ATE510302T1 - Vorrichtung mit einer halbleiteranordnung und auswerteschaltungen, und entsprechende verfahren - Google Patents

Vorrichtung mit einer halbleiteranordnung und auswerteschaltungen, und entsprechende verfahren

Info

Publication number
ATE510302T1
ATE510302T1 AT03725509T AT03725509T ATE510302T1 AT E510302 T1 ATE510302 T1 AT E510302T1 AT 03725509 T AT03725509 T AT 03725509T AT 03725509 T AT03725509 T AT 03725509T AT E510302 T1 ATE510302 T1 AT E510302T1
Authority
AT
Austria
Prior art keywords
voltage
corresponding method
semiconductor device
determining
semiconductor arrangement
Prior art date
Application number
AT03725509T
Other languages
English (en)
Inventor
John Petruzzello
Benoit Dufort
Theodore Letavic
Original Assignee
Nxp Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nxp Bv filed Critical Nxp Bv
Application granted granted Critical
Publication of ATE510302T1 publication Critical patent/ATE510302T1/de

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/80Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple passive components, e.g. resistors, capacitors or inductors
    • H10D86/85Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple passive components, e.g. resistors, capacitors or inductors characterised by only passive components
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/111Field plates
    • H10D64/112Field plates comprising multiple field plate segments
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/64Double-diffused metal-oxide semiconductor [DMOS] FETs
    • H10D30/65Lateral DMOS [LDMOS] FETs
    • H10D30/657Lateral DMOS [LDMOS] FETs having substrates comprising insulating layers, e.g. SOI-LDMOS transistors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/64Double-diffused metal-oxide semiconductor [DMOS] FETs
    • H10D30/65Lateral DMOS [LDMOS] FETs
    • H10D30/659Lateral DMOS [LDMOS] FETs having voltage-sensing or current-sensing structures, e.g. emulator sections or overcurrent sensing cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/201Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates the substrates comprising an insulating layer on a semiconductor body, e.g. SOI
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/20Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/27Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
    • H10D64/311Gate electrodes for field-effect devices
    • H10D64/411Gate electrodes for field-effect devices for FETs
    • H10D64/511Gate electrodes for field-effect devices for FETs for IGFETs
    • H10D64/514Gate electrodes for field-effect devices for FETs for IGFETs characterised by the insulating layers
    • H10D64/516Gate electrodes for field-effect devices for FETs for IGFETs characterised by the insulating layers the thicknesses being non-uniform

Landscapes

  • Thin Film Transistor (AREA)
  • Measurement Of Current Or Voltage (AREA)
  • Preparation Of Compounds By Using Micro-Organisms (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
AT03725509T 2002-05-21 2003-05-20 Vorrichtung mit einer halbleiteranordnung und auswerteschaltungen, und entsprechende verfahren ATE510302T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/152,235 US6717214B2 (en) 2002-05-21 2002-05-21 SOI-LDMOS device with integral voltage sense electrodes
PCT/IB2003/002142 WO2003098690A2 (en) 2002-05-21 2003-05-20 Soi-ldmos devices

Publications (1)

Publication Number Publication Date
ATE510302T1 true ATE510302T1 (de) 2011-06-15

Family

ID=29548459

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03725509T ATE510302T1 (de) 2002-05-21 2003-05-20 Vorrichtung mit einer halbleiteranordnung und auswerteschaltungen, und entsprechende verfahren

Country Status (8)

Country Link
US (2) US6717214B2 (de)
EP (1) EP1509955B1 (de)
JP (1) JP2005526400A (de)
KR (1) KR20040111631A (de)
CN (1) CN100505305C (de)
AT (1) ATE510302T1 (de)
AU (1) AU2003228040A1 (de)
WO (1) WO2003098690A2 (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4337983B2 (ja) * 2005-02-17 2009-09-30 国立大学法人 東京大学 混在型半導体集積回路及びその製造方法
DE102005039804B4 (de) * 2005-08-22 2009-07-09 Infineon Technologies Ag Laterales Halbleiterbauelement mit Driftstrecke und Potentialverteilungsstruktur, Verwendung des Halbleiterbauelements sowie Verfahren zur Herstellung desselben
DE102006001922B3 (de) * 2006-01-14 2007-05-03 Infineon Technologies Austria Ag Lateraler Leistungstransistor und Verfahren zu dessen Herstellung
JP5307973B2 (ja) * 2006-02-24 2013-10-02 セミコンダクター・コンポーネンツ・インダストリーズ・リミテッド・ライアビリティ・カンパニー 半導体装置
JP4989085B2 (ja) * 2006-02-24 2012-08-01 オンセミコンダクター・トレーディング・リミテッド 半導体装置及びその製造方法
WO2008128662A1 (en) * 2007-04-19 2008-10-30 Stryker Trauma Gmbh Hip fracture device with barrel and end cap for load control
EP2134279B1 (de) 2007-04-19 2017-01-04 Stryker European Holdings I, LLC Hüftbruchvorrichtung mit statischem verschlussmechanismus mit kompressionsmöglichkeit
US8174071B2 (en) * 2008-05-02 2012-05-08 Taiwan Semiconductor Manufacturing Co., Ltd. High voltage LDMOS transistor
CN101593774B (zh) * 2009-06-10 2012-05-23 苏州博创集成电路设计有限公司 P型绝缘体上硅的横向双扩散金属氧化物半导体晶体管
CN101714552B (zh) * 2009-11-09 2011-05-25 苏州博创集成电路设计有限公司 等离子显示驱动芯片用高低压器件及制备方法
CN102142460B (zh) * 2010-12-29 2013-10-02 电子科技大学 一种soi型p-ldmos
US8901676B2 (en) 2011-01-03 2014-12-02 International Business Machines Corporation Lateral extended drain metal oxide semiconductor field effect transistor (LEDMOSFET) having a high drain-to-body breakdown voltage (Vb), a method of forming an LEDMOSFET, and a silicon-controlled rectifier (SCR) incorporating a complementary pair of LEDMOSFETs
US8299547B2 (en) 2011-01-03 2012-10-30 International Business Machines Corporation Lateral extended drain metal oxide semiconductor field effect transistor (LEDMOSFET) with tapered dielectric plates
US8680615B2 (en) 2011-12-13 2014-03-25 Freescale Semiconductor, Inc. Customized shield plate for a field effect transistor
US8829570B2 (en) 2012-03-09 2014-09-09 Analog Devices, Inc. Switching device for heterojunction integrated circuits and methods of forming the same
US9142625B2 (en) 2012-10-12 2015-09-22 Nxp B.V. Field plate assisted resistance reduction in a semiconductor device
US9245960B2 (en) 2013-02-08 2016-01-26 Globalfoundries Inc. Lateral extended drain metal oxide semiconductor field effect transistor (LEDMOSFET) with tapered airgap field plates
US9275991B2 (en) 2013-02-13 2016-03-01 Analog Devices, Inc. Apparatus for transceiver signal isolation and voltage clamp
CN103762156A (zh) * 2013-12-31 2014-04-30 上海新傲科技股份有限公司 半导体衬底的制作方法、半导体衬底以及高压晶体管
US9673187B2 (en) 2015-04-07 2017-06-06 Analog Devices, Inc. High speed interface protection apparatus
US9831233B2 (en) 2016-04-29 2017-11-28 Analog Devices Global Apparatuses for communication systems transceiver interfaces
US10734806B2 (en) 2016-07-21 2020-08-04 Analog Devices, Inc. High voltage clamps with transient activation and activation release control
US10249609B2 (en) 2017-08-10 2019-04-02 Analog Devices, Inc. Apparatuses for communication systems transceiver interfaces
US10700056B2 (en) 2018-09-07 2020-06-30 Analog Devices, Inc. Apparatus for automotive and communication systems transceiver interfaces
US11387648B2 (en) 2019-01-10 2022-07-12 Analog Devices International Unlimited Company Electrical overstress protection with low leakage current for high voltage tolerant high speed interfaces

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3063085D1 (en) * 1979-05-30 1983-06-16 Xerox Corp Monolithic hvmosfet array
US5378912A (en) * 1993-11-10 1995-01-03 Philips Electronics North America Corporation Lateral semiconductor-on-insulator (SOI) semiconductor device having a lateral drift region
US6310378B1 (en) * 1997-12-24 2001-10-30 Philips Electronics North American Corporation High voltage thin film transistor with improved on-state characteristics and method for making same
US6346451B1 (en) * 1997-12-24 2002-02-12 Philips Electronics North America Corporation Laterial thin-film silicon-on-insulator (SOI) device having a gate electrode and a field plate electrode
US6028337A (en) * 1998-11-06 2000-02-22 Philips North America Corporation Lateral thin-film silicon-on-insulator (SOI) device having lateral depletion means for depleting a portion of drift region
KR100416589B1 (ko) * 2001-01-06 2004-02-05 삼성전자주식회사 스위칭 특성을 개선하고 누설전류를 감소시키는 전하펌프회로 및 이를 구비하는 위상동기 루프
JP4796238B2 (ja) * 2001-04-27 2011-10-19 Okiセミコンダクタ株式会社 ワード線駆動回路
US6627958B2 (en) * 2001-12-10 2003-09-30 Koninklijke Philips Electronics N.V. Lateral high voltage semiconductor device having a sense terminal and method for sensing a drain voltage of the same

Also Published As

Publication number Publication date
US20030218211A1 (en) 2003-11-27
WO2003098690A2 (en) 2003-11-27
AU2003228040A1 (en) 2003-12-02
AU2003228040A8 (en) 2003-12-02
US20040164351A1 (en) 2004-08-26
US6833726B2 (en) 2004-12-21
JP2005526400A (ja) 2005-09-02
EP1509955B1 (de) 2011-05-18
EP1509955A2 (de) 2005-03-02
WO2003098690A3 (en) 2004-04-22
CN100505305C (zh) 2009-06-24
US6717214B2 (en) 2004-04-06
CN1864269A (zh) 2006-11-15
KR20040111631A (ko) 2004-12-31

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