ATE502325T1 - System und verfahren zum erzeugen eines periodischen und/oder fastperiodischen musters auf einer probe - Google Patents

System und verfahren zum erzeugen eines periodischen und/oder fastperiodischen musters auf einer probe

Info

Publication number
ATE502325T1
ATE502325T1 AT05803386T AT05803386T ATE502325T1 AT E502325 T1 ATE502325 T1 AT E502325T1 AT 05803386 T AT05803386 T AT 05803386T AT 05803386 T AT05803386 T AT 05803386T AT E502325 T1 ATE502325 T1 AT E502325T1
Authority
AT
Austria
Prior art keywords
distance
periodic
sample
mask
generating
Prior art date
Application number
AT05803386T
Other languages
English (en)
Inventor
Harun Solak
Original Assignee
Eulitha Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=36228141&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE502325(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from EP04025105A external-priority patent/EP1650602A1/de
Application filed by Eulitha Ag filed Critical Eulitha Ag
Application granted granted Critical
Publication of ATE502325T1 publication Critical patent/ATE502325T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
AT05803386T 2004-10-22 2005-10-13 System und verfahren zum erzeugen eines periodischen und/oder fastperiodischen musters auf einer probe ATE502325T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP04025105A EP1650602A1 (de) 2004-10-22 2004-10-22 System und Methode zur Herstellung von periodischen und / oder quasi-periodischen Strukturen auf einer Probe
EP05003271 2005-02-16
PCT/EP2005/010986 WO2006045439A2 (en) 2004-10-22 2005-10-13 A system and a method for generating periodic and/or quasi-periodic pattern on a sample

Publications (1)

Publication Number Publication Date
ATE502325T1 true ATE502325T1 (de) 2011-04-15

Family

ID=36228141

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05803386T ATE502325T1 (de) 2004-10-22 2005-10-13 System und verfahren zum erzeugen eines periodischen und/oder fastperiodischen musters auf einer probe

Country Status (7)

Country Link
US (1) US8841046B2 (de)
EP (1) EP1810085B1 (de)
JP (1) JP4724183B2 (de)
CN (1) CN101052921B (de)
AT (1) ATE502325T1 (de)
DE (1) DE602005026968D1 (de)
WO (1) WO2006045439A2 (de)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9081193B2 (en) 2006-06-13 2015-07-14 The Arizona Board Of Regents On Behalf Of The University Of Arizona Interferometric systems and methods
US20110067123A1 (en) * 2008-02-19 2011-03-17 Julie Andersen Mao-b elevation as an early parkinson's disease biomarker
CN101750664B (zh) * 2008-12-12 2012-05-23 比亚迪股份有限公司 一种衍射导光薄膜及其制备方法
CN102325498B (zh) 2009-02-05 2013-07-10 中国科学院高能物理研究所 基于低剂量单步光栅的x射线相位衬度成像
EP2499539B1 (de) 2009-11-13 2014-06-18 Eulitha AG Optimierter maskenentwurf zur herstellung von periodischen und quasi-periodischen strukturen
US9036133B2 (en) 2010-02-16 2015-05-19 Eulitha Ag Lithographic fabrication of general periodic structures by exposing a photosensitive layer to a range of lateral intensity distributions
US8368871B2 (en) 2010-02-16 2013-02-05 Eulitha Ag Lithographic fabrication of general periodic structures
US8524443B2 (en) 2010-07-07 2013-09-03 Eulitha A.G. Method and apparatus for printing a periodic pattern with a large depth of focus
US9007566B2 (en) 2010-07-07 2015-04-14 Eulitha Ag Apparatus and method for printing a periodic pattern with a large depth of focus
US20120092634A1 (en) * 2010-10-13 2012-04-19 Solak Harun H Method and apparatus for printing periodic patterns
US8525973B2 (en) 2010-10-13 2013-09-03 Eulitha A.G. Method and apparatus for printing periodic patterns
WO2012066489A2 (en) 2010-11-16 2012-05-24 Eulitha A.G. Method and apparatus for printing high-resolution two-dimensional periodic patterns
JP5721858B2 (ja) * 2010-12-23 2015-05-20 ユーリタ アクチエンゲゼルシャフトＥｕｌｉｔｈａ Ａｇ 大きな面積にわたってナノ構造を製造するためのシステムおよび方法
EP2663898B1 (de) 2011-01-12 2015-03-25 Eulitha A.G. Verfahren und system zum drucken von periodischen mustern hoher auflösung
JPWO2012157697A1 (ja) * 2011-05-19 2014-07-31 株式会社日立ハイテクノロジーズ 回折格子製造方法、分光光度計、および半導体装置の製造方法
EP2715453A1 (de) 2011-06-01 2014-04-09 Eulitha A.G. Drucken von periodischen mustern anhand mehrerer laser
JP5757413B2 (ja) * 2011-06-29 2015-07-29 大日本印刷株式会社 位相変調マスク、露光装置および露光方法
JP5838622B2 (ja) * 2011-07-05 2016-01-06 大日本印刷株式会社 露光装置および露光方法
US9658535B2 (en) 2013-03-18 2017-05-23 Eulitha A.G. Methods and systems for printing periodic patterns
WO2015008365A1 (ja) * 2013-07-18 2015-01-22 ギガフォトン株式会社 露光装置
JP5943886B2 (ja) 2013-08-20 2016-07-05 株式会社東芝 パターン形成方法及び露光用マスク
JP6356510B2 (ja) * 2014-07-15 2018-07-11 東芝メモリ株式会社 露光方法及び露光装置
US10025197B2 (en) 2014-12-22 2018-07-17 Eulitha A.G. Method for printing colour images
JP2016152318A (ja) 2015-02-17 2016-08-22 株式会社東芝 パターン形成方法および露光装置
JP6981663B6 (ja) 2015-10-13 2022-01-17 マイクロタウ アイピー ピーティーワイ リミテッド 微細構造パターン
CN105242500B (zh) * 2015-11-10 2017-07-11 中国科学院光电技术研究所 一种基于紫外宽光谱泰伯自成像的光刻系统
WO2017091339A1 (en) 2015-11-25 2017-06-01 International Business Machines Corporation Tool to provide integrated circuit masks with accurate dimensional compensation of patterns
US10365566B2 (en) 2015-12-14 2019-07-30 Eulitha A.G. Methods and systems for printing arrays of features
CN106115681A (zh) * 2016-07-11 2016-11-16 浙江工业大学 一种实现二维材料图形化的方法
CN106054298B (zh) * 2016-08-23 2019-02-26 京东方科技集团股份有限公司 一种光栅以及3d显示装置
DE102017115169A1 (de) 2017-07-06 2019-01-10 Temicon Gmbh Erzeugung von belichteten Strukturen auf einem Werkstück
JP7044901B2 (ja) 2018-04-19 2022-03-30 ユーリタ アクチエンゲゼルシャフト 露光フィールドのオーバラップにより大きい周期パターンを印刷する方法およびシステム
US11042098B2 (en) * 2019-02-15 2021-06-22 Applied Materials, Inc. Large area high resolution feature reduction lithography technique
US12124170B2 (en) 2019-03-27 2024-10-22 Eulitha Ag Method and apparatus for printing a periodic pattern with a varying duty cycle
AU2020282386B2 (en) * 2019-05-30 2021-12-16 Microtau Ip Pty Ltd Systems and methods for fabricating microstructures
DE102019119790A1 (de) * 2019-07-22 2021-01-28 4Jet Microtech Gmbh Laserbearbeitungsvorrichtung
CN111856636B (zh) * 2020-07-03 2021-10-22 中国科学技术大学 一种变间距光栅掩模线密度分布可控微调方法
KR20240121877A (ko) 2021-12-22 2024-08-09 유리타 아. 게. 주기적 패턴의 노광의 균일성을 개선하기 위한 방법 및 장치

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3615449A (en) * 1969-09-25 1971-10-26 Rca Corp Method of generating high area-density periodic arrays by diffraction imaging
US4360586A (en) * 1979-05-29 1982-11-23 Massachusetts Institute Of Technology Spatial period division exposing
US4239790A (en) * 1979-09-12 1980-12-16 Rca Corporation Method of defining a photoresist layer
US5124843A (en) * 1989-12-27 1992-06-23 Massachusetts Institute Of Technology Array illuminator using a binary optics phase plate
US5093279A (en) * 1991-02-01 1992-03-03 International Business Machines Corporation Laser ablation damascene process
FR2673009A1 (fr) * 1991-02-18 1992-08-21 Broussaud Georges Systeme holographique de duplication d'objets plans capable d'un pouvoir de resolution tres eleve.
JP2936187B2 (ja) * 1991-12-16 1999-08-23 株式会社ニコン レジストパタ−ンの形成方法
EP0627666B1 (de) * 1993-05-24 2003-02-05 Holtronic Technologies Plc Vorrichtung und Verfahren zur Veränderung des Massstabs eines gedruckten Musters
US5759744A (en) * 1995-02-24 1998-06-02 University Of New Mexico Methods and apparatus for lithography of sparse arrays of sub-micrometer features
US5604829A (en) * 1995-04-17 1997-02-18 Hughes Aircraft Company Optical waveguide with diffraction grating and method of forming the same
FR2751785A1 (fr) * 1996-07-29 1998-01-30 Commissariat Energie Atomique Procede et dispositif de formation de motifs dans une couche de resine photosensible par insolation laser continue, application a la fabrication de sources d'electrons a cathodes emissives a micropointes et d'ecrans plats
US6233044B1 (en) * 1997-01-21 2001-05-15 Steven R. J. Brueck Methods and apparatus for integrating optical and interferometric lithography to produce complex patterns
US5812629A (en) * 1997-04-30 1998-09-22 Clauser; John F. Ultrahigh resolution interferometric x-ray imaging
JPH1126344A (ja) * 1997-06-30 1999-01-29 Hitachi Ltd パターン形成方法及び装置並びに半導体装置の製造方法
JP3101614B2 (ja) * 1998-02-26 2000-10-23 キヤノン株式会社 露光方法及び露光装置
DE19810055A1 (de) 1998-03-09 1999-09-23 Suess Kg Karl Verfahren zur Nahfeldbelichtung mit im wesentlichen parallelem Licht
JP3387834B2 (ja) * 1998-10-29 2003-03-17 キヤノン株式会社 Ｘ線露光方法およびデバイス製造方法
US6373553B1 (en) * 1999-09-20 2002-04-16 Intel Corp. Photo-lithographic method to print a line-space pattern with a pitch equal to half the pitch of the mask
WO2001035168A1 (en) 1999-11-10 2001-05-17 Massachusetts Institute Of Technology Interference lithography utilizing phase-locked scanning beams
CN2449258Y (zh) * 2000-11-08 2001-09-19 中国科学院光电技术研究所 一种干涉光刻多光束形成系统
US6525815B2 (en) * 2000-11-10 2003-02-25 The Board Of Trustees Of The Leland Stanford Junior University Miniaturized Talbot spectrometer
US6671054B2 (en) * 2002-02-07 2003-12-30 Intel Corporation Interferometric patterning for lithography
EP2499539B1 (de) * 2009-11-13 2014-06-18 Eulitha AG Optimierter maskenentwurf zur herstellung von periodischen und quasi-periodischen strukturen
US8368871B2 (en) * 2010-02-16 2013-02-05 Eulitha Ag Lithographic fabrication of general periodic structures
US9036133B2 (en) * 2010-02-16 2015-05-19 Eulitha Ag Lithographic fabrication of general periodic structures by exposing a photosensitive layer to a range of lateral intensity distributions
US8524443B2 (en) * 2010-07-07 2013-09-03 Eulitha A.G. Method and apparatus for printing a periodic pattern with a large depth of focus
US8525973B2 (en) * 2010-10-13 2013-09-03 Eulitha A.G. Method and apparatus for printing periodic patterns
US20120092634A1 (en) * 2010-10-13 2012-04-19 Solak Harun H Method and apparatus for printing periodic patterns

Also Published As

Publication number Publication date
CN101052921A (zh) 2007-10-10
US20080186579A1 (en) 2008-08-07
US8841046B2 (en) 2014-09-23
DE602005026968D1 (de) 2011-04-28
JP4724183B2 (ja) 2011-07-13
WO2006045439A3 (en) 2006-09-14
CN101052921B (zh) 2013-03-27
EP1810085B1 (de) 2011-03-16
EP1810085A2 (de) 2007-07-25
JP2008517472A (ja) 2008-05-22
WO2006045439A2 (en) 2006-05-04

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