ATE503207T1 - Lichtempfindliche beschichtungszusammensetzungen für lithographische elemente - Google Patents

Lichtempfindliche beschichtungszusammensetzungen für lithographische elemente

Info

Publication number
ATE503207T1
ATE503207T1 AT03818680T AT03818680T ATE503207T1 AT E503207 T1 ATE503207 T1 AT E503207T1 AT 03818680 T AT03818680 T AT 03818680T AT 03818680 T AT03818680 T AT 03818680T AT E503207 T1 ATE503207 T1 AT E503207T1
Authority
AT
Austria
Prior art keywords
coating compositions
photosensitive coating
composition
lithographic elements
radiation
Prior art date
Application number
AT03818680T
Other languages
English (en)
Inventor
Andre Arias
Luiz Arias
Marjorie Arias
Mario Provenzano
Original Assignee
Ibf Ind Brasileira De Filmes Sa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibf Ind Brasileira De Filmes Sa filed Critical Ibf Ind Brasileira De Filmes Sa
Application granted granted Critical
Publication of ATE503207T1 publication Critical patent/ATE503207T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
AT03818680T 2003-09-24 2003-09-24 Lichtempfindliche beschichtungszusammensetzungen für lithographische elemente ATE503207T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/BR2003/000137 WO2005029186A1 (en) 2003-09-24 2003-09-24 Light sensitive coating compositions useful for lithographic elements

Publications (1)

Publication Number Publication Date
ATE503207T1 true ATE503207T1 (de) 2011-04-15

Family

ID=34318710

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03818680T ATE503207T1 (de) 2003-09-24 2003-09-24 Lichtempfindliche beschichtungszusammensetzungen für lithographische elemente

Country Status (8)

Country Link
US (1) US8741536B2 (de)
EP (1) EP1673663B1 (de)
AT (1) ATE503207T1 (de)
AU (1) AU2003260206A1 (de)
BR (1) BR0318515A (de)
DE (1) DE60336512D1 (de)
ES (1) ES2363748T3 (de)
WO (1) WO2005029186A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5026706B2 (ja) * 2006-01-27 2012-09-19 富士フイルム株式会社 光駆動型アクチュエータ及びその製造方法
US7524615B2 (en) * 2006-08-14 2009-04-28 Gary Ganghui Teng Negative laser sensitive lithographic printing plate having specific photosensitive composition
US8133651B2 (en) * 2007-11-21 2012-03-13 Gary Ganghui Teng Lithographic printing plate comprising alkaline soluble and alkaline insoluble polymeric binders
JP5089422B2 (ja) * 2008-02-15 2012-12-05 岡本化学工業株式会社 感光性組成物およびそれを用いた平版印刷版用原版
TWI491981B (zh) * 2009-11-04 2015-07-11 Sumitomo Chemical Co Coloring the photosensitive resin composition
WO2014094080A1 (pt) * 2012-12-19 2014-06-26 Ibf Indústria Brasileira De Filmes S/A Composição sensível à radiação em regiões do espectro eletromagnético para fins de impressão, chapa para impressão compreendendo a referida composição, uso da referida composição e processo de revelação de imagem

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4053316A (en) * 1973-03-16 1977-10-11 Ici United States Inc. Photopolymerization of ethylenically-unsaturated organic compounds
US4772538A (en) * 1985-08-02 1988-09-20 American Hoechst Corporation Water developable lithographic composition
US4877711A (en) * 1986-05-19 1989-10-31 Fuji Photo Film Co., Ltd. Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group
DE3827245A1 (de) * 1988-08-11 1990-02-15 Hoechst Ag Photopolymerisierbares aufzeichnungsmaterial
JPH04161957A (ja) * 1990-10-24 1992-06-05 Nippon Paint Co Ltd 光重合性組成物および感光性平版印刷版
DE4418645C1 (de) * 1994-05-27 1995-12-14 Sun Chemical Corp Lichtempfindliches Gemisch und daraus herstellbares Aufzeichnungsmaterial
JP3478630B2 (ja) * 1995-02-09 2003-12-15 富士写真フイルム株式会社 光重合性組成物
JP3651713B2 (ja) * 1996-02-29 2005-05-25 富士写真フイルム株式会社 光重合性組成物
JPH1026834A (ja) * 1996-07-09 1998-01-27 Tokyo Ohka Kogyo Co Ltd 画像形成方法
US5912105A (en) * 1996-12-23 1999-06-15 Agfa-Gevaert Thermally imageable material
EP0851299B1 (de) * 1996-12-26 2000-10-25 Mitsubishi Chemical Corporation Photoempfindliche lithographische Druckplatte
US6232038B1 (en) * 1998-10-07 2001-05-15 Mitsubishi Chemical Corporation Photosensitive composition, image-forming material and image-forming method employing it
US6439888B1 (en) * 1999-05-03 2002-08-27 Pls Liquidating Llc Optical source and method
JP4037015B2 (ja) * 1999-09-22 2008-01-23 富士フイルム株式会社 光重合性組成物、画像形成材料及び平版印刷版用版材
JP3654422B2 (ja) * 2000-01-31 2005-06-02 三菱製紙株式会社 感光性組成物および感光性平版印刷版材料
JP4248137B2 (ja) * 2000-11-22 2009-04-02 富士フイルム株式会社 ネガ型感光性平版印刷版
JP4098483B2 (ja) * 2001-03-12 2008-06-11 富士フイルム株式会社 平版印刷版原版
US6723493B2 (en) * 2001-06-04 2004-04-20 Gary Ganghui Teng Negative lithographic printing plate comprising a specific compound in the photosensitive layer
JP3878451B2 (ja) * 2001-10-22 2007-02-07 富士フイルムホールディングス株式会社 感光性樹脂転写材料、画像形成方法、カラーフィルターとその製造方法、フォトマスクとその製造方法
US6899992B2 (en) * 2002-11-08 2005-05-31 Kodak Polychrome Graphics Llc Polymerizable compounds with quadruple hydrogen bond forming groups

Also Published As

Publication number Publication date
DE60336512D1 (de) 2011-05-05
BR0318515A (pt) 2006-09-12
EP1673663B1 (de) 2011-03-23
US8741536B2 (en) 2014-06-03
ES2363748T3 (es) 2011-08-12
AU2003260206A1 (en) 2005-04-11
WO2005029186A1 (en) 2005-03-31
EP1673663A1 (de) 2006-06-28
US20070202434A1 (en) 2007-08-30

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