ATE512570T1 - Lichtquellenvorrichtung für extremes ultraviolettlicht und verfahren zur erzeugung einer extremen ultraviolettstrahlung - Google Patents

Lichtquellenvorrichtung für extremes ultraviolettlicht und verfahren zur erzeugung einer extremen ultraviolettstrahlung

Info

Publication number
ATE512570T1
ATE512570T1 AT09012287T AT09012287T ATE512570T1 AT E512570 T1 ATE512570 T1 AT E512570T1 AT 09012287 T AT09012287 T AT 09012287T AT 09012287 T AT09012287 T AT 09012287T AT E512570 T1 ATE512570 T1 AT E512570T1
Authority
AT
Austria
Prior art keywords
energy beam
raw material
extreme ultraviolet
discharge electrodes
discharge
Prior art date
Application number
AT09012287T
Other languages
English (en)
Inventor
Yusuke Teramoto
Hiroshi Mizokoshi
Takuma Yokoyama
Original Assignee
Ushio Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Electric Inc filed Critical Ushio Electric Inc
Application granted granted Critical
Publication of ATE512570T1 publication Critical patent/ATE512570T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/007—Production of X-ray radiation generated from plasma involving electric or magnetic fields in the process of plasma generation

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • X-Ray Techniques (AREA)
AT09012287T 2008-09-29 2009-09-28 Lichtquellenvorrichtung für extremes ultraviolettlicht und verfahren zur erzeugung einer extremen ultraviolettstrahlung ATE512570T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008249574A JP4623192B2 (ja) 2008-09-29 2008-09-29 極端紫外光光源装置および極端紫外光発生方法

Publications (1)

Publication Number Publication Date
ATE512570T1 true ATE512570T1 (de) 2011-06-15

Family

ID=41381671

Family Applications (1)

Application Number Title Priority Date Filing Date
AT09012287T ATE512570T1 (de) 2008-09-29 2009-09-28 Lichtquellenvorrichtung für extremes ultraviolettlicht und verfahren zur erzeugung einer extremen ultraviolettstrahlung

Country Status (3)

Country Link
EP (1) EP2170020B1 (de)
JP (1) JP4623192B2 (de)
AT (1) ATE512570T1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102257883B (zh) * 2008-12-16 2014-06-25 皇家飞利浦电子股份有限公司 用于以提高的效率生成euv辐射或软x射线的方法和装置
DE102010047419B4 (de) * 2010-10-01 2013-09-05 Xtreme Technologies Gmbh Verfahren und Vorrichtung zur Erzeugung von EUV-Strahlung aus einem Gasentladungsplasma
JP5849746B2 (ja) * 2012-02-06 2016-02-03 株式会社Ihi プラズマ光源
DE102013000407B4 (de) * 2013-01-11 2020-03-26 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Verbesserung der Benetzbarkeit einer rotierenden Elektrode in einer Gasentladungslampe
DE102013204444A1 (de) * 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Beleuchtungsoptik für ein Maskeninspektionssystem sowie Maskeninspektionssystem mit einer derartigen Beleuchtungsoptik
JP5962699B2 (ja) 2014-04-15 2016-08-03 ウシオ電機株式会社 エネルギービームの位置合わせ装置および位置合わせ方法
JP6252358B2 (ja) * 2014-05-27 2017-12-27 ウシオ電機株式会社 極端紫外光光源装置
JP6717111B2 (ja) * 2016-08-15 2020-07-01 株式会社Ihi プラズマ光源及び極端紫外光の発光方法
JP7553296B2 (ja) * 2020-09-16 2024-09-18 ギガフォトン株式会社 極端紫外光生成装置、及び電子デバイスの製造方法
US11548190B2 (en) * 2020-12-11 2023-01-10 Phoseon Technology, Inc. Nested elliptic reflector for curing optical fibers

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
JP2002289397A (ja) * 2001-03-23 2002-10-04 Takayasu Mochizuki レーザプラズマ発生方法およびそのシステム
US6973164B2 (en) * 2003-06-26 2005-12-06 University Of Central Florida Research Foundation, Inc. Laser-produced plasma EUV light source with pre-pulse enhancement
EP1642482B1 (de) * 2003-06-27 2013-10-02 Bruker Advanced Supercon GmbH Vorrichtung und verfahren zur erzeugung von extrem ultravioletter strahlung oder weicher röntgenstrahlung
DE10342239B4 (de) 2003-09-11 2018-06-07 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen von Extrem-Ultraviolettstrahlung oder weicher Röntgenstrahlung
JP2006210157A (ja) * 2005-01-28 2006-08-10 Ushio Inc レーザ生成プラズマ方式極端紫外光光源
DE102005014433B3 (de) * 2005-03-24 2006-10-05 Xtreme Technologies Gmbh Verfahren und Anordnung zur effizienten Erzeugung von kurzwelliger Strahlung auf Basis eines lasererzeugten Plasmas
DE102005023060B4 (de) * 2005-05-19 2011-01-27 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Gasentladungs-Strahlungsquelle, insbesondere für EUV-Strahlung
US20080203325A1 (en) * 2005-06-14 2008-08-28 Koninklijke Philips Electronics, N.V. Method of Protecting a Radiation Source Producing Euv-Radiation and/or Soft X-Rays Against Short Circuits
DE102005039849B4 (de) * 2005-08-19 2011-01-27 Xtreme Technologies Gmbh Vorrichtung zur Strahlungserzeugung mittels einer Gasentladung
JP4904809B2 (ja) * 2005-12-28 2012-03-28 ウシオ電機株式会社 極端紫外光光源装置
JP2007200919A (ja) * 2006-01-23 2007-08-09 Ushio Inc 極端紫外光光源装置
EP2020165B1 (de) * 2006-05-16 2010-11-24 Philips Intellectual Property & Standards GmbH Verfahren zur erhöhung der umwandlungseffizienz einer euv- und/oder weichen röntgenstrahlenlampe und entsprechendes gerät
DE102006027856B3 (de) * 2006-06-13 2007-11-22 Xtreme Technologies Gmbh Anordnung zur Erzeugung von extrem ultravioletter Strahlung mittels elektrischer Entladung an regenerierbaren Elektroden
JP5216772B2 (ja) * 2006-09-06 2013-06-19 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ コンベアベルトターゲットを備えたｅｕｖプラズマ放電ランプ
US20080237501A1 (en) * 2007-03-28 2008-10-02 Ushio Denki Kabushiki Kaisha Extreme ultraviolet light source device and extreme ultraviolet radiation generating method
JP2008270149A (ja) * 2007-03-28 2008-11-06 Tokyo Institute Of Technology 極端紫外光光源装置および極端紫外光発生方法

Also Published As

Publication number Publication date
JP2010080362A (ja) 2010-04-08
EP2170020B1 (de) 2011-06-08
EP2170020A1 (de) 2010-03-31
JP4623192B2 (ja) 2011-02-02

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