ATE512389T1 - Erkennung von kontaminationen in euv-systemen - Google Patents

Erkennung von kontaminationen in euv-systemen

Info

Publication number
ATE512389T1
ATE512389T1 AT07119107T AT07119107T ATE512389T1 AT E512389 T1 ATE512389 T1 AT E512389T1 AT 07119107 T AT07119107 T AT 07119107T AT 07119107 T AT07119107 T AT 07119107T AT E512389 T1 ATE512389 T1 AT E512389T1
Authority
AT
Austria
Prior art keywords
sensor
contamination
contaminations
detection
reflectivity change
Prior art date
Application number
AT07119107T
Other languages
English (en)
Inventor
Rik Jonckheere
Anne-Marie Goethals
Gian Francesco Lorusso
Ivan Pollentier
Original Assignee
Imec
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imec filed Critical Imec
Application granted granted Critical
Publication of ATE512389T1 publication Critical patent/ATE512389T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
AT07119107T 2007-10-23 2007-10-23 Erkennung von kontaminationen in euv-systemen ATE512389T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP20070119107 EP2053463B1 (de) 2007-10-23 2007-10-23 Erkennung von Kontaminationen in EUV-Systemen

Publications (1)

Publication Number Publication Date
ATE512389T1 true ATE512389T1 (de) 2011-06-15

Family

ID=38920719

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07119107T ATE512389T1 (de) 2007-10-23 2007-10-23 Erkennung von kontaminationen in euv-systemen

Country Status (4)

Country Link
US (2) US20090103069A1 (de)
EP (1) EP2053463B1 (de)
JP (1) JP5171542B2 (de)
AT (1) ATE512389T1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100857797B1 (ko) * 2006-09-08 2008-09-09 엘지전자 주식회사 세탁기의 운전방법
JP5559562B2 (ja) 2009-02-12 2014-07-23 ギガフォトン株式会社 極端紫外光光源装置
US9028918B2 (en) * 2012-08-21 2015-05-12 Globalfoundries Inc. Forming a hardmask capping layer
DE102012222466A1 (de) 2012-12-06 2014-06-12 Carl Zeiss Smt Gmbh Reflektives optisches Element für die EUV-Lithographie
EP2905637A1 (de) * 2014-02-07 2015-08-12 ASML Netherlands B.V. Optisches EUV-Element mit einer blasenresistenten mehrschichtigen Kappe
DE102017222690A1 (de) 2017-12-14 2018-02-15 Carl Zeiss Smt Gmbh Optisches Element mit einem Wasserstoff-Desorptionsmaterial
WO2025256814A1 (en) * 2024-06-10 2025-12-18 Asml Netherlands B.V. An extreme ultraviolet mirror with an integrated sensor
CN121594805B (zh) * 2026-01-29 2026-04-03 中国科学院长春光学精密机械与物理研究所 基于二次电子的极紫外反射镜表面锡污染层厚度检测方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW561279B (en) * 1999-07-02 2003-11-11 Asml Netherlands Bv Reflector for reflecting radiation in a desired wavelength range, lithographic projection apparatus containing the same and method for their preparation
JP2002168776A (ja) * 2000-12-01 2002-06-14 Advantest Corp 環境モニタ方法及び装置並びに半導体製造装置
DE10061248B4 (de) * 2000-12-09 2004-02-26 Carl Zeiss Verfahren und Vorrichtung zur In-situ-Dekontamination eines EUV-Lithographiegerätes
US6664554B2 (en) * 2001-01-03 2003-12-16 Euv Llc Self-cleaning optic for extreme ultraviolet lithography
KR100455383B1 (ko) * 2002-04-18 2004-11-06 삼성전자주식회사 반사 포토마스크, 반사 포토마스크의 제조방법 및 이를이용한 집적회로 제조방법
SG115621A1 (en) * 2003-02-24 2005-10-28 Asml Netherlands Bv Method and device for measuring contamination of a surface of a component of a lithographic apparatus
DE10309084A1 (de) * 2003-03-03 2004-09-16 Carl Zeiss Smt Ag Reflektives optisches Element und EUV-Lithographiegerät
US7436635B2 (en) * 2003-07-29 2008-10-14 Hitachi Global Storage Technologies Netherlands B.V. Current perpendicular to plane (CPP) magnetoresistive sensor having a highly conductive lead structure
JP4095566B2 (ja) * 2003-09-05 2008-06-04 キヤノン株式会社 光学素子を評価する方法
SG112033A1 (en) * 2003-11-07 2005-06-29 Asml Netherlands Bv Radiation detector
US6980281B2 (en) * 2004-01-23 2005-12-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20070285643A1 (en) * 2004-03-05 2007-12-13 Carl Zeiss Smt Ag Method For Manufacturing Reflective Optical Element, Reflective Optical Elements, Euv-Lithography Apparatus And Methods For Operating Optical Elements And Euv-Lithography Apparatus, Methods For Determining The Phase Shift, Methods For Determining The Layer Thickness, And Apparatuses For Carrying Out The Methods
JP4352977B2 (ja) * 2004-04-20 2009-10-28 株式会社ニコン 多層膜反射鏡及びｅｕｖ露光装置
DE102004047677B4 (de) * 2004-09-30 2007-06-21 Advanced Micro Devices, Inc., Sunnyvale Verfahren und System für die Kontaminationserkennung und Überwachung in einer Lithographiebelichtungsanlage und Verfahren zum Betreiben der gleichen unter gesteuerten atomsphärischen Bedingungen
GB2434456B (en) * 2004-09-30 2009-03-25 Advanced Micro Devices Inc Contamination detection and monitoring in a lithographic exposure tool
US7369216B2 (en) * 2004-10-15 2008-05-06 Asml Netherlands B.V. Lithographic system, method for adapting transmission characteristics of an optical pathway within a lithographic system, semiconductor device, method of manufacturing a reflective element for use in a lithographic system, and reflective element manufactured thereby
US7914736B2 (en) * 2006-05-31 2011-03-29 Uchicago Argonne, Llc Semiconductor-based detection and decontamination system

Also Published As

Publication number Publication date
EP2053463A1 (de) 2009-04-29
US20090103069A1 (en) 2009-04-23
JP5171542B2 (ja) 2013-03-27
JP2009105403A (ja) 2009-05-14
US9086638B2 (en) 2015-07-21
US20120099092A1 (en) 2012-04-26
EP2053463B1 (de) 2011-06-08

Similar Documents

Publication Publication Date Title
WO2009151711A3 (en) Management system for mems inertial sensors
WO2009006605A3 (en) Motion-validating remote monitoring system
EP1336817A3 (de) Anordnung und Verfahren zum Ermitteln der relativen Ausrichtung zweier Körper
ATE412882T1 (de) Hochempfindliches, schnelles pixel für anwendung in einem bildsensor
DE60315743D1 (de) System zur kontaktlosen Hinderniserkennung mit hochempfindlicher kapazitiver Detektionsvorrichtung
TWI350467B (en) Optical navigation sensor with tracking and lift detection for optically transparent contact surfaces
TW200624781A (en) Method and system for sensing light using interferometric elements
WO2010027772A3 (en) System and method for detecting a camera
WO2008067244A3 (en) Apparatus and method for monitoring hazardous materials in a processing or other environment
DE50313389D1 (de) Verfahren und Vorrichtung zur Kalibrierung eines Messsystems
WO2007137261A3 (en) Methods and systems for detecting pinholes in a film formed on a wafer or for monitoring a thermal process tool
NO20091787L (no) Optisk bestemmelse av posisjonen til stopperen i glassampuller
EP2233514A4 (de) Optische folie und elektronisches informationsgerät damit
WO2008041732A8 (ja) 傾斜角推定機構を有する移動体
DE502007005802D1 (de) Berührungslos aktivierbare anzeige- und bedienvorrichtung
EP2535744A3 (de) Gegenüber Immersionsflüssigkeiten solvophobe Einfallsoberflächen und optische Fenster
TW200951646A (en) Surface position detection device, exposure device, surface position detection method and device production method
WO2007127871A3 (en) Systems and methods for monitoring and controlling dispense using a digital optical sensor
WO2009102681A3 (en) Systems and methods for resolving multitouch scenarios for optical touchscreens
AR045287A1 (es) Metodo y aparato para rastrear una carga sobre un sistema transportador
ATE523728T1 (de) Sicherung eines nur über eine sichere zugangsschleuse zugänglichen raumbereichs
WO2005114553A3 (en) Method and system for pupil detection for security applications
WO2010010311A3 (fr) Dispositif optique et procede de mesure de rotation d'un objet
MY145547A (en) Method and apparatus for detecting presence of an ophthalmic lens in a package
ATE533070T1 (de) Objektfeststellungsverfahren und objektfeststellungssensor

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties