ATE488615T1 - Mikrowellenstrahler für eine elektron-zyklotron- resonanz-plasmaquelle - Google Patents

Mikrowellenstrahler für eine elektron-zyklotron- resonanz-plasmaquelle

Info

Publication number
ATE488615T1
ATE488615T1 AT97934029T AT97934029T ATE488615T1 AT E488615 T1 ATE488615 T1 AT E488615T1 AT 97934029 T AT97934029 T AT 97934029T AT 97934029 T AT97934029 T AT 97934029T AT E488615 T1 ATE488615 T1 AT E488615T1
Authority
AT
Austria
Prior art keywords
plasma
microwave power
electron cyclotron
chamber
microwave
Prior art date
Application number
AT97934029T
Other languages
English (en)
Inventor
Raphael Dandl
Original Assignee
Asm Int
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asm Int filed Critical Asm Int
Application granted granted Critical
Publication of ATE488615T1 publication Critical patent/ATE488615T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/3222—Antennas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32229—Waveguides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32247—Resonators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32678—Electron cyclotron resonance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32688—Multi-cusp fields

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Lasers (AREA)
  • Plasma Technology (AREA)
AT97934029T 1996-07-08 1997-07-01 Mikrowellenstrahler für eine elektron-zyklotron- resonanz-plasmaquelle ATE488615T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/676,448 US5707452A (en) 1996-07-08 1996-07-08 Coaxial microwave applicator for an electron cyclotron resonance plasma source
PCT/US1997/011381 WO1998001599A1 (en) 1996-07-08 1997-07-01 Microwave applicator for an electron cyclotron resonance plasma source

Publications (1)

Publication Number Publication Date
ATE488615T1 true ATE488615T1 (de) 2010-12-15

Family

ID=24714568

Family Applications (1)

Application Number Title Priority Date Filing Date
AT97934029T ATE488615T1 (de) 1996-07-08 1997-07-01 Mikrowellenstrahler für eine elektron-zyklotron- resonanz-plasmaquelle

Country Status (6)

Country Link
US (1) US5707452A (de)
EP (1) EP0914496B1 (de)
JP (1) JP4671313B2 (de)
AT (1) ATE488615T1 (de)
DE (1) DE69740054D1 (de)
WO (1) WO1998001599A1 (de)

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JPH09266096A (ja) * 1996-03-28 1997-10-07 Hitachi Ltd プラズマ処理装置及びこれを用いたプラズマ処理方法
US5975014A (en) * 1996-07-08 1999-11-02 Asm Japan K.K. Coaxial resonant multi-port microwave applicator for an ECR plasma source
US6132632A (en) * 1997-09-11 2000-10-17 International Business Machines Corporation Method and apparatus for achieving etch rate uniformity in a reactive ion etcher
US6186090B1 (en) * 1999-03-04 2001-02-13 Energy Conversion Devices, Inc. Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor
AU1606101A (en) * 1999-11-15 2001-05-30 Lam Research Corporation Materials and gas chemistries for processing systems
JP2001203099A (ja) 2000-01-20 2001-07-27 Yac Co Ltd プラズマ生成装置およびプラズマ処理装置
US7067034B2 (en) * 2000-03-27 2006-06-27 Lam Research Corporation Method and apparatus for plasma forming inner magnetic bucket to control a volume of a plasma
US6632322B1 (en) * 2000-06-30 2003-10-14 Lam Research Corporation Switched uniformity control
US6703628B2 (en) 2000-07-25 2004-03-09 Axceliss Technologies, Inc Method and system for ion beam containment in an ion beam guide
US6414329B1 (en) * 2000-07-25 2002-07-02 Axcelis Technologies, Inc. Method and system for microwave excitation of plasma in an ion beam guide
US6541781B1 (en) * 2000-07-25 2003-04-01 Axcelis Technologies, Inc. Waveguide for microwave excitation of plasma in an ion beam guide
DE10044867A1 (de) 2000-09-12 2002-03-21 Rheinmetall W & M Gmbh Explosivstoffgetriebene RF-Strahlenquelle
JP4173679B2 (ja) * 2002-04-09 2008-10-29 エム・イー・エス・アフティ株式会社 Ｅｃｒプラズマ源およびｅｃｒプラズマ装置
US6905773B2 (en) * 2002-10-22 2005-06-14 Schlage Lock Company Corrosion-resistant coatings and methods of manufacturing the same
US20040227106A1 (en) * 2003-05-13 2004-11-18 Halling Alfred M. System and methods for ion beam containment using localized electrostatic fields in an ion beam passageway
US6891174B2 (en) * 2003-07-31 2005-05-10 Axcelis Technologies, Inc. Method and system for ion beam containment using photoelectrons in an ion beam guide
US7493869B1 (en) 2005-12-16 2009-02-24 The United States Of America As Represented By The Administration Of Nasa Very large area/volume microwave ECR plasma and ion source
CA2638183C (en) * 2007-08-03 2016-11-15 Mcmaster University Electromagnetic wave-potential communication system
US20120326592A1 (en) * 2011-06-21 2012-12-27 Jozef Kudela Transmission Line RF Applicator for Plasma Chamber
NL2007968C2 (en) * 2011-12-14 2013-06-17 Draka Comteq Bv An apparatus for performing a plasma chemical vapour deposition process.
NL2017575B1 (en) 2016-10-04 2018-04-13 Draka Comteq Bv A method and an apparatus for performing a plasma chemical vapour deposition process and a method
GB2569812A (en) * 2017-12-27 2019-07-03 Creo Medical Ltd Electrosurgical ablation instrument
ES2696227B2 (es) * 2018-07-10 2019-06-12 Centro De Investig Energeticas Medioambientales Y Tecnologicas Ciemat Fuente de iones interna para ciclotrones de baja erosion
CN114624256B (zh) * 2022-03-31 2023-07-25 核工业西南物理研究院 用于测量磁流体不稳定性模数的三维微波反射系统及方法
CN116190188A (zh) * 2022-12-12 2023-05-30 广东澳地特电气技术有限公司 微波等离子体清洗装置
CN117500136B (zh) * 2023-10-19 2025-10-17 哈尔滨工业大学 一种高效产生大体积ecr等离子体装置

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JP2567892B2 (ja) * 1988-01-22 1996-12-25 株式会社日立製作所 プラズマ処理装置
JPH0614760Y2 (ja) * 1989-03-24 1994-04-20 株式会社トキメック 加温療法用マイクロ波放射器
US5133826A (en) * 1989-03-09 1992-07-28 Applied Microwave Plasma Concepts, Inc. Electron cyclotron resonance plasma source
US5370765A (en) * 1989-03-09 1994-12-06 Applied Microwave Plasma Concepts, Inc. Electron cyclotron resonance plasma source and method of operation
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JPH07144025A (ja) * 1993-11-22 1995-06-06 Olympus Optical Co Ltd 加温治療装置
JP3171222B2 (ja) * 1994-06-14 2001-05-28 日本電気株式会社 マイクロ波プラズマ処理装置
JP3438109B2 (ja) * 1994-08-12 2003-08-18 富士通株式会社 プラズマ処理装置及びプラズマ処理方法

Also Published As

Publication number Publication date
EP0914496A1 (de) 1999-05-12
JP4671313B2 (ja) 2011-04-13
JP2000514595A (ja) 2000-10-31
EP0914496B1 (de) 2010-11-17
WO1998001599A1 (en) 1998-01-15
US5707452A (en) 1998-01-13
EP0914496A4 (de) 2007-02-14
DE69740054D1 (de) 2010-12-30

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