ATE503774T1 - Photohärtbare michaeladditionspolymere - Google Patents
Photohärtbare michaeladditionspolymereInfo
- Publication number
- ATE503774T1 ATE503774T1 AT05820205T AT05820205T ATE503774T1 AT E503774 T1 ATE503774 T1 AT E503774T1 AT 05820205 T AT05820205 T AT 05820205T AT 05820205 T AT05820205 T AT 05820205T AT E503774 T1 ATE503774 T1 AT E503774T1
- Authority
- AT
- Austria
- Prior art keywords
- michael addition
- photocureable
- addition polymers
- component
- michael
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/04—Acids, Metal salts or ammonium salts thereof
- C08F20/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B37/00—Reactions without formation or introduction of functional groups containing hetero atoms, involving either the formation of a carbon-to-carbon bond between two carbon atoms not directly linked already or the disconnection of two directly linked carbon atoms
- C07B37/02—Addition
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
- C08F22/10—Esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
- C08F220/303—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one or more carboxylic moieties in the chain
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
- C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
- C08F222/104—Esters of polyhydric alcohols or polyhydric phenols of tetraalcohols, e.g. pentaerythritol tetra(meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G61/12—Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/10—Definition of the polymer structure
- C08G2261/13—Morphological aspects
- C08G2261/135—Cross-linked structures
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/70—Post-treatment
- C08G2261/76—Post-treatment crosslinking
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S522/904—Monomer or polymer contains initiating group
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S522/904—Monomer or polymer contains initiating group
- Y10S522/905—Benzophenone group
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Paints Or Removers (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/009,588 US7307106B2 (en) | 2004-12-10 | 2004-12-10 | Photocurable Michael addition polymers |
| PCT/US2005/039099 WO2006065369A2 (en) | 2004-12-10 | 2005-10-28 | Photocurable michael addition polymers |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE503774T1 true ATE503774T1 (de) | 2011-04-15 |
Family
ID=36584900
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT05820205T ATE503774T1 (de) | 2004-12-10 | 2005-10-28 | Photohärtbare michaeladditionspolymere |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US7307106B2 (de) |
| EP (1) | EP1819737B1 (de) |
| JP (1) | JP2008523205A (de) |
| KR (1) | KR20070093097A (de) |
| CN (1) | CN101076545B (de) |
| AT (1) | ATE503774T1 (de) |
| DE (1) | DE602005027241D1 (de) |
| WO (1) | WO2006065369A2 (de) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6992217B2 (en) * | 2002-12-11 | 2006-01-31 | 3M Innovative Properties Company | Ring-opened azlactone initiators for atom transfer radical polymerization |
| CN101027326B (zh) * | 2004-04-21 | 2011-03-23 | 亚什兰许可和知识产权有限公司 | 具有内在光敏引发剂的可辐射固化迈克尔加成树脂 |
| WO2007064688A2 (en) * | 2005-11-30 | 2007-06-07 | Ashland Licensing And Intellectual Property Llc | Prepregs and cured in place solid surfaces prepared therefrom |
| BRPI0712748A2 (pt) * | 2006-06-05 | 2012-09-11 | Henkel Corp | embalagem retornável, produto alimentìcio embalado, e, composição curável por radiação |
| US7411033B2 (en) * | 2006-06-16 | 2008-08-12 | Ppg Industries Ohio, Inc. | Vinyl ethers and compositions containing them |
| US7745007B2 (en) * | 2006-10-31 | 2010-06-29 | S.D. Warren Company | Release sheets and methods of making the same |
| US7705064B2 (en) * | 2007-07-23 | 2010-04-27 | Henkel Corporation | Photosensitive compounds, photopolymerizable compositions including the same, and methods of making and using the same |
| TW201029966A (en) * | 2008-11-17 | 2010-08-16 | Bayer Materialscience Llc | Biofilm-inhibitory coatings that release salicylic acid by hydrolisis |
| EP2450344B1 (de) | 2009-06-29 | 2013-12-11 | DIC Corporation | Michael-additionsreaktionsprodukt und aktivenergie-strahlenhärtbare zusammensetzung |
| MX2014009992A (es) | 2012-03-09 | 2014-11-25 | Ccp Composites Llc | Resina termoendurecible de acetoacetilo para recubrimiento en gel sin compustos orgánicos volátiles. |
| JP6183642B2 (ja) | 2012-08-10 | 2017-08-23 | 株式会社リコー | 活性光線硬化組成物、並びにこれを用いた活性光線硬化型インクジェット印刷用インク組成物及び活性光線硬化型接着剤組成物 |
| CN105348466A (zh) * | 2015-10-29 | 2016-02-24 | 湖南汇田高分子科技有限公司 | 一种水溶性紫外光自固化氨基树脂的制备方法 |
| CN110105799B (zh) | 2019-05-07 | 2021-10-01 | 广东华润涂料有限公司 | 木器用涂料组合物以及由其制成的木制品 |
| CN110240821B (zh) | 2019-05-07 | 2021-04-02 | 广东华润涂料有限公司 | 木器用涂料组合物以及由其制成的木制品 |
| CN117534983B (zh) * | 2022-06-06 | 2025-06-27 | 广东炎墨方案科技股份有限公司 | 一种高玻璃化转变温度光固化阻焊油墨的应用方法 |
| CN117363074B (zh) * | 2023-11-03 | 2025-09-23 | 苏州瀚海新材料有限公司 | 一种uv-迈克尔双重固化三防漆及其制备方法 |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2730517A (en) * | 1952-01-15 | 1956-01-10 | Pittsburgh Plate Glass Co | Modification of polyester bodies |
| US4262072A (en) * | 1979-06-25 | 1981-04-14 | Minnesota Mining And Manufacturing Company | Poly(ethylenically unsaturated alkoxy) heterocyclic protective coatings |
| ATE46178T1 (de) * | 1984-04-04 | 1989-09-15 | Hoechst Ag | Umsetzungsprodukt von olefinisch ungesaettigten verbindungen mit wasserstoffaktiven verbindungen, verfahren zu dessen herstellung und darauf basierende 2-komponentenlacke. |
| DE3417441A1 (de) * | 1984-05-11 | 1985-11-14 | Hoechst Ag, 6230 Frankfurt | Haertungskomponente fuer kunstharze, die zur amid- oder esterbildung mit carbonsaeuren befaehigte gruppen enthalten |
| BR8606287A (pt) | 1985-12-19 | 1987-10-06 | Cook Paint & Varnish Inc | Processo para a preparacao de um polimero reticulado |
| WO1991009910A1 (en) * | 1988-10-17 | 1991-07-11 | Guertin Bros. Coatings And Sealants, Ltd. | Nco-free resins useful as a substitute for polyurethanes |
| DE3914375A1 (de) * | 1989-04-29 | 1990-11-15 | Basf Ag | Durch ultraviolette strahlung haertbares mittel |
| JP2932311B2 (ja) * | 1990-10-03 | 1999-08-09 | 住化プラステック株式会社 | 透明性に優れた赤外線吸収フィルム |
| US5567761A (en) | 1993-05-10 | 1996-10-22 | Guertin Bros. Coatings And Sealants Ltd. | Aqueous two-part isocyanate-free curable, polyurethane resin systems |
| US5506279A (en) * | 1993-10-13 | 1996-04-09 | Minnesota Mining And Manufacturing Company | Acrylamido functional disubstituted acetyl aryl ketone photoinitiators |
| US5412151A (en) * | 1993-10-22 | 1995-05-02 | Eastman Chemical Company | Thermosetting coating compositions |
| KR970704849A (ko) * | 1994-07-29 | 1997-09-06 | 워렌 리차드 보비 | 가교 점탄성 물질로 경화가능한 아크릴 시럽 |
| US5459178A (en) * | 1994-10-21 | 1995-10-17 | Ashland Inc. | Foundry mixes and their uses |
| DE19524812A1 (de) * | 1995-07-07 | 1997-01-09 | Basf Ag | Strahlungshärtbare Acrylate mit eingebautem Photoinitiatoren |
| GB9522683D0 (en) * | 1995-11-06 | 1996-01-10 | Coates Brothers Plc | Photoinitiator |
| US6025410A (en) * | 1997-09-19 | 2000-02-15 | Ashland Inc. | Liquid oligomers containing acrylate unsaturation |
| US6673851B2 (en) * | 2001-10-12 | 2004-01-06 | Ashland Inc. | Self-photoinitiating multifunctional acrylates |
| EP1342737B1 (de) * | 2002-03-07 | 2007-06-13 | Dainippon Ink And Chemicals, Inc. | Initiatorfreie vernetzbare Oligomere und Polymere |
| EP1342738B1 (de) | 2002-03-07 | 2007-03-07 | Dainippon Ink And Chemicals, Inc. | Photohärtbare Zusammensetzung, Verfahren zur Herstellung eines photohärtbaren Harzes und vernetztes Produkt |
| JP2004151691A (ja) | 2002-09-30 | 2004-05-27 | Rohm & Haas Electronic Materials Llc | 改良フォトレジスト |
| TW583226B (en) * | 2002-12-17 | 2004-04-11 | Ind Technology Res Inst Materi | Formulation in preparing solid electrolytic capacitor and process thereof |
| US8013068B2 (en) * | 2003-01-02 | 2011-09-06 | Rohm And Haas Company | Michael addition compositions |
| US7291658B2 (en) * | 2003-10-14 | 2007-11-06 | Ashland Licensing And Intellectual Property Llc | Radiation-curable inks for flexographic and screen-printing applications from multifunctional acrylate oligomers |
| AU2005237474A1 (en) | 2004-04-21 | 2005-11-10 | Ashland Licensing And Intellectual Property Llc | Radiation curable high gloss overprint varnish compositions |
| CN101027326B (zh) * | 2004-04-21 | 2011-03-23 | 亚什兰许可和知识产权有限公司 | 具有内在光敏引发剂的可辐射固化迈克尔加成树脂 |
| EP1593728B1 (de) * | 2004-05-03 | 2012-05-09 | Rohm And Haas Company | Zusammensetzungen auf Basis eines Michael-Additionsproduktes |
-
2004
- 2004-12-10 US US11/009,588 patent/US7307106B2/en not_active Expired - Fee Related
-
2005
- 2005-10-28 DE DE602005027241T patent/DE602005027241D1/de not_active Expired - Lifetime
- 2005-10-28 WO PCT/US2005/039099 patent/WO2006065369A2/en not_active Ceased
- 2005-10-28 JP JP2007545465A patent/JP2008523205A/ja active Pending
- 2005-10-28 KR KR1020077015654A patent/KR20070093097A/ko not_active Withdrawn
- 2005-10-28 EP EP05820205A patent/EP1819737B1/de not_active Expired - Lifetime
- 2005-10-28 AT AT05820205T patent/ATE503774T1/de not_active IP Right Cessation
- 2005-10-28 CN CN2005800425335A patent/CN101076545B/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2008523205A (ja) | 2008-07-03 |
| EP1819737A2 (de) | 2007-08-22 |
| KR20070093097A (ko) | 2007-09-17 |
| US7307106B2 (en) | 2007-12-11 |
| EP1819737B1 (de) | 2011-03-30 |
| US20060128825A1 (en) | 2006-06-15 |
| WO2006065369A3 (en) | 2006-08-03 |
| CN101076545B (zh) | 2011-03-02 |
| DE602005027241D1 (en) | 2011-05-12 |
| CN101076545A (zh) | 2007-11-21 |
| WO2006065369A2 (en) | 2006-06-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |