ATE494634T1 - Widerstand einer integrierten schaltung - Google Patents

Widerstand einer integrierten schaltung

Info

Publication number
ATE494634T1
ATE494634T1 AT05789167T AT05789167T ATE494634T1 AT E494634 T1 ATE494634 T1 AT E494634T1 AT 05789167 T AT05789167 T AT 05789167T AT 05789167 T AT05789167 T AT 05789167T AT E494634 T1 ATE494634 T1 AT E494634T1
Authority
AT
Austria
Prior art keywords
integrated circuit
resistance
contacts
mesa
recesses
Prior art date
Application number
AT05789167T
Other languages
English (en)
Inventor
David Heston
Jon Mooney
Original Assignee
Raytheon Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Raytheon Co filed Critical Raytheon Co
Application granted granted Critical
Publication of ATE494634T1 publication Critical patent/ATE494634T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/201—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits
    • H10D84/204—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits of combinations of diodes or capacitors or resistors
    • H10D84/209—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits of combinations of diodes or capacitors or resistors of only resistors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01—Manufacture or treatment
    • H10D84/02—Manufacture or treatment characterised by using material-based technologies
    • H10D84/05—Manufacture or treatment characterised by using material-based technologies using Group III-V technology

Landscapes

  • Semiconductor Integrated Circuits (AREA)
  • Networks Using Active Elements (AREA)
AT05789167T 2004-08-13 2005-08-11 Widerstand einer integrierten schaltung ATE494634T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/917,935 US7199016B2 (en) 2004-08-13 2004-08-13 Integrated circuit resistor
PCT/US2005/028776 WO2006020887A1 (en) 2004-08-13 2005-08-11 Integrated circuit resistor

Publications (1)

Publication Number Publication Date
ATE494634T1 true ATE494634T1 (de) 2011-01-15

Family

ID=35519698

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05789167T ATE494634T1 (de) 2004-08-13 2005-08-11 Widerstand einer integrierten schaltung

Country Status (8)

Country Link
US (2) US7199016B2 (de)
EP (1) EP1790009B1 (de)
JP (1) JP5183199B2 (de)
KR (1) KR101164272B1 (de)
CN (1) CN100524759C (de)
AT (1) ATE494634T1 (de)
DE (1) DE602005025781D1 (de)
WO (1) WO2006020887A1 (de)

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US8009011B2 (en) * 2007-06-29 2011-08-30 Semtech Corporation Electrically adjustable resistor
JP5468730B2 (ja) * 2007-08-28 2014-04-09 セイコーインスツル株式会社 半導体装置およびその製造方法
US8735734B2 (en) * 2009-07-23 2014-05-27 Lexmark International, Inc. Z-directed delay line components for printed circuit boards
US20110017504A1 (en) * 2009-07-23 2011-01-27 Keith Bryan Hardin Z-Directed Ferrite Bead Components for Printed Circuit Boards
US8237061B2 (en) * 2009-07-23 2012-08-07 Lexmark International, Inc. Z-directed filter components for printed circuit boards
US8198547B2 (en) 2009-07-23 2012-06-12 Lexmark International, Inc. Z-directed pass-through components for printed circuit boards
US20110017502A1 (en) * 2009-07-23 2011-01-27 Keith Bryan Hardin Z-Directed Components for Printed Circuit Boards
US20110017581A1 (en) * 2009-07-23 2011-01-27 Keith Bryan Hardin Z-Directed Switch Components for Printed Circuit Boards
US8278568B2 (en) * 2009-07-23 2012-10-02 Lexmark International, Inc. Z-directed variable value components for printed circuit boards
US8198548B2 (en) * 2009-07-23 2012-06-12 Lexmark International, Inc. Z-directed capacitor components for printed circuit boards
US8273996B2 (en) * 2009-07-23 2012-09-25 Lexmark International, Inc. Z-directed connector components for printed circuit boards
WO2011107161A1 (en) 2010-03-05 2011-09-09 Epcos Ag Resistance component
US8624353B2 (en) * 2010-12-22 2014-01-07 Stats Chippac, Ltd. Semiconductor device and method of forming integrated passive device over semiconductor die with conductive bridge and fan-out redistribution layer
WO2012099605A1 (en) * 2011-01-21 2012-07-26 Lexmark International, Inc. Z-directed variable value components for printed circuit boards
KR101045024B1 (ko) * 2011-05-12 2011-06-30 류순모 고층 건물의 화재피난용 맨홀개폐장치
US8943684B2 (en) * 2011-08-31 2015-02-03 Lexmark International, Inc. Continuous extrusion process for manufacturing a Z-directed component for a printed circuit board
US9009954B2 (en) 2011-08-31 2015-04-21 Lexmark International, Inc. Process for manufacturing a Z-directed component for a printed circuit board using a sacrificial constraining material
US8752280B2 (en) 2011-09-30 2014-06-17 Lexmark International, Inc. Extrusion process for manufacturing a Z-directed component for a printed circuit board
US8658245B2 (en) 2011-08-31 2014-02-25 Lexmark International, Inc. Spin coat process for manufacturing a Z-directed component for a printed circuit board
US8790520B2 (en) 2011-08-31 2014-07-29 Lexmark International, Inc. Die press process for manufacturing a Z-directed component for a printed circuit board
US9078374B2 (en) 2011-08-31 2015-07-07 Lexmark International, Inc. Screening process for manufacturing a Z-directed component for a printed circuit board
US8822840B2 (en) 2012-03-29 2014-09-02 Lexmark International, Inc. Z-directed printed circuit board components having conductive channels for controlling transmission line impedance
US8912452B2 (en) 2012-03-29 2014-12-16 Lexmark International, Inc. Z-directed printed circuit board components having different dielectric regions
US8822838B2 (en) 2012-03-29 2014-09-02 Lexmark International, Inc. Z-directed printed circuit board components having conductive channels for reducing radiated emissions
US8830692B2 (en) 2012-03-29 2014-09-09 Lexmark International, Inc. Ball grid array systems for surface mounting an integrated circuit using a Z-directed printed circuit board component
KR102241249B1 (ko) * 2012-12-25 2021-04-15 가부시키가이샤 한도오따이 에네루기 켄큐쇼 저항 소자, 표시 장치, 및 전자기기
US10236123B2 (en) 2015-07-19 2019-03-19 Vq Research, Inc. Methods and systems to minimize delamination of multilayer ceramic capacitors
US10128047B2 (en) 2015-07-19 2018-11-13 Vq Research, Inc. Methods and systems for increasing surface area of multilayer ceramic capacitors
US10431508B2 (en) 2015-07-19 2019-10-01 Vq Research, Inc. Methods and systems to improve printed electrical components and for integration in circuits
US10242803B2 (en) 2015-07-19 2019-03-26 Vq Research, Inc. Methods and systems for geometric optimization of multilayer ceramic capacitors
US10332684B2 (en) 2015-07-19 2019-06-25 Vq Research, Inc. Methods and systems for material cladding of multilayer ceramic capacitors
US10535651B2 (en) 2016-10-12 2020-01-14 Mediatek Inc. Impedance circuit with poly-resistor
US10510823B2 (en) 2016-10-12 2019-12-17 Mediatek Inc. Impedance circuit with poly-resistor
US10461702B2 (en) 2017-04-19 2019-10-29 Mediatek Inc. Amplifier circuit having poly resistor with biased depletion region

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JPS59214250A (ja) 1983-05-20 1984-12-04 Toshiba Corp 半導体装置
JPS62217671A (ja) * 1986-03-19 1987-09-25 Fujitsu Ltd 電界効果型トランジスタの製造方法
IT1197776B (it) 1986-07-15 1988-12-06 Gte Telecom Spa Processo per l'ottenimento di circuiti passivi a strato sottile con linee resistive a differenti resistenze di strato e circuito passivo realizzato con il processo suddetto
US4701241A (en) * 1986-10-06 1987-10-20 Rca Corporation Method of making a resistor
US5141597A (en) * 1990-11-14 1992-08-25 United Technologies Corporation Thin polysilicon resistors
JPH09321063A (ja) * 1996-05-31 1997-12-12 Nec Corp 半導体装置およびその製造方法
JPH1012630A (ja) 1996-06-20 1998-01-16 Mitsubishi Electric Corp 高周波集積回路装置
JPH10242394A (ja) * 1997-02-27 1998-09-11 Matsushita Electron Corp 半導体装置の製造方法
JP2000101067A (ja) * 1998-09-18 2000-04-07 Hitachi Ltd 半導体装置および集積回路装置
US6307221B1 (en) * 1998-11-18 2001-10-23 The Whitaker Corporation InxGa1-xP etch stop layer for double recess pseudomorphic high electron mobility transistor structures
JP2001015767A (ja) 1999-06-29 2001-01-19 Toshiba Corp 化合物半導体装置
US6797994B1 (en) 2000-02-14 2004-09-28 Raytheon Company Double recessed transistor
JP2003060044A (ja) 2001-08-09 2003-02-28 Seiko Epson Corp 半導体抵抗素子及びその製造方法
US8546884B2 (en) * 2002-10-29 2013-10-01 Avago Technologies General Ip (Singapore) Pte. Ltd. High value resistors in gallium arsenide
JP4064800B2 (ja) 2002-12-10 2008-03-19 株式会社東芝 ヘテロ接合型化合物半導体電界効果トランジスタ及びその製造方法
US7183593B2 (en) * 2003-12-05 2007-02-27 Taiwan Semiconductor Manufacturing Company, Ltd. Heterostructure resistor and method of forming the same
US7015519B2 (en) * 2004-02-20 2006-03-21 Anadigics, Inc. Structures and methods for fabricating vertically integrated HBT/FET device
JP2005340549A (ja) * 2004-05-28 2005-12-08 Sanyo Electric Co Ltd 半導体装置およびその製造方法

Also Published As

Publication number Publication date
DE602005025781D1 (de) 2011-02-17
JP2008510308A (ja) 2008-04-03
WO2006020887A1 (en) 2006-02-23
EP1790009B1 (de) 2011-01-05
EP1790009A1 (de) 2007-05-30
KR20070050080A (ko) 2007-05-14
US20060033177A1 (en) 2006-02-16
US20070138646A1 (en) 2007-06-21
CN100524759C (zh) 2009-08-05
JP5183199B2 (ja) 2013-04-17
CN101006583A (zh) 2007-07-25
US7199016B2 (en) 2007-04-03
KR101164272B1 (ko) 2012-07-09
US7884442B2 (en) 2011-02-08

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