ATE498665T1 - Verfahren zur herstellung von festen und porösen filmen aus teilchenförmigen stoffen durch quelle hohen wärmeflusses - Google Patents

Verfahren zur herstellung von festen und porösen filmen aus teilchenförmigen stoffen durch quelle hohen wärmeflusses

Info

Publication number
ATE498665T1
ATE498665T1 AT07825592T AT07825592T ATE498665T1 AT E498665 T1 ATE498665 T1 AT E498665T1 AT 07825592 T AT07825592 T AT 07825592T AT 07825592 T AT07825592 T AT 07825592T AT E498665 T1 ATE498665 T1 AT E498665T1
Authority
AT
Austria
Prior art keywords
porous film
uniform layer
source
solid
high heat
Prior art date
Application number
AT07825592T
Other languages
English (en)
Inventor
Goortani Behnam Mostajeran
Francois Gitzhofer
Etienne Bouyer
Original Assignee
Commissariat Energie Atomique
Commercialisation Des Produits De La Rech Appliquee Socpra Sciences Et Genie S E C Soc D
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat Energie Atomique, Commercialisation Des Produits De La Rech Appliquee Socpra Sciences Et Genie S E C Soc D filed Critical Commissariat Energie Atomique
Application granted granted Critical
Publication of ATE498665T1 publication Critical patent/ATE498665T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • C23C26/02—Coating not provided for in groups C23C2/00 - C23C24/00 applying molten material to the substrate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0039—Inorganic membrane manufacture
    • B01D67/0041—Inorganic membrane manufacture by agglomeration of particles in the dry state
    • B01D67/00411—Inorganic membrane manufacture by agglomeration of particles in the dry state by sintering
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
    • B01D67/0039—Inorganic membrane manufacture
    • B01D67/0046—Inorganic membrane manufacture by slurry techniques, e.g. die or slip-casting
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2323/00—Details relating to membrane preparation
    • B01D2323/42—Details of membrane preparation apparatus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
  • Connection Of Plates (AREA)
  • Vehicle Interior And Exterior Ornaments, Soundproofing, And Insulation (AREA)
  • Standing Axle, Rod, Or Tube Structures Coupled By Welding, Adhesion, Or Deposition (AREA)
  • Silicon Compounds (AREA)
  • Filtering Materials (AREA)
AT07825592T 2007-08-28 2007-08-28 Verfahren zur herstellung von festen und porösen filmen aus teilchenförmigen stoffen durch quelle hohen wärmeflusses ATE498665T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/IB2007/003350 WO2009027764A1 (en) 2007-08-28 2007-08-28 Method of production of solid and porous films from particulate materials by high heat flux source

Publications (1)

Publication Number Publication Date
ATE498665T1 true ATE498665T1 (de) 2011-03-15

Family

ID=39363882

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07825592T ATE498665T1 (de) 2007-08-28 2007-08-28 Verfahren zur herstellung von festen und porösen filmen aus teilchenförmigen stoffen durch quelle hohen wärmeflusses

Country Status (6)

Country Link
US (1) US20110057358A1 (de)
EP (1) EP2201076B1 (de)
AT (1) ATE498665T1 (de)
DE (1) DE602007012598D1 (de)
ES (1) ES2360967T3 (de)
WO (1) WO2009027764A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150102016A1 (en) * 2013-07-29 2015-04-16 Siemens Energy, Inc. Laser metalworking of reflective metals using flux
ES3036450T3 (en) 2015-10-09 2025-09-19 Milwaukee Silicon Llc Devices and systems for purifying silicon
JP6437419B2 (ja) * 2015-11-11 2018-12-12 日鐵住金溶接工業株式会社 炭酸ガスシールドアーク溶接用フラックス入りワイヤ
JP2017094360A (ja) 2015-11-25 2017-06-01 日鐵住金溶接工業株式会社 Ａｒ−ＣＯ２混合ガスシールドアーク溶接用フラックス入りワイヤ

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3973762A (en) * 1974-05-17 1976-08-10 Dravo Corporation Sintering process and apparatus
WO1985003460A1 (en) * 1984-02-13 1985-08-15 Schmitt Jerome J Iii Method and apparatus for the gas jet deposition of conducting and dielectric thin solid films and products produced thereby
DE3536743C2 (de) * 1985-10-15 1994-11-10 Siemens Ag Verfahren zum Herstellung von großflächigen Siliziumkristallkörpern für Solarzellen
DK249689A (da) * 1988-05-24 1989-11-25 Alcan Int Ltd Sammensat membran og fremgangsmaade ved dens fremstilling
KR100377606B1 (ko) * 1995-09-15 2003-08-25 로디아 쉬미 이산화티타늄-기재광촉매코팅기판,및이산화티타늄-기재유기분산액
US7163713B2 (en) * 1999-07-31 2007-01-16 The Regents Of The University Of California Method for making dense crack free thin films
US6994894B2 (en) * 2000-04-20 2006-02-07 Vanderbilt University Method and system for thick-film deposition of ceramic materials
DE10060221A1 (de) * 2000-12-04 2002-06-13 Cfi Ceramics For Industry Gmbh Substrat auf Basis von Siliciumnitrid für Halbleiter-Bauelemente
JP3696156B2 (ja) * 2000-12-26 2005-09-14 株式会社東芝 塗布膜の加熱装置、レジスト膜の処理方法
DE10248406A1 (de) * 2002-10-17 2004-04-29 Degussa Ag Laser-Sinter-Pulver mit Titandioxidpartikeln, Verfahren zu dessen Herstellung und Formkörper, hergestellt aus diesem Laser-Sinterpulver
US7032808B2 (en) * 2003-10-06 2006-04-25 Outokumu Oyj Thermal spray application of brazing material for manufacture of heat transfer devices

Also Published As

Publication number Publication date
EP2201076B1 (de) 2011-02-16
DE602007012598D1 (de) 2011-03-31
WO2009027764A8 (en) 2010-03-25
US20110057358A1 (en) 2011-03-10
ES2360967T3 (es) 2011-06-10
WO2009027764A1 (en) 2009-03-05
EP2201076A1 (de) 2010-06-30

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