ATE489838T1 - Verfahren und vorrichtung zur erzeugung von röntgenstrahlung - Google Patents

Verfahren und vorrichtung zur erzeugung von röntgenstrahlung

Info

Publication number
ATE489838T1
ATE489838T1 AT01952078T AT01952078T ATE489838T1 AT E489838 T1 ATE489838 T1 AT E489838T1 AT 01952078 T AT01952078 T AT 01952078T AT 01952078 T AT01952078 T AT 01952078T AT E489838 T1 ATE489838 T1 AT E489838T1
Authority
AT
Austria
Prior art keywords
ray
jet
generating
plasma
generated
Prior art date
Application number
AT01952078T
Other languages
English (en)
Inventor
Hans Hertz
Oscar Hemberg
Original Assignee
Jettec Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from SE0002785A external-priority patent/SE0002785D0/xx
Priority claimed from SE0003073A external-priority patent/SE522150C2/sv
Application filed by Jettec Ab filed Critical Jettec Ab
Application granted granted Critical
Publication of ATE489838T1 publication Critical patent/ATE489838T1/de

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • H05G2/0027—Arrangements for controlling the supply; Arrangements for measurements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H01J35/112—Non-rotating anodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/08—Targets (anodes) and X-ray converters
    • H01J2235/081—Target material
    • H01J2235/082—Fluids, e.g. liquids, gases

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
AT01952078T 2000-07-28 2001-07-18 Verfahren und vorrichtung zur erzeugung von röntgenstrahlung ATE489838T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
SE0002785A SE0002785D0 (sv) 2000-07-28 2000-07-28 Method and apparatus for generating x-ray or EUV radiation as well as use thereof
SE0003073A SE522150C2 (sv) 2000-08-31 2000-08-31 Förfarande och apparat för alstring av röntgenstrålning samt användning därav
PCT/SE2001/001646 WO2002011499A1 (en) 2000-07-28 2001-07-18 Method and apparatus for generating x-ray or euv radiation

Publications (1)

Publication Number Publication Date
ATE489838T1 true ATE489838T1 (de) 2010-12-15

Family

ID=26655193

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01952078T ATE489838T1 (de) 2000-07-28 2001-07-18 Verfahren und vorrichtung zur erzeugung von röntgenstrahlung

Country Status (7)

Country Link
EP (1) EP1305984B1 (de)
JP (1) JP5073146B2 (de)
CN (1) CN1272989C (de)
AT (1) ATE489838T1 (de)
AU (1) AU2001272873A1 (de)
DE (1) DE60143527D1 (de)
WO (1) WO2002011499A1 (de)

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DE10339495B4 (de) * 2002-10-08 2007-10-04 Xtreme Technologies Gmbh Anordnung zur optischen Detektion eines bewegten Targetstromes für eine gepulste energiestrahlgepumpte Strahlungserzeugung
US6933515B2 (en) * 2003-06-26 2005-08-23 University Of Central Florida Research Foundation Laser-produced plasma EUV light source with isolated plasma
DE102004003854A1 (de) * 2004-01-26 2005-08-18 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Verfahren und Vorrichtungen zur Erzeugung fester Filamente in einer Vakuumkammer
JP4337648B2 (ja) * 2004-06-24 2009-09-30 株式会社ニコン Ｅｕｖ光源、ｅｕｖ露光装置、及び半導体デバイスの製造方法
US7557366B2 (en) * 2006-05-04 2009-07-07 Asml Netherlands B.V. Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
SE530094C2 (sv) * 2006-05-11 2008-02-26 Jettec Ab Metod för alstring av röntgenstrålning genom elektronbestrålning av en flytande substans
KR101437583B1 (ko) * 2007-07-03 2014-09-12 삼성전자주식회사 리소그라피 장치 및 리소그라피 방법
DE102008026938A1 (de) 2008-06-05 2009-12-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Strahlungsquelle und Verfahren zum Erzeugen von Röntgenstrahlung
CN104681378B (zh) * 2009-04-03 2017-04-12 伊克斯拉姆公司 在x射线产生中液体金属靶的供应
CN102369587B (zh) * 2009-04-03 2015-02-11 伊克斯拉姆公司 在x射线产生中液体金属靶的供应
JP2011054376A (ja) * 2009-09-01 2011-03-17 Ihi Corp Ｌｐｐ方式のｅｕｖ光源とその発生方法
CN102972099B (zh) * 2010-07-09 2016-03-23 Bsr股份有限公司 X射线产生装置及电子束放出装置
JP5167475B2 (ja) * 2010-12-27 2013-03-21 双葉電子工業株式会社 光殺菌装置および紫外線エックス線発生装置
JP5347138B2 (ja) * 2010-12-27 2013-11-20 双葉電子工業株式会社 光殺菌装置および紫外線エックス線発生装置
US20140161233A1 (en) * 2012-12-06 2014-06-12 Bruker Axs Gmbh X-ray apparatus with deflectable electron beam
CN103079327B (zh) * 2013-01-05 2015-09-09 中国科学院微电子研究所 一种靶源预整形增强的极紫外光发生装置
US9767982B2 (en) * 2013-02-13 2017-09-19 Koninklijke Philips N.V. Multiple X-ray beam tube
CN103209536A (zh) * 2013-03-22 2013-07-17 中国科学院上海光学精密机械研究所 产生软x射线的方法
DE102013209447A1 (de) * 2013-05-22 2014-11-27 Siemens Aktiengesellschaft Röntgenquelle und Verfahren zur Erzeugung von Röntgenstrahlung
DE102013220189A1 (de) 2013-10-07 2015-04-23 Siemens Aktiengesellschaft Röntgenquelle und Verfahren zur Erzeugung von Röntgenstrahlung
EP3091903B1 (de) * 2014-01-07 2018-10-03 Jettec AB Röntgenstrahl-mikroabbildung
CN103871832B (zh) * 2014-03-21 2016-08-24 中国科学院空间科学与应用研究中心 一种极紫外脉冲发生调制器
WO2016010448A1 (en) * 2014-07-17 2016-01-21 Siemens Aktiengesellschaft Fluid injector for x-ray tubes and method to provide a liquid anode by liquid metal injection
US9301381B1 (en) * 2014-09-12 2016-03-29 International Business Machines Corporation Dual pulse driven extreme ultraviolet (EUV) radiation source utilizing a droplet comprising a metal core with dual concentric shells of buffer gas
DE102014226814B4 (de) * 2014-12-22 2023-05-11 Siemens Healthcare Gmbh Metallstrahlröntgenröhre
DE102014226813A1 (de) * 2014-12-22 2016-06-23 Siemens Aktiengesellschaft Metallstrahlröntgenröhre
EP3214635A1 (de) * 2016-03-01 2017-09-06 Excillum AB Flüssig-target-röntgenquelle mit strahlmischwerkzeug
RU2709183C1 (ru) * 2019-04-26 2019-12-17 Общество С Ограниченной Ответственностью "Эуф Лабс" Источник рентгеновского излучения с жидкометаллической мишенью и способ генерации излучения
RU2670273C2 (ru) * 2017-11-24 2018-10-22 Общество с ограниченной ответственностью "РнД-ИСАН" Устройство и способ для генерации излучения из лазерной плазмы
EP3493239A1 (de) * 2017-12-01 2019-06-05 Excillum AB Röntgenquelle und verfahren zum erzeugen von röntgenstrahlung
CN113728410B (zh) * 2019-04-26 2025-02-14 伊斯泰克私人有限公司 具有旋转液态金属靶的x射线源
KR102447685B1 (ko) * 2020-07-22 2022-09-27 포항공과대학교 산학협력단 특정 파장대의 광원을 발생시키기 위한 장치 및 방법
KR102895880B1 (ko) * 2021-09-10 2025-12-03 경희대학교 산학협력단 전자빔 및 액적 기반 극자외선 광원 장치
US11882642B2 (en) 2021-12-29 2024-01-23 Innovicum Technology Ab Particle based X-ray source
EP4457850A1 (de) 2021-12-29 2024-11-06 Innovicum Technology AB Partikelbasierte röntgenquelle

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JPS61153935A (ja) * 1984-12-26 1986-07-12 Toshiba Corp プラズマｘ線発生装置
US4953191A (en) * 1989-07-24 1990-08-28 The United States Of America As Represented By The United States Department Of Energy High intensity x-ray source using liquid gallium target
US5052034A (en) 1989-10-30 1991-09-24 Siemens Aktiengesellschaft X-ray generator
JPH03283398A (ja) * 1990-03-30 1991-12-13 Shimadzu Corp Ｘ線発生装置
JPH05258692A (ja) * 1992-03-10 1993-10-08 Nikon Corp Ｘ線発生方法およびｘ線発生装置
JP2552433B2 (ja) * 1994-06-30 1996-11-13 関西電力株式会社 レーザープラズマｘ線源のデブリス除去方法及び装置
JPH08162286A (ja) * 1994-12-07 1996-06-21 Olympus Optical Co Ltd レーザプラズマ光源
SE510133C2 (sv) * 1996-04-25 1999-04-19 Jettec Ab Laser-plasma röntgenkälla utnyttjande vätskor som strålmål
JPH10221499A (ja) * 1997-02-07 1998-08-21 Hitachi Ltd レーザプラズマｘ線源およびそれを用いた半導体露光装置並びに半導体露光方法
US6031241A (en) * 1997-03-11 2000-02-29 University Of Central Florida Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications
US5763930A (en) * 1997-05-12 1998-06-09 Cymer, Inc. Plasma focus high energy photon source
JP3817848B2 (ja) * 1997-07-18 2006-09-06 株式会社ニコン 照明装置
AU3466899A (en) * 1998-04-03 1999-10-25 Advanced Energy Systems, Inc. Diffuser system and energy emission system for photolithography
DE19821939A1 (de) * 1998-05-15 1999-11-18 Philips Patentverwaltung Röntgenstrahler mit einem Flüssigmetall-Target
JP3602356B2 (ja) * 1998-12-02 2004-12-15 三菱電機株式会社 電磁波発生装置

Also Published As

Publication number Publication date
DE60143527D1 (de) 2011-01-05
JP2004505421A (ja) 2004-02-19
CN1272989C (zh) 2006-08-30
AU2001272873A1 (en) 2002-02-13
JP5073146B2 (ja) 2012-11-14
EP1305984A1 (de) 2003-05-02
CN1466860A (zh) 2004-01-07
EP1305984B1 (de) 2010-11-24
WO2002011499A1 (en) 2002-02-07

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