vorrichtung zur Bestimmung der Belichtungsenergie bei der Belichtung eines Elements in einem optischen System, insbesondere für die Mikrolithographie
JP7801335B2 (ja) * 2020-11-24 2026-01-16 アプライド マテリアルズ インコーポレイテッド 拡張現実感計測学ツールのための照明システム
KR102760400B1 (ko) * 2021-09-08 2025-02-03 한국과학기술연구원 광학 필터 및 발광형 도파로를 이용한 투명 광 검출기

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4172646A (en) † 1972-12-11 1979-10-30 Canon Kabushiki Kaisha Device to control introduction of diffracted beam by means of diffraction element
DE2654464A1 (de) † 1976-12-01 1978-06-08 Sick Optik Elektronik Erwin Photoelektrische lichtempfangsanordnung
JPS5627117A (en) * 1979-08-10 1981-03-16 Canon Inc Light splitter
JPS5727227A (en) * 1980-07-25 1982-02-13 Canon Inc Optical separator
US4591256A (en) † 1982-11-08 1986-05-27 Canon Kabushiki Kaisha Beam splitter and light measuring device for camera
JPH0782981B2 (ja) † 1986-02-07 1995-09-06 株式会社ニコン 投影露光方法及び装置
GB9424523D0 (en) * 1994-12-05 1995-01-25 At & T Global Inf Solution Optical receiver for modulated light
JPH08203803A (ja) 1995-01-24 1996-08-09 Nikon Corp 露光装置
KR100472866B1 (ko) 1996-02-23 2005-10-06 에이에스엠엘 네델란즈 비.브이. 광학적장치용조명유닛
JPH10153866A (ja) * 1996-11-22 1998-06-09 Nikon Corp 照明装置および該照明装置を備えた露光装置
JP3762102B2 (ja) † 1998-06-04 2006-04-05 キヤノン株式会社 走査型投影露光装置及びそれを用いたデバイスの製造方法
JP3710321B2 (ja) 1999-04-01 2005-10-26 キヤノン株式会社 露光量制御方法、露光装置およびデバイス製造方法
JP2001059905A (ja) * 1999-06-16 2001-03-06 Matsushita Electronics Industry Corp 回折型光学素子および当該回折型光学素子を用いた光ピックアップ
US6728034B1 (en) † 1999-06-16 2004-04-27 Matsushita Electric Industrial Co., Ltd. Diffractive optical element that polarizes light and an optical pickup using the same
DE10059961A1 (de) † 2000-01-11 2001-07-12 Zeiss Carl Strahlenteiler
JP2003110802A (ja) * 2001-09-27 2003-04-11 Fuji Photo Film Co Ltd 撮像装置
JP2003257846A (ja) * 2002-03-07 2003-09-12 Nikon Corp 光源ユニット、照明装置、露光装置及び露光方法

Also Published As

Publication number Publication date
HK1099606A1 (en) 2007-08-17
EP1780770B1 (de) 2010-09-22
JPWO2005124831A1 (ja) 2008-04-17
KR101251167B1 (ko) 2013-04-05
KR20120034139A (ko) 2012-04-09
US7573019B2 (en) 2009-08-11
EP1780770A4 (de) 2008-02-27
DE602005023740D1 (de) 2010-11-04
US20080042044A1 (en) 2008-02-21
KR101173715B1 (ko) 2012-08-13
EP1780770B2 (de) 2017-01-25
JP4730712B2 (ja) 2011-07-20
WO2005124831A1 (ja) 2005-12-29
EP1780770A1 (de) 2007-05-02
KR20070026797A (ko) 2007-03-08

Similar Documents

Publication Publication Date Title
SE0501397L (sv) Optiskt testsystem
TW200951646A (en) Surface position detection device, exposure device, surface position detection method and device production method
WO2009041709A3 (en) Localized surface plasmon resonance sensor and method of detecting a target substance using said sensor
ATE460641T1 (de) Optisches bildmessgerät
JP2007508714A5 (de)
TW200739928A (en) Photo detector and optically interconnected LSI
ATE280942T1 (de) Erfassen der randkante, markierung einer laufenden warenbahn mit zweiter diffuser lichtquelle sowie lichtzeiger
ATE398764T1 (de) Optische positionsmesseinrichtung
WO2008043915A3 (fr) Dispositif de transport d'une substance muni d'un detecteur optique de fuite
WO2008081179A3 (en) Detection of ionising radiation
WO2009007977A3 (en) Method and apparatus for duv transmission mapping
WO2008094285A3 (en) Miniaturized surface plasmon resonance imaging system
SG169987A1 (en) Plane position detecting apparatus, exposure apparatus and device manufacturing method
WO2009112704A8 (fr) Dispositif d'inspection de plaquettes semi-conductrices
ATE482465T1 (de) Belichtungsvorrichtung und belichtungsverfahren
EP1903314A3 (de) Nullpunktfeststellungsverfahren für optischen Kodierer
ATE460646T1 (de) Kodierer
EP1431752A3 (de) Verfahren und Vorrichtung zur Inspektion von Oberflächen
DK2166223T3 (da) Fremgangsmåde til opretning af en komponent i en vindretning og sensor til bestemmelse af fejlagtig opretning af komponenten i forhold til en vindretning
WO2008084608A1 (ja) 免疫クロマト試験片の測定装置
DE502007003444D1 (de) Temperaturmessanordnung
TW200610963A (en) Surface inspection apparatus, polarization illuminating device and light-receiving device
WO2003100365A3 (de) Optikerfassungsvorrichtung
EP1953511A3 (de) Thermische Bildwandlermatrix mit optischem Leseverfahren
WO2003009010A3 (en) Transmissive optical disc assemblies for performing physical measurements

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties