ATE496396T1 - Laser-verarbeitungsvorrichtungen und -verfahren - Google Patents
Laser-verarbeitungsvorrichtungen und -verfahrenInfo
- Publication number
- ATE496396T1 ATE496396T1 AT04735829T AT04735829T ATE496396T1 AT E496396 T1 ATE496396 T1 AT E496396T1 AT 04735829 T AT04735829 T AT 04735829T AT 04735829 T AT04735829 T AT 04735829T AT E496396 T1 ATE496396 T1 AT E496396T1
- Authority
- AT
- Austria
- Prior art keywords
- processing
- laser
- laser beam
- processing apparatus
- irradiated
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/50—Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/083—Devices involving movement of the workpiece in at least one axial direction
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/073—Shaping the laser spot
- B23K26/0736—Shaping the laser spot into an oval shape, e.g. elliptic shape
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/082—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P54/00—Cutting or separating of wafers, substrates or parts of devices
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020040026749A KR100514996B1 (ko) | 2004-04-19 | 2004-04-19 | 레이저 가공 장치 |
| PCT/KR2004/001315 WO2005101487A1 (en) | 2004-04-19 | 2004-06-02 | Laser processing apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE496396T1 true ATE496396T1 (de) | 2011-02-15 |
Family
ID=35150255
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT04735829T ATE496396T1 (de) | 2004-04-19 | 2004-06-02 | Laser-verarbeitungsvorrichtungen und -verfahren |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US7688492B2 (de) |
| EP (1) | EP1738409B1 (de) |
| JP (1) | JP4856058B2 (de) |
| KR (1) | KR100514996B1 (de) |
| CN (1) | CN1947239B (de) |
| AT (1) | ATE496396T1 (de) |
| CA (1) | CA2564124A1 (de) |
| DE (1) | DE602004031154D1 (de) |
| WO (1) | WO2005101487A1 (de) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7616383B2 (en) | 2004-05-18 | 2009-11-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| EP2194485B1 (de) | 2004-11-16 | 2012-10-17 | Illumina, Inc. | Verfahren und Vorrichtung zum Auslesen kodierter Mikroperlen |
| US7423818B2 (en) * | 2005-07-15 | 2008-09-09 | Electro Scientific Industries, Inc. | Method of suppressing distortion of a working laser beam of a laser link processing system |
| FI119593B (fi) * | 2006-01-19 | 2009-01-15 | Savcor Alfa Oy | Laserhitsausmenetelmä |
| US7830575B2 (en) * | 2006-04-10 | 2010-11-09 | Illumina, Inc. | Optical scanner with improved scan time |
| KR20080079828A (ko) * | 2007-02-28 | 2008-09-02 | 주식회사 이오테크닉스 | 레이저 가공 장치 및 방법 |
| KR100954563B1 (ko) | 2008-12-30 | 2010-04-22 | 송혁규 | Mems 스캐닝 미러 |
| CN101882578B (zh) * | 2009-05-08 | 2014-03-12 | 东莞市中镓半导体科技有限公司 | 固体激光剥离和切割一体化设备 |
| CN101879657B (zh) * | 2009-05-08 | 2016-06-29 | 东莞市中镓半导体科技有限公司 | 固体激光剥离设备和剥离方法 |
| US8237132B2 (en) * | 2009-06-17 | 2012-08-07 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method and apparatus for reducing down time of a lithography system |
| CN102656421A (zh) * | 2009-12-23 | 2012-09-05 | Imra美国公司 | 利用结构化光学元件和聚焦光束的激光刻图 |
| JP5644033B2 (ja) * | 2011-02-07 | 2014-12-24 | 株式会社ブイ・テクノロジー | マイクロレンズアレイを使用したレーザ処理装置及びレーザ処理方法 |
| JP5894384B2 (ja) * | 2011-07-08 | 2016-03-30 | 株式会社ディスコ | 加工装置 |
| GB2494857B (en) | 2011-08-23 | 2016-07-27 | Biochrom Ltd | Cuvette |
| TWI448730B (zh) * | 2011-10-25 | 2014-08-11 | Ind Tech Res Inst | 均勻打光之掃描式視覺系統 |
| CN104395033B (zh) * | 2012-07-04 | 2017-06-23 | 法国圣戈班玻璃厂 | 用于在使用至少两个桥情况下对大面积衬底进行激光处理的设备和方法 |
| CN103894734A (zh) * | 2012-12-31 | 2014-07-02 | 上海微电子装备有限公司 | 一种激光退火装置及其操作方法 |
| JP6161188B2 (ja) * | 2013-02-05 | 2017-07-12 | 株式会社ブイ・テクノロジー | レーザ加工装置、レーザ加工方法 |
| CN103551735A (zh) * | 2013-10-18 | 2014-02-05 | 昆山思拓机器有限公司 | 一种导电橡胶垫的加工装置及工艺 |
| JP6347714B2 (ja) * | 2014-10-02 | 2018-06-27 | 株式会社ディスコ | ウエーハの加工方法 |
| CN106271105B (zh) * | 2016-08-31 | 2018-05-25 | 武汉凌云光电科技有限责任公司 | 一种可实现光纤端面角度控制的激光切割方法及系统 |
| CN106362992B (zh) * | 2016-11-29 | 2019-03-01 | 苏州热工研究院有限公司 | 管道内壁去污的激光清洁系统 |
| FR3080321B1 (fr) * | 2018-04-23 | 2020-03-27 | Addup | Appareil et procede pour fabriquer un objet tridimensionnel |
| AU2019203404B2 (en) | 2018-05-15 | 2024-11-07 | Howmedica Osteonics Corp. | Fabrication of components using shaped energy beam profiles |
| US10903121B1 (en) | 2019-08-14 | 2021-01-26 | Applied Materials, Inc. | Hybrid wafer dicing approach using a uniform rotating beam laser scribing process and plasma etch process |
| CN114778490B (zh) * | 2022-05-06 | 2025-03-25 | 天津大学 | 一种基于锁相放大的扫描式试纸条定量检测系统及方法 |
| US12564068B2 (en) * | 2022-10-06 | 2026-02-24 | Thinsic Inc. | Carbon assisted semiconductor dicing and method |
Family Cites Families (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4662708A (en) | 1983-10-24 | 1987-05-05 | Armco Inc. | Optical scanning system for laser treatment of electrical steel and the like |
| JPS6243620A (ja) | 1985-08-21 | 1987-02-25 | Fuji Photo Film Co Ltd | 半導体レ−ザ光源装置 |
| US5708252A (en) | 1986-09-26 | 1998-01-13 | Semiconductor Energy Laboratory Co., Ltd. | Excimer laser scanning system |
| JPH01224193A (ja) | 1988-03-04 | 1989-09-07 | Tanaka Seisakusho:Kk | レーザ加工機およびレーザ加工方法 |
| JPH0241784A (ja) | 1988-07-30 | 1990-02-09 | Nec Corp | レーザマーキング装置 |
| JPH02137687A (ja) | 1988-11-18 | 1990-05-25 | Fuji Electric Co Ltd | レーザ集光装置 |
| US5397327A (en) | 1993-07-27 | 1995-03-14 | Coherent, Inc. | Surgical laser handpiece for slit incisions |
| JPH07100670A (ja) * | 1993-10-05 | 1995-04-18 | Nippon Steel Corp | レーザ加工装置 |
| JPH07148583A (ja) * | 1994-09-02 | 1995-06-13 | Osaka Prefecture | 金属表面のレーザ加工方法 |
| JP3141715B2 (ja) | 1994-12-22 | 2001-03-05 | 松下電器産業株式会社 | レーザ加工方法 |
| US5854803A (en) * | 1995-01-12 | 1998-12-29 | Semiconductor Energy Laboratory Co., Ltd. | Laser illumination system |
| JPH08197271A (ja) * | 1995-01-27 | 1996-08-06 | Ricoh Co Ltd | 脆性材料の割断方法及び脆性材料の割断装置 |
| JPH08272104A (ja) | 1995-03-31 | 1996-10-18 | Sony Corp | フォトレジストの露光方法及び装置 |
| JP3738790B2 (ja) | 1996-07-26 | 2006-01-25 | セイコーエプソン株式会社 | インクジェット記録ヘッドの構成部材の開口穿孔方法 |
| JP3140968B2 (ja) | 1996-08-06 | 2001-03-05 | 日立建機株式会社 | レーザ加工装置 |
| JP3199653B2 (ja) | 1996-12-27 | 2001-08-20 | イビデン株式会社 | 多層プリント配線板の製造装置及び製造方法 |
| JPH10242617A (ja) | 1997-02-28 | 1998-09-11 | Murata Mfg Co Ltd | セラミックグリーンシートの加工方法及びレーザ加工装置 |
| JPH11151584A (ja) | 1997-11-17 | 1999-06-08 | Toshiba Corp | レーザ加工方法及びその装置 |
| JPH11156567A (ja) * | 1997-12-02 | 1999-06-15 | Fuji Electric Co Ltd | レーザ印字装置 |
| JP3323987B2 (ja) | 1998-05-25 | 2002-09-09 | 住友重機械工業株式会社 | レーザ加工装置 |
| JP4119528B2 (ja) | 1998-06-16 | 2008-07-16 | 富士重工業株式会社 | 車両用フェンダーインシュレータ |
| JP4218209B2 (ja) | 1999-03-05 | 2009-02-04 | 三菱電機株式会社 | レーザ加工装置 |
| US6492616B1 (en) * | 1999-05-24 | 2002-12-10 | Nippon Steel Chemical Co., Ltd. | Processes for laser beam machining of resin film for wiring boards and manufacture of wiring boards |
| US6313434B1 (en) * | 1999-05-27 | 2001-11-06 | International Business Machines Corporation | Method for creation of inclined microstructures using a scanned laser image |
| JP2001001178A (ja) * | 1999-06-21 | 2001-01-09 | Nippon Steel Corp | プリント基板のレーザ加工装置 |
| JP3562389B2 (ja) | 1999-06-25 | 2004-09-08 | 三菱電機株式会社 | レーザ熱処理装置 |
| JP2001079678A (ja) | 1999-09-13 | 2001-03-27 | Sumitomo Heavy Ind Ltd | レーザ穴あけ加工方法及び加工装置 |
| JP2002028798A (ja) * | 2000-07-11 | 2002-01-29 | Nippon Steel Chem Co Ltd | レーザ加工装置及びレーザ加工方法 |
| JP2002045985A (ja) * | 2000-08-07 | 2002-02-12 | Matsushita Electric Ind Co Ltd | レーザ楕円穴加工方法およびレーザ楕円穴加工装置 |
| JP2002184307A (ja) | 2000-12-18 | 2002-06-28 | Toshiba Corp | ディスプレイ装置の製造方法およびレーザ加工装置 |
| JP2002239772A (ja) | 2001-02-16 | 2002-08-28 | Matsushita Electric Ind Co Ltd | レーザ加工方法およびその装置 |
| JP4590782B2 (ja) * | 2001-06-01 | 2010-12-01 | 三菱電機株式会社 | レーザ加工装置 |
| JP2003045820A (ja) | 2001-07-30 | 2003-02-14 | Semiconductor Energy Lab Co Ltd | レーザ照射装置およびレーザ照射方法、並びに半導体装置の作製方法 |
| JP2003117676A (ja) | 2001-10-15 | 2003-04-23 | Ricoh Microelectronics Co Ltd | レーザ加工方法及びレーザ加工装置 |
| JP2003224083A (ja) | 2001-10-30 | 2003-08-08 | Semiconductor Energy Lab Co Ltd | レーザ照射装置 |
| JP3908153B2 (ja) | 2001-11-16 | 2007-04-25 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| US6849825B2 (en) * | 2001-11-30 | 2005-02-01 | Semiconductor Energy Laboratory Co., Ltd. | Laser irradiation apparatus |
| JP4293414B2 (ja) | 2002-07-04 | 2009-07-08 | 株式会社半導体エネルギー研究所 | 半導体膜の結晶化方法及びそれを用いた半導体装置の作製方法 |
| JP2004090062A (ja) * | 2002-09-02 | 2004-03-25 | Tdk Corp | レーザ加工装置、加工方法、および当該加工方法を用いた回路基板の製造方法 |
| JP2004098087A (ja) | 2002-09-05 | 2004-04-02 | Dainippon Screen Mfg Co Ltd | レーザ加工装置およびレーザ加工方法 |
| JP4364611B2 (ja) | 2002-11-29 | 2009-11-18 | 株式会社半導体エネルギー研究所 | 結晶性半導体膜の作製方法 |
| US7208395B2 (en) * | 2003-06-26 | 2007-04-24 | Semiconductor Energy Laboratory Co., Ltd. | Laser irradiation apparatus, laser irradiation method, and method for manufacturing semiconductor device |
-
2004
- 2004-04-19 KR KR1020040026749A patent/KR100514996B1/ko not_active Expired - Fee Related
- 2004-06-02 EP EP04735829A patent/EP1738409B1/de not_active Expired - Lifetime
- 2004-06-02 WO PCT/KR2004/001315 patent/WO2005101487A1/en not_active Ceased
- 2004-06-02 CN CN2004800427779A patent/CN1947239B/zh not_active Expired - Fee Related
- 2004-06-02 US US11/578,373 patent/US7688492B2/en not_active Expired - Fee Related
- 2004-06-02 AT AT04735829T patent/ATE496396T1/de not_active IP Right Cessation
- 2004-06-02 DE DE602004031154T patent/DE602004031154D1/de not_active Expired - Lifetime
- 2004-06-02 JP JP2007509387A patent/JP4856058B2/ja not_active Expired - Fee Related
- 2004-06-02 CA CA002564124A patent/CA2564124A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| JP2007532322A (ja) | 2007-11-15 |
| KR100514996B1 (ko) | 2005-09-15 |
| US7688492B2 (en) | 2010-03-30 |
| CA2564124A1 (en) | 2005-10-27 |
| EP1738409B1 (de) | 2011-01-19 |
| JP4856058B2 (ja) | 2012-01-18 |
| CN1947239A (zh) | 2007-04-11 |
| EP1738409A1 (de) | 2007-01-03 |
| US20080088900A1 (en) | 2008-04-17 |
| WO2005101487A1 (en) | 2005-10-27 |
| CN1947239B (zh) | 2011-08-31 |
| DE602004031154D1 (de) | 2011-03-03 |
| EP1738409A4 (de) | 2008-10-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |