ATE491972T1 - Verfahren und vorrichtung zum drucken grosser datenströme - Google Patents

Verfahren und vorrichtung zum drucken grosser datenströme

Info

Publication number
ATE491972T1
ATE491972T1 AT03745053T AT03745053T ATE491972T1 AT E491972 T1 ATE491972 T1 AT E491972T1 AT 03745053 T AT03745053 T AT 03745053T AT 03745053 T AT03745053 T AT 03745053T AT E491972 T1 ATE491972 T1 AT E491972T1
Authority
AT
Austria
Prior art keywords
workpiece
locations
data representation
field
stripe
Prior art date
Application number
AT03745053T
Other languages
English (en)
Inventor
Anders Thuren
Der Mast Karel Van
Arno Bleeker
Original Assignee
Micronic Laser Systems Ab
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micronic Laser Systems Ab, Asml Netherlands Bv filed Critical Micronic Laser Systems Ab
Application granted granted Critical
Publication of ATE491972T1 publication Critical patent/ATE491972T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
    • B41J2/447—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources
    • B41J2/455—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources using laser arrays, the laser array being smaller than the medium to be recorded
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Dot-Matrix Printers And Others (AREA)
  • Printing Methods (AREA)
  • Recording Measured Values (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Adornments (AREA)
AT03745053T 2002-03-21 2003-03-19 Verfahren und vorrichtung zum drucken grosser datenströme ATE491972T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SE0200864A SE0200864D0 (sv) 2002-03-21 2002-03-21 Method and apparatus for printing large data flows
PCT/SE2003/000462 WO2003081338A1 (en) 2002-03-21 2003-03-19 Method and apparatus for printing large data flows

Publications (1)

Publication Number Publication Date
ATE491972T1 true ATE491972T1 (de) 2011-01-15

Family

ID=20287344

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03745053T ATE491972T1 (de) 2002-03-21 2003-03-19 Verfahren und vorrichtung zum drucken grosser datenströme

Country Status (10)

Country Link
US (1) US7167231B2 (de)
EP (1) EP1485763B1 (de)
JP (1) JP2005521253A (de)
KR (1) KR100879195B1 (de)
CN (1) CN100472325C (de)
AT (1) ATE491972T1 (de)
AU (1) AU2003216005A1 (de)
DE (1) DE60335349D1 (de)
SE (1) SE0200864D0 (de)
WO (1) WO2003081338A1 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7317510B2 (en) 2004-12-27 2008-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7965373B2 (en) 2005-06-28 2011-06-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing a datapath having a balanced calculation load
CN101305323B (zh) * 2005-09-26 2011-03-30 麦克罗尼克激光系统公司 用于基于多种形式的设计数据的图案生成的方法和系统
WO2009011119A1 (ja) * 2007-07-13 2009-01-22 Nikon Corporation パターン形成方法及び装置、露光方法及び装置、並びにデバイス製造方法及びデバイス
JP5020745B2 (ja) * 2007-08-29 2012-09-05 株式会社ニューフレアテクノロジー 描画データの作成方法及び荷電粒子ビーム描画装置
US8065638B2 (en) 2009-01-30 2011-11-22 Synopsys, Inc. Incremental concurrent processing for efficient computation of high-volume layout data
US8893061B2 (en) * 2009-01-30 2014-11-18 Synopsys, Inc. Incremental concurrent processing for efficient computation of high-volume layout data
CN102109614A (zh) * 2010-11-30 2011-06-29 中国石油集团川庆钻探工程有限公司 一种将地震资料绘制成图件的方法
CN102043166A (zh) * 2010-12-15 2011-05-04 中国石油集团川庆钻探工程有限公司 一种地震数据的处理方法
US8507159B2 (en) 2011-03-16 2013-08-13 Taiwan Semiconductor Manufacturing Company, Ltd. Electron beam data storage system and method for high volume manufacturing
US8473877B2 (en) * 2011-09-06 2013-06-25 Taiwan Semiconductor Manufacturing Company, Ltd. Striping methodology for maskless lithography
WO2013079316A2 (en) * 2011-11-29 2013-06-06 Asml Netherlands B.V. Apparatus and method for converting a vector-based representation of a desired device pattern for a lithography apparatus, apparatus and method for providing data to a programmable patterning device, a lithography apparatus and a device manufacturing method
US8609308B1 (en) 2012-05-31 2013-12-17 Taiwan Semicondcutor Manufacturing Company, Ltd. Smart subfield method for E-beam lithography

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69331547T2 (de) * 1992-11-02 2003-04-24 Applied Materials, Inc. (N.D.Ges.D. Staates Delaware) Bildformattierung für ein mustererzeugungsgerät
US5488571A (en) * 1993-11-22 1996-01-30 Timex Corporation Method and apparatus for downloading information from a controllable light source to a portable information device
US5631721A (en) * 1995-05-24 1997-05-20 Svg Lithography Systems, Inc. Hybrid illumination system for use in photolithography
SE9800665D0 (sv) * 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
SE516914C2 (sv) * 1999-09-09 2002-03-19 Micronic Laser Systems Ab Metoder och rastrerare för högpresterande mönstergenerering
SE517550C2 (sv) * 2000-04-17 2002-06-18 Micronic Laser Systems Ab Mönstergenereringssystem användande en spatialljusmodulator

Also Published As

Publication number Publication date
WO2003081338A1 (en) 2003-10-02
EP1485763B1 (de) 2010-12-15
EP1485763A1 (de) 2004-12-15
SE0200864D0 (sv) 2002-03-21
US7167231B2 (en) 2007-01-23
DE60335349D1 (de) 2011-01-27
KR20040094830A (ko) 2004-11-10
AU2003216005A1 (en) 2003-10-08
CN100472325C (zh) 2009-03-25
KR100879195B1 (ko) 2009-01-16
CN1643453A (zh) 2005-07-20
JP2005521253A (ja) 2005-07-14
HK1076513A1 (zh) 2006-01-20
US20060055903A1 (en) 2006-03-16

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