ATE495544T1 - Einrichtung und verfahren zur nassbehandlung von plattenartigen artikeln - Google Patents

Einrichtung und verfahren zur nassbehandlung von plattenartigen artikeln

Info

Publication number
ATE495544T1
ATE495544T1 AT07822697T AT07822697T ATE495544T1 AT E495544 T1 ATE495544 T1 AT E495544T1 AT 07822697 T AT07822697 T AT 07822697T AT 07822697 T AT07822697 T AT 07822697T AT E495544 T1 ATE495544 T1 AT E495544T1
Authority
AT
Austria
Prior art keywords
chuck
plate
shaped surface
ring
article
Prior art date
Application number
AT07822697T
Other languages
English (en)
Inventor
Michael Brugger
Alexander Schwarzfurtner
Original Assignee
Lam Res Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Ag filed Critical Lam Res Ag
Application granted granted Critical
Publication of ATE495544T1 publication Critical patent/ATE495544T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
    • H10P72/7611—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge profile or support profile
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0404—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0418—Apparatus for fluid treatment for etching
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0418—Apparatus for fluid treatment for etching
    • H10P72/0422—Apparatus for fluid treatment for etching for wet etching
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0418—Apparatus for fluid treatment for etching
    • H10P72/0422—Apparatus for fluid treatment for etching for wet etching
    • H10P72/0424—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0448—Apparatus for applying a liquid, a resin, an ink or the like
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Weting (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • ing And Chemical Polishing (AREA)
AT07822697T 2006-12-15 2007-11-19 Einrichtung und verfahren zur nassbehandlung von plattenartigen artikeln ATE495544T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
AT20732006 2006-12-15
PCT/EP2007/062489 WO2008071517A1 (en) 2006-12-15 2007-11-19 Device and method for wet treating plate-like-articles

Publications (1)

Publication Number Publication Date
ATE495544T1 true ATE495544T1 (de) 2011-01-15

Family

ID=39301294

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07822697T ATE495544T1 (de) 2006-12-15 2007-11-19 Einrichtung und verfahren zur nassbehandlung von plattenartigen artikeln

Country Status (9)

Country Link
US (2) US8231939B2 (de)
EP (1) EP2102895B1 (de)
JP (1) JP4975110B2 (de)
KR (1) KR101423308B1 (de)
CN (1) CN101589453B (de)
AT (1) ATE495544T1 (de)
DE (1) DE602007011986D1 (de)
TW (1) TWI359456B (de)
WO (1) WO2008071517A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10269615B2 (en) * 2011-09-09 2019-04-23 Lam Research Ag Apparatus for treating surfaces of wafer-shaped articles
US8974632B2 (en) * 2011-11-30 2015-03-10 Lam Research Ag Device and method for treating wafer-shaped articles
US9589818B2 (en) * 2012-12-20 2017-03-07 Lam Research Ag Apparatus for liquid treatment of wafer shaped articles and liquid control ring for use in same
JP6045357B2 (ja) * 2013-01-16 2016-12-14 キヤノン株式会社 薬液層の形成方法
US10022745B2 (en) * 2013-08-01 2018-07-17 Veeco Precision Surface Processing Llc Apparatus for dual speed spin chuck
TWI556878B (zh) * 2014-02-26 2016-11-11 辛耘企業股份有限公司 流體加速裝置
US10167552B2 (en) * 2015-02-05 2019-01-01 Lam Research Ag Spin chuck with rotating gas showerhead
CN109891569B (zh) * 2019-01-29 2024-04-02 京东方科技集团股份有限公司 元件拾取装置及其制备方法、使用方法
CN109738261B (zh) * 2019-02-28 2024-11-22 东莞市丰易仪器有限公司 自动浸润仪器

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4856456A (en) * 1988-10-03 1989-08-15 Machine Technology, Inc. Apparatus and method for the fluid treatment of a workpiece
US5439519A (en) * 1992-04-28 1995-08-08 Tokyo Ohka Kogyo Co., Ltd. Solution applying apparatus
ATE174155T1 (de) 1993-02-08 1998-12-15 Sez Semiconduct Equip Zubehoer Träger für scheibenförmige gegenstände
KR100282160B1 (ko) * 1996-05-07 2001-03-02 가야시마 고조 기판처리장치 및 처리방법
TW459266B (en) * 1997-08-27 2001-10-11 Tokyo Electron Ltd Substrate processing method
JP3441380B2 (ja) * 1997-08-27 2003-09-02 東京エレクトロン株式会社 処理装置及び処理方法
TW392226B (en) * 1997-11-05 2000-06-01 Tokyo Electron Ltd Apparatus for processing substrate
US6706321B2 (en) * 2000-06-13 2004-03-16 Tokyo Electron Limited Developing treatment method and developing treatment unit
AT413162B (de) 2001-09-26 2005-11-15 Sez Ag Ringförmige aufnahmevorrichtung für einen rotierenden träger zur aufnahme eines scheibenförmigen gegenstandes wie eines halbleiterwafers
JP3761457B2 (ja) * 2001-12-04 2006-03-29 Ｎｅｃエレクトロニクス株式会社 半導体基板の薬液処理装置
AT500984B1 (de) * 2002-06-25 2007-05-15 Sez Ag Vorrichtung zur flüssigkeitsbehandlung von scheibenförmigen gegenständen
EP1609172B1 (de) * 2003-03-20 2009-01-14 Sez Ag Einrichtung und verfahren zur nassbehandlung scheibenförmiger artikel
KR101364137B1 (ko) * 2003-06-24 2014-02-17 램 리서치 아게 디스크상 기판의 습식처리 장치 및 방법
CN100515583C (zh) * 2004-12-10 2009-07-22 Lg化学株式会社 旋涂装置以及使用该装置制备的涂布基板

Also Published As

Publication number Publication date
KR20090100371A (ko) 2009-09-23
EP2102895B1 (de) 2011-01-12
EP2102895A1 (de) 2009-09-23
JP4975110B2 (ja) 2012-07-11
CN101589453B (zh) 2011-05-18
DE602007011986D1 (de) 2011-02-24
CN101589453A (zh) 2009-11-25
US8936832B2 (en) 2015-01-20
TWI359456B (en) 2012-03-01
JP2010514147A (ja) 2010-04-30
US20120085374A1 (en) 2012-04-12
US20110059242A1 (en) 2011-03-10
TW200834707A (en) 2008-08-16
US8231939B2 (en) 2012-07-31
WO2008071517A1 (en) 2008-06-19
KR101423308B1 (ko) 2014-07-24

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Legal Events

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