ATE509734T1 - Polierkissen mit unterlage und dieses umfassendes mehrlagiges kissen - Google Patents

Polierkissen mit unterlage und dieses umfassendes mehrlagiges kissen

Info

Publication number
ATE509734T1
ATE509734T1 AT05726461T AT05726461T ATE509734T1 AT E509734 T1 ATE509734 T1 AT E509734T1 AT 05726461 T AT05726461 T AT 05726461T AT 05726461 T AT05726461 T AT 05726461T AT E509734 T1 ATE509734 T1 AT E509734T1
Authority
AT
Austria
Prior art keywords
backing
polishing pad
comprehensive multi
layer pillow
pillow
Prior art date
Application number
AT05726461T
Other languages
English (en)
Inventor
Eu-Gene Song
Ju-Yeol Lee
Sung-Min Kim
Jae-Seok Kim
Hyun-Woo Lee
Original Assignee
Skc Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Skc Co Ltd filed Critical Skc Co Ltd
Priority claimed from PCT/KR2005/000441 external-priority patent/WO2005077602A1/en
Application granted granted Critical
Publication of ATE509734T1 publication Critical patent/ATE509734T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21J—FORGING; HAMMERING; PRESSING METAL; RIVETING; FORGE FURNACES
    • B21J13/00—Details of machines for forging, pressing, or hammering
    • B21J13/08—Accessories for handling work or tools
    • B21J13/10—Manipulators

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
AT05726461T 2004-02-17 2005-02-16 Polierkissen mit unterlage und dieses umfassendes mehrlagiges kissen ATE509734T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR20040010492 2004-02-17
KR1020040016402A KR100545795B1 (ko) 2004-02-17 2004-03-11 연마 패드의 기재 패드와 이를 이용한 다층 패드
PCT/KR2005/000441 WO2005077602A1 (en) 2004-02-17 2005-02-16 Base pad polishing pad and multi-layer pad comprising the same

Publications (1)

Publication Number Publication Date
ATE509734T1 true ATE509734T1 (de) 2011-06-15

Family

ID=37268614

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05726461T ATE509734T1 (de) 2004-02-17 2005-02-16 Polierkissen mit unterlage und dieses umfassendes mehrlagiges kissen

Country Status (3)

Country Link
KR (1) KR100545795B1 (de)
CN (1) CN100475447C (de)
AT (1) ATE509734T1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101850541B (zh) * 2009-04-02 2013-05-08 贝达先进材料股份有限公司 具有阻绝层的抛光垫和其制造方法
US10252396B2 (en) 2014-04-03 2019-04-09 3M Innovative Properties Company Polishing pads and systems and methods of making and using the same
CN108247529B (zh) * 2018-04-02 2020-11-10 上海欧柏森环境工程管理有限公司 一种石材抛光、结晶、研磨、清洁垫

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6705934B1 (en) * 1998-08-28 2004-03-16 Toray Industries, Inc. Polishing pad
CN1137013C (zh) * 1999-01-21 2004-02-04 罗德尔控股公司 改进的抛光垫及其抛光方法
US6319108B1 (en) * 1999-07-09 2001-11-20 3M Innovative Properties Company Metal bond abrasive article comprising porous ceramic abrasive composites and method of using same to abrade a workpiece
DE60110226T2 (de) * 2000-06-30 2006-03-09 Rohm and Haas Electronic Materials CMP Holdings, Inc., Wilmington Unterlage für polierscheibe
US6679769B2 (en) * 2000-09-19 2004-01-20 Rodel Holdings, Inc Polishing pad having an advantageous micro-texture and methods relating thereto

Also Published As

Publication number Publication date
CN1905993A (zh) 2007-01-31
KR100545795B1 (ko) 2006-01-24
KR20050082142A (ko) 2005-08-22
CN100475447C (zh) 2009-04-08

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Legal Events

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