ATE510220T1 - Chemisch geätzter mikrokontakt - Google Patents

Chemisch geätzter mikrokontakt

Info

Publication number
ATE510220T1
ATE510220T1 AT02020973T AT02020973T ATE510220T1 AT E510220 T1 ATE510220 T1 AT E510220T1 AT 02020973 T AT02020973 T AT 02020973T AT 02020973 T AT02020973 T AT 02020973T AT E510220 T1 ATE510220 T1 AT E510220T1
Authority
AT
Austria
Prior art keywords
photoresist
probes
metal foil
mask
chemical etched
Prior art date
Application number
AT02020973T
Other languages
English (en)
Inventor
Fran Mcquade
Charles Barto
Original Assignee
Wentworth Lab Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wentworth Lab Inc filed Critical Wentworth Lab Inc
Application granted granted Critical
Publication of ATE510220T1 publication Critical patent/ATE510220T1/de

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02—General constructional details
    • G01R1/06—Measuring leads; Measuring probes
    • G01R1/067—Measuring probes
    • G01R1/06711—Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
    • G01R1/06733—Geometry aspects
    • G01R1/06744—Microprobes, i.e. having dimensions as IC details
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R3/00—Apparatus or processes specially adapted for the manufacture or maintenance of measuring instruments, e.g. of probe tips

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Measuring Leads Or Probes (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • ing And Chemical Polishing (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
AT02020973T 2001-09-20 2002-09-19 Chemisch geätzter mikrokontakt ATE510220T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US32365101P 2001-09-20 2001-09-20
US10/027,146 US6906540B2 (en) 2001-09-20 2001-12-20 Method for chemically etching photo-defined micro electrical contacts

Publications (1)

Publication Number Publication Date
ATE510220T1 true ATE510220T1 (de) 2011-06-15

Family

ID=26702127

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02020973T ATE510220T1 (de) 2001-09-20 2002-09-19 Chemisch geätzter mikrokontakt

Country Status (6)

Country Link
US (1) US6906540B2 (de)
EP (1) EP1300685B1 (de)
JP (1) JP3696849B2 (de)
KR (1) KR100690235B1 (de)
AT (1) ATE510220T1 (de)
TW (1) TW567553B (de)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5914613A (en) * 1996-08-08 1999-06-22 Cascade Microtech, Inc. Membrane probing system with local contact scrub
US6256882B1 (en) 1998-07-14 2001-07-10 Cascade Microtech, Inc. Membrane probing system
US6578264B1 (en) 1999-06-04 2003-06-17 Cascade Microtech, Inc. Method for constructing a membrane probe using a depression
US20030078499A1 (en) * 1999-08-12 2003-04-24 Eppstein Jonathan A. Microporation of tissue for delivery of bioactive agents
AU2002327490A1 (en) * 2001-08-21 2003-06-30 Cascade Microtech, Inc. Membrane probing system
US6977515B2 (en) * 2001-09-20 2005-12-20 Wentworth Laboratories, Inc. Method for forming photo-defined micro electrical contacts
US9918665B2 (en) 2002-03-11 2018-03-20 Nitto Denko Corporation Transdermal porator and patch system and method for using same
US8116860B2 (en) 2002-03-11 2012-02-14 Altea Therapeutics Corporation Transdermal porator and patch system and method for using same
WO2003077971A2 (en) 2002-03-11 2003-09-25 Altea Therapeutics Corporation Transdermal drug delivery patch system, method of making same and method of using same
USD510043S1 (en) 2003-06-11 2005-09-27 K&S Interconnect, Inc. Continuously profiled probe beam
US8016811B2 (en) 2003-10-24 2011-09-13 Altea Therapeutics Corporation Method for transdermal delivery of permeant substances
MY137372A (en) * 2003-11-14 2009-01-30 Wentworth Lab Inc Die design with integrated assembly aid
DE602004009662T2 (de) * 2004-03-24 2008-08-28 Technoprobe S.P.A. Kontaktstift für einen Prüfkopf
EP1766426B1 (de) 2004-07-07 2013-09-11 Cascade Microtech, Inc. Tastkopf mit einem an der membran aufgehängten fühler
CN100446355C (zh) * 2005-02-03 2008-12-24 旺矽科技股份有限公司 微接触元件
TWI284209B (en) * 2005-12-30 2007-07-21 Ind Tech Res Inst A method of fabricating vertical probe head
KR100766193B1 (ko) * 2006-04-19 2007-10-10 광주과학기술원 전기화학적 에칭법을 이용한 마이크로 탐침 제조방법 및 그장치
KR100781574B1 (ko) * 2006-08-08 2007-12-03 주식회사 나디스 평판 표시소자 검사용 프로브 블레이드 형 팁 및 그 프로브 블레이드 형 팁의 제조방법
TWI332086B (en) * 2006-10-24 2010-10-21 Ind Tech Res Inst Multi-layer electric probe and fabricating method
US7642793B2 (en) 2006-11-22 2010-01-05 Taiwan Semiconductor Manufacturing Company, Ltd. Ultra-fine pitch probe card structure
US7696766B2 (en) * 2007-01-31 2010-04-13 Taiwan Semiconductor Manufacturing Company, Ltd. Ultra-fine pitch probe card structure
US8264248B2 (en) * 2007-03-30 2012-09-11 Dsl Labs, Inc. Micro probe assembly
US20080238452A1 (en) * 2007-03-30 2008-10-02 Dsl Labs, Incorporated Vertical micro probes
US7554348B2 (en) * 2007-06-29 2009-06-30 Wentworth Laboratories, Inc. Multi-offset die head
US7733102B2 (en) 2007-07-10 2010-06-08 Taiwan Semiconductor Manufacturing Company, Ltd. Ultra-fine area array pitch probe card
KR100932104B1 (ko) 2008-06-09 2009-12-16 (주)에이원메카 사선형 탐침부재를 구비한 프로브 블록 및 상기탐침부재를 제조하는 방법
US7888957B2 (en) 2008-10-06 2011-02-15 Cascade Microtech, Inc. Probing apparatus with impedance optimized interface
US8410806B2 (en) 2008-11-21 2013-04-02 Cascade Microtech, Inc. Replaceable coupon for a probing apparatus
KR101073829B1 (ko) * 2009-05-14 2011-10-14 주식회사 프로이천 프로브핀 제조방법
CN103328993B (zh) 2010-12-09 2016-03-23 温特沃斯实验室公司 探针卡组件和包括碳纳米管材料体的探针针体
TWI525326B (zh) * 2013-06-03 2016-03-11 Probe and probe module using the probe
CN103983933B (zh) * 2014-05-08 2017-09-19 工业和信息化部电子第五研究所 板级射频电流探头频率标定方法及系统和装置
JP7130247B2 (ja) * 2019-05-31 2022-09-05 共進電機株式会社 プローブ及び太陽電池セル用測定装置

Family Cites Families (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5230848B2 (de) 1973-10-09 1977-08-11
JPS5065232A (de) 1973-10-09 1975-06-02
US4027935A (en) 1976-06-21 1977-06-07 International Business Machines Corporation Contact for an electrical contactor assembly
EP0078339B1 (de) 1981-10-30 1986-07-30 Ibm Deutschland Gmbh Tastkopfanordnung für Leiterzugüberprüfung mit mindestens einem, eine Vielzahl von federnden Kontakten aufweisenden Tastkopf
US4451327A (en) 1982-12-17 1984-05-29 Psi Star, Inc. Process and structure for etching copper
US4466859A (en) 1983-05-25 1984-08-21 Psi Star, Inc. Process for etching copper
US5829128A (en) 1993-11-16 1998-11-03 Formfactor, Inc. Method of mounting resilient contact structures to semiconductor devices
US6043563A (en) 1997-05-06 2000-03-28 Formfactor, Inc. Electronic components with terminals and spring contact elements extending from areas which are remote from the terminals
US5917707A (en) 1993-11-16 1999-06-29 Formfactor, Inc. Flexible contact structure with an electrically conductive shell
US4747907A (en) 1986-10-29 1988-05-31 International Business Machines Corporation Metal etching process with etch rate enhancement
US4980638A (en) 1989-05-26 1990-12-25 Dermon John A Microcircuit probe and method for manufacturing same
JPH0362546A (ja) * 1989-07-31 1991-03-18 Toshiba Corp 走査探針及びその製造方法
JPH06249878A (ja) 1993-03-01 1994-09-09 Kobe Steel Ltd プローブユニット及びその製造方法
US5326428A (en) * 1993-09-03 1994-07-05 Micron Semiconductor, Inc. Method for testing semiconductor circuitry for operability and method of forming apparatus for testing semiconductor circuitry for operability
US6023103A (en) 1994-11-15 2000-02-08 Formfactor, Inc. Chip-scale carrier for semiconductor devices including mounted spring contacts
US5508144A (en) 1993-11-19 1996-04-16 At&T Corp. Process for fabricating a device
US5416429A (en) 1994-05-23 1995-05-16 Wentworth Laboratories, Inc. Probe assembly for testing integrated circuits
US5495667A (en) 1994-11-07 1996-03-05 Micron Technology, Inc. Method for forming contact pins for semiconductor dice and interconnects
US6150186A (en) 1995-05-26 2000-11-21 Formfactor, Inc. Method of making a product with improved material properties by moderate heat-treatment of a metal incorporating a dilute additive
KR970053345A (ko) * 1995-12-30 1997-07-31 김광호 캐리어(carrier) 이송 장치
US5959461A (en) 1997-07-14 1999-09-28 Wentworth Laboratories, Inc. Probe station adapter for backside emission inspection
WO1999004273A1 (en) 1997-07-15 1999-01-28 Wentworth Laboratories, Inc. Probe station with multiple adjustable probe supports
JPH11125646A (ja) * 1997-10-21 1999-05-11 Mitsubishi Electric Corp 垂直針型プローブカード、その製造方法およびその不良プローブ針の交換方法
JPH11160356A (ja) * 1997-11-25 1999-06-18 Matsushita Electric Ind Co Ltd ウェハ一括型測定検査用プローブカードおよびセラミック多層配線基板ならびにそれらの製造方法
US5952843A (en) 1998-03-24 1999-09-14 Vinh; Nguyen T. Variable contact pressure probe
US6194127B1 (en) 1998-05-27 2001-02-27 Mcdonnell Douglas Corporation Resistive sheet patterning process and product thereof
US6150176A (en) * 1998-06-09 2000-11-21 The Regents Of The University Of California Fluorescent protein sensors for measuring the pH of a biological sample
US6503231B1 (en) * 1998-06-10 2003-01-07 Georgia Tech Research Corporation Microneedle device for transport of molecules across tissue
US6303262B1 (en) 1998-06-18 2001-10-16 Mitsubishi Paper Mills Ltd. Photomask material, photomask and methods for the production thereof
US6124723A (en) 1998-08-31 2000-09-26 Wentworth Laboratories, Inc. Probe holder for low voltage, low current measurements in a water probe station
US6160412A (en) 1998-11-05 2000-12-12 Wentworth Laboratories, Inc. Impedance-matched interconnection device for connecting a vertical-pin integrated circuit probing device to integrated circuit test equipment
US6163162A (en) 1999-01-11 2000-12-19 Wentworth Laboratories, Inc. Temperature compensated vertical pin probing device
US6297657B1 (en) 1999-01-11 2001-10-02 Wentworth Laboratories, Inc. Temperature compensated vertical pin probing device
US6255602B1 (en) 1999-03-15 2001-07-03 Wentworth Laboratories, Inc. Multiple layer electrical interface
US6330744B1 (en) * 1999-07-12 2001-12-18 Pjc Technologies, Inc. Customized electrical test probe head using uniform probe assemblies
US6363605B1 (en) * 1999-11-03 2002-04-02 Yi-Chi Shih Method for fabricating a plurality of non-symmetrical waveguide probes
FR2802346B1 (fr) 1999-12-13 2002-02-08 Upsys Probe Technology Sas Connecteur de test de haute densite d'interconnexion destine notamment a la verification de circuits integres
US6633175B1 (en) 2000-03-06 2003-10-14 Wenworth Laboratories, Inc. Temperature compensated vertical pin probing device
US6564454B1 (en) * 2000-12-28 2003-05-20 Amkor Technology, Inc. Method of making and stacking a semiconductor package
US6448506B1 (en) * 2000-12-28 2002-09-10 Amkor Technology, Inc. Semiconductor package and circuit board for making the package
US6573734B2 (en) * 2001-05-08 2003-06-03 The Board Of Trustees Of The University Of Illinois Integrated thin film liquid conductivity sensor

Also Published As

Publication number Publication date
HK1054790A1 (en) 2003-12-12
JP2003185678A (ja) 2003-07-03
EP1300685A3 (de) 2003-05-21
US20030057957A1 (en) 2003-03-27
JP3696849B2 (ja) 2005-09-21
KR100690235B1 (ko) 2007-03-12
EP1300685A2 (de) 2003-04-09
KR20030025827A (ko) 2003-03-29
TW567553B (en) 2003-12-21
US6906540B2 (en) 2005-06-14
EP1300685B1 (de) 2011-05-18

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